KR101016860B1 - 확산기 지지부 - Google Patents

확산기 지지부 Download PDF

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KR101016860B1
KR101016860B1 KR1020080057715A KR20080057715A KR101016860B1 KR 101016860 B1 KR101016860 B1 KR 101016860B1 KR 1020080057715 A KR1020080057715 A KR 1020080057715A KR 20080057715 A KR20080057715 A KR 20080057715A KR 101016860 B1 KR101016860 B1 KR 101016860B1
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Prior art keywords
diffuser
gas distribution
backing plate
distribution device
support member
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KR20080112961A (ko
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존 엠. 화이트
로빈 엘. 티너
예이 쿠르트 창
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어플라이드 머티어리얼스, 인코포레이티드
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
KR1020080057715A 2007-06-22 2008-06-19 확산기 지지부 Active KR101016860B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/767,307 2007-06-22
US11/767,307 US20080317973A1 (en) 2007-06-22 2007-06-22 Diffuser support

Publications (2)

Publication Number Publication Date
KR20080112961A KR20080112961A (ko) 2008-12-26
KR101016860B1 true KR101016860B1 (ko) 2011-02-22

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KR1020080057715A Active KR101016860B1 (ko) 2007-06-22 2008-06-19 확산기 지지부

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US (2) US20080317973A1 (cg-RX-API-DMAC7.html)
JP (1) JP5215055B2 (cg-RX-API-DMAC7.html)
KR (1) KR101016860B1 (cg-RX-API-DMAC7.html)
CN (2) CN102251227B (cg-RX-API-DMAC7.html)
TW (1) TWI389172B (cg-RX-API-DMAC7.html)

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KR101352925B1 (ko) * 2011-09-16 2014-01-22 주식회사 에스에프에이 평면디스플레이용 화학 기상 증착장치
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KR102248657B1 (ko) * 2014-06-02 2021-05-07 주성엔지니어링(주) 기판처리장치
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KR102431354B1 (ko) * 2017-07-11 2022-08-11 삼성디스플레이 주식회사 화학기상 증착장치 및 이를 이용한 표시 장치의 제조 방법
TWI663674B (zh) * 2017-07-25 2019-06-21 漢民科技股份有限公司 用於半導體製程之腔體蓋與頂板之組合體及成膜裝置
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JP2022545273A (ja) 2019-08-23 2022-10-26 ラム リサーチ コーポレーション 温度制御型のシャンデリア型シャワーヘッド
KR102707623B1 (ko) * 2020-09-11 2024-09-19 주식회사 원익아이피에스 기판처리장치
KR102526364B1 (ko) * 2021-04-14 2023-05-02 주식회사 에이치앤이루자 기판 처리 장치의 샤워 헤드 지지 및 조절부

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CN102251227A (zh) 2011-11-23
JP5215055B2 (ja) 2013-06-19
US20080317973A1 (en) 2008-12-25
CN101333651A (zh) 2008-12-31
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