USD958401S1 - Ion shield plate for plasma processing device - Google Patents
Ion shield plate for plasma processing device Download PDFInfo
- Publication number
- USD958401S1 USD958401S1 US29/759,815 US202029759815F USD958401S US D958401 S1 USD958401 S1 US D958401S1 US 202029759815 F US202029759815 F US 202029759815F US D958401 S USD958401 S US D958401S
- Authority
- US
- United States
- Prior art keywords
- plasma processing
- shield plate
- processing device
- ion shield
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Description
The broken lines shown in FIGS. 8 and 9 represent the boundary of enlarged view and form no part of the claimed design.
Claims (1)
- The ornamental design for an ion shield plate for plasma processing apparatus, as shown and described.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020-010384D | 2020-05-27 | ||
JPD2020-10384F JP1678330S (en) | 2020-05-27 | 2020-05-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD958401S1 true USD958401S1 (en) | 2022-07-19 |
Family
ID=74312455
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/759,815 Active USD958401S1 (en) | 2020-05-27 | 2020-11-25 | Ion shield plate for plasma processing device |
Country Status (3)
Country | Link |
---|---|
US (1) | USD958401S1 (en) |
JP (1) | JP1678330S (en) |
TW (1) | TWD212326S (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD1005245S1 (en) * | 2021-04-19 | 2023-11-21 | Hitachi High-Tech Corporation | Electrode cover for a plasma processing apparatus |
USD1008986S1 (en) * | 2021-04-26 | 2023-12-26 | Hitachi High-Tech Corporation | Ion shield plate for plasma processing apparatus |
USD1031079S1 (en) * | 2021-10-07 | 2024-06-11 | iRoma Scents A.B. Ltd. | Multi-chamber canister |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD997893S1 (en) | 2021-09-28 | 2023-09-05 | Applied Materials, Inc. | Shadow ring lift plate |
USD997894S1 (en) | 2021-09-28 | 2023-09-05 | Applied Materials, Inc. | Shadow ring lift assembly |
JP1712507S (en) | 2021-11-26 | 2022-04-13 | ||
JP1713113S (en) | 2021-11-26 | 2022-04-20 | ||
TWD228949S (en) | 2022-05-31 | 2023-12-11 | 荷蘭商Asm Ip私人控股有限公司 | Susceptor |
USD1030687S1 (en) | 2022-05-31 | 2024-06-11 | Asm Ip Holding B.V. | Susceptor |
Citations (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD638550S1 (en) * | 2009-11-13 | 2011-05-24 | 3M Innovative Properties Company | Sample processing disk cover |
USD638951S1 (en) * | 2009-11-13 | 2011-05-31 | 3M Innovative Properties Company | Sample processing disk cover |
USD667561S1 (en) * | 2009-11-13 | 2012-09-18 | 3M Innovative Properties Company | Sample processing disk cover |
USD675330S1 (en) * | 2010-07-23 | 2013-01-29 | Apollo Industrial Co., Ltd. | Plate valve for bubble generator |
US20160122995A1 (en) * | 2014-11-03 | 2016-05-05 | Micah Corder | Drain cover |
USD776295S1 (en) * | 2014-11-04 | 2017-01-10 | Charles River Laboratories, Inc. | Base |
USD794753S1 (en) * | 2016-04-08 | 2017-08-15 | Applied Materials, Inc. | Showerhead for a semiconductor processing chamber |
USD868993S1 (en) * | 2017-08-31 | 2019-12-03 | Hitachi High-Technologies Corporation | Electrode plate for a plasma processing apparatus |
USD877931S1 (en) * | 2018-05-09 | 2020-03-10 | Moleculight, Inc. | Dispenser for a darkening drape |
USD891636S1 (en) * | 2018-10-25 | 2020-07-28 | Hitachi High-Tech Corporation | Ring for a plasma processing apparatus |
USD900760S1 (en) * | 2018-07-24 | 2020-11-03 | Hitachi High-Tech Corporation | Ion shield plate for semiconductor manufacturing apparatus |
USD901714S1 (en) * | 2017-12-05 | 2020-11-10 | Hamamatsu Photonics K.K. | Cover for culture vessel |
USD901407S1 (en) * | 2018-07-24 | 2020-11-10 | Hitachi High-Tech Corporation | Integrated type ion shield for semiconductor manufacturing apparatus |
USD907235S1 (en) * | 2017-09-18 | 2021-01-05 | University Of Hertfordshire Higher Education Corporation | Enclosure for dissolution system |
USD924824S1 (en) * | 2018-07-24 | 2021-07-13 | Hitachi High-Tech Corporation | Ion shield plate base for semiconductor manufacturing apparatus |
USD927015S1 (en) * | 2019-10-02 | 2021-08-03 | Anthony Joseph Thomas | Skirted petri dish |
-
2020
- 2020-05-27 JP JPD2020-10384F patent/JP1678330S/ja active Active
- 2020-11-25 US US29/759,815 patent/USD958401S1/en active Active
- 2020-11-26 TW TW109306616F patent/TWD212326S/en unknown
Patent Citations (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD638951S1 (en) * | 2009-11-13 | 2011-05-31 | 3M Innovative Properties Company | Sample processing disk cover |
USD667561S1 (en) * | 2009-11-13 | 2012-09-18 | 3M Innovative Properties Company | Sample processing disk cover |
USD638550S1 (en) * | 2009-11-13 | 2011-05-24 | 3M Innovative Properties Company | Sample processing disk cover |
USD675330S1 (en) * | 2010-07-23 | 2013-01-29 | Apollo Industrial Co., Ltd. | Plate valve for bubble generator |
US20160122995A1 (en) * | 2014-11-03 | 2016-05-05 | Micah Corder | Drain cover |
USD776295S1 (en) * | 2014-11-04 | 2017-01-10 | Charles River Laboratories, Inc. | Base |
USD794753S1 (en) * | 2016-04-08 | 2017-08-15 | Applied Materials, Inc. | Showerhead for a semiconductor processing chamber |
USD868993S1 (en) * | 2017-08-31 | 2019-12-03 | Hitachi High-Technologies Corporation | Electrode plate for a plasma processing apparatus |
USD907235S1 (en) * | 2017-09-18 | 2021-01-05 | University Of Hertfordshire Higher Education Corporation | Enclosure for dissolution system |
USD901714S1 (en) * | 2017-12-05 | 2020-11-10 | Hamamatsu Photonics K.K. | Cover for culture vessel |
USD877931S1 (en) * | 2018-05-09 | 2020-03-10 | Moleculight, Inc. | Dispenser for a darkening drape |
USD900760S1 (en) * | 2018-07-24 | 2020-11-03 | Hitachi High-Tech Corporation | Ion shield plate for semiconductor manufacturing apparatus |
USD901407S1 (en) * | 2018-07-24 | 2020-11-10 | Hitachi High-Tech Corporation | Integrated type ion shield for semiconductor manufacturing apparatus |
USD924824S1 (en) * | 2018-07-24 | 2021-07-13 | Hitachi High-Tech Corporation | Ion shield plate base for semiconductor manufacturing apparatus |
USD891636S1 (en) * | 2018-10-25 | 2020-07-28 | Hitachi High-Tech Corporation | Ring for a plasma processing apparatus |
USD927015S1 (en) * | 2019-10-02 | 2021-08-03 | Anthony Joseph Thomas | Skirted petri dish |
Non-Patent Citations (1)
Title |
---|
Clean your SEM/TEM Samples and TEM Specimen Holders: Evactron® Easy Plasma SoftClean (EPSC). Online, published date unknown. Retrieved on Mar. 28, 2022 from URL: https://www.azom.com/equipment-details.aspx?EquipID=7728. * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD1005245S1 (en) * | 2021-04-19 | 2023-11-21 | Hitachi High-Tech Corporation | Electrode cover for a plasma processing apparatus |
USD1008986S1 (en) * | 2021-04-26 | 2023-12-26 | Hitachi High-Tech Corporation | Ion shield plate for plasma processing apparatus |
USD1031079S1 (en) * | 2021-10-07 | 2024-06-11 | iRoma Scents A.B. Ltd. | Multi-chamber canister |
Also Published As
Publication number | Publication date |
---|---|
TWD212326S (en) | 2021-06-21 |
JP1678330S (en) | 2021-02-01 |
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Legal Events
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FEPP | Fee payment procedure |
Free format text: ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |