TWI316968B - - Google Patents

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Publication number
TWI316968B
TWI316968B TW095105918A TW95105918A TWI316968B TW I316968 B TWI316968 B TW I316968B TW 095105918 A TW095105918 A TW 095105918A TW 95105918 A TW95105918 A TW 95105918A TW I316968 B TWI316968 B TW I316968B
Authority
TW
Taiwan
Prior art keywords
substrate
mask
chuck
glass substrate
film forming
Prior art date
Application number
TW095105918A
Other languages
English (en)
Chinese (zh)
Other versions
TW200632117A (en
Inventor
Tatsuya Kataoka
Kenji Nagao
Kenichi Saito
Original Assignee
Mitsui Shipbuilding Eng
Choshu Industry Company Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Shipbuilding Eng, Choshu Industry Company Ltd filed Critical Mitsui Shipbuilding Eng
Publication of TW200632117A publication Critical patent/TW200632117A/zh
Application granted granted Critical
Publication of TWI316968B publication Critical patent/TWI316968B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
TW095105918A 2005-02-23 2006-02-22 Method of mounting substrate in film deposition apparatus and method of depositing film TW200632117A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005047815A JP4609757B2 (ja) 2005-02-23 2005-02-23 成膜装置における基板装着方法

Publications (2)

Publication Number Publication Date
TW200632117A TW200632117A (en) 2006-09-16
TWI316968B true TWI316968B (ja) 2009-11-11

Family

ID=36927387

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095105918A TW200632117A (en) 2005-02-23 2006-02-22 Method of mounting substrate in film deposition apparatus and method of depositing film

Country Status (5)

Country Link
JP (1) JP4609757B2 (ja)
KR (1) KR100932140B1 (ja)
CN (1) CN101090996B (ja)
TW (1) TW200632117A (ja)
WO (1) WO2006090749A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10344123B2 (en) 2015-08-20 2019-07-09 Dairen Chemical Corporation Polycarbonate diol and thermoplastic polyurethane made from the same

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101932749B (zh) * 2008-04-09 2012-07-18 株式会社爱发科 气化源及成膜装置
WO2010106958A1 (ja) * 2009-03-18 2010-09-23 株式会社アルバック 位置合わせ方法、蒸着方法
DE102009034532A1 (de) 2009-07-23 2011-02-03 Msg Lithoglas Ag Verfahren zum Herstellen einer strukturierten Beschichtung auf einem Substrat, beschichtetes Substrat sowie Halbzeug mit einem beschichteten Substrat
CN105762278B (zh) * 2016-03-04 2018-05-01 苏州大学 一种真空蒸镀装置及利用其制备有机电致发光器件的方法
JP6876520B2 (ja) * 2016-06-24 2021-05-26 キヤノントッキ株式会社 基板の挟持方法、基板の挟持装置、成膜方法、成膜装置、及び電子デバイスの製造方法、基板載置方法、アライメント方法、基板載置装置
US20190355906A1 (en) * 2017-05-19 2019-11-21 Sharp Kabushiki Kaisha Vapor deposition method, and el device manufacturing method
JP6468540B2 (ja) * 2017-05-22 2019-02-13 キヤノントッキ株式会社 基板搬送機構、基板載置機構、成膜装置及びそれらの方法
JP2024037209A (ja) * 2022-09-07 2024-03-19 キヤノントッキ株式会社 成膜装置、成膜装置の駆動方法及び成膜方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH051375A (ja) * 1991-06-25 1993-01-08 Canon Inc 真空処理装置
JP3516346B2 (ja) * 1992-09-08 2004-04-05 大日本印刷株式会社 スパッタ用治具
JPH1046339A (ja) * 1996-07-29 1998-02-17 Matsushita Electric Ind Co Ltd 基板ハンドリング方法
JP2004183044A (ja) * 2002-12-03 2004-07-02 Seiko Epson Corp マスク蒸着方法及び装置、マスク及びマスクの製造方法、表示パネル製造装置、表示パネル並びに電子機器
JP2004303559A (ja) * 2003-03-31 2004-10-28 Tohoku Pioneer Corp アライメント装置及び方法、並びにこれを用いて製造される有機ｅｌ素子

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10344123B2 (en) 2015-08-20 2019-07-09 Dairen Chemical Corporation Polycarbonate diol and thermoplastic polyurethane made from the same
US10875961B2 (en) 2015-08-20 2020-12-29 Dairen Chemical Corporation Polycarbonate diol and thermoplastic polyurethane made from the same

Also Published As

Publication number Publication date
TW200632117A (en) 2006-09-16
JP2006233259A (ja) 2006-09-07
KR20070087080A (ko) 2007-08-27
CN101090996B (zh) 2010-05-26
WO2006090749A1 (ja) 2006-08-31
JP4609757B2 (ja) 2011-01-12
CN101090996A (zh) 2007-12-19
KR100932140B1 (ko) 2009-12-16

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