TWI291953B - - Google Patents
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- Publication number
- TWI291953B TWI291953B TW091122267A TW91122267A TWI291953B TW I291953 B TWI291953 B TW I291953B TW 091122267 A TW091122267 A TW 091122267A TW 91122267 A TW91122267 A TW 91122267A TW I291953 B TWI291953 B TW I291953B
- Authority
- TW
- Taiwan
- Prior art keywords
- group
- alkyl
- carbon number
- hydrogen atom
- polymer
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
- C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
- C07D317/72—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 spiro-condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
- C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
- C07D317/10—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings
- C07D317/14—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D317/18—Radicals substituted by singly bound oxygen or sulfur atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
- C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
- C07D317/10—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings
- C07D317/32—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D317/34—Oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
- C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
- C07D317/10—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings
- C07D317/32—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D317/42—Halogen atoms or nitro radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F20/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F24/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001324824 | 2001-10-23 | ||
JP2002006354 | 2002-01-15 | ||
JP2002159847 | 2002-05-31 | ||
JP2002225066 | 2002-08-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWI291953B true TWI291953B (US07399806-20080715-C00011.png) | 2008-01-01 |
Family
ID=27482637
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW091122267A TWI291953B (US07399806-20080715-C00011.png) | 2001-10-23 | 2002-09-27 |
Country Status (7)
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007522262A (ja) * | 2003-06-26 | 2007-08-09 | シミックス・テクノロジーズ・インコーポレイテッド | フォトレジストポリマー |
ATE370975T1 (de) * | 2003-06-26 | 2007-09-15 | Jsr Corp | Photoresistpolymerzusammensetzungen |
US7250475B2 (en) * | 2003-06-26 | 2007-07-31 | Symyx Technologies, Inc. | Synthesis of photoresist polymers |
CN1802603A (zh) | 2003-07-17 | 2006-07-12 | 霍尼韦尔国际公司 | 用于高级微电子应用的平面化薄膜及其生产装置和方法 |
JP4977347B2 (ja) | 2004-09-15 | 2012-07-18 | 東進セミケム株式会社 | スピロ環状ケタール基を有するフォトレジスト用モノマー、ポリマーおよびこれを含むフォトレジスト組成物 |
CN1904736B (zh) * | 2005-07-25 | 2012-06-13 | 日产化学工业株式会社 | 正型感光性树脂组合物和由其得到的固化膜 |
JP4762630B2 (ja) * | 2005-08-03 | 2011-08-31 | 東京応化工業株式会社 | レジスト組成物およびレジストパターン形成方法 |
JP4524237B2 (ja) * | 2005-09-28 | 2010-08-11 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
CN101313247A (zh) * | 2005-11-21 | 2008-11-26 | Jsr株式会社 | 感辐射线性树脂组合物 |
US8105746B2 (en) * | 2006-02-17 | 2012-01-31 | Kuraray Co., Ltd. | Tertiary alcohol derivative, polymer compound and photoresist composition |
US8771924B2 (en) * | 2006-12-26 | 2014-07-08 | Fujifilm Corporation | Polymerizable composition, lithographic printing plate precursor and lithographic printing method |
JP4882788B2 (ja) * | 2007-02-21 | 2012-02-22 | Jsr株式会社 | 感放射線性樹脂組成物、スペーサーとその製法および液晶表示素子 |
WO2009022681A1 (ja) | 2007-08-10 | 2009-02-19 | Fujifilm Corporation | ポジ型レジスト組成物、該組成物を用いたパターン形成方法及び該組成物に用いられる化合物 |
JP5562826B2 (ja) * | 2008-02-25 | 2014-07-30 | 株式会社ダイセル | 電子吸引性置換基及びラクトン骨格を含む単量体、高分子化合物及びフォトレジスト組成物 |
JP5487784B2 (ja) * | 2008-08-07 | 2014-05-07 | 住友化学株式会社 | 化学増幅型ポジ型レジスト組成物 |
WO2010084997A1 (ja) * | 2009-01-26 | 2010-07-29 | 国立大学法人徳島大学 | 立体規則性の高い多官能性ポリマー及びその製造方法 |
JP5678963B2 (ja) * | 2010-09-30 | 2015-03-04 | Jsr株式会社 | 感放射線性樹脂組成物、重合体及び化合物 |
JP5947028B2 (ja) * | 2010-12-02 | 2016-07-06 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | ポリマー、フォトレジスト組成物、およびフォトリソグラフィパターンを形成する方法 |
EP2472326A1 (en) * | 2010-12-31 | 2012-07-04 | Rohm and Haas Electronic Materials LLC | Polymers, photoresist compositions and methods of forming photolithographic patterns |
EP2472324A1 (en) * | 2010-12-31 | 2012-07-04 | Rohm and Haas Electronic Materials LLC | Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns |
EP2472325A1 (en) * | 2010-12-31 | 2012-07-04 | Rohm and Haas Electronic Materials LLC | Polymers, photoresist compositions and methods of forming photolithographic patterns |
JP6005932B2 (ja) * | 2011-01-07 | 2016-10-12 | 住友化学株式会社 | ポジ型レジスト組成物及びパターン形成方法 |
JP5862657B2 (ja) * | 2011-03-31 | 2016-02-16 | Jsr株式会社 | フォトレジスト組成物 |
WO2013047117A1 (ja) * | 2011-09-29 | 2013-04-04 | Jsr株式会社 | フォトレジスト組成物、レジストパターン形成方法及び重合体 |
JP6232837B2 (ja) * | 2012-08-31 | 2017-11-22 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
US9256125B2 (en) | 2013-03-30 | 2016-02-09 | Rohm And Haas Electronic Materials, Llc | Acid generators and photoresists comprising same |
JP6327036B2 (ja) * | 2013-07-24 | 2018-05-23 | Jsr株式会社 | 感放射線性樹脂組成物、レジストパターン形成方法、重合体、化合物及び化合物の製造方法 |
JP6319001B2 (ja) * | 2014-09-08 | 2018-05-09 | Jsr株式会社 | 感放射線性樹脂組成物及びレジストパターン形成方法 |
JP6721823B2 (ja) * | 2016-01-05 | 2020-07-15 | Jsr株式会社 | 感放射線性樹脂組成物、レジストパターン形成方法、重合体及び化合物 |
JP6969889B2 (ja) * | 2016-05-13 | 2021-11-24 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
JP6992166B2 (ja) * | 2018-03-30 | 2022-01-13 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 |
EP3848756B1 (en) * | 2018-09-07 | 2022-07-06 | FUJIFILM Corporation | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device |
WO2020137918A1 (ja) * | 2018-12-28 | 2020-07-02 | 富士フイルム株式会社 | 有機溶剤現像用ネガ型感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SU606313A1 (ru) | 1970-03-11 | 1984-02-15 | Предприятие П/Я М-5927 | Способ получени замещенных 5-метилен-1,3-диоксолан-4-онов |
JPS58176618A (ja) * | 1982-04-10 | 1983-10-17 | Toyo Contact Lens Co Ltd | 含水性コンタクトレンズおよびその製造法 |
JPH0337214A (ja) * | 1989-07-04 | 1991-02-18 | Hitachi Chem Co Ltd | 低収縮性ラジカル重合性熱硬化樹脂組成物 |
JP2881969B2 (ja) | 1990-06-05 | 1999-04-12 | 富士通株式会社 | 放射線感光レジストとパターン形成方法 |
JP2867847B2 (ja) | 1993-08-26 | 1999-03-10 | 株式会社クラレ | 5−メチレン−1,3−ジオキソラン−4−オン類の製造方法 |
DE69409733T2 (de) * | 1993-08-26 | 1998-11-19 | Kuraray Co | Verfahren zur Herstellung optisch aktiven 2-Norbornanons |
JP3751065B2 (ja) | 1995-06-28 | 2006-03-01 | 富士通株式会社 | レジスト材料及びレジストパターンの形成方法 |
JP3297272B2 (ja) | 1995-07-14 | 2002-07-02 | 富士通株式会社 | レジスト組成物及びレジストパターンの形成方法 |
KR100261022B1 (ko) | 1996-10-11 | 2000-09-01 | 윤종용 | 화학증폭형 레지스트 조성물 |
JP3712218B2 (ja) | 1997-01-24 | 2005-11-02 | 東京応化工業株式会社 | 化学増幅型ホトレジスト組成物 |
JP3546679B2 (ja) | 1997-01-29 | 2004-07-28 | 住友化学工業株式会社 | 化学増幅型ポジ型レジスト組成物 |
JPH10316609A (ja) * | 1997-05-20 | 1998-12-02 | Kuraray Co Ltd | 2−ヒドロキシ−5−ノルボルネン−2−カルボン酸の製造方法 |
JP3819531B2 (ja) | 1997-05-20 | 2006-09-13 | 富士通株式会社 | レジスト組成物及びレジストパターン形成方法 |
KR100273172B1 (ko) * | 1998-08-01 | 2001-03-02 | 윤덕용 | 아크릴 측쇄에 디옥사스피로환기 유도체를 갖는 화합물을 이용한 포토레지스트 |
GB2348879B (en) * | 1999-04-16 | 2004-03-31 | Hydron Ltd | Process |
JP2001089511A (ja) * | 1999-09-27 | 2001-04-03 | Dainippon Ink & Chem Inc | 活性エネルギー線硬化型樹脂組成物 |
TW538056B (en) | 2000-07-11 | 2003-06-21 | Samsung Electronics Co Ltd | Resist composition comprising photosensitive polymer having lactone in its backbone |
KR100749494B1 (ko) * | 2001-04-03 | 2007-08-14 | 삼성에스디아이 주식회사 | 화학증폭형 네가티브 포토레지스트용 중합체 및 포토레지스트 조성물 |
-
2002
- 2002-09-27 TW TW091122267A patent/TWI291953B/zh not_active IP Right Cessation
- 2002-10-22 JP JP2003538153A patent/JP4481005B2/ja not_active Expired - Lifetime
- 2002-10-22 CN CN2005100908050A patent/CN1737000B/zh not_active Expired - Lifetime
- 2002-10-22 EP EP02777914.9A patent/EP1447403B1/en not_active Expired - Lifetime
- 2002-10-22 CN CNB021465800A patent/CN100453539C/zh not_active Expired - Lifetime
- 2002-10-22 WO PCT/JP2002/010938 patent/WO2003035637A1/ja active Application Filing
- 2002-10-22 KR KR1020047005997A patent/KR100943786B1/ko active IP Right Grant
- 2002-10-22 US US10/492,207 patent/US7316884B2/en not_active Expired - Lifetime
-
2009
- 2009-11-11 JP JP2009257911A patent/JP5243390B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1447403A4 (en) | 2010-10-27 |
CN100453539C (zh) | 2009-01-21 |
WO2003035637A1 (en) | 2003-05-01 |
JP2010077440A (ja) | 2010-04-08 |
CN1737000B (zh) | 2013-04-24 |
EP1447403B1 (en) | 2016-02-03 |
JPWO2003035637A1 (ja) | 2005-02-10 |
US7316884B2 (en) | 2008-01-08 |
JP5243390B2 (ja) | 2013-07-24 |
US20040248031A1 (en) | 2004-12-09 |
KR100943786B1 (ko) | 2010-02-23 |
JP4481005B2 (ja) | 2010-06-16 |
CN1737000A (zh) | 2006-02-22 |
EP1447403A1 (en) | 2004-08-18 |
KR20040058226A (ko) | 2004-07-03 |
CN1413992A (zh) | 2003-04-30 |
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