TWD207362S - 半導體製造用之晶圓用的支撐器具 - Google Patents
半導體製造用之晶圓用的支撐器具 Download PDFInfo
- Publication number
- TWD207362S TWD207362S TW108306786F TW108306786F TWD207362S TW D207362 S TWD207362 S TW D207362S TW 108306786 F TW108306786 F TW 108306786F TW 108306786 F TW108306786 F TW 108306786F TW D207362 S TWD207362 S TW D207362S
- Authority
- TW
- Taiwan
- Prior art keywords
- semiconductor manufacturing
- support tool
- semiconductor
- wafer
- design
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract description 17
- 238000004519 manufacturing process Methods 0.000 title abstract description 9
- 235000012431 wafers Nutrition 0.000 abstract description 14
- 239000010409 thin film Substances 0.000 abstract description 4
- 239000013078 crystal Substances 0.000 abstract description 2
Images
Abstract
【物品用途】;根據本設計之物品係一種半導體製造用之晶圓用的支撐器具,其用於半導體製造裝置之中的薄膜晶體生長技術之磊晶生長裝置的反應腔之中。此半導體製造用之晶圓用的支撐器具係支撐供承載半導體晶圓的承載盤。以承載盤的頂面承載半導體晶圓,並且對半導體晶圓加熱而使半導體晶圓的薄膜生長。;【設計說明】;本案之「半導體製造用之晶圓用的支撐器具」設計如附圖所示。
Description
根據本設計之物品係一種半導體製造用之晶圓用的支撐器具,其用於半導體製造裝置之中的薄膜晶體生長技術之磊晶生長裝置的反應腔之中。此半導體製造用之晶圓用的支撐器具係支撐供承載半導體晶圓的承載盤。以承載盤的頂面承載半導體晶圓,並且對半導體晶圓加熱而使半導體晶圓的薄膜生長。
本案之「半導體製造用之晶圓用的支撐器具」設計如附圖所示。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPD2019-16842F JP1651258S (zh) | 2019-07-29 | 2019-07-29 | |
JP2019-016842 | 2019-07-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD207362S true TWD207362S (zh) | 2020-09-21 |
Family
ID=69183509
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW108306786F TWD207362S (zh) | 2019-07-29 | 2019-11-04 | 半導體製造用之晶圓用的支撐器具 |
Country Status (3)
Country | Link |
---|---|
US (1) | USD926715S1 (zh) |
JP (1) | JP1651258S (zh) |
TW (1) | TWD207362S (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD975665S1 (en) * | 2019-05-17 | 2023-01-17 | Asm Ip Holding B.V. | Susceptor shaft |
USD947913S1 (en) * | 2019-05-17 | 2022-04-05 | Asm Ip Holding B.V. | Susceptor shaft |
USD965044S1 (en) * | 2019-08-19 | 2022-09-27 | Asm Ip Holding B.V. | Susceptor shaft |
USD953309S1 (en) * | 2020-03-11 | 2022-05-31 | Zhicheng Zhou | TV antenna |
JP1706322S (zh) * | 2021-08-27 | 2022-01-31 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6572814B2 (en) * | 1998-09-08 | 2003-06-03 | Applied Materials Inc. | Method of fabricating a semiconductor wafer support chuck apparatus having small diameter gas distribution ports for distributing a heat transfer gas |
US7204887B2 (en) * | 2000-10-16 | 2007-04-17 | Nippon Steel Corporation | Wafer holding, wafer support member, wafer boat and heat treatment furnace |
JP2004207606A (ja) * | 2002-12-26 | 2004-07-22 | Disco Abrasive Syst Ltd | ウェーハサポートプレート |
USD552565S1 (en) * | 2005-09-08 | 2007-10-09 | Tokyo Ohka Kogyo Co., Ltd. | Supporting plate |
USD614593S1 (en) * | 2008-07-21 | 2010-04-27 | Asm Genitech Korea Ltd | Substrate support for a semiconductor deposition apparatus |
USD606952S1 (en) * | 2009-01-16 | 2009-12-29 | Asm Genitech Korea Ltd. | Plasma inducing plate for semiconductor deposition apparatus |
USD616394S1 (en) * | 2009-03-06 | 2010-05-25 | Tokyo Electron Limited | Support of wafer boat for manufacturing semiconductor wafers |
USD616395S1 (en) * | 2009-03-11 | 2010-05-25 | Tokyo Electron Limited | Support of wafer boat for manufacturing semiconductor wafers |
US10854498B2 (en) * | 2011-07-15 | 2020-12-01 | Asm Ip Holding B.V. | Wafer-supporting device and method for producing same |
USD784276S1 (en) * | 2013-08-06 | 2017-04-18 | Applied Materials, Inc. | Susceptor assembly |
USD819580S1 (en) * | 2016-04-01 | 2018-06-05 | Veeco Instruments, Inc. | Self-centering wafer carrier for chemical vapor deposition |
USD830981S1 (en) * | 2017-04-07 | 2018-10-16 | Asm Ip Holding B.V. | Susceptor for semiconductor substrate processing apparatus |
USD864134S1 (en) * | 2018-10-24 | 2019-10-22 | Asm Ip Holding B.V. | Susceptor |
-
2019
- 2019-07-29 JP JPD2019-16842F patent/JP1651258S/ja active Active
- 2019-11-04 TW TW108306786F patent/TWD207362S/zh unknown
- 2019-11-12 US US29/712,911 patent/USD926715S1/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP1651258S (zh) | 2020-01-27 |
USD926715S1 (en) | 2021-08-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWD207362S (zh) | 半導體製造用之晶圓用的支撐器具 | |
TWI335945B (en) | Vapor-phase epitaxial growth method and vapor-phase epitaxy apparatus | |
TWD204260S (zh) | 通氣基座 | |
TWD206688S (zh) | 通氣基座 | |
TWD217559S (zh) | 用於處理腔室基板支撐件的基底板 | |
TWD197827S (zh) | 半導體晶圓研磨用彈性膜 | |
TW200539322A (en) | Epitaxially growing equipment | |
TWD200220S (zh) | 用於半導體基板支撐裝置的基座 | |
TWD187175S (zh) | 圖案化石英晶圓 | |
TWD210557S (zh) | 熱製程用承載盤 | |
TWD183002S (zh) | 圖案化石英晶圓 | |
TW200603242A (en) | A substrate processing apparatus and a semiconductor device manufacturing method use the same | |
CN105568371A (zh) | 一种改善硅基氮化物各圈波长均值的石墨盘 | |
TWD215079S (zh) | 半導體晶圓研磨用彈性膜 | |
JP5306432B2 (ja) | 気相成長方法 | |
FR3079532B1 (fr) | Procede de fabrication d'une couche monocristalline de materiau ain et substrat pour croissance par epitaxie d'une couche monocristalline de materiau ain | |
TWD228948S (zh) | 基座 | |
TWD228949S (zh) | 基座 | |
TWD218088S (zh) | 基板處理裝置用晶舟 | |
TWD220762S (zh) | 加熱燈泡 | |
TWD194249S (zh) | 晶圓固定環 | |
TWD193203S (zh) | Elastic film for semiconductor wafer polishing | |
TWD209963S (zh) | 等離子體處理裝置用容器 | |
TWD223130S (zh) | 微小構造體和薄化晶圓處理用載體基板 | |
TWD214286S (zh) | 半導體晶圓研磨用彈性膜之部分 |