TWI435332B - 單次可程式化記憶體及其操作方法 - Google Patents
單次可程式化記憶體及其操作方法 Download PDFInfo
- Publication number
- TWI435332B TWI435332B TW095128581A TW95128581A TWI435332B TW I435332 B TWI435332 B TW I435332B TW 095128581 A TW095128581 A TW 095128581A TW 95128581 A TW95128581 A TW 95128581A TW I435332 B TWI435332 B TW I435332B
- Authority
- TW
- Taiwan
- Prior art keywords
- programmable
- transistor
- current
- electrode
- control electrode
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 10
- 239000000758 substrate Substances 0.000 claims description 19
- 239000004065 semiconductor Substances 0.000 claims description 16
- 239000013078 crystal Substances 0.000 claims description 5
- 238000002955 isolation Methods 0.000 claims description 5
- 230000007704 transition Effects 0.000 claims description 3
- 230000008878 coupling Effects 0.000 claims description 2
- 238000010168 coupling process Methods 0.000 claims description 2
- 238000005859 coupling reaction Methods 0.000 claims description 2
- 230000004044 response Effects 0.000 claims description 2
- 238000009792 diffusion process Methods 0.000 description 11
- 239000004020 conductor Substances 0.000 description 9
- 230000015556 catabolic process Effects 0.000 description 8
- 230000008901 benefit Effects 0.000 description 7
- 239000003990 capacitor Substances 0.000 description 6
- 125000006850 spacer group Chemical group 0.000 description 6
- 230000005641 tunneling Effects 0.000 description 4
- 239000003989 dielectric material Substances 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 101100297345 Caenorhabditis elegans pgl-2 gene Proteins 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000005689 Fowler Nordheim tunneling Effects 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C17/00—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C17/00—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
- G11C17/14—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM
- G11C17/16—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM using electrically-fusible links
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C17/00—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
- G11C17/14—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM
- G11C17/18—Auxiliary circuits, e.g. for writing into memory
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B20/00—Read-only memory [ROM] devices
Landscapes
- Semiconductor Memories (AREA)
- Read Only Memory (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/197,814 US7206214B2 (en) | 2005-08-05 | 2005-08-05 | One time programmable memory and method of operation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200713289A TW200713289A (en) | 2007-04-01 |
| TWI435332B true TWI435332B (zh) | 2014-04-21 |
Family
ID=37717476
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW095128581A TWI435332B (zh) | 2005-08-05 | 2006-08-04 | 單次可程式化記憶體及其操作方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7206214B2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP5124456B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR101236582B1 (cg-RX-API-DMAC7.html) |
| CN (1) | CN101361139B (cg-RX-API-DMAC7.html) |
| TW (1) | TWI435332B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2007019109A2 (cg-RX-API-DMAC7.html) |
Families Citing this family (44)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7411815B2 (en) * | 2005-11-14 | 2008-08-12 | Infineon Technologies Ag | Memory write circuit |
| US7924596B2 (en) * | 2007-09-26 | 2011-04-12 | Intel Corporation | Area efficient programmable read only memory (PROM) array |
| US20090086521A1 (en) * | 2007-09-28 | 2009-04-02 | Herner S Brad | Multiple antifuse memory cells and methods to form, program, and sense the same |
| US7974127B2 (en) | 2007-11-06 | 2011-07-05 | Macronix International Co., Ltd. | Operation methods for memory cell and array for reducing punch through leakage |
| US7916551B2 (en) | 2007-11-06 | 2011-03-29 | Macronix International Co., Ltd. | Method of programming cell in memory and memory apparatus utilizing the method |
| JP5238458B2 (ja) * | 2008-11-04 | 2013-07-17 | 株式会社東芝 | 不揮発性半導体記憶装置 |
| CN101923583B (zh) * | 2009-06-10 | 2013-01-16 | 杭州士兰集成电路有限公司 | 一种将otp存储器版图改为rom存储器版图的方法 |
| WO2012085627A1 (en) * | 2010-12-23 | 2012-06-28 | Universitat Politecnica De Catalunya | Method for operating a transistor, reconfigurable processing architecture and use of a restored broken down transistor for a multiple mode operation |
| US8866121B2 (en) | 2011-07-29 | 2014-10-21 | Sandisk 3D Llc | Current-limiting layer and a current-reducing layer in a memory device |
| US8659001B2 (en) | 2011-09-01 | 2014-02-25 | Sandisk 3D Llc | Defect gradient to boost nonvolatile memory performance |
| KR20130032458A (ko) * | 2011-09-23 | 2013-04-02 | 에스케이하이닉스 주식회사 | Otp 메모리 셀을 포함하는 반도체 장치 |
| US8637413B2 (en) | 2011-12-02 | 2014-01-28 | Sandisk 3D Llc | Nonvolatile resistive memory element with a passivated switching layer |
| US8698119B2 (en) | 2012-01-19 | 2014-04-15 | Sandisk 3D Llc | Nonvolatile memory device using a tunnel oxide as a current limiter element |
| US8686386B2 (en) | 2012-02-17 | 2014-04-01 | Sandisk 3D Llc | Nonvolatile memory device using a varistor as a current limiter element |
| KR20140011790A (ko) | 2012-07-19 | 2014-01-29 | 삼성전자주식회사 | 멀티 레벨 안티퓨즈 메모리 장치 및 이의 동작 방법 |
| US8767434B2 (en) * | 2012-09-11 | 2014-07-01 | SK Hynix Inc. | E-fuse array circuit |
| US20140198583A1 (en) * | 2013-01-17 | 2014-07-17 | Infineon Technologies Ag | Method and System for Reducing the Size of Nonvolatile Memories |
| US9105310B2 (en) * | 2013-02-05 | 2015-08-11 | Qualcomm Incorporated | System and method of programming a memory cell |
| US8942034B2 (en) * | 2013-02-05 | 2015-01-27 | Qualcomm Incorporated | System and method of programming a memory cell |
| US20140241031A1 (en) | 2013-02-28 | 2014-08-28 | Sandisk 3D Llc | Dielectric-based memory cells having multi-level one-time programmable and bi-level rewriteable operating modes and methods of forming the same |
| JP2015076556A (ja) * | 2013-10-10 | 2015-04-20 | ソニー株式会社 | メモリ装置、書込方法、読出方法 |
| TWI543302B (zh) * | 2014-03-14 | 2016-07-21 | 林崇榮 | 一次編程記憶體及其相關記憶胞結構 |
| KR102169197B1 (ko) * | 2014-09-16 | 2020-10-22 | 에스케이하이닉스 주식회사 | 향상된 프로그램 효율을 갖는 안티퓨즈 오티피 메모리 셀 및 셀 어레이 |
| CN105513642B (zh) * | 2014-09-24 | 2019-11-05 | 珠海创飞芯科技有限公司 | Otp存储器 |
| KR102258112B1 (ko) * | 2015-04-01 | 2021-05-31 | 삼성전자주식회사 | 반도체 소자 및 이의 제조 방법 |
| US9799662B2 (en) * | 2015-08-18 | 2017-10-24 | Ememory Technology Inc. | Antifuse-type one time programming memory cell and array structure with same |
| TWI578325B (zh) * | 2015-08-18 | 2017-04-11 | 力旺電子股份有限公司 | 反熔絲型一次編程的記憶胞及其相關的陣列結構 |
| US10181357B2 (en) | 2015-08-18 | 2019-01-15 | Ememory Technology Inc. | Code generating apparatus and one time programming block |
| US9634015B2 (en) * | 2015-08-18 | 2017-04-25 | Ememory Technology Inc. | Antifuse-type one time programming memory cell and array structure with same |
| CN105243342B (zh) * | 2015-10-08 | 2019-02-19 | 浪潮(北京)电子信息产业有限公司 | 一种基于一次可编程查找表的标准单元逻辑电路 |
| US10109364B2 (en) * | 2015-10-21 | 2018-10-23 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Non-volatile memory cell having multiple signal pathways to provide access to an antifuse of the memory cell |
| KR102327140B1 (ko) * | 2015-11-30 | 2021-11-16 | 삼성전자주식회사 | Otp 메모리 소자와 그 제조방법 및 그 메모리 소자를 포함한 전자 장치 |
| US10032522B2 (en) * | 2016-06-10 | 2018-07-24 | Synopsys, Inc. | Three-transistor OTP memory cell |
| EP3288037B1 (en) * | 2016-08-25 | 2023-11-08 | eMemory Technology Inc. | Memory array having a small chip area |
| US10103732B1 (en) | 2017-10-04 | 2018-10-16 | Synopsys, Inc. | Low power voltage level shifter circuit |
| US10163520B1 (en) | 2017-10-16 | 2018-12-25 | Synopsys, Inc. | OTP cell with improved programmability |
| CN108511024A (zh) * | 2018-04-11 | 2018-09-07 | 珠海创飞芯科技有限公司 | 一种反熔丝编程方法、系统及反熔丝器件 |
| US10847236B2 (en) * | 2018-10-17 | 2020-11-24 | Ememory Technology Inc. | Memory cell with a sensing control circuit |
| KR102520496B1 (ko) | 2019-01-03 | 2023-04-11 | 삼성전자주식회사 | 오티피 메모리 장치 및 오피 메모리 장치의 테스트 방법 |
| CN113540045A (zh) * | 2020-04-15 | 2021-10-22 | 合肥晶合集成电路股份有限公司 | 一种反熔丝电路 |
| CN111881638B (zh) * | 2020-07-31 | 2024-04-26 | 上海华力微电子有限公司 | 可编程电路及其编程方法、读取方法 |
| US11763875B2 (en) * | 2021-05-26 | 2023-09-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Second word line combined with Y-MUX signal in high voltage memory program |
| CN113707207B (zh) * | 2021-10-20 | 2022-02-15 | 成都凯路威电子有限公司 | Otp存储器阵列和读写方法 |
| TWI867695B (zh) * | 2022-08-24 | 2024-12-21 | 振生半導體股份有限公司 | 多狀態的一次性可程式化記憶體電路 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0669455A (ja) * | 1992-08-18 | 1994-03-11 | Mitsubishi Electric Corp | 半導体記憶装置 |
| DE19505293A1 (de) * | 1995-02-16 | 1996-08-22 | Siemens Ag | Mehrwertige Festwertspeicherzelle mit verbessertem Störabstand |
| EP0996161A1 (en) * | 1998-10-20 | 2000-04-26 | STMicroelectronics S.r.l. | EEPROM with common control gate and common source for two cells |
| JP4058219B2 (ja) * | 1999-09-17 | 2008-03-05 | 株式会社ルネサステクノロジ | 半導体集積回路 |
| US6515344B1 (en) * | 1999-10-28 | 2003-02-04 | Advanced Micro Devices, Inc. | Thin oxide anti-fuse |
| JP4923318B2 (ja) * | 1999-12-17 | 2012-04-25 | ソニー株式会社 | 不揮発性半導体記憶装置およびその動作方法 |
| US6928001B2 (en) * | 2000-12-07 | 2005-08-09 | Saifun Semiconductors Ltd. | Programming and erasing methods for a non-volatile memory cell |
| US6798693B2 (en) * | 2001-09-18 | 2004-09-28 | Kilopass Technologies, Inc. | Semiconductor memory cell and memory array using a breakdown phenomena in an ultra-thin dielectric |
| WO2003025944A1 (en) * | 2001-09-18 | 2003-03-27 | Kilopass Technologies, Inc. | Semiconductor memory cell and memory array using a breakdown phenomena in an ultra-thin dielectric |
| CN1190849C (zh) * | 2001-12-06 | 2005-02-23 | 彭泽忠 | 利用超薄介质击穿现象的半导体存储器单元和存储器阵列 |
| US6747896B2 (en) * | 2002-05-06 | 2004-06-08 | Multi Level Memory Technology | Bi-directional floating gate nonvolatile memory |
| EP1434235A1 (en) * | 2002-12-24 | 2004-06-30 | STMicroelectronics S.r.l. | Semiconductor memory system including selection transistors |
| CN1229870C (zh) * | 2003-02-28 | 2005-11-30 | 彭泽忠 | 采用单个晶体管的高密度半导体存储器单元和存储器阵列 |
| FR2871282B1 (fr) * | 2004-06-04 | 2006-09-15 | St Microelectronics Sa | Dispositif memoire programmable une seule fois |
-
2005
- 2005-08-05 US US11/197,814 patent/US7206214B2/en not_active Expired - Fee Related
-
2006
- 2006-07-28 KR KR1020087003002A patent/KR101236582B1/ko not_active Expired - Fee Related
- 2006-07-28 CN CN2006800286318A patent/CN101361139B/zh not_active Expired - Fee Related
- 2006-07-28 WO PCT/US2006/029704 patent/WO2007019109A2/en not_active Ceased
- 2006-07-28 JP JP2008525077A patent/JP5124456B2/ja not_active Expired - Fee Related
- 2006-08-04 TW TW095128581A patent/TWI435332B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| CN101361139A (zh) | 2009-02-04 |
| CN101361139B (zh) | 2011-12-14 |
| WO2007019109A2 (en) | 2007-02-15 |
| US7206214B2 (en) | 2007-04-17 |
| JP5124456B2 (ja) | 2013-01-23 |
| TW200713289A (en) | 2007-04-01 |
| JP2009503901A (ja) | 2009-01-29 |
| KR101236582B1 (ko) | 2013-02-22 |
| US20070030719A1 (en) | 2007-02-08 |
| WO2007019109A3 (en) | 2007-11-22 |
| KR20080041189A (ko) | 2008-05-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |