TWD212326S - 電漿處理裝置用離子遮蔽板 - Google Patents

電漿處理裝置用離子遮蔽板 Download PDF

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Publication number
TWD212326S
TWD212326S TW109306616F TW109306616F TWD212326S TW D212326 S TWD212326 S TW D212326S TW 109306616 F TW109306616 F TW 109306616F TW 109306616 F TW109306616 F TW 109306616F TW D212326 S TWD212326 S TW D212326S
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TW
Taiwan
Prior art keywords
plasma processing
shielding plate
ion shielding
processing device
article
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TW109306616F
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English (en)
Chinese (zh)
Inventor
田中一海
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日商日立全球先端科技股份有限公司
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Publication of TWD212326S publication Critical patent/TWD212326S/zh

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TW109306616F 2020-05-27 2020-11-26 電漿處理裝置用離子遮蔽板 TWD212326S (zh)

Applications Claiming Priority (2)

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JP2020-010384 2020-05-27
JPD2020-10384F JP1678330S (enrdf_load_stackoverflow) 2020-05-27 2020-05-27

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TWD212326S true TWD212326S (zh) 2021-06-21

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TW109306616F TWD212326S (zh) 2020-05-27 2020-11-26 電漿處理裝置用離子遮蔽板

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US (1) USD958401S1 (enrdf_load_stackoverflow)
JP (1) JP1678330S (enrdf_load_stackoverflow)
TW (1) TWD212326S (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD223247S (zh) 2021-09-28 2023-01-21 美商應用材料股份有限公司 遮蔽環升降組件
TWD225641S (zh) 2021-09-28 2023-06-01 美商應用材料股份有限公司 遮蔽環升降板
TWD225930S (zh) 2021-11-26 2023-06-21 日商巴川製紙所股份有限公司 熱交換用板之部分
TWD227756S (zh) 2021-11-26 2023-10-01 日商巴川製紙所股份有限公司 熱交換用板之部分
TWD228948S (zh) 2022-05-31 2023-12-11 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 基座
TWD228949S (zh) 2022-05-31 2023-12-11 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 基座
TWD235077S (zh) 2023-01-19 2024-12-01 美商蘭姆研究公司 (美國) 用於基板處理系統的擋板
USD1073758S1 (en) 2022-10-13 2025-05-06 Lam Research Corporation Baffle for substrate processing system

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1704964S (ja) * 2021-04-19 2022-01-14 プラズマ処理装置用サセプタリング
JP1700629S (enrdf_load_stackoverflow) * 2021-04-26 2021-11-29
USD1031079S1 (en) * 2021-10-07 2024-06-11 iRoma Scents A.B. Ltd. Multi-chamber canister

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD638550S1 (en) * 2009-11-13 2011-05-24 3M Innovative Properties Company Sample processing disk cover
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD638951S1 (en) * 2009-11-13 2011-05-31 3M Innovative Properties Company Sample processing disk cover
USD675330S1 (en) * 2010-07-23 2013-01-29 Apollo Industrial Co., Ltd. Plate valve for bubble generator
US9573086B2 (en) * 2014-11-03 2017-02-21 Micah Corder Drain cover
USD776295S1 (en) * 2014-11-04 2017-01-10 Charles River Laboratories, Inc. Base
USD794753S1 (en) * 2016-04-08 2017-08-15 Applied Materials, Inc. Showerhead for a semiconductor processing chamber
JP1598996S (enrdf_load_stackoverflow) * 2017-08-31 2018-03-05
USD907235S1 (en) * 2017-09-18 2021-01-05 University Of Hertfordshire Higher Education Corporation Enclosure for dissolution system
USD901714S1 (en) * 2017-12-05 2020-11-10 Hamamatsu Photonics K.K. Cover for culture vessel
USD877931S1 (en) * 2018-05-09 2020-03-10 Moleculight, Inc. Dispenser for a darkening drape
JP1624793S (enrdf_load_stackoverflow) * 2018-07-24 2019-02-18
JP1624794S (enrdf_load_stackoverflow) * 2018-07-24 2019-02-18
JP1624795S (enrdf_load_stackoverflow) * 2018-07-24 2019-02-18
JP1640255S (enrdf_load_stackoverflow) * 2018-10-25 2019-09-02
USD927015S1 (en) * 2019-10-02 2021-08-03 Anthony Joseph Thomas Skirted petri dish

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD223247S (zh) 2021-09-28 2023-01-21 美商應用材料股份有限公司 遮蔽環升降組件
TWD225641S (zh) 2021-09-28 2023-06-01 美商應用材料股份有限公司 遮蔽環升降板
TWD225930S (zh) 2021-11-26 2023-06-21 日商巴川製紙所股份有限公司 熱交換用板之部分
TWD227756S (zh) 2021-11-26 2023-10-01 日商巴川製紙所股份有限公司 熱交換用板之部分
TWD228948S (zh) 2022-05-31 2023-12-11 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 基座
TWD228949S (zh) 2022-05-31 2023-12-11 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 基座
USD1073758S1 (en) 2022-10-13 2025-05-06 Lam Research Corporation Baffle for substrate processing system
TWD235077S (zh) 2023-01-19 2024-12-01 美商蘭姆研究公司 (美國) 用於基板處理系統的擋板
USD1076837S1 (en) 2023-01-19 2025-05-27 Lam Research Corporation Baffle

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Publication number Publication date
JP1678330S (enrdf_load_stackoverflow) 2021-02-01
USD958401S1 (en) 2022-07-19

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