TWI405633B - 雷射加工裝置 - Google Patents

雷射加工裝置 Download PDF

Info

Publication number
TWI405633B
TWI405633B TW097114836A TW97114836A TWI405633B TW I405633 B TWI405633 B TW I405633B TW 097114836 A TW097114836 A TW 097114836A TW 97114836 A TW97114836 A TW 97114836A TW I405633 B TWI405633 B TW I405633B
Authority
TW
Taiwan
Prior art keywords
optical axis
laser processing
optical
processing apparatus
modulation element
Prior art date
Application number
TW097114836A
Other languages
English (en)
Chinese (zh)
Other versions
TW200932409A (en
Inventor
Tatsuya Nakamura
Koichi Takahashi
Junko Aruga
Original Assignee
Olympus Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Publication of TW200932409A publication Critical patent/TW200932409A/zh
Application granted granted Critical
Publication of TWI405633B publication Critical patent/TWI405633B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laser Beam Processing (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
TW097114836A 2007-05-01 2008-04-23 雷射加工裝置 TWI405633B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007120812A JP5086687B2 (ja) 2007-05-01 2007-05-01 レーザ加工装置

Publications (2)

Publication Number Publication Date
TW200932409A TW200932409A (en) 2009-08-01
TWI405633B true TWI405633B (zh) 2013-08-21

Family

ID=40051446

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097114836A TWI405633B (zh) 2007-05-01 2008-04-23 雷射加工裝置

Country Status (4)

Country Link
JP (1) JP5086687B2 (enExample)
KR (1) KR101523293B1 (enExample)
CN (1) CN101298117B (enExample)
TW (1) TWI405633B (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5301955B2 (ja) * 2008-11-13 2013-09-25 オリンパス株式会社 欠陥修正装置
JP5346690B2 (ja) * 2009-05-26 2013-11-20 オリンパス株式会社 レーザ照射装置
DE102010020183B4 (de) * 2010-05-11 2013-07-11 Precitec Kg Laserschneidkopf und Verfahren zum Schneiden eines Werkstücks mittels eines Laserschneidkopfes
TWI642507B (zh) * 2011-12-16 2018-12-01 應用材料股份有限公司 用於雷射處理設備的輻射源及多重光束組合器
CN102608875A (zh) * 2012-03-27 2012-07-25 深圳市华星光电技术有限公司 基于修补机台的玻璃基板补刻号方法及玻璃基板补刻号装置
CN103203541B (zh) * 2013-02-04 2015-05-13 张立国 一种激光加工装置
CN104375383B (zh) * 2013-08-13 2017-08-29 上海微电子装备有限公司 用于光刻设备的调焦调平检测装置及方法
JP6321932B2 (ja) * 2013-09-24 2018-05-09 株式会社小糸製作所 車両用前照灯
CN104227243A (zh) * 2014-09-11 2014-12-24 深圳英诺激光科技有限公司 一种硬质材料激光深加工设备及加工方法
CN106141457B (zh) * 2016-07-19 2018-01-12 张立国 一种激光钻孔系统及激光钻孔方法
CN106735875B (zh) * 2017-02-20 2019-01-18 湖北工业大学 一种基于液晶空间光调制器的激光柔性微加工系统及方法
CN107824968A (zh) * 2017-11-08 2018-03-23 深圳泰德激光科技有限公司 Ccd视觉定位的激光焊接装置
JP7402814B2 (ja) * 2018-10-30 2023-12-21 浜松ホトニクス株式会社 レーザ加工ヘッド及びレーザ加工装置
CN111098043B (zh) * 2020-01-19 2024-12-27 中国科学院宁波材料技术与工程研究所 水导激光加工装置和加工系统

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09206965A (ja) * 1996-01-26 1997-08-12 Keyence Corp レーザマーク装置
JP2006227198A (ja) * 2005-02-16 2006-08-31 Olympus Corp レーザ加工装置
TW200711773A (en) * 2005-06-17 2007-04-01 Olympus Corp Laser beam machining method and apparatus

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2220936Y (zh) * 1995-04-07 1996-02-28 中国科学院长春光学精密机械研究所 一种新型激光照排机
JP4429974B2 (ja) * 2005-06-17 2010-03-10 オリンパス株式会社 レーザ加工方法および装置
JP4947933B2 (ja) * 2005-07-26 2012-06-06 オリンパス株式会社 レーザリペア装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09206965A (ja) * 1996-01-26 1997-08-12 Keyence Corp レーザマーク装置
JP2006227198A (ja) * 2005-02-16 2006-08-31 Olympus Corp レーザ加工装置
TW200711773A (en) * 2005-06-17 2007-04-01 Olympus Corp Laser beam machining method and apparatus

Also Published As

Publication number Publication date
KR101523293B1 (ko) 2015-05-27
JP2008272806A (ja) 2008-11-13
TW200932409A (en) 2009-08-01
CN101298117A (zh) 2008-11-05
JP5086687B2 (ja) 2012-11-28
CN101298117B (zh) 2013-04-10
KR20080097340A (ko) 2008-11-05

Similar Documents

Publication Publication Date Title
TWI405633B (zh) 雷射加工裝置
JP5137488B2 (ja) レーザ照射装置およびそれを用いたレーザ加工システム
JP5185617B2 (ja) リペア方法及びその装置
KR101207198B1 (ko) 기판 검사장치
KR101368167B1 (ko) 리페어 장치 및 리페어 방법
JP2008263092A (ja) 投影露光装置
JP2009244446A (ja) 像位置調整装置および光学装置
JP2014083562A (ja) レーザ照射ユニット及びレーザ加工装置
JP2005103581A (ja) リペア方法及びその装置
US20070033680A1 (en) Optical inspection system and its illumination method
JP4195915B2 (ja) Ｐｃプロジェクターを用いた任意パターン転写装置
JP5064778B2 (ja) レーザ加工装置
JP2586662B2 (ja) 投影露光装置
JP2014215059A (ja) 評価装置、評価方法、および半導体装置
JP2007033381A (ja) 光学式検査装置及びその照明方法
JP2007326132A (ja) レーザ加工装置
JP4690754B2 (ja) 大面積マスクレス露光方法及び露光装置
TW201433826A (zh) 照明光學系統、曝光裝置、以及裝置之製造方法
TWI527651B (zh) 雷射照射裝置
KR20080059558A (ko) 노광 장치
JP2730004B2 (ja) 光源装置
JP2002090313A (ja) パターン欠陥検査装置
JP2011100804A (ja) 露光装置
KR101133653B1 (ko) 기판 검사장치 및 이를 이용한 기판 검사방법
KR0139970Y1 (ko) 화상 취득 장치

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees