TW551616U - Photoelectric converter - Google Patents
Photoelectric converterInfo
- Publication number
- TW551616U TW551616U TW091217259U TW91217259U TW551616U TW 551616 U TW551616 U TW 551616U TW 091217259 U TW091217259 U TW 091217259U TW 91217259 U TW91217259 U TW 91217259U TW 551616 U TW551616 U TW 551616U
- Authority
- TW
- Taiwan
- Prior art keywords
- photoelectric converter
- photoelectric
- converter
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/1446—Devices controlled by radiation in a repetitive configuration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14603—Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14609—Pixel-elements with integrated switching, control, storage or amplification elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
- H01L27/14658—X-ray, gamma-ray or corpuscular radiation imagers
- H01L27/14659—Direct radiation imagers structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
- H01L27/14658—X-ray, gamma-ray or corpuscular radiation imagers
- H01L27/14663—Indirect radiation imagers, e.g. using luminescent members
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14665—Imagers using a photoconductor layer
- H01L27/14676—X-ray, gamma-ray or corpuscular radiation imagers
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/30—Cameras or camera modules comprising electronic image sensors; Control thereof for generating image signals from X-rays
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/40—Extracting pixel data from image sensors by controlling scanning circuits, e.g. by modifying the number of pixels sampled or to be sampled
- H04N25/41—Extracting pixel data from a plurality of image sensors simultaneously picking up an image, e.g. for increasing the field of view by combining the outputs of a plurality of sensors
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N5/00—Details of television systems
- H04N5/30—Transforming light or analogous information into electric information
- H04N5/32—Transforming X-rays
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1462—Coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
- H01L27/14658—X-ray, gamma-ray or corpuscular radiation imagers
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Light Receiving Elements (AREA)
- Facsimile Heads (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22785295 | 1995-09-05 | ||
JP22785195 | 1995-09-05 | ||
JP23287296A JP3183390B2 (ja) | 1995-09-05 | 1996-09-03 | 光電変換装置及びそれを用いた撮像装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW551616U true TW551616U (en) | 2003-09-01 |
Family
ID=27331329
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW091217259U TW551616U (en) | 1995-09-05 | 1996-09-07 | Photoelectric converter |
Country Status (5)
Country | Link |
---|---|
US (9) | US5914485A (zh) |
EP (4) | EP0762504B1 (zh) |
JP (1) | JP3183390B2 (zh) |
DE (2) | DE69637898D1 (zh) |
TW (1) | TW551616U (zh) |
Families Citing this family (63)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3066944B2 (ja) | 1993-12-27 | 2000-07-17 | キヤノン株式会社 | 光電変換装置、その駆動方法及びそれを有するシステム |
JP3183390B2 (ja) * | 1995-09-05 | 2001-07-09 | キヤノン株式会社 | 光電変換装置及びそれを用いた撮像装置 |
TW331667B (en) * | 1995-09-05 | 1998-05-11 | Canon Kk | Photoelectric converter |
JP4750878B2 (ja) * | 1995-09-05 | 2011-08-17 | キヤノン株式会社 | 光電変換装置及び放射線撮像装置 |
JP4557763B2 (ja) * | 1995-09-05 | 2010-10-06 | キヤノン株式会社 | 光電変換装置及び放射線撮像装置 |
US6448561B1 (en) | 1996-02-26 | 2002-09-10 | Canon Kabushiki Kaisha | Photoelectric conversion apparatus and driving method of the apparatus |
JP3620936B2 (ja) * | 1996-10-11 | 2005-02-16 | 浜松ホトニクス株式会社 | 裏面照射型受光デバイスおよびその製造方法 |
JP3847889B2 (ja) * | 1997-04-08 | 2006-11-22 | キヤノン株式会社 | 光電変換装置 |
JP3805100B2 (ja) * | 1997-04-10 | 2006-08-02 | キヤノン株式会社 | 光電変換装置 |
JP3847918B2 (ja) * | 1997-10-01 | 2006-11-22 | キヤノン株式会社 | 光電変換装置 |
JP3636579B2 (ja) * | 1997-11-04 | 2005-04-06 | キヤノン株式会社 | 光電変換装置、光電変換装置の駆動方法及びその光電変換装置を有するシステム |
JPH11307756A (ja) * | 1998-02-20 | 1999-11-05 | Canon Inc | 光電変換装置および放射線読取装置 |
JP2000046645A (ja) * | 1998-07-31 | 2000-02-18 | Canon Inc | 光電変換装置及びその製造方法及びx線撮像装置 |
EP1049171B1 (en) * | 1998-10-30 | 2005-01-12 | Hamamatsu Photonics K.K. | Solid-state imaging array |
US7129985B1 (en) | 1998-11-24 | 2006-10-31 | Canon Kabushiki Kaisha | Image sensing apparatus arranged on a single substrate |
JP2000184282A (ja) * | 1998-12-15 | 2000-06-30 | Canon Inc | 撮像装置、撮像装置の駆動方法、画像処理方法、情報記録媒体、及び画像処理システム |
US6051867A (en) * | 1999-05-06 | 2000-04-18 | Hewlett-Packard Company | Interlayer dielectric for passivation of an elevated integrated circuit sensor structure |
JP4181703B2 (ja) | 1999-09-02 | 2008-11-19 | キヤノン株式会社 | 光電変換装置 |
JP4621161B2 (ja) * | 2000-05-08 | 2011-01-26 | キヤノン株式会社 | 半導体装置 |
JP3984808B2 (ja) | 2000-09-07 | 2007-10-03 | キヤノン株式会社 | 信号処理装置及びそれを用いた撮像装置並びに放射線撮像システム |
JP4724313B2 (ja) * | 2001-05-18 | 2011-07-13 | キヤノン株式会社 | 撮像装置、放射線撮像装置及びそれを用いた放射線撮像システム |
JP4208491B2 (ja) * | 2002-06-11 | 2009-01-14 | キヤノン株式会社 | 撮像装置及び指紋認識装置 |
JP4109944B2 (ja) * | 2002-09-20 | 2008-07-02 | キヤノン株式会社 | 固体撮像装置の製造方法 |
US20070111014A1 (en) * | 2003-08-01 | 2007-05-17 | Dow Corning Corporation | Silicone based dielectric coatings and films for photovoltaic applications |
EP1542272B1 (en) * | 2003-10-06 | 2016-07-20 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
US7145152B2 (en) * | 2003-10-14 | 2006-12-05 | General Electric Company | Storage capacitor design for a solid state imager |
CN1890811A (zh) * | 2003-12-10 | 2007-01-03 | 皇家飞利浦电子股份有限公司 | X射线探测器 |
JP4455435B2 (ja) * | 2004-08-04 | 2010-04-21 | キヤノン株式会社 | 固体撮像装置及び同固体撮像装置を用いたカメラ |
JP4498149B2 (ja) * | 2005-01-17 | 2010-07-07 | キヤノン株式会社 | 画像読み取り装置 |
JP5197915B2 (ja) * | 2005-06-20 | 2013-05-15 | 浜松ホトニクス株式会社 | イメージセンサ |
JP4142066B2 (ja) * | 2006-06-01 | 2008-08-27 | エプソンイメージングデバイス株式会社 | 電気光学装置および電子機器 |
US20080308585A1 (en) * | 2006-09-27 | 2008-12-18 | John Foley | Nozzle |
US7751863B2 (en) * | 2007-02-06 | 2010-07-06 | Glumetrics, Inc. | Optical determination of ph and glucose |
AU2008213677A1 (en) | 2007-02-06 | 2008-08-14 | Glumetrics, Inc. | Optical systems and methods for rationmetric measurement of blood glucose concentration |
US20090018426A1 (en) * | 2007-05-10 | 2009-01-15 | Glumetrics, Inc. | Device and methods for calibrating analyte sensors |
JP2007288777A (ja) * | 2007-03-27 | 2007-11-01 | Canon Inc | 光電変換装置及びその製造方法並びにx線撮像装置 |
CA2686065A1 (en) * | 2007-05-10 | 2008-11-20 | Glumetrics, Inc. | Equilibrium non-consuming fluorescence sensor for real time intravascular glucose measurement |
JP2008306080A (ja) * | 2007-06-11 | 2008-12-18 | Hitachi Ltd | 光センサ素子、およびこれを用いた光センサ装置、画像表示装置 |
US7495227B2 (en) * | 2007-07-10 | 2009-02-24 | General Electric Company | Digital x-ray detectors |
FR2921756B1 (fr) * | 2007-09-27 | 2009-12-25 | Commissariat Energie Atomique | Matrice de pixels dotes de regulateurs de tension. |
JP4971091B2 (ja) * | 2007-09-27 | 2012-07-11 | 富士フイルム株式会社 | 放射線画像撮影装置 |
KR101393633B1 (ko) * | 2007-10-31 | 2014-05-09 | 삼성디스플레이 주식회사 | 엑스레이 검출 패널, 엑스레이 검출기 및 엑스레이검출기의 구동 방법 |
JP5631215B2 (ja) | 2007-11-21 | 2014-11-26 | メドトロニック ミニメド インコーポレイテッド | 血糖管理維持システム |
WO2009129186A2 (en) * | 2008-04-17 | 2009-10-22 | Glumetrics, Inc. | Sensor for percutaneous intravascular deployment without an indwelling cannula |
JP2009272540A (ja) * | 2008-05-09 | 2009-11-19 | Canon Inc | 電子機器 |
US8124938B1 (en) * | 2008-08-18 | 2012-02-28 | X-Scan Imaging Corporation | Linear X-ray detector with monolithic detector chip including both photodiode array and peripheral circuits spaced apart |
KR101761108B1 (ko) * | 2008-10-03 | 2017-07-25 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 |
EP2483679A4 (en) | 2009-09-30 | 2013-04-24 | Glumetrics Inc | SENSORS WITH THROMORETIC COATINGS |
US8467843B2 (en) * | 2009-11-04 | 2013-06-18 | Glumetrics, Inc. | Optical sensor configuration for ratiometric correction of blood glucose measurement |
US7902512B1 (en) * | 2009-12-04 | 2011-03-08 | Carestream Health, Inc. | Coplanar high fill factor pixel architecture |
US20110152658A1 (en) * | 2009-12-17 | 2011-06-23 | Glumetrics, Inc. | Identification of aberrant measurements of in vivo glucose concentration using temperature |
WO2011145171A1 (ja) * | 2010-05-18 | 2011-11-24 | キヤノン株式会社 | 撮像システム及びその制御方法 |
CN102736095A (zh) * | 2011-03-30 | 2012-10-17 | Ge医疗系统环球技术有限公司 | 用于x射线探测器的成像平板及其模块布置方法 |
US9270904B2 (en) * | 2012-08-28 | 2016-02-23 | General Electric Company | X-ray system and method with digital image acquisition using a photovoltaic device |
CN107789794B (zh) | 2013-09-11 | 2019-07-23 | 赛百斯国际健身器材有限公司 | 锻炼设备 |
FR3013175B1 (fr) * | 2013-11-08 | 2015-11-06 | Trixell | Circuit integre presentant plusieurs blocs identiques identifies |
EP2874187B1 (en) * | 2013-11-15 | 2020-01-01 | Evonik Operations GmbH | Low contact resistance thin film transistor |
WO2015138538A1 (en) | 2014-03-11 | 2015-09-17 | Cybex International, Inc. | Pull down exercise apparatus |
US9457224B2 (en) | 2014-11-11 | 2016-10-04 | Cybex International, Inc. | Exercise apparatus |
JP6731874B2 (ja) * | 2017-03-22 | 2020-07-29 | 富士フイルム株式会社 | 放射線検出器及び放射線画像撮影装置 |
EP3444843B8 (en) * | 2017-08-14 | 2021-03-24 | ams International AG | Assembly for detecting electromagnetic radiation and method of producing an assembly for detecting electromagnetic radiation |
CN110346039A (zh) * | 2018-04-02 | 2019-10-18 | 群创光电股份有限公司 | 光线检测装置及光线检测方法 |
FR3102885B1 (fr) * | 2019-10-31 | 2022-03-18 | Trixell | Capteur photosensible à capteurs élémentaires raboutés |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4376888A (en) | 1978-04-20 | 1983-03-15 | Canon Kabushiki Kaisha | Photoelectric conversion type information processing device |
JPS6223944A (ja) | 1985-07-22 | 1987-01-31 | Nippon Yakin Kogyo Co Ltd | 酸化ニッケル鉱石からフェロニッケルルッペを製造する方法 |
US5306648A (en) | 1986-01-24 | 1994-04-26 | Canon Kabushiki Kaisha | Method of making photoelectric conversion device |
EP0232083B1 (en) | 1986-01-24 | 1995-04-19 | Canon Kabushiki Kaisha | Photoelectric conversion device |
JPS636617A (ja) | 1986-06-26 | 1988-01-12 | Canon Inc | デ−タ処理装置 |
JP2680002B2 (ja) * | 1987-11-14 | 1997-11-19 | キヤノン株式会社 | 光電変換装置 |
JPH01302972A (ja) | 1988-05-31 | 1989-12-06 | Canon Inc | 撮像素子 |
US5233442A (en) * | 1989-06-07 | 1993-08-03 | Canon Kabushiki Kaisha | Photosensor and image reading device with improved correction means for signal correction and image reading method |
JP2929550B2 (ja) * | 1989-06-07 | 1999-08-03 | キヤノン株式会社 | 光センサ及び画像読取装置 |
JP2911519B2 (ja) * | 1990-02-06 | 1999-06-23 | キヤノン株式会社 | 光電変換装置 |
JP2991354B2 (ja) * | 1990-11-07 | 1999-12-20 | キヤノン株式会社 | 画像読取装置およびそれを備えた画像情報処理装置 |
GB9202693D0 (en) * | 1992-02-08 | 1992-03-25 | Philips Electronics Uk Ltd | A method of manufacturing a large area active matrix array |
JP3396039B2 (ja) | 1992-04-20 | 2003-04-14 | オリンパス光学工業株式会社 | 固体撮像装置 |
JPH05316438A (ja) * | 1992-05-11 | 1993-11-26 | Sony Corp | 固体撮像装置 |
JPH06104434A (ja) | 1992-09-18 | 1994-04-15 | Sharp Corp | 薄膜トランジスタ素子,アクティブマトリクス表示装置及びイメージセンサ |
JP3154850B2 (ja) | 1992-12-21 | 2001-04-09 | キヤノン株式会社 | 光電変換装置及びその製造方法 |
US5333690A (en) * | 1992-12-31 | 1994-08-02 | Shell Oil Company | Cementing with blast furnace slag using spacer |
JPH0794697A (ja) | 1993-09-20 | 1995-04-07 | Fuji Xerox Co Ltd | 2次元イメ−ジセンサ |
JP3478612B2 (ja) * | 1993-11-16 | 2003-12-15 | 浜松ホトニクス株式会社 | 半導体デバイス検査システム |
JP3066944B2 (ja) | 1993-12-27 | 2000-07-17 | キヤノン株式会社 | 光電変換装置、その駆動方法及びそれを有するシステム |
JP3183390B2 (ja) * | 1995-09-05 | 2001-07-09 | キヤノン株式会社 | 光電変換装置及びそれを用いた撮像装置 |
US6878977B1 (en) * | 1999-02-25 | 2005-04-12 | Canon Kabushiki Kaisha | Photoelectric conversion device, and image sensor and image input system making use of the same |
JP3992504B2 (ja) * | 2002-02-04 | 2007-10-17 | 富士通株式会社 | Cmosイメージセンサ |
US20070041063A1 (en) * | 2005-08-18 | 2007-02-22 | Matsushita Electric Industrial Co., Ltd. | Image sensor |
JP4968681B2 (ja) * | 2007-07-17 | 2012-07-04 | Nltテクノロジー株式会社 | 半導体回路とそれを用いた表示装置並びにその駆動方法 |
-
1996
- 1996-09-03 JP JP23287296A patent/JP3183390B2/ja not_active Expired - Fee Related
- 1996-09-04 EP EP96114152A patent/EP0762504B1/en not_active Expired - Lifetime
- 1996-09-04 DE DE69637898T patent/DE69637898D1/de not_active Expired - Lifetime
- 1996-09-04 DE DE69637703T patent/DE69637703D1/de not_active Expired - Lifetime
- 1996-09-04 EP EP10184183A patent/EP2317556A3/en not_active Withdrawn
- 1996-09-04 EP EP04028244A patent/EP1511083B1/en not_active Expired - Lifetime
- 1996-09-04 EP EP08152058A patent/EP1930949A3/en not_active Withdrawn
- 1996-09-05 US US08/708,490 patent/US5914485A/en not_active Expired - Lifetime
- 1996-09-07 TW TW091217259U patent/TW551616U/zh not_active IP Right Cessation
-
1999
- 1999-05-12 US US09/310,122 patent/US6297493B1/en not_active Expired - Lifetime
-
2001
- 2001-05-14 US US09/853,683 patent/US6664527B2/en not_active Expired - Fee Related
-
2003
- 2003-11-10 US US10/703,513 patent/US7170042B2/en not_active Expired - Fee Related
-
2007
- 2007-01-12 US US11/622,971 patent/US7285765B2/en not_active Expired - Fee Related
- 2007-08-24 US US11/844,839 patent/US7381938B2/en not_active Expired - Fee Related
-
2008
- 2008-04-16 US US12/104,287 patent/US7635835B2/en not_active Expired - Fee Related
-
2009
- 2009-12-16 US US12/639,372 patent/US7915573B2/en not_active Expired - Fee Related
-
2011
- 2011-02-25 US US13/035,589 patent/US8274033B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20080224058A1 (en) | 2008-09-18 |
DE69637898D1 (de) | 2009-05-20 |
US7170042B2 (en) | 2007-01-30 |
EP1511083A3 (en) | 2007-03-14 |
US5914485A (en) | 1999-06-22 |
US20070114363A1 (en) | 2007-05-24 |
US20100108899A1 (en) | 2010-05-06 |
JPH09135013A (ja) | 1997-05-20 |
US20010025916A1 (en) | 2001-10-04 |
EP1511083B1 (en) | 2009-04-08 |
EP1930949A3 (en) | 2011-10-12 |
US7635835B2 (en) | 2009-12-22 |
US7381938B2 (en) | 2008-06-03 |
EP2317556A2 (en) | 2011-05-04 |
EP1930949A2 (en) | 2008-06-11 |
US20040108463A1 (en) | 2004-06-10 |
US7285765B2 (en) | 2007-10-23 |
EP1511083A2 (en) | 2005-03-02 |
JP3183390B2 (ja) | 2001-07-09 |
EP0762504A2 (en) | 1997-03-12 |
US20110147598A1 (en) | 2011-06-23 |
US6664527B2 (en) | 2003-12-16 |
US7915573B2 (en) | 2011-03-29 |
EP0762504A3 (en) | 1998-09-16 |
DE69637703D1 (de) | 2008-11-20 |
EP2317556A3 (en) | 2011-06-08 |
US20080001091A1 (en) | 2008-01-03 |
US8274033B2 (en) | 2012-09-25 |
EP0762504B1 (en) | 2008-10-08 |
US6297493B1 (en) | 2001-10-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4K | Issue of patent certificate for granted utility model filed before june 30, 2004 | ||
MM4K | Annulment or lapse of a utility model due to non-payment of fees |