TWI362598B - Method of adding fabrication monitors to integrated circuit chips - Google Patents
Method of adding fabrication monitors to integrated circuit chips Download PDFInfo
- Publication number
- TWI362598B TWI362598B TW095111771A TW95111771A TWI362598B TW I362598 B TWI362598 B TW I362598B TW 095111771 A TW095111771 A TW 095111771A TW 95111771 A TW95111771 A TW 95111771A TW I362598 B TWI362598 B TW I362598B
- Authority
- TW
- Taiwan
- Prior art keywords
- shape
- integrated circuit
- monitoring
- area
- region
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Semiconductor Integrated Circuits (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/907,494 US7240322B2 (en) | 2005-04-04 | 2005-04-04 | Method of adding fabrication monitors to integrated circuit chips |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200705229A TW200705229A (en) | 2007-02-01 |
| TWI362598B true TWI362598B (en) | 2012-04-21 |
Family
ID=37072118
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW095111771A TWI362598B (en) | 2005-04-04 | 2006-04-03 | Method of adding fabrication monitors to integrated circuit chips |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US7240322B2 (enExample) |
| EP (1) | EP1869595B1 (enExample) |
| JP (1) | JP5052501B2 (enExample) |
| CN (1) | CN101147148B (enExample) |
| TW (1) | TWI362598B (enExample) |
| WO (1) | WO2006107356A2 (enExample) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7240322B2 (en) * | 2005-04-04 | 2007-07-03 | International Business Machines Corporation | Method of adding fabrication monitors to integrated circuit chips |
| US7926006B2 (en) * | 2007-02-23 | 2011-04-12 | International Business Machines Corporation | Variable fill and cheese for mitigation of BEOL topography |
| JP5431661B2 (ja) * | 2007-09-05 | 2014-03-05 | ルネサスエレクトロニクス株式会社 | 半導体集積回路およびそのパターンレイアウト方法 |
| US7999566B2 (en) * | 2007-12-31 | 2011-08-16 | Hitachi Global Storage Technologies, Netherlands B.V. | Wafer level testing |
| US8716135B1 (en) | 2008-01-30 | 2014-05-06 | Cadence Design Systems, Inc. | Method of eliminating a lithography operation |
| US20110004598A1 (en) * | 2008-03-26 | 2011-01-06 | Nec Corporation | Service response performance analyzing device, method, program, and recording medium containing the program |
| US20110101534A1 (en) * | 2009-11-04 | 2011-05-05 | International Business Machines Corporation | Automated short length wire shape strapping and methods of fabricting the same |
| US8470674B2 (en) * | 2011-01-03 | 2013-06-25 | International Business Machines Corporation | Structure, method and system for complementary strain fill for integrated circuit chips |
| TWI447887B (zh) * | 2011-06-01 | 2014-08-01 | 矽品精密工業股份有限公司 | 電路元件孔鏈結構及其佈局方法 |
| US9524916B2 (en) * | 2012-10-31 | 2016-12-20 | International Business Machines Corporation | Structures and methods for determining TDDB reliability at reduced spacings using the structures |
| US9059052B2 (en) | 2013-05-16 | 2015-06-16 | International Business Machines Corporation | Alternating open-ended via chains for testing via formation and dielectric integrity |
| US9672316B2 (en) | 2013-07-17 | 2017-06-06 | Arm Limited | Integrated circuit manufacture using direct write lithography |
| JP5647328B2 (ja) * | 2013-12-09 | 2014-12-24 | ルネサスエレクトロニクス株式会社 | 半導体集積回路およびそのパターンレイアウト方法 |
| US9519210B2 (en) * | 2014-11-21 | 2016-12-13 | International Business Machines Corporation | Voltage contrast characterization structures and methods for within chip process variation characterization |
| US9799575B2 (en) * | 2015-12-16 | 2017-10-24 | Pdf Solutions, Inc. | Integrated circuit containing DOEs of NCEM-enabled fill cells |
| US10199283B1 (en) | 2015-02-03 | 2019-02-05 | Pdf Solutions, Inc. | Method for processing a semiconductor wager using non-contact electrical measurements indicative of a resistance through a stitch, where such measurements are obtained by scanning a pad comprised of at least three parallel conductive stripes using a moving stage with beam deflection to account for motion of the stage |
| US10593604B1 (en) | 2015-12-16 | 2020-03-17 | Pdf Solutions, Inc. | Process for making semiconductor dies, chips, and wafers using in-line measurements obtained from DOEs of NCEM-enabled fill cells |
| US10978438B1 (en) | 2015-12-16 | 2021-04-13 | Pdf Solutions, Inc. | IC with test structures and E-beam pads embedded within a contiguous standard cell area |
| US9905553B1 (en) | 2016-04-04 | 2018-02-27 | Pdf Solutions, Inc. | Integrated circuit containing standard logic cells and library-compatible, NCEM-enabled fill cells, including at least via-open-configured, AACNT-short-configured, GATECNT-short-configured, and metal-short-configured, NCEM-enabled fill cells |
| US9929063B1 (en) | 2016-04-04 | 2018-03-27 | Pdf Solutions, Inc. | Process for making an integrated circuit that includes NCEM-Enabled, tip-to-side gap-configured fill cells, with NCEM pads formed from at least three conductive stripes positioned between adjacent gates |
| US9627370B1 (en) | 2016-04-04 | 2017-04-18 | Pdf Solutions, Inc. | Integrated circuit containing standard logic cells and library-compatible, NCEM-enabled fill cells, including at least via-open-configured, GATE-short-configured, GATECNT-short-configured, and TS-short-configured, NCEM-enabled fill cells |
| US9748153B1 (en) | 2017-03-29 | 2017-08-29 | Pdf Solutions, Inc. | Process for making and using a semiconductor wafer containing first and second does of standard cell compatible, NCEM-enabled fill cells, with the first DOE including side-to-side short configured fill cells, and the second DOE including tip-to-side short configure |
| US9773774B1 (en) | 2017-03-30 | 2017-09-26 | Pdf Solutions, Inc. | Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including chamfer short configured fill cells, and the second DOE including corner short configured fill cells |
| US9768083B1 (en) | 2017-06-27 | 2017-09-19 | Pdf Solutions, Inc. | Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including merged-via open configured fill cells, and the second DOE including snake open configured fill cells |
| US9786649B1 (en) | 2017-06-27 | 2017-10-10 | Pdf Solutions, Inc. | Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including via open configured fill cells, and the second DOE including stitch open configured fill cells |
| US10096530B1 (en) | 2017-06-28 | 2018-10-09 | Pdf Solutions, Inc. | Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including merged-via open configured fill cells, and the second DOE including stitch open configured fill cells |
| US9865583B1 (en) | 2017-06-28 | 2018-01-09 | Pdf Solutions, Inc. | Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including snake open configured fill cells, and the second DOE including stitch open configured fill cells |
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| US4801869A (en) * | 1987-04-27 | 1989-01-31 | International Business Machines Corporation | Semiconductor defect monitor for diagnosing processing-induced defects |
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| US5736863A (en) * | 1996-06-19 | 1998-04-07 | Taiwan Semiconductor Manufacturing Company, Ltd. | Abatement of electron beam charging distortion during dimensional measurements of integrated circuit patterns with scanning electron microscopy by the utilization of specially designed test structures |
| US5723874A (en) * | 1996-06-24 | 1998-03-03 | International Business Machines Corporation | Dishing and erosion monitor structure for damascene metal processing |
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| US5959459A (en) * | 1996-12-10 | 1999-09-28 | International Business Machines Corporation | Defect monitor and method for automated contactless inline wafer inspection |
| US6147361A (en) * | 1997-02-07 | 2000-11-14 | Taiwan Semiconductor Manufacturing Company | Polysilicon electromigration sensor which can detect and monitor electromigration in composite metal lines on integrated circuit structures with improved sensitivity |
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| JP2000294730A (ja) * | 1999-04-09 | 2000-10-20 | Mitsubishi Electric Corp | システムlsiチップ及びその製造方法 |
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| US6834117B1 (en) * | 1999-11-30 | 2004-12-21 | Texas Instruments Incorporated | X-ray defect detection in integrated circuit metallization |
| JP4307664B2 (ja) * | 1999-12-03 | 2009-08-05 | 株式会社ルネサステクノロジ | 半導体装置 |
| US6433561B1 (en) * | 1999-12-14 | 2002-08-13 | Kla-Tencor Corporation | Methods and apparatus for optimizing semiconductor inspection tools |
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| US7240322B2 (en) * | 2005-04-04 | 2007-07-03 | International Business Machines Corporation | Method of adding fabrication monitors to integrated circuit chips |
-
2005
- 2005-04-04 US US10/907,494 patent/US7240322B2/en not_active Expired - Lifetime
- 2005-12-22 WO PCT/US2005/047083 patent/WO2006107356A2/en not_active Ceased
- 2005-12-22 CN CN2005800492611A patent/CN101147148B/zh not_active Expired - Fee Related
- 2005-12-22 EP EP05855609.3A patent/EP1869595B1/en not_active Expired - Lifetime
- 2005-12-22 JP JP2008504019A patent/JP5052501B2/ja not_active Expired - Fee Related
-
2006
- 2006-04-03 TW TW095111771A patent/TWI362598B/zh not_active IP Right Cessation
-
2007
- 2007-03-19 US US11/687,731 patent/US7323278B2/en not_active Expired - Lifetime
- 2007-09-24 US US11/859,890 patent/US7620931B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US20080017857A1 (en) | 2008-01-24 |
| TW200705229A (en) | 2007-02-01 |
| EP1869595A2 (en) | 2007-12-26 |
| US7240322B2 (en) | 2007-07-03 |
| CN101147148A (zh) | 2008-03-19 |
| JP2008535239A (ja) | 2008-08-28 |
| US20060225023A1 (en) | 2006-10-05 |
| US7323278B2 (en) | 2008-01-29 |
| CN101147148B (zh) | 2010-07-07 |
| WO2006107356A2 (en) | 2006-10-12 |
| US7620931B2 (en) | 2009-11-17 |
| JP5052501B2 (ja) | 2012-10-17 |
| WO2006107356A3 (en) | 2007-11-22 |
| EP1869595B1 (en) | 2013-08-07 |
| EP1869595A4 (en) | 2009-12-16 |
| US20070160920A1 (en) | 2007-07-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |