USD868995S1 - Gas diffusion plate for a plasma processing apparatus - Google Patents

Description

FIG. 1 is a front, bottom and right side perspective view of a gas diffusion plate for a plasma processing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is a rear elevational view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2;

FIG. 9 is an enlarged view of the portion shown in BOX 9 in FIG. 2; and,

FIG. 10 is an enlarged view of the portion shown in BOX 10 in FIG. 8.

The broken lines show the boundary of enlarged portions and form no part of the claimed design.

Claims (1)

CLAIM
1. The ornamental design for a gas diffusion plate for a plasma processing apparatus, as shown and described.

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