TWI348020B - Semiconductor sensor device and manufacturing method thereof - Google Patents

Semiconductor sensor device and manufacturing method thereof

Info

Publication number
TWI348020B
TWI348020B TW096132894A TW96132894A TWI348020B TW I348020 B TWI348020 B TW I348020B TW 096132894 A TW096132894 A TW 096132894A TW 96132894 A TW96132894 A TW 96132894A TW I348020 B TWI348020 B TW I348020B
Authority
TW
Taiwan
Prior art keywords
manufacturing
sensor device
semiconductor sensor
semiconductor
sensor
Prior art date
Application number
TW096132894A
Other languages
English (en)
Other versions
TW200821559A (en
Inventor
Takanori Aono
Ryoji Okada
Atsushi Kazama
Yoshiaki Takada
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2006317972A external-priority patent/JP4548793B2/ja
Priority claimed from JP2007011473A external-priority patent/JP4548799B2/ja
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Publication of TW200821559A publication Critical patent/TW200821559A/zh
Application granted granted Critical
Publication of TWI348020B publication Critical patent/TWI348020B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/02Containers; Seals
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/125Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by capacitive pick-up
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00865Multistep processes for the separation of wafers into individual elements
    • B81C1/00873Multistep processes for the separation of wafers into individual elements characterised by special arrangements of the devices, allowing an easier separation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01CMEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5719Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using planar vibrating masses driven in a translation vibration along an axis
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P1/00Details of instruments
    • G01P1/02Housings
    • G01P1/023Housings for acceleration measuring devices
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/0802Details
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/12Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by alteration of electrical resistance
    • G01P15/123Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by alteration of electrical resistance by piezo-resistive elements, e.g. semiconductor strain gauges
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/18Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration in two or more dimensions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/80Constructional details
    • H10N30/88Mounts; Supports; Enclosures; Casings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/48145Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/146Mixed devices
    • H01L2924/1461MEMS

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Pressure Sensors (AREA)
  • Micromachines (AREA)
TW096132894A 2006-09-06 2007-09-04 Semiconductor sensor device and manufacturing method thereof TWI348020B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006241089 2006-09-06
JP2006317972A JP4548793B2 (ja) 2006-09-06 2006-11-27 半導体センサー装置およびその製造方法
JP2007011473A JP4548799B2 (ja) 2007-01-22 2007-01-22 半導体センサー装置

Publications (2)

Publication Number Publication Date
TW200821559A TW200821559A (en) 2008-05-16
TWI348020B true TWI348020B (en) 2011-09-01

Family

ID=39157087

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096132894A TWI348020B (en) 2006-09-06 2007-09-04 Semiconductor sensor device and manufacturing method thereof

Country Status (7)

Country Link
US (1) US8022433B2 (zh)
EP (1) EP2065929A4 (zh)
KR (1) KR101004574B1 (zh)
CN (1) CN101427365B (zh)
HK (1) HK1132584A1 (zh)
TW (1) TWI348020B (zh)
WO (1) WO2008029654A1 (zh)

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JP5540911B2 (ja) * 2010-06-09 2014-07-02 三菱電機株式会社 半導体装置
US8680843B2 (en) 2010-06-10 2014-03-25 Infineon Technologies Ag Magnetic field current sensors
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CN102162756B (zh) * 2010-12-29 2012-03-21 厦门大学 一种全对称硅微谐振式压力传感器
US8975889B2 (en) 2011-01-24 2015-03-10 Infineon Technologies Ag Current difference sensors, systems and methods
US8963536B2 (en) 2011-04-14 2015-02-24 Infineon Technologies Ag Current sensors, systems and methods for sensing current in a conductor
US8476087B2 (en) * 2011-04-21 2013-07-02 Freescale Semiconductor, Inc. Methods for fabricating sensor device package using a sealing structure
US8384168B2 (en) 2011-04-21 2013-02-26 Freescale Semiconductor, Inc. Sensor device with sealing structure
TWI456201B (zh) * 2011-11-29 2014-10-11 Univ Chung Hua 無線式熱氣泡式加速儀及其製備方法
US9046546B2 (en) 2012-04-27 2015-06-02 Freescale Semiconductor Inc. Sensor device and related fabrication methods
JP6194624B2 (ja) * 2013-04-25 2017-09-13 ミツミ電機株式会社 物理量検出素子及び物理量検出装置
JP2015005597A (ja) * 2013-06-20 2015-01-08 日立オートモティブシステムズ株式会社 樹脂封止型センサ装置
DE102014105861B4 (de) * 2014-04-25 2015-11-05 Infineon Technologies Ag Sensorvorrichtung und Verfahren zum Herstellen einer Sensorvorrichtung
CN105826215B (zh) * 2015-01-09 2018-08-10 中芯国际集成电路制造(上海)有限公司 半导体结构的形成方法
JP6417970B2 (ja) * 2015-01-28 2018-11-07 ミツミ電機株式会社 モジュール及びその製造方法
JP2016161472A (ja) * 2015-03-04 2016-09-05 セイコーエプソン株式会社 物理量センサーおよびその製造方法、電子機器、ならびに移動体
CN111506132B (zh) * 2015-04-20 2022-04-05 深圳市大疆创新科技有限公司 用于对传感器操作进行热调节的系统和方法
KR102525345B1 (ko) * 2015-09-01 2023-04-25 삼성전자주식회사 반도체 칩
CN105300371B (zh) * 2015-12-02 2019-02-05 北京七维航测科技股份有限公司 抗冲击角速陀螺灌封工艺
JP6553587B2 (ja) * 2016-12-20 2019-07-31 Nissha株式会社 ガスセンサモジュール及びその製造方法
JP6815880B2 (ja) * 2017-01-25 2021-01-20 株式会社ディスコ 半導体パッケージの製造方法
JP6819338B2 (ja) * 2017-02-13 2021-01-27 セイコーエプソン株式会社 物理量検出装置および電子機器
TWI610403B (zh) * 2017-03-03 2018-01-01 矽品精密工業股份有限公司 基板結構及其製法與電子封裝件
JP7024349B2 (ja) * 2017-11-24 2022-02-24 セイコーエプソン株式会社 センサーユニット、センサーユニットの製造方法、慣性計測装置、電子機器、および移動体
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CN114178710A (zh) * 2020-08-24 2022-03-15 奥特斯(中国)有限公司 部件承载件及其制造方法

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Also Published As

Publication number Publication date
WO2008029654A1 (en) 2008-03-13
EP2065929A4 (en) 2011-07-06
TW200821559A (en) 2008-05-16
HK1132584A1 (en) 2010-02-26
US20090050990A1 (en) 2009-02-26
CN101427365A (zh) 2009-05-06
KR20080105097A (ko) 2008-12-03
KR101004574B1 (ko) 2010-12-30
CN101427365B (zh) 2011-06-15
EP2065929A1 (en) 2009-06-03
US8022433B2 (en) 2011-09-20

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