TWI389172B - 擴散器支撐件 - Google Patents

擴散器支撐件 Download PDF

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Publication number
TWI389172B
TWI389172B TW097123127A TW97123127A TWI389172B TW I389172 B TWI389172 B TW I389172B TW 097123127 A TW097123127 A TW 097123127A TW 97123127 A TW97123127 A TW 97123127A TW I389172 B TWI389172 B TW I389172B
Authority
TW
Taiwan
Prior art keywords
diffuser
backing plate
support
coupled
frame structure
Prior art date
Application number
TW097123127A
Other languages
English (en)
Chinese (zh)
Other versions
TW200908079A (en
Inventor
John M White
Robin L Tiner
Yeh Kurt Chang
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of TW200908079A publication Critical patent/TW200908079A/zh
Application granted granted Critical
Publication of TWI389172B publication Critical patent/TWI389172B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
TW097123127A 2007-06-22 2008-06-20 擴散器支撐件 TWI389172B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/767,307 US20080317973A1 (en) 2007-06-22 2007-06-22 Diffuser support

Publications (2)

Publication Number Publication Date
TW200908079A TW200908079A (en) 2009-02-16
TWI389172B true TWI389172B (zh) 2013-03-11

Family

ID=40136792

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097123127A TWI389172B (zh) 2007-06-22 2008-06-20 擴散器支撐件

Country Status (5)

Country Link
US (2) US20080317973A1 (cg-RX-API-DMAC7.html)
JP (1) JP5215055B2 (cg-RX-API-DMAC7.html)
KR (1) KR101016860B1 (cg-RX-API-DMAC7.html)
CN (2) CN102251227B (cg-RX-API-DMAC7.html)
TW (1) TWI389172B (cg-RX-API-DMAC7.html)

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TWI663674B (zh) * 2017-07-25 2019-06-21 漢民科技股份有限公司 用於半導體製程之腔體蓋與頂板之組合體及成膜裝置
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US20100181024A1 (en) 2010-07-22
US9580804B2 (en) 2017-02-28
TW200908079A (en) 2009-02-16
JP2009065121A (ja) 2009-03-26
CN102251227A (zh) 2011-11-23
JP5215055B2 (ja) 2013-06-19
US20080317973A1 (en) 2008-12-25
CN101333651A (zh) 2008-12-31
CN102251227B (zh) 2013-11-27
KR101016860B1 (ko) 2011-02-22
CN101333651B (zh) 2011-08-24
KR20080112961A (ko) 2008-12-26

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