TWD228949S - 基座 - Google Patents

基座 Download PDF

Info

Publication number
TWD228949S
TWD228949S TW111305855F TW111305855F TWD228949S TW D228949 S TWD228949 S TW D228949S TW 111305855 F TW111305855 F TW 111305855F TW 111305855 F TW111305855 F TW 111305855F TW D228949 S TWD228949 S TW D228949S
Authority
TW
Taiwan
Prior art keywords
design
article
substrate
susceptor
base
Prior art date
Application number
TW111305855F
Other languages
English (en)
Inventor
黄舒瑾
蘇俊威
王文濤
林興
Original Assignee
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 filed Critical 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司
Publication of TWD228949S publication Critical patent/TWD228949S/zh

Links

Abstract

【物品用途】;本設計物品關於一種基座；並且;本案設計之產業領域為半導體裝置製造；並且;本設計之用途為在基板上沉積材料層之期間支撐基板。;【設計說明】;省略之。

Description

基座
本設計物品關於一種基座；並且本案設計之產業領域為半導體裝置製造；並且本設計之用途為在基板上沉積材料層之期間支撐基板。
TW111305855F 2022-05-31 2022-11-23 基座 TWD228949S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/840,695 USD1067204S1 (en) 2022-05-31 2022-05-31 Susceptor
US29/840,695 2022-05-31

Publications (1)

Publication Number Publication Date
TWD228949S true TWD228949S (zh) 2023-12-11

Family

ID=89074847

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111305855F TWD228949S (zh) 2022-05-31 2022-11-23 基座

Country Status (2)

Country Link
US (1) USD1067204S1 (zh)
TW (1) TWD228949S (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1745874S (ja) * 2022-10-20 2023-06-08 サセプタカバー
JP1741175S (ja) * 2022-10-20 2023-04-06 サセプタ
JP1745924S (ja) * 2022-10-20 2023-06-08 サセプタ
JP1773328S (ja) * 2024-02-13 2024-06-18 サセプタ
JP1773327S (ja) * 2024-02-13 2024-06-18 サセプタ
JP1773329S (ja) * 2024-02-13 2024-06-18 サセプタ

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD212326S (zh) 2020-05-27 2021-06-21 日商日立全球先端科技股份有限公司 電漿處理裝置用離子遮蔽板

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3796182A (en) * 1971-12-16 1974-03-12 Applied Materials Tech Susceptor structure for chemical vapor deposition reactor
US5242501A (en) * 1982-09-10 1993-09-07 Lam Research Corporation Susceptor in chemical vapor deposition reactors
US4499354A (en) * 1982-10-06 1985-02-12 General Instrument Corp. Susceptor for radiant absorption heater system
JPS63186422A (ja) * 1987-01-28 1988-08-02 Tadahiro Omi ウエハサセプタ装置
US4978567A (en) * 1988-03-31 1990-12-18 Materials Technology Corporation, Subsidiary Of The Carbon/Graphite Group, Inc. Wafer holding fixture for chemical reaction processes in rapid thermal processing equipment and method for making same
US4986215A (en) * 1988-09-01 1991-01-22 Kyushu Electronic Metal Co., Ltd. Susceptor for vapor-phase growth system
JPH0834187B2 (ja) * 1989-01-13 1996-03-29 東芝セラミックス株式会社 サセプタ
US5645646A (en) * 1994-02-25 1997-07-08 Applied Materials, Inc. Susceptor for deposition apparatus
JPH0878347A (ja) * 1994-09-06 1996-03-22 Komatsu Electron Metals Co Ltd エピタキシャル成長装置のサセプタ
US5584936A (en) * 1995-12-14 1996-12-17 Cvd, Incorporated Susceptor for semiconductor wafer processing
US5863843A (en) * 1996-07-31 1999-01-26 Lucent Technologies Inc. Wafer holder for thermal processing apparatus
US7256375B2 (en) * 2002-08-30 2007-08-14 Asm International N.V. Susceptor plate for high temperature heat treatment
US8366830B2 (en) * 2003-03-04 2013-02-05 Cree, Inc. Susceptor apparatus for inverted type MOCVD reactor
USD525127S1 (en) * 2004-03-01 2006-07-18 Kraft Foods Holdings, Inc. Susceptor ring
EP1772901B1 (en) * 2005-10-07 2012-07-25 Rohm and Haas Electronic Materials, L.L.C. Wafer holding article and method for semiconductor processing
US8394229B2 (en) * 2008-08-07 2013-03-12 Asm America, Inc. Susceptor ring
USD600223S1 (en) * 2008-08-07 2009-09-15 Ravinder Aggarwal Susceptor ring
US11085112B2 (en) * 2011-10-28 2021-08-10 Asm Ip Holding B.V. Susceptor with ring to limit backside deposition
US9682398B2 (en) * 2012-03-30 2017-06-20 Applied Materials, Inc. Substrate processing system having susceptorless substrate support with enhanced substrate heating control
USD743357S1 (en) * 2013-03-01 2015-11-17 Asm Ip Holding B.V. Susceptor
US10068791B2 (en) * 2013-03-08 2018-09-04 Semiconductor Components Industries, Llc Wafer susceptor for forming a semiconductor device and method therefor
USD784276S1 (en) * 2013-08-06 2017-04-18 Applied Materials, Inc. Susceptor assembly
USD830981S1 (en) * 2017-04-07 2018-10-16 Asm Ip Holding B.V. Susceptor for semiconductor substrate processing apparatus
USD864134S1 (en) * 2018-10-24 2019-10-22 Asm Ip Holding B.V. Susceptor
USD948463S1 (en) * 2018-10-24 2022-04-12 Asm Ip Holding B.V. Susceptor for semiconductor substrate supporting apparatus
USD920936S1 (en) * 2019-01-17 2021-06-01 Asm Ip Holding B.V. Higher temperature vented susceptor
USD914620S1 (en) * 2019-01-17 2021-03-30 Asm Ip Holding B.V. Vented susceptor
USD1035598S1 (en) 2020-09-02 2024-07-16 Applied Materials, Inc. Gas distribution plate for a semiconductor processing chamber

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD212326S (zh) 2020-05-27 2021-06-21 日商日立全球先端科技股份有限公司 電漿處理裝置用離子遮蔽板

Also Published As

Publication number Publication date
USD1067204S1 (en) 2025-03-18

Similar Documents

Publication Publication Date Title
TWD228948S (zh) 基座
TWD228949S (zh) 基座
TWD215402S (zh) 用於基板處理腔室的沉積環
JP1741174S (ja) サセプタ
JP1711120S (ja) サセプタカバー
JP1711119S (ja) サセプタリング
JP1741176S (ja) サセプタ用カバーベース
JP1741172S (ja) サセプタカバー
TWD211363S (zh) 基板載具
JP1745873S (ja) サセプタ
JP1746405S (ja) サセプタカバー
TWD207362S (zh) 半導體製造用之晶圓用的支撐器具
JP1745924S (ja) サセプタ
JP1741175S (ja) サセプタ
JP1746408S (ja) サセプタ
TWD210557S (zh) 熱製程用承載盤
TWD227852S (zh) 用於半導體基板處理的處理套組之接地環
JP1717341S (ja) 基板保持リング
JP1746404S (ja) サセプタカバーベース
TWD208042S (zh) 等離子體處理裝置用容器
TWD230339S (zh) 用於容納基材之卡匣
TWD220762S (zh) 加熱燈泡
TWD235150S (zh) 用於基板處理腔室的淨化環
TWD235787S (zh) 基板載體
JP1770547S (ja) 静電チャック