JP1598996S - - Google Patents

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Publication number
JP1598996S
JP1598996S JPD2017-18889F JP2017018889F JP1598996S JP 1598996 S JP1598996 S JP 1598996S JP 2017018889 F JP2017018889 F JP 2017018889F JP 1598996 S JP1598996 S JP 1598996S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2017-18889F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2017-18889F priority Critical patent/JP1598996S/ja
Priority to US29/635,287 priority patent/USD868993S1/en
Priority to TW107300618F priority patent/TWD193613S/zh
Application granted granted Critical
Publication of JP1598996S publication Critical patent/JP1598996S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2017-18889F 2017-08-31 2017-08-31 Active JP1598996S (enrdf_load_stackoverflow)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JPD2017-18889F JP1598996S (enrdf_load_stackoverflow) 2017-08-31 2017-08-31
US29/635,287 USD868993S1 (en) 2017-08-31 2018-01-30 Electrode plate for a plasma processing apparatus
TW107300618F TWD193613S (zh) 2017-08-31 2018-01-31 Electrode plate for plasma processing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2017-18889F JP1598996S (enrdf_load_stackoverflow) 2017-08-31 2017-08-31

Publications (1)

Publication Number Publication Date
JP1598996S true JP1598996S (enrdf_load_stackoverflow) 2018-03-05

Family

ID=61274622

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2017-18889F Active JP1598996S (enrdf_load_stackoverflow) 2017-08-31 2017-08-31

Country Status (3)

Country Link
US (1) USD868993S1 (enrdf_load_stackoverflow)
JP (1) JP1598996S (enrdf_load_stackoverflow)
TW (1) TWD193613S (enrdf_load_stackoverflow)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2020259445A1 (en) 2019-04-17 2021-12-02 Masimo Corporation Patient monitoring systems, devices, and methods
USD971192S1 (en) 2019-06-03 2022-11-29 Space Exploration Technologies Corp. Antenna apparatus
USD971900S1 (en) * 2019-06-03 2022-12-06 Space Exploration Technologies Corp. Antenna apparatus
USD976242S1 (en) * 2019-06-03 2023-01-24 Space Exploration Technologies Corp. Antenna apparatus
USD985498S1 (en) 2019-08-16 2023-05-09 Masimo Corporation Connector
USD917704S1 (en) 2019-08-16 2021-04-27 Masimo Corporation Patient monitor
USD919100S1 (en) 2019-08-16 2021-05-11 Masimo Corporation Holder for a patient monitor
JP1659287S (enrdf_load_stackoverflow) * 2019-10-18 2020-05-11
USD927699S1 (en) * 2019-10-18 2021-08-10 Masimo Corporation Electrode pad
TWD206473S (zh) * 2019-11-29 2020-08-11 廣達電腦股份有限公司 無線聽診器
USD963623S1 (en) * 2020-01-09 2022-09-13 Space Exploration Technologies Corp. Antenna apparatus
USD962206S1 (en) * 2020-01-09 2022-08-30 Space Exploration Technologies Corp. Antenna apparatus
USD962906S1 (en) * 2020-01-09 2022-09-06 Space Exploration Technologies Corp. Antenna apparatus
USD986228S1 (en) * 2020-01-09 2023-05-16 Space Exploration Technologies Corp. Antenna apparatus
USD933232S1 (en) 2020-05-11 2021-10-12 Masimo Corporation Blood pressure monitor
USD979516S1 (en) 2020-05-11 2023-02-28 Masimo Corporation Connector
JP1678330S (enrdf_load_stackoverflow) * 2020-05-27 2021-02-01
USD962908S1 (en) * 2020-07-09 2022-09-06 Space Exploration Technologies Corp. Antenna apparatus
USD998817S1 (en) * 2021-02-26 2023-09-12 AnuCell Biosystems Limited Assembly of bioreactor components
JP1704964S (ja) * 2021-04-19 2022-01-14 プラズマ処理装置用サセプタリング
JP1700629S (enrdf_load_stackoverflow) * 2021-04-26 2021-11-29
TWD222303S (zh) 2021-05-04 2022-12-01 南韓商吉佳藍科技股份有限公司 花灑頭支撐件
USD1071103S1 (en) * 2022-04-11 2025-04-15 Applied Materials, Inc. Gas distribution plate
USD1085029S1 (en) * 2022-07-19 2025-07-22 Applied Materials, Inc. Gas distribution plate

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD411516S (en) * 1996-03-15 1999-06-29 Tokyo Electron Limited Gas diffusion plate for electrode of semiconductor wafer processing apparatus
KR20040070008A (ko) * 2003-01-29 2004-08-06 쿄세라 코포레이션 정전척
US7430104B2 (en) * 2003-03-11 2008-09-30 Appiled Materials, Inc. Electrostatic chuck for wafer metrology and inspection equipment
USD553104S1 (en) * 2004-04-21 2007-10-16 Tokyo Electron Limited Absorption board for an electric chuck used in semiconductor manufacture
USD548705S1 (en) * 2005-09-29 2007-08-14 Tokyo Electron Limited Attracting disc for an electrostatic chuck for semiconductor production
USD587339S1 (en) * 2008-01-31 2009-02-24 Hansgrohe Ag Showerhead
US8206506B2 (en) * 2008-07-07 2012-06-26 Lam Research Corporation Showerhead electrode
USD638550S1 (en) * 2009-11-13 2011-05-24 3M Innovative Properties Company Sample processing disk cover
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD672050S1 (en) * 2012-01-13 2012-12-04 Samsung Electronics Co., Ltd. Disk for a medical testing machine
JP1545222S (enrdf_load_stackoverflow) * 2015-06-10 2016-03-07
JP1545406S (enrdf_load_stackoverflow) 2015-06-16 2016-03-14
USD790489S1 (en) * 2015-07-08 2017-06-27 Ebara Corporation Vacuum contact pad
USD787458S1 (en) * 2015-11-18 2017-05-23 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
TWD178425S (zh) * 2016-01-08 2016-09-21 Asm Ip Holding Bv 用於半導體製造設備的電極板
USD790039S1 (en) * 2016-04-08 2017-06-20 Applied Materials, Inc. Showerhead for a semiconductor processing chamber
USD794753S1 (en) * 2016-04-08 2017-08-15 Applied Materials, Inc. Showerhead for a semiconductor processing chamber
USD793526S1 (en) * 2016-04-08 2017-08-01 Applied Materials, Inc. Showerhead for a semiconductor processing chamber

Also Published As

Publication number Publication date
TWD193613S (zh) 2018-10-21
USD868993S1 (en) 2019-12-03

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