CN101438196B - 用于微光刻的具有四个透镜组的对称物镜 - Google Patents

用于微光刻的具有四个透镜组的对称物镜 Download PDF

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Publication number
CN101438196B
CN101438196B CN2007800163153A CN200780016315A CN101438196B CN 101438196 B CN101438196 B CN 101438196B CN 2007800163153 A CN2007800163153 A CN 2007800163153A CN 200780016315 A CN200780016315 A CN 200780016315A CN 101438196 B CN101438196 B CN 101438196B
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China
Prior art keywords
lens
optical
lens system
lenses
optical lens
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Expired - Fee Related
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CN2007800163153A
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English (en)
Chinese (zh)
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CN101438196A (zh
Inventor
戴维·谢弗
奥里莉恩·多多克
海科·费尔德曼
约翰尼斯·泽尔纳
威廉·乌尔里克
霍尔格·沃尔特
乌尔里克·洛林
丹尼尔·克雷默
格哈特·富尔特
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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Publication of CN101438196A publication Critical patent/CN101438196A/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G02B13/26—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances for reproducing with unit magnification
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
CN2007800163153A 2006-05-05 2007-05-04 用于微光刻的具有四个透镜组的对称物镜 Expired - Fee Related CN101438196B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US79815706P 2006-05-05 2006-05-05
US60/798,157 2006-05-05
US83821306P 2006-08-17 2006-08-17
US60/838,213 2006-08-17
PCT/US2007/068227 WO2007131161A2 (en) 2006-05-05 2007-05-04 Symmetrical objective having four lens groups for microlithography

Publications (2)

Publication Number Publication Date
CN101438196A CN101438196A (zh) 2009-05-20
CN101438196B true CN101438196B (zh) 2011-03-02

Family

ID=38657719

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2007800163153A Expired - Fee Related CN101438196B (zh) 2006-05-05 2007-05-04 用于微光刻的具有四个透镜组的对称物镜

Country Status (7)

Country Link
US (1) US7697211B2 (enExample)
EP (2) EP2021854A2 (enExample)
JP (1) JP5522520B2 (enExample)
KR (1) KR101402449B1 (enExample)
CN (1) CN101438196B (enExample)
TW (1) TWI330719B (enExample)
WO (1) WO2007131161A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI705279B (zh) 2018-11-06 2020-09-21 大陸商上海微電子裝備（集團）股份有限公司 一種投影物鏡及曝光系統

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US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US20100283978A1 (en) * 2009-05-07 2010-11-11 Ultratech,Inc. LED-based UV illuminators and lithography systems using same
CN102707415B (zh) * 2010-03-23 2014-07-16 上海微电子装备有限公司 光刻投影物镜
CN102707414B (zh) * 2010-03-23 2014-07-16 上海微电子装备有限公司 光刻投影物镜
CN102200624B (zh) * 2010-03-23 2013-05-22 上海微电子装备有限公司 光刻投影物镜
CN102279459B (zh) * 2010-06-09 2014-06-18 上海微电子装备有限公司 一种投影物镜
CN102298198B (zh) * 2010-06-22 2013-05-22 上海微电子装备有限公司 一种大视场光刻投影物镜
DE102010061950A1 (de) * 2010-11-25 2012-05-31 Carl Zeiss Smt Gmbh Verfahren sowie Anordnung zum Bestimmen des Erwärmungszustandes eines Spiegels in einem optischen System
CN102023377B (zh) * 2010-12-07 2012-11-21 桂林电子科技大学 无CaF2中倍平场复消色差金相显微物镜
CN102540419B (zh) * 2010-12-31 2014-01-22 上海微电子装备有限公司 一种大视场投影光刻物镜
JP5903809B2 (ja) * 2011-09-06 2016-04-13 リソテック株式会社 投影光学系
TWI500878B (zh) * 2012-07-24 2015-09-21 Lextar Electronics Corp 可調光形之發光裝置及光源模組
JP6080255B2 (ja) * 2012-12-11 2017-02-15 Hoya株式会社 内視鏡
DE102013211310A1 (de) * 2013-06-17 2014-12-18 Carl Zeiss Smt Gmbh EUV-Abbildungsvorrichtung
CN104111534B (zh) * 2014-08-07 2016-07-06 张家港鹏博光电科技有限公司 一种对称式双远心投影光学系统的倍率调节方法
KR20170041359A (ko) * 2015-10-07 2017-04-17 엘지이노텍 주식회사 조명 장치
JP6658172B2 (ja) * 2016-03-22 2020-03-04 コニカミノルタ株式会社 投影光学系及び投影装置
KR101950726B1 (ko) 2016-12-21 2019-02-21 한남대학교 산학협력단 멀티스케일 이미징 시스템
CN109581622B (zh) * 2017-09-29 2020-12-04 上海微电子装备（集团）股份有限公司 一种投影物镜
CN109634058B (zh) * 2017-10-09 2020-08-04 上海微电子装备（集团）股份有限公司 光学透镜系统、曝光装置、曝光方法和元件的制造方法
KR101957353B1 (ko) 2017-11-16 2019-03-12 한남대학교 산학협력단 미러의 회전이 가능한 멀티스케일 이미징 시스템
KR101957357B1 (ko) 2017-11-16 2019-03-12 한남대학교 산학협력단 단일 미러를 사용한 멀티스케일 이미징 시스템
DE102018106236B3 (de) * 2018-03-16 2019-09-12 Ernst Leitz Wetzlar Gmbh Objektiv mit fester Brennweite
WO2020188368A1 (en) * 2019-03-19 2020-09-24 Omek Optics Ltd. Unit magnification microscope
IL290406B2 (en) * 2019-09-03 2025-08-01 Asml Netherlands Bv Assembly for collimating broadband radiation
CN113866994B (zh) * 2020-06-30 2023-04-18 上海微电子装备（集团）股份有限公司 一种准直镜及像传感器
CN113835209B (zh) * 2021-11-19 2024-04-26 中导光电设备股份有限公司 一种大视场duv物镜
DE102022201002A1 (de) 2022-01-31 2023-08-03 Carl Zeiss Smt Gmbh Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren
DE102022201001A1 (de) * 2022-01-31 2023-08-03 Carl Zeiss Smt Gmbh Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren

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Publication number Priority date Publication date Assignee Title
US5696631A (en) * 1996-02-22 1997-12-09 Anvik Corporation Unit magnification projection lens system
US5903400A (en) * 1996-08-08 1999-05-11 Nikon Corporation Projection-optical system for use in a projection-exposure apparatus
CN1651962A (zh) * 2005-02-07 2005-08-10 中国科学院光电技术研究所 深紫外投影光刻物镜

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US2698555A (en) 1949-03-19 1955-01-04 Perkin Elmer Corp Optical system with corrected secondary spectrum
JPS61138226A (ja) * 1984-12-10 1986-06-25 Canon Inc 投影露光用のアライメント光学系
JP3823436B2 (ja) * 1997-04-03 2006-09-20 株式会社ニコン 投影光学系
JP2002014281A (ja) * 2000-04-26 2002-01-18 Nikon Gijutsu Kobo:Kk 両側テレセントリック投影光学系および該投影光学系を備えた露光装置
JP4811623B2 (ja) 2000-06-14 2011-11-09 株式会社ニコン 投影光学系および該投影光学系を備えた露光装置
JP4779394B2 (ja) 2005-03-23 2011-09-28 株式会社ニコン 投影光学系、露光装置、および露光方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5696631A (en) * 1996-02-22 1997-12-09 Anvik Corporation Unit magnification projection lens system
US5903400A (en) * 1996-08-08 1999-05-11 Nikon Corporation Projection-optical system for use in a projection-exposure apparatus
CN1651962A (zh) * 2005-02-07 2005-08-10 中国科学院光电技术研究所 深紫外投影光刻物镜

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI705279B (zh) 2018-11-06 2020-09-21 大陸商上海微電子裝備（集團）股份有限公司 一種投影物鏡及曝光系統

Also Published As

Publication number Publication date
KR101402449B1 (ko) 2014-06-03
JP5522520B2 (ja) 2014-06-18
JP2009536373A (ja) 2009-10-08
EP2021854A2 (en) 2009-02-11
TWI330719B (en) 2010-09-21
KR20090018918A (ko) 2009-02-24
CN101438196A (zh) 2009-05-20
TW200809424A (en) 2008-02-16
US7697211B2 (en) 2010-04-13
WO2007131161A2 (en) 2007-11-15
WO2007131161A3 (en) 2008-04-24
EP2101209A1 (en) 2009-09-16
US20090080086A1 (en) 2009-03-26

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C56 Change in the name or address of the patentee

Owner name: CARL ZEISS SMT AG

Free format text: FORMER NAME: ZEISS CARL SMT AG

CP01 Change in the name or title of a patent holder

Address after: Germany Cohen

Patentee after: Carl Zeiss SMT Co., Ltd.

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CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20110302

Termination date: 20200504

CF01 Termination of patent right due to non-payment of annual fee