KR101402449B1 - 광학 렌즈 시스템 - Google Patents

광학 렌즈 시스템 Download PDF

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Publication number
KR101402449B1
KR101402449B1 KR1020087028398A KR20087028398A KR101402449B1 KR 101402449 B1 KR101402449 B1 KR 101402449B1 KR 1020087028398 A KR1020087028398 A KR 1020087028398A KR 20087028398 A KR20087028398 A KR 20087028398A KR 101402449 B1 KR101402449 B1 KR 101402449B1
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KR
South Korea
Prior art keywords
lens
optical
lens system
lenses
optical lens
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Expired - Fee Related
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KR1020087028398A
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English (en)
Korean (ko)
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KR20090018918A (ko
Inventor
데이비드 쉐이퍼
아우렐리안 도도크
하이코 펠트만
요하네스 ?너
빌헬름 울리히
홀거 발터
울리히 뢰링
다니엘 크래머
게르하르트 퓌르터
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칼 짜이스 에스엠티 게엠베하
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Publication of KR20090018918A publication Critical patent/KR20090018918A/ko
Application granted granted Critical
Publication of KR101402449B1 publication Critical patent/KR101402449B1/ko
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G02B13/26—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances for reproducing with unit magnification
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
KR1020087028398A 2006-05-05 2007-05-04 광학 렌즈 시스템 Expired - Fee Related KR101402449B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US79815706P 2006-05-05 2006-05-05
US60/798,157 2006-05-05
US83821306P 2006-08-17 2006-08-17
US60/838,213 2006-08-17
PCT/US2007/068227 WO2007131161A2 (en) 2006-05-05 2007-05-04 Symmetrical objective having four lens groups for microlithography

Publications (2)

Publication Number Publication Date
KR20090018918A KR20090018918A (ko) 2009-02-24
KR101402449B1 true KR101402449B1 (ko) 2014-06-03

Family

ID=38657719

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087028398A Expired - Fee Related KR101402449B1 (ko) 2006-05-05 2007-05-04 광학 렌즈 시스템

Country Status (7)

Country Link
US (1) US7697211B2 (enExample)
EP (2) EP2101209A1 (enExample)
JP (1) JP5522520B2 (enExample)
KR (1) KR101402449B1 (enExample)
CN (1) CN101438196B (enExample)
TW (1) TWI330719B (enExample)
WO (1) WO2007131161A2 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180072078A (ko) 2016-12-21 2018-06-29 한남대학교 산학협력단 멀티스케일 이미징 시스템
KR101957353B1 (ko) 2017-11-16 2019-03-12 한남대학교 산학협력단 미러의 회전이 가능한 멀티스케일 이미징 시스템
KR101957357B1 (ko) 2017-11-16 2019-03-12 한남대학교 산학협력단 단일 미러를 사용한 멀티스케일 이미징 시스템

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US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20170028451A (ko) 2004-05-17 2017-03-13 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US20100283978A1 (en) * 2009-05-07 2010-11-11 Ultratech,Inc. LED-based UV illuminators and lithography systems using same
CN102200624B (zh) * 2010-03-23 2013-05-22 上海微电子装备有限公司 光刻投影物镜
CN102707414B (zh) * 2010-03-23 2014-07-16 上海微电子装备有限公司 光刻投影物镜
CN102707415B (zh) * 2010-03-23 2014-07-16 上海微电子装备有限公司 光刻投影物镜
CN102279459B (zh) * 2010-06-09 2014-06-18 上海微电子装备有限公司 一种投影物镜
CN102298198B (zh) * 2010-06-22 2013-05-22 上海微电子装备有限公司 一种大视场光刻投影物镜
DE102010061950A1 (de) * 2010-11-25 2012-05-31 Carl Zeiss Smt Gmbh Verfahren sowie Anordnung zum Bestimmen des Erwärmungszustandes eines Spiegels in einem optischen System
CN102023377B (zh) * 2010-12-07 2012-11-21 桂林电子科技大学 无CaF2中倍平场复消色差金相显微物镜
CN102540419B (zh) * 2010-12-31 2014-01-22 上海微电子装备有限公司 一种大视场投影光刻物镜
JP5903809B2 (ja) * 2011-09-06 2016-04-13 リソテック株式会社 投影光学系
TWI500878B (zh) * 2012-07-24 2015-09-21 Lextar Electronics Corp 可調光形之發光裝置及光源模組
JP6080255B2 (ja) * 2012-12-11 2017-02-15 Hoya株式会社 内視鏡
DE102013211310A1 (de) * 2013-06-17 2014-12-18 Carl Zeiss Smt Gmbh EUV-Abbildungsvorrichtung
CN104111534B (zh) * 2014-08-07 2016-07-06 张家港鹏博光电科技有限公司 一种对称式双远心投影光学系统的倍率调节方法
KR20170041359A (ko) * 2015-10-07 2017-04-17 엘지이노텍 주식회사 조명 장치
JP6658172B2 (ja) * 2016-03-22 2020-03-04 コニカミノルタ株式会社 投影光学系及び投影装置
CN109581622B (zh) * 2017-09-29 2020-12-04 上海微电子装备（集团）股份有限公司 一种投影物镜
CN109634058B (zh) * 2017-10-09 2020-08-04 上海微电子装备（集团）股份有限公司 光学透镜系统、曝光装置、曝光方法和元件的制造方法
DE102018106236B3 (de) * 2018-03-16 2019-09-12 Ernst Leitz Wetzlar Gmbh Objektiv mit fester Brennweite
CN111142337B (zh) 2018-11-06 2021-04-02 上海微电子装备（集团）股份有限公司 一种投影物镜及曝光系统
CN113260895A (zh) * 2019-03-19 2021-08-13 欧米克奥皮提克斯有限公司 单位放大倍率的显微镜
WO2021043516A1 (en) * 2019-09-03 2021-03-11 Asml Netherlands B.V. Assembly for collimating broadband radiation
CN113866994B (zh) * 2020-06-30 2023-04-18 上海微电子装备（集团）股份有限公司 一种准直镜及像传感器
CN113835209B (zh) * 2021-11-19 2024-04-26 中导光电设备股份有限公司 一种大视场duv物镜
DE102022201001A1 (de) * 2022-01-31 2023-08-03 Carl Zeiss Smt Gmbh Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren
DE102022201002A1 (de) 2022-01-31 2023-08-03 Carl Zeiss Smt Gmbh Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren

Citations (3)

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Publication number Priority date Publication date Assignee Title
JPS61138226A (ja) * 1984-12-10 1986-06-25 Canon Inc 投影露光用のアライメント光学系
JPH10282411A (ja) * 1997-04-03 1998-10-23 Nikon Corp 投影光学系
JP2002014281A (ja) * 2000-04-26 2002-01-18 Nikon Gijutsu Kobo:Kk 両側テレセントリック投影光学系および該投影光学系を備えた露光装置

Family Cites Families (6)

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US2698555A (en) * 1949-03-19 1955-01-04 Perkin Elmer Corp Optical system with corrected secondary spectrum
US5696631A (en) * 1996-02-22 1997-12-09 Anvik Corporation Unit magnification projection lens system
JP3864399B2 (ja) * 1996-08-08 2006-12-27 株式会社ニコン 投影露光装置及び該投影露光装置に用いられる投影光学系並びにデバイス製造方法
JP4811623B2 (ja) 2000-06-14 2011-11-09 株式会社ニコン 投影光学系および該投影光学系を備えた露光装置
CN100547447C (zh) * 2005-02-07 2009-10-07 中国科学院光电技术研究所 深紫外投影光刻物镜
JP4779394B2 (ja) 2005-03-23 2011-09-28 株式会社ニコン 投影光学系、露光装置、および露光方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61138226A (ja) * 1984-12-10 1986-06-25 Canon Inc 投影露光用のアライメント光学系
JPH10282411A (ja) * 1997-04-03 1998-10-23 Nikon Corp 投影光学系
JP2002014281A (ja) * 2000-04-26 2002-01-18 Nikon Gijutsu Kobo:Kk 両側テレセントリック投影光学系および該投影光学系を備えた露光装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180072078A (ko) 2016-12-21 2018-06-29 한남대학교 산학협력단 멀티스케일 이미징 시스템
KR101957353B1 (ko) 2017-11-16 2019-03-12 한남대학교 산학협력단 미러의 회전이 가능한 멀티스케일 이미징 시스템
KR101957357B1 (ko) 2017-11-16 2019-03-12 한남대학교 산학협력단 단일 미러를 사용한 멀티스케일 이미징 시스템

Also Published As

Publication number Publication date
EP2101209A1 (en) 2009-09-16
KR20090018918A (ko) 2009-02-24
CN101438196B (zh) 2011-03-02
US20090080086A1 (en) 2009-03-26
TWI330719B (en) 2010-09-21
JP5522520B2 (ja) 2014-06-18
CN101438196A (zh) 2009-05-20
TW200809424A (en) 2008-02-16
WO2007131161A2 (en) 2007-11-15
JP2009536373A (ja) 2009-10-08
EP2021854A2 (en) 2009-02-11
US7697211B2 (en) 2010-04-13
WO2007131161A3 (en) 2008-04-24

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