TWI391235B - Light irradiation device - Google Patents
Light irradiation device Download PDFInfo
- Publication number
- TWI391235B TWI391235B TW095134845A TW95134845A TWI391235B TW I391235 B TWI391235 B TW I391235B TW 095134845 A TW095134845 A TW 095134845A TW 95134845 A TW95134845 A TW 95134845A TW I391235 B TWI391235 B TW I391235B
- Authority
- TW
- Taiwan
- Prior art keywords
- light
- light source
- source lamp
- mirror
- cooling air
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
- B05C9/12—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed after the application
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- General Health & Medical Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Manufacturing & Machinery (AREA)
- Toxicology (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Arrangement Of Elements, Cooling, Sealing, Or The Like Of Lighting Devices (AREA)
- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
- Discharge Lamps And Accessories Thereof (AREA)
- Vessels And Coating Films For Discharge Lamps (AREA)
Description
本發明關於具備例如棒狀的光源燈及將由此光源燈所放射的光予以反射之反射鏡,藉由將包含紫外線的光對被處理對象物照射,來進行例如硬化處理或改質處理之光照射裝置。According to the present invention, a light source lamp having, for example, a rod-shaped light source and a mirror that reflects light emitted from the light source lamp are irradiated with light to be subjected to an object to be processed, for example, a curing process or a modification process. Irradiation device.
現今,使用具備用來照射包含紫外線的光之光源燈的光照射裝置,對於例如被處理對象物之保護膜、接著劑、塗料、墨水、光阻劑、樹脂、定向膜等,進行硬化、乾燥、熔融或軟化、改質處理等,在各領域被廣泛地採用進行。Nowadays, a light irradiation device including a light source lamp for irradiating light including ultraviolet rays is used to cure and dry a protective film, an adhesive, a paint, an ink, a photoresist, a resin, an orientation film, and the like of an object to be processed, for example. , melting or softening, upgrading treatment, etc., are widely used in various fields.
圖6是顯示以往之光照射裝置的一例之結構的概略斷面圖,圖7是顯示構成圖6所示的光照射裝置之光照射器之與光源燈的管軸垂直之斷面的斷面圖。6 is a schematic cross-sectional view showing a configuration of an example of a conventional light irradiation device, and FIG. 7 is a cross-sectional view showing a section of a light irradiator constituting the light irradiation device shown in FIG. 6 perpendicular to a tube axis of a light source lamp. Figure.
此光照射裝置之結構是具備用來照射包含紫外線的光之光照射器40,對於藉由未圖示的搬送機構以例如通過此光照射器40的下方位置的方式予以搬送之被處理對象物(工件)W,照射紫外線。In the light irradiation device, the light illuminator 40 for illuminating the light including the ultraviolet ray is provided, and the object to be processed is transported by, for example, the lower position of the light illuminator 40 by a transport mechanism (not shown). (Workpiece) W, irradiated with ultraviolet rays.
光照射器40是內部空間受到隔壁42所劃分,使得風洞43及燈配置用空間44於上下方向排列而形成,燈配置用空間44的下方具備開口之大致呈箱型的燈室41,在燈配置用空間44,棒狀的光源燈50配設成朝對被處理對象 物呈正交的方向延伸,並且具有將來自於光源燈50的光予以反射之例如橢圓面反射面的反射鏡55以其第1焦點位置f在與光源燈50的中心一致之狀態下沿著光源燈50延伸的方式予以配設著。The light illuminator 40 is formed by the partition wall 42 so that the wind tunnel 43 and the lamp arrangement space 44 are arranged in the vertical direction, and the lamp arrangement space 44 has a substantially box-shaped lamp chamber 41 below the lamp arrangement space 44. The arrangement space 44, the rod-shaped light source lamp 50 is disposed to face the object to be processed The object 55 extends in an orthogonal direction, and has a mirror 55 such as an elliptical reflecting surface that reflects light from the light source lamp 50, with the first focus position f being aligned with the center of the light source lamp 50. The light source lamp 50 is disposed in such a manner as to extend.
在燈室41之隔壁42,形成有在例如將風洞43與燈配置用空間44連通的複數個貫通孔沿著光源燈50的長方向排列的狀態下所形成之冷卻風流通用開口部45,並且在冷卻風流通用開口部45的兩側緣位置朝下方突出之噴嘴部46是與隔壁42一體形成為沿著光源燈50的長方向延伸。In the partition wall 42 of the lamp chamber 41, a cooling airflow common opening portion 45 formed in a state in which a plurality of through holes that communicate the wind tunnel 43 and the lamp arrangement space 44 are arranged along the longitudinal direction of the light source lamp 50 is formed, and The nozzle portion 46 that protrudes downward at the both side edges of the cooling air flow general opening portion 45 is formed integrally with the partition wall 42 so as to extend along the longitudinal direction of the light source lamp 50.
又,在燈室41的上部,設有連接於排氣風扇49之連通於風洞43的內部空間之導管48。Further, a duct 48 connected to the internal space of the exhaust fan 49 and connected to the wind tunnel 43 is provided in the upper portion of the lamp chamber 41.
在反射鏡55的頂部,形成有由形成例如沿著光源燈50延伸的溝槽所構成之開口部56,在此開口部56內,與隔壁42一體地形成之噴嘴部46的前端部分被插入,藉此形成供用來將光源燈50及反射鏡55的冷卻風流通之冷卻風路60。At the top of the mirror 55, an opening portion 56 formed by, for example, a groove extending along the light source lamp 50 is formed, in which the front end portion of the nozzle portion 46 integrally formed with the partition wall 42 is inserted. Thereby, a cooling air passage 60 for circulating the cooling air of the light source lamp 50 and the mirror 55 is formed.
在此光照射裝置,由光源燈50所放射的光是直接或受到反射鏡55所反射而照射至被處理對象物W。具體而言,受到反射鏡55所反射之反射光是於在反射鏡55的第2焦點f2之位置暫時被聚光之後擴大的狀態下,對比起較反射鏡55的第2焦點f2更位於光照射方向遠方側之被處理對象物W全體進行照射。In the light irradiation device, the light emitted from the light source lamp 50 is directly or reflected by the mirror 55 and is irradiated onto the object W to be processed. Specifically, the reflected light reflected by the mirror 55 is enlarged in a state where the position of the second focus f2 of the mirror 55 is temporarily concentrated, and is located closer to the light than the second focus f2 of the mirror 55. The entire object to be processed W on the far side in the irradiation direction is irradiated.
另外,在光源燈50點燈時,藉由使排氣風扇49作動,將冷卻風吸引至燈室41內,藉由此冷卻風將光源燈50 及反射鏡55冷卻,已被導入至燈室41內的冷卻風經由形成冷卻風路60之噴嘴部46,流入至風洞43,再經由導管48進行排氣。Further, when the light source lamp 50 is turned on, the exhaust fan 49 is actuated to attract the cooling air into the lamp chamber 41, whereby the wind source lamp 50 is cooled by the wind. The mirror 55 is cooled, and the cooling air introduced into the lamp chamber 41 flows into the wind tunnel 43 via the nozzle portion 46 forming the cooling air passage 60, and is then exhausted via the duct 48.
在專利文獻1所揭示之光照射裝置,記載著,如圖8所示,為了對光源燈50的管徑,設定與光源燈50最理想的大小之冷卻風路60的寬度,將形成冷卻風路60的噴嘴部46做為與燈室41之隔壁42不同體的結構加以構成者。In the light irradiation device disclosed in Patent Document 1, as shown in FIG. 8, in order to set the width of the cooling air passage 60 which is the most optimal size of the light source lamp 50 with respect to the diameter of the light source lamp 50, a cooling air is formed. The nozzle portion 46 of the path 60 is configured to be different from the partition wall 42 of the lamp chamber 41.
〔專利文獻1〕日本特開平8-174567號公報[Patent Document 1] Japanese Patent Laid-Open No. Hei 8-174567
一般,利用如上述般之紫外線的光照射處理之處理時間,是大大地依存於紫外線的照射量,藉由將光照射區域之紫外線的照射量設定成為大,能夠將處理時間予以縮短話,可提升處理效率為眾所皆知,期望可增大由光照射器所照射之紫外線的照射量。In general, the processing time of the light irradiation treatment using the ultraviolet light as described above is greatly dependent on the irradiation amount of the ultraviolet light, and by setting the irradiation amount of the ultraviolet light in the light irradiation region to be large, the processing time can be shortened. It is known to improve the processing efficiency, and it is desirable to increase the amount of ultraviolet rays irradiated by the light irradiator.
在上述結構之光照射裝置,當光源燈50點燈時,為了防止光源燈50及反射鏡55成為過熱狀態,而必須形成有供冷卻風流通用的冷卻風路60之開口部56,例如形成於光源燈50的頂部。In the light irradiation device of the above configuration, when the light source lamp 50 is turned on, in order to prevent the light source lamp 50 and the mirror 55 from being overheated, it is necessary to form the opening portion 56 of the cooling air passage 60 for common cooling air flow, for example, formed in The top of the light source lamp 50.
但,會有因該開口部56的存在,使得由光源燈50朝反射鏡55的開口部56放射的紫外線無法有效地利用之問題。實際上,對於由光源燈50所放射的光全體,朝反射 鏡55的開口部56放射而無法有效地利用之紫外線的比例達到例如20%左右。However, there is a problem that the ultraviolet light emitted from the light source lamp 50 toward the opening 56 of the mirror 55 cannot be effectively utilized due to the presence of the opening 56. In fact, for the entire light emitted by the light source lamp 50, toward the reflection The ratio of the ultraviolet rays that are radiated by the opening 56 of the mirror 55 and cannot be effectively utilized is, for example, about 20%.
針對這樣的問題,做為用來增大對被處理對象物W之紫外線的照射量的一手段,可考量增大光源燈50本身之燈輸入電力,但在使用燈輸入電力大的光源燈50之情況,容易產生以下所示的問題。即,由光源燈50朝反射鏡55的開口部56所放射之光會直接地照射至形成冷卻風路60之噴嘴部46或噴嘴部46A而加以加熱,但噴嘴部46或噴嘴部46A由於因加工的容易性或低成本等的製造上理由,而藉由例如鋁來形成,故容易受到加熱造成變形。因此,為了防止噴嘴部46或噴嘴部46A伴隨加熱造成變形,不僅光源燈50及反射鏡55,亦需將噴嘴部46或噴嘴部46A冷卻,其結果,成為需要更大風量之冷卻風,增加了光照射裝置之能量消耗量,阻礙了對這樣的光照射裝置之要求之一的省能量化。In view of such a problem, as a means for increasing the amount of irradiation of ultraviolet rays to the object W to be processed, it is possible to increase the lamp input power of the light source lamp 50 itself, but the light source lamp 50 having a large input power is used. In the case of the above, it is easy to cause the problems shown below. In other words, the light emitted from the light source lamp 50 toward the opening 56 of the mirror 55 is directly irradiated to the nozzle portion 46 or the nozzle portion 46A forming the cooling air passage 60, and is heated, but the nozzle portion 46 or the nozzle portion 46A is caused by the nozzle portion 46A. The reason for the ease of processing, low cost, etc., is formed by, for example, aluminum, so that it is easily deformed by heating. Therefore, in order to prevent the nozzle portion 46 or the nozzle portion 46A from being deformed by heating, not only the light source lamp 50 and the mirror 55 but also the nozzle portion 46 or the nozzle portion 46A need to be cooled, and as a result, the cooling air requiring a larger air volume is increased. The energy consumption of the light irradiation device hinders the energy saving of one of the requirements of such a light irradiation device.
本發明是有鑒於以上的情事而開發完成之發明,其目的在於提供:一種光照射裝置,具備形成有供用來冷卻光源燈及反射鏡的冷卻風流通用之冷卻風路的光照射器之光照射裝置,能夠增大對被處理對象物之光照射量,可謀求處理效率提昇,並且即使不大幅地增加冷卻風的風量亦可獲得充分的冷卻功能之光照射裝置。The present invention has been made in view of the above circumstances, and an object thereof is to provide a light irradiation device including light irradiation of a light illuminator formed with a cooling air passage for cooling a light source and a cooling airflow of a mirror. In the device, it is possible to increase the amount of light irradiation to the object to be processed, and it is possible to obtain a light irradiation device which can obtain a sufficient cooling function without greatly increasing the amount of wind of the cooling air.
又,本發明的另一目的是在於提供一種光源燈,可使由光源燈所放射的光之利用率提昇而增大光照射面之光照射量,並且可確實地防止形成光照射裝置之冷卻風路的噴 嘴成為過熱狀態之光源燈。Further, another object of the present invention is to provide a light source lamp which can increase the light utilization amount of the light irradiated by the light source lamp and increase the amount of light irradiation on the light irradiation surface, and can surely prevent the formation of the light irradiation device from being cooled. Spray of wind road The mouth becomes the light source of the overheated state.
本發明是一種光照射裝置,是具備將剖面為圓形的棒狀光源燈在其管軸與具有反射面的反射鏡之第1焦點位置一致的狀態下予以配設而構成之光照射器,當光源燈點燈時,藉由冷卻風將光源燈及反射鏡冷卻之光照射裝置,其特徵為:對光照射方向,於光源燈的後方,形成有冷卻風路,其是與受到反射鏡所包圍的空間連通,用來使冷卻風流通,且在反射鏡的頂部形成沿著光源燈延伸,在上述冷卻風路,設有:設定與上述光源燈的寬度之噴嘴,在光源燈之與冷卻風路開口相對向的外表面區域,形成有將由該光源燈所放射的光予以反射之反射膜,該反射膜,以在發光區域的全區域範圍沿著管軸延伸的方式形成於:與該光源燈的管軸垂直的剖面之以該管軸為中心觀看上述噴嘴時所呈的角度範圍之外表面區域。The present invention relates to a light-irradiating device comprising a light-emitting device in which a rod-shaped light source lamp having a circular cross section is disposed in a state in which a tube axis thereof and a first focus position of a mirror having a reflecting surface are aligned. When the light source lamp is lit, the light source lamp and the mirror cooling light are irradiated by the cooling wind, and the light is irradiated in the direction of the light, and a cooling air path is formed behind the light source lamp, which is a mirror The enclosed space is connected to allow the cooling air to circulate, and is formed along the light source lamp at the top of the mirror. The cooling air passage is provided with a nozzle for setting the width of the light source lamp, and the light source lamp a reflecting film that reflects the light emitted by the light source lamp is formed on an outer surface region of the cooling air passage opening, and the reflecting film is formed to extend along the tube axis over the entire area of the light emitting region: The surface area of the vertical direction of the tube axis of the light source lamp is outside the angle range of the nozzle when the nozzle is viewed from the center of the tube axis.
本發明的光源燈是使用於上述光照射裝置之光源燈,其特徵為:具備剖面為圓形的棒狀封體,在配置於光照射器內之溝槽狀反射鏡的第1焦點位置之狀態下,於與和受到反射鏡所包圍的空間連通且用來使冷卻風流通的冷卻風路之開口相對向之封體的外表面區域,形成有反射膜,該反射膜,以在發光區域的全區域範圍沿著管軸延伸的方式 形成於:與該光源燈的管軸垂直的剖面之以該管軸為中心觀看上述噴嘴時所呈的角度範圍之外表面區域。The light source lamp of the present invention is a light source lamp used in the above-described light irradiation device, and is characterized in that it has a rod-shaped sealing body having a circular cross section, and is disposed at a first focus position of a grooved mirror disposed in the light irradiator. In a state, an opening surface of the cooling air passage that communicates with the space surrounded by the mirror and used to circulate the cooling air is opposed to the outer surface region of the sealing body, and a reflecting film is formed in the light emitting region. The entire area extends along the tube axis It is formed on a surface area outside a range of angles when the nozzle is viewed from the cross section perpendicular to the tube axis of the light source lamp.
若根據本發明之光照射裝置的話,因藉由使用在封體的外表面區域之適當範圍形成反射膜者做為光源燈,利用該反射膜,可使由光源燈朝冷卻風路的開口方向放射之光不會阻礙反射鏡的有效反射區域而加以有效地反射,所以可提高光照射面之光照射量,能夠高處理效率進行針對被處理對象物之預定的光照射處理。According to the light-irradiating device of the present invention, since a reflecting film is formed by using an appropriate range in the outer surface region of the sealing body as a light source lamp, the reflecting film can be used to make the light source lamp face the opening direction of the cooling air passage. Since the emitted light does not hinder the effective reflection area of the mirror and is effectively reflected, the amount of light irradiation on the light-irradiated surface can be increased, and predetermined light irradiation processing for the object to be processed can be performed with high processing efficiency.
並且,在設定與光源燈的寬度之噴嘴設置於冷卻風路之結構者,因可防止朝冷卻風路的開口方向放射的光直接對噴嘴照射,所以不需要增大所必須之冷卻風的風量,即可確實地防止噴嘴成為過熱狀態,能夠謀求省能源化。Further, in the case where the nozzle for setting the width of the light source lamp is provided in the cooling air passage, since the light radiated toward the opening direction of the cooling air passage can be prevented from directly irradiating the nozzle, it is not necessary to increase the amount of cooling air necessary for the cooling air. Therefore, it is possible to surely prevent the nozzle from being overheated, and it is possible to save energy.
若根據本發明之光源燈的話,在使用於上述光照射裝置之情況,在與利用反射鏡之有效反射區域的關係,因可藉由反射膜將朝冷卻風路的開口方向放射的光予以反射加以有效地利用,所以可提高對光照射面之光照射量,並且因能夠防止來自光源燈的光直接地照射至噴嘴,所以在光源燈點燈時,不需要增大所必須之冷卻風的風量,即可確實地防止噴嘴成為過熱狀態,其結果,能夠謀求使用該光源燈所構成之光照射裝置的省能源化。According to the light source lamp of the present invention, in the case of using the light irradiation device, the light radiated toward the opening direction of the cooling air passage can be reflected by the reflection film in relation to the effective reflection region of the mirror. Since it can be effectively utilized, the amount of light irradiation to the light-irradiated surface can be increased, and since the light from the light source lamp can be prevented from being directly irradiated to the nozzle, it is not necessary to increase the required cooling wind when the light source lamp is lit. The air volume can surely prevent the nozzle from being overheated, and as a result, it is possible to save energy by using the light irradiation device including the light source lamp.
以下,參照圖面,詳細地說明關於本發明。Hereinafter, the present invention will be described in detail with reference to the drawings.
圖1是顯示本發明的光照射裝置之一例的結構之概略的剖面圖,圖2是顯示圖1所示的光照射裝置之光照射器的結構之概略的立體圖,圖3是顯示圖2所示的光照射器之與光源燈的管軸垂直之剖面的剖面圖。1 is a schematic cross-sectional view showing a configuration of an example of a light irradiation device according to the present invention, FIG. 2 is a perspective view showing a schematic configuration of a light irradiator of the light irradiation device shown in FIG. 1, and FIG. 3 is a view showing the structure of FIG. A cross-sectional view of a section of the light illuminator shown perpendicular to the tube axis of the light source lamp.
此光照射裝置是具備照射包含紫外線的光之光照射器10,藉由對藉由未圖示的搬送機構以通過例如光照射器10的下方位置之方式予以搬送的被處理對象物照射紫外線,來進行預定的光照射處理者。The light irradiation device is configured to emit ultraviolet light to the object to be processed which is conveyed by, for example, a lower position of the light irradiator 10 by a transport mechanism (not shown). To perform a predetermined light irradiation processor.
光照射器10是具備大致呈箱型的燈室11,該燈室11在下方具有開口之光照射口11A,且形成有藉由隔壁12所劃分成上下之構成風洞13的上部室及構成燈配置用空間14之下部室,在燈室11的上部,設有導管17,其連接於排氣風扇16且與風洞13的內部連通。The light irradiator 10 is provided with a substantially box-shaped lamp chamber 11 having an open light irradiation port 11A at the lower side, and an upper chamber and a constituent lamp constituting the wind tunnel 13 partitioned by the partition wall 12 are formed. A lower chamber of the space 14 is disposed, and a duct 17 is provided at an upper portion of the lamp chamber 11, which is connected to the exhaust fan 16 and communicates with the inside of the wind tunnel 13.
在燈室11之燈配置用空間14,棒狀的光源燈20以其管軸與光照射面A平行地延伸之姿勢被配設著。In the lamp arrangement space 14 of the lamp chamber 11, the rod-shaped light source lamp 20 is disposed in a posture in which the tube axis extends in parallel with the light irradiation surface A.
在燈室11之隔壁12,形成有在例如將風洞13與燈配置用空間14連通的複數個貫通孔15A沿著光源燈20的管軸排列的狀態下所形成之冷卻風流通用開口15,並且在冷卻風流通用開口部155的兩側緣位置朝下方突出之例如由鋁所形成的噴嘴部18是以沿著光源燈20的長方向延伸的方式,與隔壁12一體形成,藉此,形成冷卻風路19,該冷卻風路是供藉由使排氣風扇16作動而吸入至燈室11內之用來冷卻光源燈20及反射鏡30的冷卻風流通用者。In the partition wall 12 of the lamp chamber 11, a cooling air flow common opening 15 formed in a state in which a plurality of through holes 15A that communicate the wind tunnel 13 and the lamp arrangement space 14 are arranged along the tube axis of the light source lamp 20 is formed, and The nozzle portion 18 formed of aluminum, which protrudes downward from the both side edges of the cooling air flow general opening portion 155, is formed integrally with the partition wall 12 so as to extend along the longitudinal direction of the light source lamp 20, thereby forming cooling. The air passage 19 is a versatile cooling airflow for cooling the light source lamp 20 and the mirror 30 by the exhaust fan 16 being actuated into the lamp chamber 11.
噴嘴部18是用來設定形成於與光源燈20之間的冷卻風路之寬度(與光源燈20之分離距離),使流動於光源燈20的周圍之冷卻風的速度成為最理想者。The nozzle portion 18 is for setting the width of the cooling air passage formed between the light source lamp 20 (separation distance from the light source lamp 20), and is preferably the speed of the cooling air flowing around the light source lamp 20.
在燈配置用空間14,具有與光源燈20的發光區域L(發光長度)的大小相等或以上之長度並且具有橢圓面反射面的溝槽狀反射鏡30是在其第1焦點f1位置與構成光源燈20的發光部之燈中心C一致的狀態下被配設著。In the lamp arrangement space 14, the grooved mirror 30 having the length equal to or longer than the size of the light-emitting area L (light-emitting length) of the light source lamp 20 and having an elliptical reflecting surface is at the position and composition of the first focus f1 thereof. The lamp center C of the light-emitting portion of the light source lamp 20 is disposed in a state of being aligned.
在反射鏡30的頂部,形成有由以例如沿著光源燈20延伸的方式所形成的溝槽所構成之開口部31,此開口部31的開口緣部受到形成於噴嘴部18的前端部之反射鏡保持部18A所保持,並且前端部被光照射口11A的開口緣部所支承。An opening portion 31 formed by a groove formed, for example, along the light source lamp 20 is formed at the top of the mirror 30, and an opening edge portion of the opening portion 31 is formed at a front end portion of the nozzle portion 18. The mirror holding portion 18A is held, and the front end portion is supported by the opening edge portion of the light irradiation port 11A.
在反射鏡30的內面,藉由例如蒸鍍,形成由氧化鉭(Ta2 O5 )與二氧化矽(SiO2 )所構成之多層反射膜(未圖示)。On the inner surface of the mirror 30, a multilayer reflective film (not shown) made of tantalum oxide (Ta 2 O 5 ) and cerium oxide (SiO 2 ) is formed by, for example, vapor deposition.
多層反射膜之各層的厚度及積層數等的具體結構,是能夠適宜地設定成:因應利用光照射裝置之處理目的,使特定波長之紫外線有效率地被反射。例如,在使用於光硬化性樹脂的硬化處理之情況,設定各層的厚度及積層數使得可有效率地反射波長350~400nm之紫外線,又,例如在使用於備用於液晶面板之定向膜的光定向處理之情況時,設定各層的厚度及積層數使得可有效率地反射波長240~280nm之紫外線。The specific structure of the thickness and the number of layers of each layer of the multilayer reflective film can be appropriately set so that ultraviolet rays of a specific wavelength are efficiently reflected by the purpose of processing by the light irradiation device. For example, in the case of curing treatment of a photocurable resin, the thickness and the number of layers of each layer are set so that ultraviolet rays having a wavelength of 350 to 400 nm can be efficiently reflected, and, for example, light used for an alignment film of a liquid crystal panel can be used. In the case of the orientation treatment, the thickness and the number of layers of each layer are set so that the ultraviolet rays having a wavelength of 240 to 280 nm can be efficiently reflected.
光源燈20是如圖4所示,具備兩端被密封之例如由 玻璃所構成的剖面呈圓形之封體21,在此封體21內,於兩端部位置,一對電極22被對向配置,並且封裝有例如水銀、稀有氣體及鹵素氣體,由放射包含紫外線的光之高壓水銀燈所構成。The light source lamp 20 is as shown in FIG. 4, and has two ends sealed, for example by The cross section of the glass is a circular envelope 21 in which a pair of electrodes 22 are disposed opposite each other at the both end portions, and are packaged with, for example, mercury, a rare gas, and a halogen gas, and are contained by radiation. Ultraviolet light high pressure mercury lamp.
在此光源燈20之連續於發光區域L的兩端部,用來防止受到噴射冷卻風所造成之溫度降低的傘狀遮風構件23是以覆蓋與電極22的配置位置相對向的封體之表面部分的方式被設置著。In the both ends of the light source lamp 20 which are continuous with the light-emitting region L, the umbrella-shaped windshield member 23 for preventing the temperature from being lowered by the jetted cooling air is a cover body which covers the position opposite to the arrangement position of the electrode 22. The way the surface portion is set.
在此光源燈20,於以預定的姿勢配置於燈室11內的預定位置之狀態下,與形成冷卻風路19的噴嘴部18之開口對向,換言之,與形成於反射鏡30的頂部之開口部31相對向的外表面區域,具有因應處理目的來有效地反射特定波長的紫外線的功能之反射膜25形成沿著光源燈20的管軸方向延伸。In the state in which the light source lamp 20 is disposed at a predetermined position in the lamp chamber 11 in a predetermined posture, it faces the opening of the nozzle portion 18 where the cooling air passage 19 is formed, in other words, on the top of the mirror 30. The reflection film 25 having a function of effectively reflecting ultraviolet rays of a specific wavelength for the purpose of processing in the outer surface region facing the opening portion 31 is formed to extend along the tube axis direction of the light source lamp 20.
此反射膜25是在與光源燈20的管軸垂直之剖面,形成於以光源燈20的管軸(燈中心C)為中心觀看噴嘴部18之反射鏡保持部18A時所呈的角度範圍θ區域為佳,該角度範圍做為例如90°(參照圖3)。藉由這樣的結構,不會阻礙反射鏡30之有效反射區域,可藉由反射膜25及反射鏡30兩者有效地反射朝反射鏡30的開口部31方向放射之光。The reflection film 25 is a cross section perpendicular to the tube axis of the light source lamp 20, and is formed in an angular range θ when the mirror holding portion 18A of the nozzle portion 18 is viewed centering on the tube axis (the lamp center C) of the light source lamp 20. The area is preferably such that the angle range is, for example, 90° (refer to Fig. 3). With such a configuration, the effective reflection area of the mirror 30 is not hindered, and the light radiated toward the opening 31 of the mirror 30 can be efficiently reflected by both the reflection film 25 and the mirror 30.
反射膜25是由於在光源燈20點燈時,封體21之表面溫度形成例如600~800℃,故需要藉由例如具有優良的耐熱性之材質所構成,例如藉由以氧化鉭(Ta2 O5 )與二 氧化矽(SiO2 )所形成之多層反射膜來構成的。這種結構的反射膜可藉由例如蒸鍍來加以形成。The reflective film 25 is formed by, for example, 600 to 800 ° C when the light source lamp 20 is turned on. Therefore, it is required to be formed of, for example, a material having excellent heat resistance, for example, by using tantalum oxide (Ta 2 ). O 5 ) is composed of a multilayer reflective film formed of cerium oxide (SiO 2 ). The reflective film of such a structure can be formed by, for example, evaporation.
反射膜25是如上所述,若構成可因應利用光照射裝置之處理目的,有效地反射特定波長之紫外線的話,其材質、各層的厚度及積層數不被特別限定,例如亦可例如使用氧化鋯或氧化鉿來取代氧化鉭。In the reflection film 25, as described above, the ultraviolet ray of a specific wavelength can be effectively reflected by the purpose of the treatment by the light irradiation device, and the material, the thickness of each layer, and the number of layers are not particularly limited. For example, zirconia can also be used. Or yttrium oxide to replace yttrium oxide.
在此光照射器10,噴嘴部18與光源燈20之寬度,即光源燈20與噴嘴部18的反射鏡保持部18A之最接近距離K的大小做成例如4~5mm,藉此,可使冷卻風確實地流過光源燈20的背面側。In the light irradiator 10, the width of the nozzle portion 18 and the light source lamp 20, that is, the closest distance K between the light source lamp 20 and the mirror holding portion 18A of the nozzle portion 18 is, for example, 4 to 5 mm, whereby The cooling air surely flows through the back side of the light source lamp 20.
在上述光照射裝置,例如被處理對象物在保持著與光源燈20一定的分離距離之狀態下,以通過光照射器10的下方位置之方式朝與光源燈20的管軸正交的方向搬送,藉由從光照射器10所照射的紫外線,進行預定處理。即,當光源燈20點燈時,包含由光源燈20所放射的紫外線之光經由光照射口11A直接或受到反射鏡30及光源燈20之反射膜25所反射而照射至被處理對象物。在此,受到反射鏡30所反射之反射光I1是暫時被聚光於反射鏡30的第2焦點f2後,進一步通過此第2焦點f2而擴散之狀態下,對比起第2焦點f2更位於光照射方向遠方側之被處理對象物全體進行照射,又,受到反射膜25所反射的反射光I2是與受到反射鏡30所反射的反射光I1不同,不會通過反射鏡30之第2焦點f2,而對例如光照射面A的中心位置(光源燈20之正下方位置)的兩側位置進行照 射(參照圖1)。In the light irradiation device, for example, the object to be processed is conveyed in a direction orthogonal to the tube axis of the light source lamp 20 so as to pass through the lower position of the light illuminator 10 while maintaining a constant separation distance from the light source lamp 20. The predetermined process is performed by the ultraviolet rays irradiated from the light irradiator 10. In other words, when the light source lamp 20 is turned on, the light including the ultraviolet light emitted from the light source lamp 20 is directly reflected by the light irradiation port 11A or reflected by the reflection film 25 of the mirror 30 and the light source lamp 20, and is irradiated onto the object to be processed. Here, the reflected light I1 reflected by the mirror 30 is temporarily collected by the second focus f2 of the mirror 30, and further diffused by the second focus f2, and is located further in comparison with the second focus f2. The entire object to be processed on the far side in the light irradiation direction is irradiated, and the reflected light I2 reflected by the reflection film 25 is different from the reflected light I1 reflected by the mirror 30, and does not pass through the second focus of the mirror 30. F2, for example, on both sides of the center position of the light irradiation surface A (the position directly under the light source lamp 20) Shoot (see Figure 1).
另外,利用以排氣風扇16作動而經由光照射口11A所吸入的冷卻風沿著反射鏡30的內面流過並且沿著光源燈20的封體21之表面流過,來將反射鏡30及光源燈20冷卻,然後,伴隨利用經由以噴嘴部18所形成的冷卻風路19流入風洞13,來將噴嘴部18冷卻,再經由導管17排氣至光照射器10的外部。又,反射鏡30,亦從背面側,受到經由形成於光照射口11A的開口緣部分的貫通孔11B吸入至燈配置用空間14內的冷卻風所冷卻(參照圖3)。在此,冷卻風的風量例如為1.5~2m3 /min。Further, the cooling mirror 30 that is moved by the exhaust fan 16 and flows through the light irradiation port 11A flows along the inner surface of the mirror 30 and flows along the surface of the envelope 21 of the light source lamp 20 to move the mirror 30. The light source lamp 20 is cooled, and then the nozzle portion 18 is cooled by flowing into the wind tunnel 13 via the cooling air passage 19 formed by the nozzle portion 18, and then exhausted to the outside of the light irradiator 10 via the duct 17. In addition, the mirror 30 is cooled by the cooling air sucked into the lamp arrangement space 14 through the through hole 11B formed in the opening edge portion of the light irradiation port 11A from the back side (see FIG. 3). Here, the air volume of the cooling air is, for example, 1.5 to 2 m 3 /min.
然而,在僅使用於封體的外表面形成有反射膜的光源燈的話,比起使用不具有反射膜的光源燈之光照射裝置,無法增大光照射面之光照射量。這是因反射鏡之反射光與反射膜之反射光的光線不同,所以在與反射鏡的有效反射區域的關係上,若利用反射鏡反射的情況的話,會有能夠反射至光照射面之預定範圍內的光受到反射膜所反射而照射到該範圍外的情事之故。However, in the light source lamp in which the reflection film is formed only on the outer surface of the package, the amount of light irradiation on the light irradiation surface cannot be increased compared to the light irradiation device using the light source lamp without the reflection film. This is because the reflected light from the mirror is different from the light reflected from the reflective film. Therefore, if it is reflected by the mirror in relation to the effective reflection area of the mirror, there is a possibility that it can be reflected to the light irradiation surface. The light in the range is reflected by the reflective film and is irradiated outside the range.
但,藉由使用於封體21的外表面區域之適當範圍形成反射膜25者做為光源燈20,若根據上述結構的光照射裝置的話,能夠藉由該反射膜25,來將由光源燈20朝反射鏡30的開口部31方向放射之光不會阻礙反射鏡30的有效反射區域而加以有效地反射,因此,可增大光照射面A之光照射量。具體而言,能夠獲得光照射面A之包含光源燈的正下方位置(中心位置)之預定範圍內的照度之等 級全體性變高的照度分佈(例如參照圖5),實際上,若根據這樣的照度分佈的話,能夠確實地覆蓋被處理對象物全體,能夠以高處理效率進行針對被處理對象物之預定的光照射處理。However, the light source lamp 20 is formed by forming the reflecting film 25 in an appropriate range of the outer surface area of the sealing body 21. According to the light irradiation device of the above configuration, the light source lamp 20 can be used by the reflecting film 25. Since the light radiated toward the opening 31 of the mirror 30 is not effectively blocked by the effective reflection area of the mirror 30, the amount of light irradiation on the light irradiation surface A can be increased. Specifically, it is possible to obtain the illuminance within a predetermined range including the position (center position) directly under the light source lamp of the light-irradiating surface A. In the illuminance distribution (for example, see FIG. 5) in which the overall level is high, it is possible to reliably cover the entire object to be processed, and to perform the predetermined object to be processed with high processing efficiency. Light irradiation treatment.
並且,因防止了朝反射鏡30的開口部31方向放射之光直接對形成冷卻風路19的噴嘴部18照射,所以不需要增加所必要的冷卻風之風量,即可防止噴嘴部18成為過熱狀態,可謀求省能量化。Further, since the light radiated toward the opening 31 of the mirror 30 is prevented from directly irradiating the nozzle portion 18 forming the cooling air passage 19, it is not necessary to increase the amount of cooling air required to prevent the nozzle portion 18 from being overheated. The state can be saved energy.
以下,說明關於為了確認本發明的效果所進行之實驗例。Hereinafter, an experimental example performed to confirm the effects of the present invention will be described.
根據圖1所示的結構,製作本發明之光照射裝置。此光照射裝置之具體形態如下所示。According to the structure shown in Fig. 1, the light irradiation device of the present invention was produced. The specific form of this light irradiation device is as follows.
光源燈是封體的外徑為23mm、發光長度為125mm、額定電力為1.5kW、燈輸入電力為120W/cm之高壓水銀燈,在封體之以管軸為中心之90°的角度範圍之外表面區域形成反射膜者。The light source lamp is the outer diameter of the enclosure A high-pressure mercury lamp of 23 mm, a light-emitting length of 125 mm, a rated power of 1.5 kW, and a lamp input power of 120 W/cm, and a reflective film formed on the surface area outside the angular range of 90° centered on the tube axis of the package.
反射膜是藉由蒸鍍,將氧化鉭與二氧化矽交互地積層大約20層之多層蒸鍍膜。The reflective film is a multilayer deposited film of about 20 layers by laminating cerium oxide and cerium oxide by evaporation.
反射膜是具有橢圓面反射面,由第1焦點至第2焦點之分離距離為120mm者。The reflective film has an elliptical reflecting surface, and the separation distance from the first focus to the second focus is 120 mm.
排氣風扇是具有可設定成流過光照射器內之風量成為1.5~2m3 /min之能力者。The exhaust fan has a capability of being set such that the amount of air flowing through the light irradiator becomes 1.5 to 2 m 3 /min.
燈室及噴嘴部為鋁製,噴嘴部的反射鏡保持部與光源燈之最接近距離為4.5mm。The lamp chamber and the nozzle portion were made of aluminum, and the closest distance between the mirror holding portion of the nozzle portion and the light source lamp was 4.5 mm.
又,製作除了使用不具有反射膜之與上述光源燈同樣形態的高壓水營燈,其餘具有與上述光照射裝置相同結構之比較用光照射裝置。Further, a high-pressure water lamp having the same configuration as that of the above-described light source lamp was used, except that a high-pressure water lamp having the same configuration as that of the above-described light source lamp was used.
針對本發明之光照射裝置及比較用的光照射裝置,在設置於由反射鏡的第1焦點位置對光照射方向分離400mm之位置的光照射面,測定於波長365nm具有中心感度之紫外線照度。其結果如圖5所示。圖5中之縱軸是顯示以光源燈的正下方位置(中心位置、0mm)起,與燈管軸正交的方向之距離所表示的測定位置,以□顯示本發明之光照射裝置的結果,以△顯示比較用的光照射裝置之結果。In the light irradiation device of the present invention and the light irradiation device for comparison, the light irradiation surface provided at a position separated by 400 mm from the first focus position of the mirror in the light irradiation direction is measured for ultraviolet illuminance having a central sensitivity at a wavelength of 365 nm. The result is shown in Fig. 5. The vertical axis in Fig. 5 is a measurement position indicating the distance in the direction orthogonal to the tube axis from the position immediately below the light source lamp (center position, 0 mm), and shows the result of the light irradiation device of the present invention. The result of the light irradiation device for comparison is shown by Δ.
由圖5所示的結果確認了,光源燈的正下方位置之中心位置(測定位置0mm)之照度的大小,在本發明之光照射裝置與比較用之光照射裝置,沒有大差異,但在本發明之光照射裝置,於照度分佈之中心位置的兩側位置具有照度高之部分,在由中心位置起朝左右600mm之範圍內,紫外線照射量(圖5中之照度的積分值)比起比較用之光照射裝置高出大約20%。From the results shown in FIG. 5, it was confirmed that the illuminance of the center position (measurement position 0 mm) of the position directly below the light source lamp is not greatly different between the light irradiation device of the present invention and the light irradiation device for comparison, but In the light irradiation device of the present invention, the illuminance is high on both sides of the center position of the illuminance distribution, and the ultraviolet ray irradiation amount (the integral value of the illuminance in Fig. 5) is in the range of 600 mm from the center position to the left and right. The comparative light irradiation device is about 20% higher.
其理由如下。即,由於形成於光源燈之反射膜是形成於剖面呈圓形的棒狀光源燈的封體之表面,反射膜的反射面之剖面也呈圓形,故例如當光由光源燈的中心射出時,光會被反射膜朝與射出方向180°相反的方向反射。The reason is as follows. That is, since the reflective film formed on the light source lamp is formed on the surface of the sealing body of the rod-shaped light source lamp having a circular cross section, the reflecting surface of the reflecting film has a circular cross section, so that, for example, when light is emitted from the center of the light source lamp At this time, the light is reflected by the reflection film in a direction opposite to the emission direction by 180°.
但,實際的光源燈之發光部具有某程度的大小,光是 由具有該大小的發光部之表面所放射。即,光射出的位置會形成由燈的中心稍微偏移,如圖1的「反射膜之反射光I2」所顯示的光線,受到反射膜所反射的光不是朝180°相反側,而是朝稍微靠近中心被反射而加以照射。因此,在照度分佈之中心位置的兩側產生照度高的部分之故。However, the actual light source of the light source lamp has a certain size, and the light is It is radiated from the surface of the light-emitting portion having the size. That is, the position at which the light is emitted is slightly offset from the center of the lamp, as shown by the "reflected light I2 of the reflective film" as shown in Fig. 1, and the light reflected by the reflective film is not directed to the opposite side of 180°, but It is reflected slightly closer to the center and illuminated. Therefore, a portion having a high illuminance is generated on both sides of the center position of the illuminance distribution.
如上所述,確認了,若根據本發明之光照射裝置的話,能夠藉由反射膜及反射鏡,將在比較用光照射裝置無法有效地利用之朝冷卻風路方向放射的光反射而加以有效地利用,可提高光照射量。As described above, according to the light irradiation device of the present invention, it is possible to effectively reflect the light emitted in the direction of the cooling air passage which cannot be effectively used by the comparative light irradiation device by the reflection film and the mirror. The use of the ground can increase the amount of light exposure.
又,可期待若能夠增大光照射面之光照射量的範圍為由中心位置起左右600mm的範圍內的話,實際上,可覆蓋被處理對象物全體,在實用上可獲得充分的效果。In addition, when the range of the light irradiation amount of the light-irradiated surface is in the range of 600 mm from the center position, it is expected that the entire object to be processed can be covered, and a sufficient effect can be obtained practically.
又,在測定光源燈點燈時之噴嘴部的溫度時,確認了,在比較用光照射裝置,大約為120~130℃,相對於此,在本發明之光照射裝置,大約為100℃左右,比起比較用光照射裝置,呈低於20℃以上之溫度狀態。Further, when measuring the temperature of the nozzle portion when the light source lamp was turned on, it was confirmed that the comparative light irradiation device was approximately 120 to 130 ° C, whereas the light irradiation device of the present invention was approximately 100 ° C or so. It is a temperature lower than 20 ° C than the comparative light irradiation device.
這是由於在本發明之光照射裝置,被朝冷卻風路方向所放射的光受到反射膜所反射,而經由光射出口射出,減低了直接照射至噴嘴部之光的照射量之故。因此,不需要增大為了防止噴嘴部成為過熱狀態所必要之冷卻風的風量,即可具有可充分將光照射裝置冷卻之冷卻功能之結構。This is because, in the light irradiation device of the present invention, the light emitted in the direction of the cooling air path is reflected by the reflection film, and is emitted through the light exit port, thereby reducing the amount of light directly irradiated to the nozzle portion. Therefore, it is not necessary to increase the amount of cooling air necessary for preventing the nozzle portion from being in an overheated state, and it is possible to have a cooling function capable of sufficiently cooling the light irradiation device.
以上,說明了說明本發明的實施形態,但本發明不限於上述實施形態,亦可進行各種變更。The embodiment of the present invention has been described above, but the present invention is not limited to the above embodiment, and various modifications can be made.
例如,在上述實施形態,以藉由排氣風扇將冷卻風吸 入燈室內之排氣冷卻方向者為例進行了說明,但亦可為經由冷卻風路將冷卻風供給至燈室內之送風冷卻方式者。For example, in the above embodiment, the cooling air is sucked by the exhaust fan Although the exhaust gas cooling direction in the lamp chamber has been described as an example, it may be a case where the cooling air is supplied to the lamp room through the cooling air passage.
又,在本發明之光照射裝置,設定與光源燈的寬度之噴嘴部,亦可為一體地形成於光照射裝置的燈室之隔壁者,亦可為與隔壁不同體地加以形成者。Further, in the light irradiation device of the present invention, the nozzle portion that sets the width of the light source lamp may be formed integrally with the partition wall of the lamp chamber of the light irradiation device, or may be formed differently from the partition wall.
且,構成光照射器之反射鏡,其反射面亦可不是橢圓面,而為拋物面者。Moreover, the reflecting mirror constituting the light illuminator may not be an elliptical surface but a paraboloid.
又,在本發明之光照射裝置,構成光照射器之反射鏡,亦可為組合具有與光源燈的發光長度之大小相同或以上之長度,並且具有反射面之2個鏡予以組合做成溝槽狀者。在此情況,在兩個反射鏡之間形成冷卻風路。Further, in the light irradiation device of the present invention, the mirror constituting the light illuminator may be a combination of two mirrors having a length equal to or greater than the length of the light-emitting lamp, and having two reflecting mirrors. Slotted. In this case, a cooling air path is formed between the two mirrors.
又,形成於反射鏡的頂部之開口部,亦可藉由形成於沿著光源燈相互分離而排列之位置的複數個孔所形成的。Further, the opening formed at the top of the mirror may be formed by a plurality of holes formed at positions spaced apart from each other along the light source lamps.
10‧‧‧光照射器10‧‧‧Light illuminator
11‧‧‧燈室11‧‧‧ lamp room
11A‧‧‧光照射口11A‧‧‧Lighting port
11B‧‧‧貫通孔11B‧‧‧through hole
12‧‧‧隔壁12‧‧‧ next door
13‧‧‧風洞13‧‧‧Wind Cave
14‧‧‧燈配置用空間14‧‧‧Light configuration space
15‧‧‧冷卻風流通用開口15‧‧‧General opening for cooling airflow
15A‧‧‧貫通孔15A‧‧‧through hole
16‧‧‧排氣風扇16‧‧‧Exhaust fan
17‧‧‧導管17‧‧‧ catheter
18‧‧‧噴嘴部18‧‧‧Nozzle Department
19‧‧‧冷卻風路19‧‧‧Cooling wind road
20‧‧‧光源燈20‧‧‧Light source
21‧‧‧封體21‧‧‧Enclosed
22‧‧‧電極22‧‧‧Electrode
23‧‧‧遮風構件23‧‧‧winding members
25‧‧‧反射膜25‧‧‧Reflective film
30‧‧‧反射鏡30‧‧‧Mirror
31‧‧‧開口部31‧‧‧ openings
f1‧‧‧第1焦點F1‧‧‧1st focus
f2‧‧‧第2焦點F2‧‧‧2nd focus
I1‧‧‧反射鏡之反射光Reflected light from I1‧‧‧ mirror
I2‧‧‧反射膜之反射光Reflected light of I2‧‧‧reflective film
40‧‧‧光照射器40‧‧‧Light illuminator
41‧‧‧燈室41‧‧‧light room
42‧‧‧隔壁42‧‧‧ next door
43‧‧‧風洞43‧‧‧Wind Cave
44‧‧‧燈配置用空間44‧‧‧Light configuration space
45‧‧‧冷卻風流通用開口部45‧‧‧Mainstream opening for cooling airflow
46‧‧‧噴嘴部46‧‧‧Nozzle Department
46A‧‧‧噴嘴46A‧‧‧Nozzles
48‧‧‧導管48‧‧‧ catheter
49‧‧‧排氣風扇49‧‧‧Exhaust fan
50‧‧‧光源燈50‧‧‧Light source lamp
55‧‧‧反射鏡55‧‧‧Mirror
56‧‧‧開口部56‧‧‧ openings
60‧‧‧冷卻風路60‧‧‧Cooling wind road
W‧‧‧被處理對象物W‧‧‧Objects to be treated
圖1是顯示本發明的光照射裝置之一例的結構之概略的剖面圖。Fig. 1 is a cross-sectional view showing the outline of an example of a light irradiation device of the present invention.
圖2是顯示圖1所示的光照射裝置之光照射器的結構之概略的立體圖。Fig. 2 is a perspective view showing a schematic configuration of a light irradiator of the light irradiation device shown in Fig. 1;
圖3是顯示圖2所示的光照射器之與光源燈的管軸垂直之剖面的剖面圖。Figure 3 is a cross-sectional view showing a cross section of the light irradiator shown in Figure 2 perpendicular to the tube axis of the light source lamp.
圖4是顯示本發明的光源燈之一例的結構之概略的平面圖。Fig. 4 is a plan view showing the outline of a configuration of an example of a light source lamp of the present invention.
圖5是顯示在實驗例所製作的本發明之光照射裝置的 照度分佈之圖表。Figure 5 is a view showing the light irradiation device of the present invention produced in the experimental example. A chart of illuminance distribution.
圖6是顯示以往的光照射裝置之一例的結構之概略的剖面圖。FIG. 6 is a cross-sectional view showing a schematic configuration of an example of a conventional light irradiation device.
圖7是顯示構成圖6所示光照射裝置的光照射器之與光源燈的管軸垂直之剖面的剖面圖。Fig. 7 is a cross-sectional view showing a cross section of a light irradiator constituting the light irradiation device shown in Fig. 6 perpendicular to a tube axis of a light source lamp.
圖8是顯示以往之光照射裝置的其他例之結構的概略的立體圖。8 is a perspective view showing a schematic configuration of another example of a conventional light irradiation device.
11‧‧‧燈室11‧‧‧ lamp room
11A‧‧‧光照射口11A‧‧‧Lighting port
11B‧‧‧貫通孔11B‧‧‧through hole
12‧‧‧隔壁12‧‧‧ next door
13‧‧‧風洞13‧‧‧Wind Cave
14‧‧‧燈配置用空間14‧‧‧Light configuration space
15‧‧‧冷卻風流通用開口15‧‧‧General opening for cooling airflow
15A‧‧‧貫通孔15A‧‧‧through hole
18‧‧‧噴嘴部18‧‧‧Nozzle Department
18A‧‧‧反射鏡保持部18A‧‧‧Mirror Holder
19‧‧‧冷卻風路19‧‧‧Cooling wind road
20‧‧‧光源燈20‧‧‧Light source
23‧‧‧遮風構件23‧‧‧winding members
25‧‧‧反射膜25‧‧‧Reflective film
30‧‧‧反射鏡30‧‧‧Mirror
C‧‧‧光源燈的發光部之燈中心C‧‧‧Light center of the light-emitting part of the light source lamp
K‧‧‧光源燈與噴嘴部的反射鏡保持部之最接近距離K‧‧‧The closest distance between the light source lamp and the mirror holding portion of the nozzle section
Claims (2)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005353541A JP4811000B2 (en) | 2005-12-07 | 2005-12-07 | Light irradiation device |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200722274A TW200722274A (en) | 2007-06-16 |
TWI391235B true TWI391235B (en) | 2013-04-01 |
Family
ID=38130241
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095134845A TWI391235B (en) | 2005-12-07 | 2006-09-20 | Light irradiation device |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4811000B2 (en) |
KR (1) | KR101030421B1 (en) |
CN (1) | CN1978983B (en) |
TW (1) | TWI391235B (en) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7964858B2 (en) | 2008-10-21 | 2011-06-21 | Applied Materials, Inc. | Ultraviolet reflector with coolant gas holes and method |
KR20130041756A (en) * | 2010-03-31 | 2013-04-25 | 가부시키가이샤 지에스 유아사 | Uv irradiation device and inkjet printer |
JP2012198997A (en) * | 2011-03-18 | 2012-10-18 | Ushio Inc | Long arc metal halide lamp and light irradiation device |
US8823249B2 (en) * | 2011-11-15 | 2014-09-02 | Seiko Epson Corporation | Irradiation device and irradiation method |
CN103292282B (en) * | 2012-03-05 | 2016-07-06 | 上海微电子装备有限公司 | For the cooling system of ellipsoidal reflector and the high power lighting source lamp chamber applying it |
JP5573910B2 (en) * | 2012-10-03 | 2014-08-20 | 岩崎電気株式会社 | Irradiation device |
KR101991521B1 (en) * | 2012-04-20 | 2019-06-20 | 이와사키 덴끼 가부시키가이샤 | Polarizer unit, jig for adjusting, lamp replacement stage and irradiation apparatus |
CN103836596B (en) * | 2012-11-22 | 2016-06-01 | 上海微电子装备有限公司 | A kind of superpower mercury lamp room device |
CN104141891B (en) * | 2013-05-08 | 2017-05-31 | 海洋王(东莞)照明科技有限公司 | Fitting structure |
CN104141892B (en) * | 2013-05-08 | 2017-05-31 | 海洋王(东莞)照明科技有限公司 | Fitting structure |
CN103644469A (en) * | 2013-11-25 | 2014-03-19 | 湖州市妙西镇资产经营有限公司 | Novel LED (light-emitting diode) lamp structure |
CN103644470A (en) * | 2013-11-25 | 2014-03-19 | 湖州市妙西镇资产经营有限公司 | Fluorescent lamp structure |
JP6052199B2 (en) * | 2014-02-12 | 2016-12-27 | ウシオ電機株式会社 | Polarized light irradiation device and rod-shaped light source for photo-alignment |
CN105216283A (en) * | 2015-08-28 | 2016-01-06 | 广州达意隆包装机械股份有限公司 | A kind of bottle blowing machine heating fluorescent tube |
CN105487352B (en) * | 2016-02-16 | 2017-06-27 | 武汉华星光电技术有限公司 | The replacing options of exposure machine and Exposing Lamp |
CN106016974B (en) * | 2016-05-12 | 2018-07-06 | 绍兴中漂印染有限公司 | A kind of drying unit for fabric printing |
JP6798275B2 (en) * | 2016-11-25 | 2020-12-09 | ウシオ電機株式会社 | Excimer lamp unit and excimer lamp device |
JP6859814B2 (en) * | 2017-04-03 | 2021-04-14 | 株式会社Gsユアサ | Light irradiation device |
CN108591876A (en) * | 2018-01-17 | 2018-09-28 | 东莞市天合机电开发有限公司 | A kind of absorption type outdoor LED illuminator |
EP4029532A1 (en) * | 2021-01-05 | 2022-07-20 | The Boeing Company | Ultraviolet device and methods of using the same |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5760656A (en) * | 1980-09-29 | 1982-04-12 | Mitsubishi Electric Corp | Forcefuly cooled super high pressure mercury lamp |
JPH0817457A (en) * | 1994-06-28 | 1996-01-19 | Tokyo Gas Co Ltd | Water treatment equipment for fuel cell |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01209631A (en) * | 1988-02-15 | 1989-08-23 | Nec Corp | Very high pressure mercury-vapor lamp for phosphor film exposure |
JPH08174567A (en) * | 1994-10-25 | 1996-07-09 | Ushio Inc | Illuminator |
DE19814300B4 (en) * | 1998-03-31 | 2008-09-25 | Bernhard Weber | Headlight or light |
JP2000206619A (en) * | 1999-01-18 | 2000-07-28 | Matsushita Electric Ind Co Ltd | Lamp and liquid crystal projection device |
CA2267674C (en) * | 1999-03-31 | 2010-03-30 | Imax Corporation | Method for cooling an arc lamp |
JP3846232B2 (en) * | 2000-12-08 | 2006-11-15 | ウシオ電機株式会社 | Circulating air cooling system for light irradiators |
JP2003187604A (en) * | 2001-12-17 | 2003-07-04 | Ushio Inc | Optical device |
-
2005
- 2005-12-07 JP JP2005353541A patent/JP4811000B2/en not_active Expired - Fee Related
-
2006
- 2006-09-20 TW TW095134845A patent/TWI391235B/en not_active IP Right Cessation
- 2006-10-19 KR KR1020060101923A patent/KR101030421B1/en active IP Right Grant
- 2006-12-07 CN CN2006101531253A patent/CN1978983B/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5760656A (en) * | 1980-09-29 | 1982-04-12 | Mitsubishi Electric Corp | Forcefuly cooled super high pressure mercury lamp |
JPH0817457A (en) * | 1994-06-28 | 1996-01-19 | Tokyo Gas Co Ltd | Water treatment equipment for fuel cell |
Also Published As
Publication number | Publication date |
---|---|
KR101030421B1 (en) | 2011-04-20 |
JP4811000B2 (en) | 2011-11-09 |
KR20070059937A (en) | 2007-06-12 |
TW200722274A (en) | 2007-06-16 |
JP2007157583A (en) | 2007-06-21 |
CN1978983A (en) | 2007-06-13 |
CN1978983B (en) | 2011-05-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI391235B (en) | Light irradiation device | |
JP6275250B2 (en) | Apparatus for curing a coating by use of radiant energy and method for curing a polymer coating on a high aspect ratio substrate | |
JPH0768163A (en) | Ultraviolet irradiation device | |
JP2008130302A (en) | Light irradiation device | |
JP2014044883A (en) | Ultraviolet irradiation device | |
JP6981150B2 (en) | Light irradiation device | |
US20040211927A1 (en) | Infrared radiator and irradiation apparatus | |
JP2004105852A (en) | Ultraviolet curing device | |
JPS61158455A (en) | Ultraviolet-ray irradiation device | |
TWI615884B (en) | Light irradiation device and long arc discharge lamp | |
JP2002170415A (en) | Light radiating device | |
WO2024195231A1 (en) | Ultraviolet light irradiation apparatus | |
JP7422983B2 (en) | Light irradiation equipment and processing equipment | |
JPS61261055A (en) | Ultraviolet ray irradiation device | |
JP2022143717A (en) | Ultraviolet irradiation device | |
JPH10286509A (en) | Ultraviolet-ray radiation device | |
JP2021012775A (en) | Light irradiator | |
JPH03238041A (en) | Ultraviolet-ray irradiation apparatus | |
JPH0330863A (en) | Cooling blow duct apparatus | |
JP2013202429A (en) | Ultraviolet irradiation device | |
JP5316173B2 (en) | Light source device | |
JPH0386235A (en) | Ultraviolet ray irradiation device | |
JP5963119B2 (en) | Light irradiation device and long arc type discharge lamp | |
JP2006116368A (en) | Ultraviolet irradiator | |
KR20240012815A (en) | Air Sterilizer |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |