TWI330719B - Optical lens system - Google Patents
Optical lens system Download PDFInfo
- Publication number
- TWI330719B TWI330719B TW096115999A TW96115999A TWI330719B TW I330719 B TWI330719 B TW I330719B TW 096115999 A TW096115999 A TW 096115999A TW 96115999 A TW96115999 A TW 96115999A TW I330719 B TWI330719 B TW I330719B
- Authority
- TW
- Taiwan
- Prior art keywords
- lens
- optical
- lens system
- optical lens
- lenses
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims description 499
- 239000000463 material Substances 0.000 claims description 153
- 238000003384 imaging method Methods 0.000 claims description 134
- 230000004075 alteration Effects 0.000 claims description 123
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 34
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 34
- 239000006185 dispersion Substances 0.000 claims description 20
- 239000005308 flint glass Substances 0.000 claims description 10
- 230000003321 amplification Effects 0.000 claims description 9
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 9
- 238000012937 correction Methods 0.000 claims description 4
- 239000005331 crown glasses (windows) Substances 0.000 claims description 2
- BTCSSZJGUNDROE-UHFFFAOYSA-N gamma-aminobutyric acid Chemical compound NCCCC(O)=O BTCSSZJGUNDROE-UHFFFAOYSA-N 0.000 claims 1
- 102100032986 CCR4-NOT transcription complex subunit 8 Human genes 0.000 description 36
- 101000942586 Homo sapiens CCR4-NOT transcription complex subunit 8 Proteins 0.000 description 36
- 239000011521 glass Substances 0.000 description 30
- 239000008186 active pharmaceutical agent Substances 0.000 description 24
- 230000005855 radiation Effects 0.000 description 23
- 230000000875 corresponding effect Effects 0.000 description 22
- 210000001747 pupil Anatomy 0.000 description 21
- 238000010586 diagram Methods 0.000 description 19
- 230000008859 change Effects 0.000 description 17
- 230000003595 spectral effect Effects 0.000 description 16
- 230000000694 effects Effects 0.000 description 12
- 238000001228 spectrum Methods 0.000 description 12
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 11
- 229910001634 calcium fluoride Inorganic materials 0.000 description 11
- 235000012431 wafers Nutrition 0.000 description 11
- 239000000758 substrate Substances 0.000 description 10
- 238000005286 illumination Methods 0.000 description 9
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 8
- 229910052753 mercury Inorganic materials 0.000 description 8
- 238000013461 design Methods 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- 238000005094 computer simulation Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000005452 bending Methods 0.000 description 4
- 239000005350 fused silica glass Substances 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 201000009310 astigmatism Diseases 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 229910004261 CaF 2 Inorganic materials 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 238000003723 Smelting Methods 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 108010068370 Glutens Proteins 0.000 description 1
- 235000006040 Prunus persica var persica Nutrition 0.000 description 1
- 240000006413 Prunus persica var. persica Species 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 description 1
- 229910001632 barium fluoride Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000004456 color vision Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000010411 cooking Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 235000021312 gluten Nutrition 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 230000000116 mitigating effect Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 235000010269 sulphur dioxide Nutrition 0.000 description 1
- 239000004291 sulphur dioxide Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 239000010455 vermiculite Substances 0.000 description 1
- 229910052902 vermiculite Inorganic materials 0.000 description 1
- 235000019354 vermiculite Nutrition 0.000 description 1
- 230000002087 whitening effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
- G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
- G02B13/26—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances for reproducing with unit magnification
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Lenses (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US79815706P | 2006-05-05 | 2006-05-05 | |
| US83821306P | 2006-08-17 | 2006-08-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200809424A TW200809424A (en) | 2008-02-16 |
| TWI330719B true TWI330719B (en) | 2010-09-21 |
Family
ID=38657719
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW096115999A TWI330719B (en) | 2006-05-05 | 2007-05-04 | Optical lens system |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7697211B2 (enExample) |
| EP (2) | EP2021854A2 (enExample) |
| JP (1) | JP5522520B2 (enExample) |
| KR (1) | KR101402449B1 (enExample) |
| CN (1) | CN101438196B (enExample) |
| TW (1) | TWI330719B (enExample) |
| WO (1) | WO2007131161A2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI500878B (zh) * | 2012-07-24 | 2015-09-21 | Lextar Electronics Corp | 可調光形之發光裝置及光源模組 |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| KR101213831B1 (ko) | 2004-05-17 | 2012-12-24 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
| US20100283978A1 (en) * | 2009-05-07 | 2010-11-11 | Ultratech,Inc. | LED-based UV illuminators and lithography systems using same |
| CN102707415B (zh) * | 2010-03-23 | 2014-07-16 | 上海微电子装备有限公司 | 光刻投影物镜 |
| CN102707414B (zh) * | 2010-03-23 | 2014-07-16 | 上海微电子装备有限公司 | 光刻投影物镜 |
| CN102200624B (zh) * | 2010-03-23 | 2013-05-22 | 上海微电子装备有限公司 | 光刻投影物镜 |
| CN102279459B (zh) * | 2010-06-09 | 2014-06-18 | 上海微电子装备有限公司 | 一种投影物镜 |
| CN102298198B (zh) * | 2010-06-22 | 2013-05-22 | 上海微电子装备有限公司 | 一种大视场光刻投影物镜 |
| DE102010061950A1 (de) * | 2010-11-25 | 2012-05-31 | Carl Zeiss Smt Gmbh | Verfahren sowie Anordnung zum Bestimmen des Erwärmungszustandes eines Spiegels in einem optischen System |
| CN102023377B (zh) * | 2010-12-07 | 2012-11-21 | 桂林电子科技大学 | 无CaF2中倍平场复消色差金相显微物镜 |
| CN102540419B (zh) * | 2010-12-31 | 2014-01-22 | 上海微电子装备有限公司 | 一种大视场投影光刻物镜 |
| JP5903809B2 (ja) * | 2011-09-06 | 2016-04-13 | リソテック株式会社 | 投影光学系 |
| JP6080255B2 (ja) * | 2012-12-11 | 2017-02-15 | Hoya株式会社 | 内視鏡 |
| DE102013211310A1 (de) * | 2013-06-17 | 2014-12-18 | Carl Zeiss Smt Gmbh | EUV-Abbildungsvorrichtung |
| CN104111534B (zh) * | 2014-08-07 | 2016-07-06 | 张家港鹏博光电科技有限公司 | 一种对称式双远心投影光学系统的倍率调节方法 |
| KR20170041359A (ko) * | 2015-10-07 | 2017-04-17 | 엘지이노텍 주식회사 | 조명 장치 |
| JP6658172B2 (ja) * | 2016-03-22 | 2020-03-04 | コニカミノルタ株式会社 | 投影光学系及び投影装置 |
| KR101950726B1 (ko) | 2016-12-21 | 2019-02-21 | 한남대학교 산학협력단 | 멀티스케일 이미징 시스템 |
| CN109581622B (zh) * | 2017-09-29 | 2020-12-04 | 上海微电子装备（集团）股份有限公司 | 一种投影物镜 |
| CN109634058B (zh) * | 2017-10-09 | 2020-08-04 | 上海微电子装备（集团）股份有限公司 | 光学透镜系统、曝光装置、曝光方法和元件的制造方法 |
| KR101957353B1 (ko) | 2017-11-16 | 2019-03-12 | 한남대학교 산학협력단 | 미러의 회전이 가능한 멀티스케일 이미징 시스템 |
| KR101957357B1 (ko) | 2017-11-16 | 2019-03-12 | 한남대학교 산학협력단 | 단일 미러를 사용한 멀티스케일 이미징 시스템 |
| DE102018106236B3 (de) * | 2018-03-16 | 2019-09-12 | Ernst Leitz Wetzlar Gmbh | Objektiv mit fester Brennweite |
| CN111142337B (zh) * | 2018-11-06 | 2021-04-02 | 上海微电子装备（集团）股份有限公司 | 一种投影物镜及曝光系统 |
| WO2020188368A1 (en) * | 2019-03-19 | 2020-09-24 | Omek Optics Ltd. | Unit magnification microscope |
| IL290406B2 (en) * | 2019-09-03 | 2025-08-01 | Asml Netherlands Bv | Assembly for collimating broadband radiation |
| CN113866994B (zh) * | 2020-06-30 | 2023-04-18 | 上海微电子装备（集团）股份有限公司 | 一种准直镜及像传感器 |
| CN113835209B (zh) * | 2021-11-19 | 2024-04-26 | 中导光电设备股份有限公司 | 一种大视场duv物镜 |
| DE102022201002A1 (de) | 2022-01-31 | 2023-08-03 | Carl Zeiss Smt Gmbh | Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren |
| DE102022201001A1 (de) * | 2022-01-31 | 2023-08-03 | Carl Zeiss Smt Gmbh | Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2698555A (en) | 1949-03-19 | 1955-01-04 | Perkin Elmer Corp | Optical system with corrected secondary spectrum |
| JPS61138226A (ja) * | 1984-12-10 | 1986-06-25 | Canon Inc | 投影露光用のアライメント光学系 |
| US5696631A (en) * | 1996-02-22 | 1997-12-09 | Anvik Corporation | Unit magnification projection lens system |
| JP3864399B2 (ja) * | 1996-08-08 | 2006-12-27 | 株式会社ニコン | 投影露光装置及び該投影露光装置に用いられる投影光学系並びにデバイス製造方法 |
| JP3823436B2 (ja) * | 1997-04-03 | 2006-09-20 | 株式会社ニコン | 投影光学系 |
| JP2002014281A (ja) * | 2000-04-26 | 2002-01-18 | Nikon Gijutsu Kobo:Kk | 両側テレセントリック投影光学系および該投影光学系を備えた露光装置 |
| JP4811623B2 (ja) | 2000-06-14 | 2011-11-09 | 株式会社ニコン | 投影光学系および該投影光学系を備えた露光装置 |
| CN100547447C (zh) * | 2005-02-07 | 2009-10-07 | 中国科学院光电技术研究所 | 深紫外投影光刻物镜 |
| JP4779394B2 (ja) | 2005-03-23 | 2011-09-28 | 株式会社ニコン | 投影光学系、露光装置、および露光方法 |
-
2007
- 2007-05-04 EP EP07783270A patent/EP2021854A2/en not_active Withdrawn
- 2007-05-04 CN CN2007800163153A patent/CN101438196B/zh not_active Expired - Fee Related
- 2007-05-04 KR KR1020087028398A patent/KR101402449B1/ko not_active Expired - Fee Related
- 2007-05-04 JP JP2009510094A patent/JP5522520B2/ja active Active
- 2007-05-04 TW TW096115999A patent/TWI330719B/zh not_active IP Right Cessation
- 2007-05-04 WO PCT/US2007/068227 patent/WO2007131161A2/en not_active Ceased
- 2007-05-04 EP EP09008347A patent/EP2101209A1/en not_active Withdrawn
-
2008
- 2008-10-23 US US12/257,156 patent/US7697211B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI500878B (zh) * | 2012-07-24 | 2015-09-21 | Lextar Electronics Corp | 可調光形之發光裝置及光源模組 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101402449B1 (ko) | 2014-06-03 |
| CN101438196B (zh) | 2011-03-02 |
| JP5522520B2 (ja) | 2014-06-18 |
| JP2009536373A (ja) | 2009-10-08 |
| EP2021854A2 (en) | 2009-02-11 |
| KR20090018918A (ko) | 2009-02-24 |
| CN101438196A (zh) | 2009-05-20 |
| TW200809424A (en) | 2008-02-16 |
| US7697211B2 (en) | 2010-04-13 |
| WO2007131161A2 (en) | 2007-11-15 |
| WO2007131161A3 (en) | 2008-04-24 |
| EP2101209A1 (en) | 2009-09-16 |
| US20090080086A1 (en) | 2009-03-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |