TWD228948S - 基座 - Google Patents

基座 Download PDF

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Publication number
TWD228948S
TWD228948S TW111305854F TW111305854F TWD228948S TW D228948 S TWD228948 S TW D228948S TW 111305854 F TW111305854 F TW 111305854F TW 111305854 F TW111305854 F TW 111305854F TW D228948 S TWD228948 S TW D228948S
Authority
TW
Taiwan
Prior art keywords
design
article
substrate
susceptor
base
Prior art date
Application number
TW111305854F
Other languages
English (en)
Inventor
黄舒瑾
蘇俊威
王文濤
林興
Original Assignee
荷蘭商Asm Ip私人控股有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 荷蘭商Asm Ip私人控股有限公司 filed Critical 荷蘭商Asm Ip私人控股有限公司
Publication of TWD228948S publication Critical patent/TWD228948S/zh

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Abstract

【物品用途】;本設計物品關於一種基座;;並且本案設計之產業領域為半導體裝置製造;並且;本設計之用途為在基板上沉積材料層之期間支撐基板。;【設計說明】;省略之。

Description

基座
本設計物品關於一種基座;並且本案設計之產業領域為半導體裝置製造;並且本設計之用途為在基板上沉積材料層之期間支撐基板。
TW111305854F 2022-05-31 2022-11-23 基座 TWD228948S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/840,698 USD1030687S1 (en) 2022-05-31 2022-05-31 Susceptor
US29/840,698 2022-05-31

Publications (1)

Publication Number Publication Date
TWD228948S true TWD228948S (zh) 2023-12-11

Family

ID=89074749

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111305854F TWD228948S (zh) 2022-05-31 2022-11-23 基座

Country Status (2)

Country Link
US (1) USD1030687S1 (zh)
TW (1) TWD228948S (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1071103S1 (en) * 2022-04-11 2025-04-15 Applied Materials, Inc. Gas distribution plate
JP1745874S (ja) * 2022-10-20 2023-06-08 サセプタカバー
JP1741173S (ja) * 2022-10-20 2023-04-06 半導体ウェハ及びサセプタ加熱用ヒータ
JP1741175S (ja) * 2022-10-20 2023-04-06 サセプタ
JP1745924S (ja) * 2022-10-20 2023-06-08 サセプタ
USD1052548S1 (en) * 2023-06-26 2024-11-26 Applied Materials, Inc. Gas diffuser
USD1116010S1 (en) * 2023-08-23 2026-03-03 Applied Materials, Inc. Gas diffuser assembly
JP1773328S (ja) * 2024-02-13 2024-06-18 サセプタ
JP1773327S (ja) * 2024-02-13 2024-06-18 サセプタ
JP1773329S (ja) * 2024-02-13 2024-06-18 サセプタ

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD212326S (zh) 2020-05-27 2021-06-21 日商日立全球先端科技股份有限公司 電漿處理裝置用離子遮蔽板

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JPH0834187B2 (ja) * 1989-01-13 1996-03-29 東芝セラミックス株式会社 サセプタ
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USD525127S1 (en) * 2004-03-01 2006-07-18 Kraft Foods Holdings, Inc. Susceptor ring
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USD600223S1 (en) * 2008-08-07 2009-09-15 Ravinder Aggarwal Susceptor ring
US11085112B2 (en) * 2011-10-28 2021-08-10 Asm Ip Holding B.V. Susceptor with ring to limit backside deposition
US9682398B2 (en) * 2012-03-30 2017-06-20 Applied Materials, Inc. Substrate processing system having susceptorless substrate support with enhanced substrate heating control
USD743357S1 (en) * 2013-03-01 2015-11-17 Asm Ip Holding B.V. Susceptor
US10068791B2 (en) * 2013-03-08 2018-09-04 Semiconductor Components Industries, Llc Wafer susceptor for forming a semiconductor device and method therefor
USD784276S1 (en) * 2013-08-06 2017-04-18 Applied Materials, Inc. Susceptor assembly
USD830981S1 (en) * 2017-04-07 2018-10-16 Asm Ip Holding B.V. Susceptor for semiconductor substrate processing apparatus
USD864134S1 (en) * 2018-10-24 2019-10-22 Asm Ip Holding B.V. Susceptor
USD948463S1 (en) * 2018-10-24 2022-04-12 Asm Ip Holding B.V. Susceptor for semiconductor substrate supporting apparatus
USD920936S1 (en) * 2019-01-17 2021-06-01 Asm Ip Holding B.V. Higher temperature vented susceptor
USD914620S1 (en) * 2019-01-17 2021-03-30 Asm Ip Holding B.V. Vented susceptor
USD1035598S1 (en) 2020-09-02 2024-07-16 Applied Materials, Inc. Gas distribution plate for a semiconductor processing chamber

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD212326S (zh) 2020-05-27 2021-06-21 日商日立全球先端科技股份有限公司 電漿處理裝置用離子遮蔽板

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