TWD213398S - 基板支撐底座 - Google Patents
基板支撐底座 Download PDFInfo
- Publication number
- TWD213398S TWD213398S TW109300093F TW109300093F TWD213398S TW D213398 S TWD213398 S TW D213398S TW 109300093 F TW109300093 F TW 109300093F TW 109300093 F TW109300093 F TW 109300093F TW D213398 S TWD213398 S TW D213398S
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate support
- support pedestal
- design
- support base
- dotted line
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract description 3
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 title 1
- 230000000007 visual effect Effects 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 1
Images
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/700,012 | 2019-07-30 | ||
US29/700,012 USD931240S1 (en) | 2019-07-30 | 2019-07-30 | Substrate support pedestal |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD213398S true TWD213398S (zh) | 2021-08-21 |
Family
ID=72322262
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109300093F TWD213398S (zh) | 2019-07-30 | 2020-01-08 | 基板支撐底座 |
TW109306863F TWD211589S (zh) | 2019-07-30 | 2020-01-08 | 基板支撐底座 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109306863F TWD211589S (zh) | 2019-07-30 | 2020-01-08 | 基板支撐底座 |
Country Status (3)
Country | Link |
---|---|
US (1) | USD931240S1 (enrdf_load_stackoverflow) |
JP (2) | JP1667763S (enrdf_load_stackoverflow) |
TW (2) | TWD213398S (enrdf_load_stackoverflow) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP1655453S (enrdf_load_stackoverflow) * | 2019-06-17 | 2020-03-23 | ||
USD896767S1 (en) * | 2019-12-02 | 2020-09-22 | Advanced Thermal Solutions, Inc. | Fluid mover enclosure |
USD956376S1 (en) * | 2019-12-18 | 2022-06-28 | Goldeep Ltd. | Vacuum bag valve |
USD989012S1 (en) * | 2020-09-17 | 2023-06-13 | Ebara Corporation | Elastic membrane |
USD990533S1 (en) * | 2020-10-21 | 2023-06-27 | Bryan Ross Schmitt | Sanding table for attachment to a garbage can |
USD1006768S1 (en) * | 2021-01-07 | 2023-12-05 | Solaero Technologies Corp. | Semiconductor wafer for mosaic solar cell fabrication |
USD1057675S1 (en) * | 2021-04-12 | 2025-01-14 | Lam Research Corporation | Pedestal for a substrate processing system |
USD1071886S1 (en) * | 2022-01-20 | 2025-04-22 | Applied Materials, Inc. | Substrate support for a substrate processing chamber |
USD1071103S1 (en) * | 2022-04-11 | 2025-04-15 | Applied Materials, Inc. | Gas distribution plate |
USD1085029S1 (en) * | 2022-07-19 | 2025-07-22 | Applied Materials, Inc. | Gas distribution plate |
USD1037778S1 (en) * | 2022-07-19 | 2024-08-06 | Applied Materials, Inc. | Gas distribution plate |
USD1073758S1 (en) * | 2022-10-13 | 2025-05-06 | Lam Research Corporation | Baffle for substrate processing system |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD406852S (en) | 1997-11-14 | 1999-03-16 | Applied Materials, Inc. | Electrostatic chuck with improved spacing mask and workpiece detection device |
USD708651S1 (en) | 2011-11-22 | 2014-07-08 | Applied Materials, Inc. | Electrostatic chuck |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD490827S1 (en) * | 2002-12-20 | 2004-06-01 | Ngk Spark Plug Co., Ltd. | Electrostatic chuck |
KR20070017255A (ko) | 2005-08-06 | 2007-02-09 | 삼성전자주식회사 | 플라즈마 장치의 반도체 기판 고정 장치 |
KR100854500B1 (ko) | 2007-02-12 | 2008-08-26 | 삼성전자주식회사 | 척 어셈블리 및 이를 구비한 고밀도 플라즈마 설비 |
JP5022077B2 (ja) | 2007-03-27 | 2012-09-12 | 株式会社アルバック | 成膜装置 |
USD621804S1 (en) * | 2009-08-07 | 2010-08-17 | Hon Hai Precision Industry Co., Ltd. | PCB for arranging LED lights |
US8409995B2 (en) | 2009-08-07 | 2013-04-02 | Tokyo Electron Limited | Substrate processing apparatus, positioning method and focus ring installation method |
JP5183659B2 (ja) | 2010-03-23 | 2013-04-17 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法、プログラム及びコンピュータ記憶媒体 |
USD664249S1 (en) * | 2011-07-01 | 2012-07-24 | Applied Materials, Inc. | Flow blocker plate |
US9673077B2 (en) * | 2012-07-03 | 2017-06-06 | Watlow Electric Manufacturing Company | Pedestal construction with low coefficient of thermal expansion top |
US9490150B2 (en) | 2012-07-03 | 2016-11-08 | Applied Materials, Inc. | Substrate support for substrate backside contamination control |
US9478447B2 (en) | 2012-11-26 | 2016-10-25 | Applied Materials, Inc. | Substrate support with wire mesh plasma containment |
US9543186B2 (en) | 2013-02-01 | 2017-01-10 | Applied Materials, Inc. | Substrate support with controlled sealing gap |
TWD163540S (zh) | 2013-03-28 | 2014-10-11 | 平田機工股份有限公司 | 晶圓載入/載出腔用蓋 |
USD716742S1 (en) * | 2013-09-13 | 2014-11-04 | Asm Ip Holding B.V. | Substrate supporter for semiconductor deposition apparatus |
USD723077S1 (en) * | 2013-12-03 | 2015-02-24 | Applied Materials, Inc. | Chuck carrier film |
US9779971B2 (en) | 2014-04-11 | 2017-10-03 | Applied Materials, Inc. | Methods and apparatus for rapidly cooling a substrate |
US20160002778A1 (en) | 2014-07-03 | 2016-01-07 | Applied Materials, Inc. | Substrate support with more uniform edge purge |
JP1528261S (enrdf_load_stackoverflow) | 2014-12-25 | 2016-06-27 | ||
USD798248S1 (en) * | 2015-06-18 | 2017-09-26 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
JP1547357S (enrdf_load_stackoverflow) | 2015-07-27 | 2016-04-11 | ||
USD813181S1 (en) * | 2016-07-26 | 2018-03-20 | Hitachi Kokusai Electric Inc. | Cover of seal cap for reaction chamber of semiconductor |
US10435784B2 (en) | 2016-08-10 | 2019-10-08 | Applied Materials, Inc. | Thermally optimized rings |
JP1582993S (enrdf_load_stackoverflow) | 2016-12-12 | 2018-07-30 | ||
USD830981S1 (en) * | 2017-04-07 | 2018-10-16 | Asm Ip Holding B.V. | Susceptor for semiconductor substrate processing apparatus |
TWI749231B (zh) * | 2017-05-25 | 2021-12-11 | 日商日本碍子股份有限公司 | 晶圓基座 |
TWD197827S (zh) | 2017-12-19 | 2019-06-01 | Ebara Corp | 半導體晶圓研磨用彈性膜 |
JP6793828B2 (ja) | 2018-01-19 | 2020-12-02 | 株式会社アルバック | ヒータベース及び処理装置 |
JP7030006B2 (ja) * | 2018-04-12 | 2022-03-04 | 株式会社ディスコ | 拡張方法及び拡張装置 |
-
2019
- 2019-07-30 US US29/700,012 patent/USD931240S1/en active Active
-
2020
- 2020-01-08 TW TW109300093F patent/TWD213398S/zh unknown
- 2020-01-08 TW TW109306863F patent/TWD211589S/zh unknown
- 2020-01-30 JP JPD2020-1663F patent/JP1667763S/ja active Active
- 2020-01-30 JP JPD2020-1659F patent/JP1667762S/ja active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD406852S (en) | 1997-11-14 | 1999-03-16 | Applied Materials, Inc. | Electrostatic chuck with improved spacing mask and workpiece detection device |
USD708651S1 (en) | 2011-11-22 | 2014-07-08 | Applied Materials, Inc. | Electrostatic chuck |
Also Published As
Publication number | Publication date |
---|---|
TWD211589S (zh) | 2021-05-11 |
USD931240S1 (en) | 2021-09-21 |
JP1667763S (enrdf_load_stackoverflow) | 2020-09-07 |
JP1667762S (enrdf_load_stackoverflow) | 2020-09-07 |
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