JP1678330S - - Google Patents
Info
- Publication number
- JP1678330S JP1678330S JPD2020-10384F JP2020010384F JP1678330S JP 1678330 S JP1678330 S JP 1678330S JP 2020010384 F JP2020010384 F JP 2020010384F JP 1678330 S JP1678330 S JP 1678330S
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2020-10384F JP1678330S (zh) | 2020-05-27 | 2020-05-27 | |
| US29/759,815 USD958401S1 (en) | 2020-05-27 | 2020-11-25 | Ion shield plate for plasma processing device |
| TW109306616F TWD212326S (zh) | 2020-05-27 | 2020-11-26 | 電漿處理裝置用離子遮蔽板 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2020-10384F JP1678330S (zh) | 2020-05-27 | 2020-05-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP1678330S true JP1678330S (zh) | 2021-02-01 |
Family
ID=74312455
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JPD2020-10384F Active JP1678330S (zh) | 2020-05-27 | 2020-05-27 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD958401S1 (zh) |
| JP (1) | JP1678330S (zh) |
| TW (1) | TWD212326S (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD1005245S1 (en) * | 2021-04-19 | 2023-11-21 | Hitachi High-Tech Corporation | Electrode cover for a plasma processing apparatus |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP1700629S (zh) * | 2021-04-26 | 2021-11-29 | ||
| USD997893S1 (en) | 2021-09-28 | 2023-09-05 | Applied Materials, Inc. | Shadow ring lift plate |
| USD997894S1 (en) | 2021-09-28 | 2023-09-05 | Applied Materials, Inc. | Shadow ring lift assembly |
| USD1031079S1 (en) * | 2021-10-07 | 2024-06-11 | iRoma Scents A.B. Ltd. | Multi-chamber canister |
| JP1712507S (zh) | 2021-11-26 | 2022-04-13 | ||
| JP1713113S (zh) | 2021-11-26 | 2022-04-20 | ||
| TWD228949S (zh) | 2022-05-31 | 2023-12-11 | 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 | 基座 |
| USD1030687S1 (en) | 2022-05-31 | 2024-06-11 | Asm Ip Holding B.V. | Susceptor |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD667561S1 (en) * | 2009-11-13 | 2012-09-18 | 3M Innovative Properties Company | Sample processing disk cover |
| USD638951S1 (en) * | 2009-11-13 | 2011-05-31 | 3M Innovative Properties Company | Sample processing disk cover |
| USD638550S1 (en) * | 2009-11-13 | 2011-05-24 | 3M Innovative Properties Company | Sample processing disk cover |
| USD675330S1 (en) * | 2010-07-23 | 2013-01-29 | Apollo Industrial Co., Ltd. | Plate valve for bubble generator |
| US9573086B2 (en) * | 2014-11-03 | 2017-02-21 | Micah Corder | Drain cover |
| USD776295S1 (en) * | 2014-11-04 | 2017-01-10 | Charles River Laboratories, Inc. | Base |
| USD794753S1 (en) * | 2016-04-08 | 2017-08-15 | Applied Materials, Inc. | Showerhead for a semiconductor processing chamber |
| JP1598996S (zh) * | 2017-08-31 | 2018-03-05 | ||
| USD907235S1 (en) * | 2017-09-18 | 2021-01-05 | University Of Hertfordshire Higher Education Corporation | Enclosure for dissolution system |
| USD901714S1 (en) * | 2017-12-05 | 2020-11-10 | Hamamatsu Photonics K.K. | Cover for culture vessel |
| USD877931S1 (en) * | 2018-05-09 | 2020-03-10 | Moleculight, Inc. | Dispenser for a darkening drape |
| JP1624795S (zh) * | 2018-07-24 | 2019-02-18 | ||
| JP1624793S (zh) * | 2018-07-24 | 2019-02-18 | ||
| JP1624794S (zh) * | 2018-07-24 | 2019-02-18 | ||
| JP1640255S (zh) * | 2018-10-25 | 2019-09-02 | ||
| USD927015S1 (en) * | 2019-10-02 | 2021-08-03 | Anthony Joseph Thomas | Skirted petri dish |
-
2020
- 2020-05-27 JP JPD2020-10384F patent/JP1678330S/ja active Active
- 2020-11-25 US US29/759,815 patent/USD958401S1/en active Active
- 2020-11-26 TW TW109306616F patent/TWD212326S/zh unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD1005245S1 (en) * | 2021-04-19 | 2023-11-21 | Hitachi High-Tech Corporation | Electrode cover for a plasma processing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| TWD212326S (zh) | 2021-06-21 |
| USD958401S1 (en) | 2022-07-19 |