TWD225641S - 遮蔽環升降板 - Google Patents

遮蔽環升降板 Download PDF

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Publication number
TWD225641S
TWD225641S TW111301127F TW111301127F TWD225641S TW D225641 S TWD225641 S TW D225641S TW 111301127 F TW111301127 F TW 111301127F TW 111301127 F TW111301127 F TW 111301127F TW D225641 S TWD225641 S TW D225641S
Authority
TW
Taiwan
Prior art keywords
lift plate
shadow ring
design
ring lift
lifting plate
Prior art date
Application number
TW111301127F
Other languages
English (en)
Inventor
黃祖濱
史瑞尼法斯 托庫爾莫哈納
史瑞雅斯 帕提珊塔維拉斯瓦米
珊德許 雅達曼尼
拉菲 傑立巴利
哈爾普利特 辛格
曼裘那薩 高帕
Original Assignee
美商應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD225641S publication Critical patent/TWD225641S/zh

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Abstract

【物品用途】;本設計係請求遮蔽環升降板的外觀設計。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。

Description

遮蔽環升降板
本設計係請求遮蔽環升降板的外觀設計。
圖式所揭露之虛線部分，為本案不主張設計之部分。
TW111301127F 2021-09-28 2022-03-09 遮蔽環升降板 TWD225641S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/809,529 2021-09-28
US29/809,529 USD997893S1 (en) 2021-09-28 2021-09-28 Shadow ring lift plate

Publications (1)

Publication Number Publication Date
TWD225641S true TWD225641S (zh) 2023-06-01

Family

ID=84027333

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111301127F TWD225641S (zh) 2021-09-28 2022-03-09 遮蔽環升降板

Country Status (3)

Country Link
US (1) USD997893S1 (zh)
JP (1) JP1729849S (zh)
TW (1) TWD225641S (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1013215S1 (en) * 2023-06-26 2024-01-30 Weiwei Bi Pneumatic plate

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD212326S (zh) 2020-05-27 2021-06-21 日商日立全球先端科技股份有限公司 電漿處理裝置用離子遮蔽板

Family Cites Families (15)

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Publication number Priority date Publication date Assignee Title
US5922133A (en) 1997-09-12 1999-07-13 Applied Materials, Inc. Multiple edge deposition exclusion rings
US6589352B1 (en) * 1999-12-10 2003-07-08 Applied Materials, Inc. Self aligning non contact shadow ring process kit
US20030000647A1 (en) 2001-06-29 2003-01-02 Applied Materials, Inc. Substrate processing chamber
JP2006324610A (ja) 2005-05-20 2006-11-30 Matsushita Electric Ind Co Ltd 基板処理装置及び基板処理方法
US20220172980A1 (en) * 2008-10-31 2022-06-02 Asm Ip Holding B.V. Self-centering susceptor ring assembly
US8801857B2 (en) * 2008-10-31 2014-08-12 Asm America, Inc. Self-centering susceptor ring assembly
US9236284B2 (en) 2014-01-31 2016-01-12 Applied Materials, Inc. Cooled tape frame lift and low contact shadow ring for plasma heat isolation
SG11201701465QA (en) * 2014-09-05 2017-03-30 Applied Materials Inc Susceptor and pre-heat ring for thermal processing of substrates
US20180138074A1 (en) * 2016-11-11 2018-05-17 Samsung Electronics Co., Ltd. Carrier ring and chemical vapor deposition apparatus including the same
US12531210B2 (en) 2018-04-20 2026-01-20 Lam Research Corporation Edge exclusion control
US11512393B2 (en) * 2018-11-29 2022-11-29 Lam Research Corporation Dynamic sheath control with edge ring lift
KR102770274B1 (ko) 2019-08-06 2025-02-20 삼성전자주식회사 샤워헤드 및 이를 구비하는 기판 처리장치
WO2021146352A1 (en) * 2020-01-17 2021-07-22 Lam Research Corporation Exclusion ring with flow paths for exhausting wafer edge gas
US12476143B2 (en) 2020-02-21 2025-11-18 Lam Research Corporation Backside reactive inhibition gas
US20220108908A1 (en) * 2020-10-06 2022-04-07 Applied Materials, Inc. Shadow ring kit for plasma etch wafer singulation process

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD212326S (zh) 2020-05-27 2021-06-21 日商日立全球先端科技股份有限公司 電漿處理裝置用離子遮蔽板

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Publication number Publication date
JP1729849S (ja) 2022-11-15
USD997893S1 (en) 2023-09-05

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