TWI391235B - Light irradiation device - Google Patents

Light irradiation device Download PDF

Info

Publication number
TWI391235B
TWI391235B TW095134845A TW95134845A TWI391235B TW I391235 B TWI391235 B TW I391235B TW 095134845 A TW095134845 A TW 095134845A TW 95134845 A TW95134845 A TW 95134845A TW I391235 B TWI391235 B TW I391235B
Authority
TW
Taiwan
Prior art keywords
light
light source
source lamp
mirror
cooling air
Prior art date
Application number
TW095134845A
Other languages
English (en)
Chinese (zh)
Other versions
TW200722274A (en
Inventor
Yoneta Tanaka
Nozomu Tajika
Original Assignee
Ushio Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Electric Inc filed Critical Ushio Electric Inc
Publication of TW200722274A publication Critical patent/TW200722274A/zh
Application granted granted Critical
Publication of TWI391235B publication Critical patent/TWI391235B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/12—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed after the application
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • General Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Manufacturing & Machinery (AREA)
  • Toxicology (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Arrangement Of Elements, Cooling, Sealing, Or The Like Of Lighting Devices (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)
  • Vessels And Coating Films For Discharge Lamps (AREA)
TW095134845A 2005-12-07 2006-09-20 Light irradiation device TWI391235B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005353541A JP4811000B2 (ja) 2005-12-07 2005-12-07 光照射装置

Publications (2)

Publication Number Publication Date
TW200722274A TW200722274A (en) 2007-06-16
TWI391235B true TWI391235B (zh) 2013-04-01

Family

ID=38130241

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095134845A TWI391235B (zh) 2005-12-07 2006-09-20 Light irradiation device

Country Status (4)

Country Link
JP (1) JP4811000B2 (ja)
KR (1) KR101030421B1 (ja)
CN (1) CN1978983B (ja)
TW (1) TWI391235B (ja)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7964858B2 (en) * 2008-10-21 2011-06-21 Applied Materials, Inc. Ultraviolet reflector with coolant gas holes and method
WO2011122257A1 (ja) * 2010-03-31 2011-10-06 株式会社Ｇｓユアサ 紫外線照射装置及びインクジェットプリント装置
JP2012198997A (ja) * 2011-03-18 2012-10-18 Ushio Inc ロングアーク型メタルハライドランプ及び光照射装置
US8823249B2 (en) * 2011-11-15 2014-09-02 Seiko Epson Corporation Irradiation device and irradiation method
CN103292282B (zh) * 2012-03-05 2016-07-06 上海微电子装备有限公司 用于椭球反射镜的冷却系统及应用其的高功率光源灯室
JP5573910B2 (ja) * 2012-10-03 2014-08-20 岩崎電気株式会社 照射装置
KR101991521B1 (ko) * 2012-04-20 2019-06-20 이와사키 덴끼 가부시키가이샤 편광자 유닛, 조정용 지그, 램프 교환대 및 조사 장치
CN103836596B (zh) * 2012-11-22 2016-06-01 上海微电子装备有限公司 一种高功率汞灯灯室装置
CN104141892B (zh) * 2013-05-08 2017-05-31 海洋王（东莞）照明科技有限公司 灯具结构
CN104141891B (zh) * 2013-05-08 2017-05-31 海洋王（东莞）照明科技有限公司 灯具结构
CN103644469A (zh) * 2013-11-25 2014-03-19 湖州市妙西镇资产经营有限公司 一种新型led灯结构
CN103644470A (zh) * 2013-11-25 2014-03-19 湖州市妙西镇资产经营有限公司 一种日光灯结构
JP6052199B2 (ja) * 2014-02-12 2016-12-27 ウシオ電機株式会社 偏光光照射装置及び光配向用棒状光源
CN105216283A (zh) * 2015-08-28 2016-01-06 广州达意隆包装机械股份有限公司 一种吹瓶机加热灯管
CN105487352B (zh) * 2016-02-16 2017-06-27 武汉华星光电技术有限公司 曝光机及曝光灯的更换方法
CN106016974B (zh) * 2016-05-12 2018-07-06 绍兴中漂印染有限公司 一种用于织物印染的烘干装置
JP6798275B2 (ja) * 2016-11-25 2020-12-09 ウシオ電機株式会社 エキシマランプユニットおよびエキシマランプ装置
JP6859814B2 (ja) * 2017-04-03 2021-04-14 株式会社Ｇｓユアサ 光照射装置
CN108591876A (zh) * 2018-01-17 2018-09-28 东莞市天合机电开发有限公司 一种吸附式户外led照明灯具
EP4029532A1 (en) * 2021-01-05 2022-07-20 The Boeing Company Ultraviolet device and methods of using the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5760656A (en) * 1980-09-29 1982-04-12 Mitsubishi Electric Corp Forcefuly cooled super high pressure mercury lamp
JPH0817457A (ja) * 1994-06-28 1996-01-19 Tokyo Gas Co Ltd 燃料電池の水処理装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01209631A (ja) * 1988-02-15 1989-08-23 Nec Corp 蛍光膜露光用超高圧水銀灯
JPH08174567A (ja) * 1994-10-25 1996-07-09 Ushio Inc 光照射器
DE19814300B4 (de) * 1998-03-31 2008-09-25 Bernhard Weber Scheinwerfer oder Leuchte
JP2000206619A (ja) * 1999-01-18 2000-07-28 Matsushita Electric Ind Co Ltd ランプと液晶プロジェクション装置
CA2267674C (en) * 1999-03-31 2010-03-30 Imax Corporation Method for cooling an arc lamp
JP3846232B2 (ja) * 2000-12-08 2006-11-15 ウシオ電機株式会社 光照射器の循環空冷システム
JP2003187604A (ja) * 2001-12-17 2003-07-04 Ushio Inc 光学装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5760656A (en) * 1980-09-29 1982-04-12 Mitsubishi Electric Corp Forcefuly cooled super high pressure mercury lamp
JPH0817457A (ja) * 1994-06-28 1996-01-19 Tokyo Gas Co Ltd 燃料電池の水処理装置

Also Published As

Publication number Publication date
TW200722274A (en) 2007-06-16
KR20070059937A (ko) 2007-06-12
CN1978983A (zh) 2007-06-13
KR101030421B1 (ko) 2011-04-20
JP4811000B2 (ja) 2011-11-09
CN1978983B (zh) 2011-05-18
JP2007157583A (ja) 2007-06-21

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MM4A Annulment or lapse of patent due to non-payment of fees