TWD193613S - Electrode plate for plasma processing device - Google Patents
Electrode plate for plasma processing deviceInfo
- Publication number
- TWD193613S TWD193613S TW107300618F TW107300618F TWD193613S TW D193613 S TWD193613 S TW D193613S TW 107300618 F TW107300618 F TW 107300618F TW 107300618 F TW107300618 F TW 107300618F TW D193613 S TWD193613 S TW D193613S
- Authority
- TW
- Taiwan
- Prior art keywords
- gas
- light
- product
- reference drawing
- plasma processing
- Prior art date
Links
- 239000011148 porous material Substances 0.000 abstract description 5
- 230000002093 peripheral effect Effects 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 239000002002 slurry Substances 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 2
Abstract
【物品用途】;本設計的物品是電漿處理裝置用電極板,為一種作為半導體製造的電漿處理裝置的氣體噴出板使用的電極板。;【設計說明】;本物品如「使用狀態參考圖及標示各部名稱之參考圖」所示,是設置在上部對向電極之下方。多數的細孔(氣體用孔)是以從本物品正面貫通至背面的方式進行分佈,從氣體供給管線所供給的氣體是經由上部對向電極及本物品的細孔被釋放到真空室內。本設計如「B-B、C-C部分放大圖」所示,設有無氣體用孔的區域(無氣體用孔區域),本物品是如「使用狀態及標示各部名稱之參考圖」所示,以來自電漿受光棒的光和來自晶圓的光通過無氣體用孔區域的方式被配置。本案藉此能夠接收到電漿受光棒更穩定的反射光。;在「表示透明部、具有透光性之部分的參考圖」中以斜線所示的外周部,係正面側至背面側為具有透光性的部分,以薄墨所示的部分為透明的。
Description
本設計的物品是電漿處理裝置用電極板,為一種作為半導體製造的電漿處理裝置的氣體噴出板使用的電極板。
本物品如「使用狀態參考圖及標示各部名稱之參考圖」所示,是設置在上部對向電極之下方。多數的細孔(氣體用孔)是以從本物品正面貫通至背面的方式進行分佈,從氣體供給管線所供給的氣體是經由上部對向電極及本物品的細孔被釋放到真空室內。本設計如「B-B、C-C部分放大圖」所示,設有無氣體用孔的區域(無氣體用孔區域),本物品是如「使用狀態及標示各部名稱之參考圖」所示,以來自電漿受光棒的光和來自晶圓的光通過無氣體用孔區域的方式被配置。本案藉此能夠接收到電漿受光棒更穩定的反射光。
在「表示透明部、具有透光性之部分的參考圖」中以斜線所示的外周部,係正面側至背面側為具有透光性的部分,以薄墨所示的部分為透明的。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPD2017-18889F JP1598996S (zh) | 2017-08-31 | 2017-08-31 | |
JP2017-018889 | 2017-08-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD193613S true TWD193613S (zh) | 2018-10-21 |
Family
ID=61274622
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107300618F TWD193613S (zh) | 2017-08-31 | 2018-01-31 | Electrode plate for plasma processing device |
Country Status (3)
Country | Link |
---|---|
US (1) | USD868993S1 (zh) |
JP (1) | JP1598996S (zh) |
TW (1) | TWD193613S (zh) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MX2021012686A (es) | 2019-04-17 | 2022-01-06 | Masimo Corp | Sistemas, dispositivos y metodos para monitoreo del paciente. |
USD976242S1 (en) * | 2019-06-03 | 2023-01-24 | Space Exploration Technologies Corp. | Antenna apparatus |
USD971192S1 (en) * | 2019-06-03 | 2022-11-29 | Space Exploration Technologies Corp. | Antenna apparatus |
USD971900S1 (en) * | 2019-06-03 | 2022-12-06 | Space Exploration Technologies Corp. | Antenna apparatus |
USD917704S1 (en) | 2019-08-16 | 2021-04-27 | Masimo Corporation | Patient monitor |
USD919100S1 (en) | 2019-08-16 | 2021-05-11 | Masimo Corporation | Holder for a patient monitor |
USD985498S1 (en) | 2019-08-16 | 2023-05-09 | Masimo Corporation | Connector |
USD927699S1 (en) * | 2019-10-18 | 2021-08-10 | Masimo Corporation | Electrode pad |
JP1659287S (zh) * | 2019-10-18 | 2020-05-11 | ||
TWD206473S (zh) * | 2019-11-29 | 2020-08-11 | 廣達電腦股份有限公司 | 無線聽診器 |
USD986228S1 (en) * | 2020-01-09 | 2023-05-16 | Space Exploration Technologies Corp. | Antenna apparatus |
USD962206S1 (en) * | 2020-01-09 | 2022-08-30 | Space Exploration Technologies Corp. | Antenna apparatus |
USD963623S1 (en) * | 2020-01-09 | 2022-09-13 | Space Exploration Technologies Corp. | Antenna apparatus |
USD962906S1 (en) * | 2020-01-09 | 2022-09-06 | Space Exploration Technologies Corp. | Antenna apparatus |
USD933232S1 (en) | 2020-05-11 | 2021-10-12 | Masimo Corporation | Blood pressure monitor |
USD979516S1 (en) | 2020-05-11 | 2023-02-28 | Masimo Corporation | Connector |
JP1678330S (zh) * | 2020-05-27 | 2021-02-01 | ||
USD962908S1 (en) * | 2020-07-09 | 2022-09-06 | Space Exploration Technologies Corp. | Antenna apparatus |
USD998817S1 (en) * | 2021-02-26 | 2023-09-12 | AnuCell Biosystems Limited | Assembly of bioreactor components |
JP1704964S (ja) * | 2021-04-19 | 2022-01-14 | プラズマ処理装置用サセプタリング | |
JP1700629S (zh) * | 2021-04-26 | 2021-11-29 | ||
TWD222303S (zh) | 2021-05-04 | 2022-12-01 | 南韓商吉佳藍科技股份有限公司 | 花灑頭支撐件 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD411516S (en) * | 1996-03-15 | 1999-06-29 | Tokyo Electron Limited | Gas diffusion plate for electrode of semiconductor wafer processing apparatus |
KR20040070008A (ko) * | 2003-01-29 | 2004-08-06 | 쿄세라 코포레이션 | 정전척 |
US7430104B2 (en) * | 2003-03-11 | 2008-09-30 | Appiled Materials, Inc. | Electrostatic chuck for wafer metrology and inspection equipment |
USD553104S1 (en) * | 2004-04-21 | 2007-10-16 | Tokyo Electron Limited | Absorption board for an electric chuck used in semiconductor manufacture |
USD548705S1 (en) * | 2005-09-29 | 2007-08-14 | Tokyo Electron Limited | Attracting disc for an electrostatic chuck for semiconductor production |
USD593640S1 (en) * | 2008-01-31 | 2009-06-02 | Hansgrohe Ag | Showerhead |
US8206506B2 (en) * | 2008-07-07 | 2012-06-26 | Lam Research Corporation | Showerhead electrode |
USD667561S1 (en) * | 2009-11-13 | 2012-09-18 | 3M Innovative Properties Company | Sample processing disk cover |
USD638550S1 (en) * | 2009-11-13 | 2011-05-24 | 3M Innovative Properties Company | Sample processing disk cover |
USD672050S1 (en) * | 2012-01-13 | 2012-12-04 | Samsung Electronics Co., Ltd. | Disk for a medical testing machine |
JP1545222S (zh) * | 2015-06-10 | 2016-03-07 | ||
JP1545406S (zh) | 2015-06-16 | 2016-03-14 | ||
USD790489S1 (en) * | 2015-07-08 | 2017-06-27 | Ebara Corporation | Vacuum contact pad |
USD787458S1 (en) * | 2015-11-18 | 2017-05-23 | Asm Ip Holding B.V. | Gas supply plate for semiconductor manufacturing apparatus |
TWD178425S (zh) * | 2016-01-08 | 2016-09-21 | Asm知識產權私人控股有限公司 | 用於半導體製造設備的電極板 |
USD793526S1 (en) * | 2016-04-08 | 2017-08-01 | Applied Materials, Inc. | Showerhead for a semiconductor processing chamber |
USD794753S1 (en) * | 2016-04-08 | 2017-08-15 | Applied Materials, Inc. | Showerhead for a semiconductor processing chamber |
USD790039S1 (en) * | 2016-04-08 | 2017-06-20 | Applied Materials, Inc. | Showerhead for a semiconductor processing chamber |
-
2017
- 2017-08-31 JP JPD2017-18889F patent/JP1598996S/ja active Active
-
2018
- 2018-01-30 US US29/635,287 patent/USD868993S1/en active Active
- 2018-01-31 TW TW107300618F patent/TWD193613S/zh unknown
Also Published As
Publication number | Publication date |
---|---|
USD868993S1 (en) | 2019-12-03 |
JP1598996S (zh) | 2018-03-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWD193613S (zh) | Electrode plate for plasma processing device | |
TWD177427S (zh) | 電漿處理裝置用電極板 | |
ES2613044T3 (es) | Aparato dental con lengüetas | |
TWD194248S (zh) | Air jet board for plasma processing equipment | |
TWD210893S (zh) | 用於基板處理腔室的沉積環 | |
TWD193611S (zh) | Electrode plate peripheral ring for plasma processing equipment | |
TWD149063S (zh) | 半導體製造裝置用擋板 | |
TWD205619S (zh) | 檯燈 | |
ES2583167T3 (es) | Módulo de LED y luminaria que comprende dicho módulo | |
TWD205975S (zh) | 可程式化控制器 | |
ES2517419T3 (es) | Artículos adhesivos para dentadura postiza | |
TWD146490S (zh) | 半導體晶圓研磨用彈性膜 | |
TW200745969A (en) | Integrated PUF | |
TWD202287S (zh) | 半導體製造裝置用離子遮蔽板保持具 | |
USD888044S1 (en) | Combined electronic device holder and wall plate | |
AR112041A1 (es) | Unidades de entrega agroquímica de liberación controlada, fabricación y uso de las mismas | |
TWD186915S (zh) | 椅子 | |
TWD203487S (zh) | 遊戲器 | |
TWD194954S (zh) | Elastic film for semiconductor wafer polishing | |
TWD152723S (zh) | 發光二極體模組 | |
TWD178422S (zh) | 電漿處理裝置用電極板之部分 | |
USD737475S1 (en) | Three internal element LED bulb | |
TWD146490S1 (zh) | 半導體晶圓研磨用彈性膜 | |
TWD208352S (zh) | 容器 | |
TWD201932S (zh) | 蛋捲(二) |