TW546254B - High-purity fluorine gas, production and use thereof, and method for analyzing trace impurities in high-purity - Google Patents
High-purity fluorine gas, production and use thereof, and method for analyzing trace impurities in high-purity Download PDFInfo
- Publication number
- TW546254B TW546254B TW091114435A TW91114435A TW546254B TW 546254 B TW546254 B TW 546254B TW 091114435 A TW091114435 A TW 091114435A TW 91114435 A TW91114435 A TW 91114435A TW 546254 B TW546254 B TW 546254B
- Authority
- TW
- Taiwan
- Prior art keywords
- fluorine gas
- gas
- fluorine
- nickel
- container
- Prior art date
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- 239000011737 fluorine Substances 0.000 title claims abstract description 391
- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 391
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 388
- 239000012535 impurity Substances 0.000 title claims abstract description 82
- 238000000034 method Methods 0.000 title claims description 68
- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 239000007789 gas Substances 0.000 claims abstract description 412
- -1 fluoronickel compound Chemical class 0.000 claims abstract description 65
- 238000010438 heat treatment Methods 0.000 claims abstract description 45
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims abstract description 21
- 238000004817 gas chromatography Methods 0.000 claims abstract description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 57
- 238000011049 filling Methods 0.000 claims description 42
- 238000004458 analytical method Methods 0.000 claims description 41
- 239000007769 metal material Substances 0.000 claims description 36
- MEIDRGPPJVWRKW-UHFFFAOYSA-N [F].[Ni] Chemical compound [F].[Ni] MEIDRGPPJVWRKW-UHFFFAOYSA-N 0.000 claims description 28
- 229910052759 nickel Inorganic materials 0.000 claims description 28
- 230000002079 cooperative effect Effects 0.000 claims description 24
- 238000001179 sorption measurement Methods 0.000 claims description 22
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 16
- 150000002816 nickel compounds Chemical class 0.000 claims description 15
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 13
- 239000011248 coating agent Substances 0.000 claims description 12
- 238000000576 coating method Methods 0.000 claims description 12
- 238000003682 fluorination reaction Methods 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- XIKYYQJBTPYKSG-UHFFFAOYSA-N nickel Chemical compound [Ni].[Ni] XIKYYQJBTPYKSG-UHFFFAOYSA-N 0.000 claims description 7
- 229910052700 potassium Inorganic materials 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 239000001569 carbon dioxide Substances 0.000 claims description 4
- 239000011261 inert gas Substances 0.000 claims description 4
- 229910001507 metal halide Inorganic materials 0.000 claims description 4
- 150000005309 metal halides Chemical class 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 2
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical group [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 2
- 229910001634 calcium fluoride Inorganic materials 0.000 claims description 2
- 229910052734 helium Inorganic materials 0.000 claims description 2
- 229910052743 krypton Inorganic materials 0.000 claims description 2
- 229910052754 neon Inorganic materials 0.000 claims description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 claims 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims 1
- 229910052702 rhenium Inorganic materials 0.000 claims 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 abstract description 4
- 239000003795 chemical substances by application Substances 0.000 description 21
- 238000000926 separation method Methods 0.000 description 19
- 238000003860 storage Methods 0.000 description 15
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 14
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 8
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 8
- 239000002994 raw material Substances 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000011775 sodium fluoride Substances 0.000 description 7
- 235000013024 sodium fluoride Nutrition 0.000 description 7
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 6
- 238000003795 desorption Methods 0.000 description 6
- 229910001882 dioxygen Inorganic materials 0.000 description 6
- 229910004014 SiF4 Inorganic materials 0.000 description 5
- 230000006837 decompression Effects 0.000 description 5
- 229910001510 metal chloride Inorganic materials 0.000 description 5
- 229910001512 metal fluoride Inorganic materials 0.000 description 5
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 3
- 238000004566 IR spectroscopy Methods 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 150000002221 fluorine Chemical class 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 229910000792 Monel Inorganic materials 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000001354 calcination Methods 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 238000004587 chromatography analysis Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000001784 detoxification Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- 235000012054 meals Nutrition 0.000 description 2
- 239000002808 molecular sieve Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- DBJLJFTWODWSOF-UHFFFAOYSA-L nickel(ii) fluoride Chemical compound F[Ni]F DBJLJFTWODWSOF-UHFFFAOYSA-L 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000004445 quantitative analysis Methods 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 2
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 229910021582 Cobalt(II) fluoride Inorganic materials 0.000 description 1
- 229910021583 Cobalt(III) fluoride Inorganic materials 0.000 description 1
- 229910000934 Monel 400 Inorganic materials 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- SKYGTJFKXUWZMD-UHFFFAOYSA-N ac1l2n4h Chemical compound [Co].[Co] SKYGTJFKXUWZMD-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 230000003466 anti-cipated effect Effects 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- YCYBZKSMUPTWEE-UHFFFAOYSA-L cobalt(ii) fluoride Chemical compound F[Co]F YCYBZKSMUPTWEE-UHFFFAOYSA-L 0.000 description 1
- WZJQNLGQTOCWDS-UHFFFAOYSA-K cobalt(iii) fluoride Chemical compound F[Co](F)F WZJQNLGQTOCWDS-UHFFFAOYSA-K 0.000 description 1
- OANFWJQPUHQWDL-UHFFFAOYSA-N copper iron manganese nickel Chemical compound [Mn].[Fe].[Ni].[Cu] OANFWJQPUHQWDL-UHFFFAOYSA-N 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 239000011363 dried mixture Substances 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000004868 gas analysis Methods 0.000 description 1
- FVIZARNDLVOMSU-UHFFFAOYSA-N ginsenoside K Natural products C1CC(C2(CCC3C(C)(C)C(O)CCC3(C)C2CC2O)C)(C)C2C1C(C)(CCC=C(C)C)OC1OC(CO)C(O)C(O)C1O FVIZARNDLVOMSU-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011403 purification operation Methods 0.000 description 1
- 230000036632 reaction speed Effects 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- DNYWZCXLKNTFFI-UHFFFAOYSA-N uranium Chemical compound [U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U][U] DNYWZCXLKNTFFI-UHFFFAOYSA-N 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 238000003221 volumetric titration Methods 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B7/00—Halogens; Halogen acids
- C01B7/19—Fluorine; Hydrogen fluoride
- C01B7/20—Fluorine
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/03—Cuvette constructions
- G01N21/0303—Optical path conditioning in cuvettes, e.g. windows; adapted optical elements or systems; path modifying or adjustment
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/03—Cuvette constructions
- G01N21/09—Cuvette constructions adapted to resist hostile environments or corrosive or abrasive materials
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
- G01N30/02—Column chromatography
- G01N30/04—Preparation or injection of sample to be analysed
- G01N30/06—Preparation
- G01N30/14—Preparation by elimination of some components
- G01N2030/143—Preparation by elimination of some components selective absorption
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T436/00—Chemistry: analytical and immunological testing
- Y10T436/19—Halogen containing
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Chemistry (AREA)
- Electromagnetism (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Sampling And Sample Adjustment (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001199731A JP4744017B2 (ja) | 2001-06-29 | 2001-06-29 | 高純度フッ素ガス中の微量不純物の分析方法 |
| JP2001199437 | 2001-06-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW546254B true TW546254B (en) | 2003-08-11 |
Family
ID=29738262
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW091114435A TW546254B (en) | 2001-06-29 | 2002-06-28 | High-purity fluorine gas, production and use thereof, and method for analyzing trace impurities in high-purity |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6955801B2 (fr) |
| EP (1) | EP1399382B1 (fr) |
| KR (2) | KR100633870B1 (fr) |
| CN (1) | CN1639058A (fr) |
| AT (1) | ATE505434T1 (fr) |
| DE (1) | DE60239740D1 (fr) |
| TW (1) | TW546254B (fr) |
| WO (1) | WO2003002454A2 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI385121B (zh) * | 2004-09-24 | 2013-02-11 | Showa Denko Kk | Production method of fluorine gas |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090001524A1 (en) * | 2001-11-26 | 2009-01-01 | Siegele Stephen H | Generation and distribution of a fluorine gas |
| US20040037768A1 (en) * | 2001-11-26 | 2004-02-26 | Robert Jackson | Method and system for on-site generation and distribution of a process gas |
| US20030121796A1 (en) * | 2001-11-26 | 2003-07-03 | Siegele Stephen H | Generation and distribution of molecular fluorine within a fabrication facility |
| US20050006248A1 (en) * | 2001-12-17 | 2005-01-13 | Toyo Tanso Co., Ltd. | Apparatus for generating f2 gas method for generating f2 gas and f2 gas |
| US7638006B2 (en) * | 2004-08-23 | 2009-12-29 | Lockheed Martin Corporation | Method of generating fluorine gas using coruscative reaction |
| US7498171B2 (en) * | 2002-04-12 | 2009-03-03 | Anthrogenesis Corporation | Modulation of stem and progenitor cell differentiation, assays, and uses thereof |
| JP4440546B2 (ja) * | 2003-01-10 | 2010-03-24 | レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード | ガス供給ライン構造 |
| EP1807354B1 (fr) * | 2004-09-10 | 2008-11-12 | Showa Denko Kabushiki Kaisha | Procédé de production de fluorure de manganèse |
| US7163036B2 (en) * | 2004-12-22 | 2007-01-16 | The Boc Group Plc | Method of supplying fluorine |
| JP4642602B2 (ja) * | 2005-08-24 | 2011-03-02 | 昭和電工株式会社 | フッ素ガス中の含有ガス成分の定量分析方法およびこれに用いる装置 |
| KR100836188B1 (ko) * | 2006-09-28 | 2008-06-09 | 포항공과대학교 산학협력단 | 가스 크로마토그래프 자동 제어 장치와 데이터 통합 분석프로그램 및 데이터 통합 분석 방법 |
| US8323364B2 (en) * | 2007-07-31 | 2012-12-04 | Purdue Research Foundation | Control system for an on-demand gas generator |
| CN102574682A (zh) * | 2009-10-16 | 2012-07-11 | 苏威氟有限公司 | 高纯度氟气、其生产和用途、以及用于监测氟气中杂质的方法 |
| WO2011108382A1 (fr) * | 2010-03-05 | 2011-09-09 | Semiconductor Energy Laboratory Co., Ltd. | Procédé de fabrication d'un dispositif à semi-conducteur |
| CN101799458B (zh) * | 2010-03-25 | 2013-06-19 | 广东电网公司电力科学研究院 | 一种分析电气设备中的sf6的分解产物的方法 |
| KR101866580B1 (ko) * | 2010-04-08 | 2018-06-11 | 솔베이(소시에떼아노님) | 정제된 불소를 이용한 전자장치의 제조 방법 |
| TWI586842B (zh) * | 2010-09-15 | 2017-06-11 | 首威公司 | 氟之製造工廠及使用彼之方法 |
| JP5370319B2 (ja) * | 2010-09-16 | 2013-12-18 | 株式会社島津製作所 | 赤外線吸収式ガス分析計 |
| CN105510503A (zh) * | 2015-12-31 | 2016-04-20 | 上海正帆科技股份有限公司 | 一种电子级氯气的分析装置和方法 |
| CN105784863A (zh) * | 2016-03-09 | 2016-07-20 | 广东华特气体股份有限公司 | 一种有毒有害气体的分析系统及使用方法 |
| CN107337180B (zh) * | 2017-07-10 | 2019-08-23 | 洛阳森蓝化工材料科技有限公司 | 一种纯化氟气的填料及其制备方法和应用 |
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Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3989808A (en) * | 1975-07-28 | 1976-11-02 | The United States Of America As Represented By The United States Energy Research And Development Administration | Method of preparing pure fluorine gas |
| US4292287A (en) * | 1980-04-24 | 1981-09-29 | The United States Of America As Represented By The United States Department Of Energy | Method for directly recovering fluorine from gas streams |
| US4711680A (en) * | 1983-05-23 | 1987-12-08 | Rockwell International Corporation | Pure fluorine gas generator |
| IT1229210B (it) * | 1988-03-31 | 1991-07-25 | Central Glass Co Ltd | Metodo e dispositivo per analizzare gas contenenti fluoro. |
| DE4002436A1 (de) | 1990-01-27 | 1991-08-01 | Man Technologie Gmbh | Gaskuevette fuer materialanalysen |
| GB9011535D0 (en) * | 1990-05-23 | 1990-07-11 | Oxford Lasers Ltd | Gas management system |
| DE4206803C2 (de) * | 1992-03-04 | 1994-02-10 | Lambda Physik Gmbh | Verfahren zum Nachfüllen von Halogengas in das Gasreservoir eines Excimer-Lasers |
| JP3339962B2 (ja) | 1994-04-18 | 2002-10-28 | 関東電化工業株式会社 | フッ素ガス中の不純物ガスの分析方法およびその装置 |
| DE19618119C2 (de) | 1995-05-12 | 2003-02-13 | Lambda Physik Ag | Verfahren zum Regeln der Energie von Strahlungspulsen eines Excimerlasers |
| US6280597B1 (en) * | 1997-09-12 | 2001-08-28 | Showa Denko K.K. | Fluorinated metal having a fluorinated layer and process for its production |
| JP3094000B2 (ja) | 1997-09-12 | 2000-10-03 | 昭和電工株式会社 | フッ化表面層を有する金属材料もしくは金属皮膜ならびにフッ化方法 |
| JPH11326160A (ja) | 1998-05-13 | 1999-11-26 | L'air Liquide | 反応性フッ素系ガスのサンプリング装置及び方法 |
| JP2001007423A (ja) | 1999-06-24 | 2001-01-12 | Showa Denko Kk | フッ素ガスの供給方法および供給装置 |
| US6609540B1 (en) * | 1999-06-24 | 2003-08-26 | Showa Denko Kabushiki Kaisha | Method and apparatus for supplying fluorine gas |
-
2002
- 2002-06-27 DE DE60239740T patent/DE60239740D1/de not_active Expired - Lifetime
- 2002-06-27 KR KR1020037002972A patent/KR100633870B1/ko not_active IP Right Cessation
- 2002-06-27 CN CNA028022432A patent/CN1639058A/zh active Pending
- 2002-06-27 KR KR1020057006386A patent/KR100633872B1/ko not_active IP Right Cessation
- 2002-06-27 EP EP02738834A patent/EP1399382B1/fr not_active Expired - Lifetime
- 2002-06-27 WO PCT/JP2002/006519 patent/WO2003002454A2/fr not_active Application Discontinuation
- 2002-06-27 AT AT02738834T patent/ATE505434T1/de not_active IP Right Cessation
- 2002-06-27 US US10/362,876 patent/US6955801B2/en not_active Expired - Fee Related
- 2002-06-28 TW TW091114435A patent/TW546254B/zh active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI385121B (zh) * | 2004-09-24 | 2013-02-11 | Showa Denko Kk | Production method of fluorine gas |
Also Published As
| Publication number | Publication date |
|---|---|
| US6955801B2 (en) | 2005-10-18 |
| WO2003002454A2 (fr) | 2003-01-09 |
| KR100633870B1 (ko) | 2006-10-13 |
| ATE505434T1 (de) | 2011-04-15 |
| KR20050040947A (ko) | 2005-05-03 |
| WO2003002454A3 (fr) | 2003-05-30 |
| DE60239740D1 (de) | 2011-05-26 |
| KR20040014989A (ko) | 2004-02-18 |
| EP1399382A2 (fr) | 2004-03-24 |
| CN1639058A (zh) | 2005-07-13 |
| KR100633872B1 (ko) | 2006-10-16 |
| US20040028600A1 (en) | 2004-02-12 |
| EP1399382B1 (fr) | 2011-04-13 |
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