TWD193613S - Electrode plate for plasma processing device - Google Patents

Electrode plate for plasma processing device

Info

Publication number
TWD193613S
TWD193613S TW107300618F TW107300618F TWD193613S TW D193613 S TWD193613 S TW D193613S TW 107300618 F TW107300618 F TW 107300618F TW 107300618 F TW107300618 F TW 107300618F TW D193613 S TWD193613 S TW D193613S
Authority
TW
Taiwan
Prior art keywords
gas
light
product
reference drawing
plasma processing
Prior art date
Application number
TW107300618F
Other languages
English (en)
Inventor
磯崎真一
森政士
横川賢悅
荒瀬高男
橋本尊久
Original Assignee
日商日立全球先端科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日立全球先端科技股份有限公司 filed Critical 日商日立全球先端科技股份有限公司
Publication of TWD193613S publication Critical patent/TWD193613S/zh

Links

Abstract

【物品用途】;本設計的物品是電漿處理裝置用電極板，為一種作為半導體製造的電漿處理裝置的氣體噴出板使用的電極板。;【設計說明】;本物品如「使用狀態參考圖及標示各部名稱之參考圖」所示，是設置在上部對向電極之下方。多數的細孔(氣體用孔)是以從本物品正面貫通至背面的方式進行分佈，從氣體供給管線所供給的氣體是經由上部對向電極及本物品的細孔被釋放到真空室內。本設計如「B-B、C-C部分放大圖」所示，設有無氣體用孔的區域(無氣體用孔區域)，本物品是如「使用狀態及標示各部名稱之參考圖」所示，以來自電漿受光棒的光和來自晶圓的光通過無氣體用孔區域的方式被配置。本案藉此能夠接收到電漿受光棒更穩定的反射光。;在「表示透明部、具有透光性之部分的參考圖」中以斜線所示的外周部，係正面側至背面側為具有透光性的部分，以薄墨所示的部分為透明的。

Description

電漿處理裝置用電極板
本設計的物品是電漿處理裝置用電極板，為一種作為半導體製造的電漿處理裝置的氣體噴出板使用的電極板。
本物品如「使用狀態參考圖及標示各部名稱之參考圖」所示，是設置在上部對向電極之下方。多數的細孔(氣體用孔)是以從本物品正面貫通至背面的方式進行分佈，從氣體供給管線所供給的氣體是經由上部對向電極及本物品的細孔被釋放到真空室內。本設計如「B-B、C-C部分放大圖」所示，設有無氣體用孔的區域(無氣體用孔區域)，本物品是如「使用狀態及標示各部名稱之參考圖」所示，以來自電漿受光棒的光和來自晶圓的光通過無氣體用孔區域的方式被配置。本案藉此能夠接收到電漿受光棒更穩定的反射光。
在「表示透明部、具有透光性之部分的參考圖」中以斜線所示的外周部，係正面側至背面側為具有透光性的部分，以薄墨所示的部分為透明的。
TW107300618F 2017-08-31 2018-01-31 Electrode plate for plasma processing device TWD193613S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPD2017-18889F JP1598996S (zh) 2017-08-31 2017-08-31
JP2017-018889 2017-08-31

Publications (1)

Publication Number Publication Date
TWD193613S true TWD193613S (zh) 2018-10-21

Family

ID=61274622

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107300618F TWD193613S (zh) 2017-08-31 2018-01-31 Electrode plate for plasma processing device

Country Status (3)

Country Link
US (1) USD868993S1 (zh)
JP (1) JP1598996S (zh)
TW (1) TWD193613S (zh)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20200329993A1 (en) 2019-04-17 2020-10-22 Masimo Corporation Electrocardiogram device
USD971192S1 (en) * 2019-06-03 2022-11-29 Space Exploration Technologies Corp. Antenna apparatus
USD976242S1 (en) * 2019-06-03 2023-01-24 Space Exploration Technologies Corp. Antenna apparatus
USD971900S1 (en) * 2019-06-03 2022-12-06 Space Exploration Technologies Corp. Antenna apparatus
USD917704S1 (en) 2019-08-16 2021-04-27 Masimo Corporation Patient monitor
USD985498S1 (en) 2019-08-16 2023-05-09 Masimo Corporation Connector
USD927699S1 (en) * 2019-10-18 2021-08-10 Masimo Corporation Electrode pad
JP1659287S (zh) * 2019-10-18 2020-05-11
TWD206473S (zh) * 2019-11-29 2020-08-11 廣達電腦股份有限公司 無線聽診器
USD963623S1 (en) * 2020-01-09 2022-09-13 Space Exploration Technologies Corp. Antenna apparatus
USD986228S1 (en) * 2020-01-09 2023-05-16 Space Exploration Technologies Corp. Antenna apparatus
USD962906S1 (en) * 2020-01-09 2022-09-06 Space Exploration Technologies Corp. Antenna apparatus
USD962206S1 (en) * 2020-01-09 2022-08-30 Space Exploration Technologies Corp. Antenna apparatus
USD933232S1 (en) 2020-05-11 2021-10-12 Masimo Corporation Blood pressure monitor
USD979516S1 (en) 2020-05-11 2023-02-28 Masimo Corporation Connector
JP1678330S (zh) * 2020-05-27 2021-02-01
USD962908S1 (en) * 2020-07-09 2022-09-06 Space Exploration Technologies Corp. Antenna apparatus
USD998817S1 (en) * 2021-02-26 2023-09-12 AnuCell Biosystems Limited Assembly of bioreactor components
JP1704964S (ja) * 2021-04-19 2022-01-14 プラズマ処理装置用サセプタリング
JP1700629S (zh) * 2021-04-26 2021-11-29
TWD222303S (zh) 2021-05-04 2022-12-01 南韓商吉佳藍科技股份有限公司 花灑頭支撐件

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD411516S (en) * 1996-03-15 1999-06-29 Tokyo Electron Limited Gas diffusion plate for electrode of semiconductor wafer processing apparatus
KR20040070008A (ko) * 2003-01-29 2004-08-06 쿄세라 코포레이션 정전척
US7430104B2 (en) * 2003-03-11 2008-09-30 Appiled Materials, Inc. Electrostatic chuck for wafer metrology and inspection equipment
USD553104S1 (en) * 2004-04-21 2007-10-16 Tokyo Electron Limited Absorption board for an electric chuck used in semiconductor manufacture
USD548705S1 (en) * 2005-09-29 2007-08-14 Tokyo Electron Limited Attracting disc for an electrostatic chuck for semiconductor production
USD593640S1 (en) * 2008-01-31 2009-06-02 Hansgrohe Ag Showerhead
US8206506B2 (en) * 2008-07-07 2012-06-26 Lam Research Corporation Showerhead electrode
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD638550S1 (en) * 2009-11-13 2011-05-24 3M Innovative Properties Company Sample processing disk cover
USD672050S1 (en) * 2012-01-13 2012-12-04 Samsung Electronics Co., Ltd. Disk for a medical testing machine
JP1545222S (zh) * 2015-06-10 2016-03-07
JP1545406S (zh) 2015-06-16 2016-03-14
USD790489S1 (en) * 2015-07-08 2017-06-27 Ebara Corporation Vacuum contact pad
USD787458S1 (en) * 2015-11-18 2017-05-23 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
TWD178425S (zh) * 2016-01-08 2016-09-21 ＡＳＭ知識產權私人控股有&#x9 用於半導體製造設備的電極板
USD790039S1 (en) * 2016-04-08 2017-06-20 Applied Materials, Inc. Showerhead for a semiconductor processing chamber
USD793526S1 (en) * 2016-04-08 2017-08-01 Applied Materials, Inc. Showerhead for a semiconductor processing chamber
USD794753S1 (en) * 2016-04-08 2017-08-15 Applied Materials, Inc. Showerhead for a semiconductor processing chamber

Also Published As

Publication number Publication date
USD868993S1 (en) 2019-12-03
JP1598996S (zh) 2018-03-05

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