IT1229210B - Metodo e dispositivo per analizzare gas contenenti fluoro. - Google Patents

Metodo e dispositivo per analizzare gas contenenti fluoro.

Info

Publication number
IT1229210B
IT1229210B IT8919907A IT1990789A IT1229210B IT 1229210 B IT1229210 B IT 1229210B IT 8919907 A IT8919907 A IT 8919907A IT 1990789 A IT1990789 A IT 1990789A IT 1229210 B IT1229210 B IT 1229210B
Authority
IT
Italy
Prior art keywords
containing fluorine
gases containing
analyzing gases
analyzing
fluorine
Prior art date
Application number
IT8919907A
Other languages
English (en)
Other versions
IT8919907A0 (it
Inventor
Kohzo Hakuta
Takashi Suenaga
Hisaji Nakano
Minoru Aramaki
Mitsuo Kodama
Shinsuke Nakagawa
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP31765888A external-priority patent/JPH0797106B2/ja
Priority claimed from JP33011588A external-priority patent/JPH0718862B2/ja
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Publication of IT8919907A0 publication Critical patent/IT8919907A0/it
Application granted granted Critical
Publication of IT1229210B publication Critical patent/IT1229210B/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/104—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N31/00—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
    • G01N31/005—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods investigating the presence of an element by oxidation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/0004—Gaseous mixtures, e.g. polluted air
    • G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
    • G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
    • G01N33/0036—General constructional details of gas analysers, e.g. portable test equipment concerning the detector specially adapted to detect a particular component
    • G01N33/0052—Gaseous halogens
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T436/00—Chemistry: analytical and immunological testing
    • Y10T436/12—Condition responsive control
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T436/00—Chemistry: analytical and immunological testing
    • Y10T436/19—Halogen containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T436/00—Chemistry: analytical and immunological testing
    • Y10T436/20—Oxygen containing
    • Y10T436/204998—Inorganic carbon compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T436/00—Chemistry: analytical and immunological testing
    • Y10T436/20—Oxygen containing
    • Y10T436/207497—Molecular oxygen

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Combustion & Propulsion (AREA)
  • Food Science & Technology (AREA)
  • Medicinal Chemistry (AREA)
  • Molecular Biology (AREA)
  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
IT8919907A 1988-03-31 1989-03-24 Metodo e dispositivo per analizzare gas contenenti fluoro. IT1229210B (it)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP7908888 1988-03-31
JP31765888A JPH0797106B2 (ja) 1988-12-16 1988-12-16 含フッ素ガス成分濃度測定方法およびその装置
JP33011588A JPH0718862B2 (ja) 1988-03-31 1988-12-27 フッ素濃度測定方法およびその装置

Publications (2)

Publication Number Publication Date
IT8919907A0 IT8919907A0 (it) 1989-03-24
IT1229210B true IT1229210B (it) 1991-07-25

Family

ID=27302920

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8919907A IT1229210B (it) 1988-03-31 1989-03-24 Metodo e dispositivo per analizzare gas contenenti fluoro.

Country Status (5)

Country Link
US (2) US5017499A (it)
DE (1) DE3910345A1 (it)
FR (1) FR2627863B1 (it)
GB (1) GB2217842B (it)
IT (1) IT1229210B (it)

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IT1229210B (it) * 1988-03-31 1991-07-25 Central Glass Co Ltd Metodo e dispositivo per analizzare gas contenenti fluoro.
JPH02112292A (ja) * 1988-10-20 1990-04-24 Mitsubishi Electric Corp ハロゲンガスレーザのガス制御装置
GB8927209D0 (en) * 1989-12-01 1990-01-31 British Aerospace Apparatus for controlling the composition of a laser gas or gas mixture
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JP3815578B2 (ja) * 1996-07-19 2006-08-30 忠弘 大見 エキシマレーザー発振装置
US6282013B1 (en) 1997-04-30 2001-08-28 Lasermed, Inc. System for curing polymeric materials, such as those used in dentistry, and for tailoring the post-cure properties of polymeric materials through the use of light source power modulation
US6008264A (en) 1997-04-30 1999-12-28 Laser Med, Inc. Method for curing polymeric materials, such as those used in dentistry, and for tailoring the post-cure properties of polymeric materials through the use of light source power modulation
WO1999021505A1 (en) 1997-10-29 1999-05-06 Bisco, Inc. Dental composite light curing system
US6116900A (en) * 1997-11-17 2000-09-12 Lumachem, Inc. Binary energizer and peroxide delivery system for dental bleaching
US6200134B1 (en) 1998-01-20 2001-03-13 Kerr Corporation Apparatus and method for curing materials with radiation
US6240117B1 (en) 1998-01-30 2001-05-29 Cymer, Inc. Fluorine control system with fluorine monitor
WO1999039414A1 (en) * 1998-01-30 1999-08-05 Cymer, Inc. Fluorine control system with fluorine monitor
US5978406A (en) * 1998-01-30 1999-11-02 Cymer, Inc. Fluorine control system for excimer lasers
US6526085B2 (en) * 1998-10-05 2003-02-25 Lambda Physik Ag Performance control system and method for gas discharge lasers
US6490307B1 (en) 1999-03-17 2002-12-03 Lambda Physik Ag Method and procedure to automatically stabilize excimer laser output parameters
US6212214B1 (en) * 1998-10-05 2001-04-03 Lambda Physik Ag Performance control system and method for gas discharge lasers
DE19942455A1 (de) 1998-10-05 2000-04-06 Lambda Physik Gmbh Leistungssteuersystem und -verfahren für Gasentladungslaser
US6804285B2 (en) 1998-10-29 2004-10-12 Canon Kabushiki Kaisha Gas supply path structure for a gas laser
US6389052B2 (en) 1999-03-17 2002-05-14 Lambda Physik Ag Laser gas replenishment method
US6965624B2 (en) * 1999-03-17 2005-11-15 Lambda Physik Ag Laser gas replenishment method
US6727731B1 (en) 1999-03-12 2004-04-27 Lambda Physik Ag Energy control for an excimer or molecular fluorine laser
US6243406B1 (en) 1999-03-12 2001-06-05 Peter Heist Gas performance control system for gas discharge lasers
US6714577B1 (en) 1999-03-17 2004-03-30 Lambda Physik Ag Energy stabilized gas discharge laser
JP3377183B2 (ja) * 1999-04-09 2003-02-17 セントラル硝子株式会社 Ｎｆ３の処理方法
US6157661A (en) * 1999-05-12 2000-12-05 Laserphysics, Inc. System for producing a pulsed, varied and modulated laser output
US7179653B2 (en) * 2000-03-31 2007-02-20 Showa Denko K.K. Measuring method for concentration of halogen and fluorine compound, measuring equipment thereof and manufacturing method of halogen compound
US6721345B2 (en) 2000-07-14 2004-04-13 Lambda Physik Ag Electrostatic precipitator corona discharge ignition voltage probe for gas status detection and control system for gas discharge lasers
ATE505434T1 (de) * 2001-06-29 2011-04-15 Showa Denko Kk Herstellung eines hochreinen fluorgases und methode zur analyse von spuren in einem hochreinen fluorgas
JP2003021619A (ja) * 2001-07-05 2003-01-24 Canon Inc 蛍石及びその分析法、製造法、光学特性評価法
US7830934B2 (en) * 2001-08-29 2010-11-09 Cymer, Inc. Multi-chamber gas discharge laser bandwidth control through discharge timing
US7209507B2 (en) * 2003-07-30 2007-04-24 Cymer, Inc. Method and apparatus for controlling the output of a gas discharge MOPA laser system
US7317179B2 (en) * 2005-10-28 2008-01-08 Cymer, Inc. Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate
US7679029B2 (en) * 2005-10-28 2010-03-16 Cymer, Inc. Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
US9072572B2 (en) 2009-04-02 2015-07-07 Kerr Corporation Dental light device
US9066777B2 (en) 2009-04-02 2015-06-30 Kerr Corporation Curing light device
US8444935B2 (en) * 2009-06-12 2013-05-21 Bose Corporation Multiple-specimen device testing with particle measurement
WO2011045338A1 (en) * 2009-10-16 2011-04-21 Solvay Fluor Gmbh High-purity fluorine gas, the production and use thereof, and a method for monitoring impurities in a fluorine gas
CN105353057B (zh) * 2015-12-17 2017-02-01 中国原子能科学研究院 一种用于在线分析Ne中微量He、H2和杂质组分的气相色谱检测系统及方法
CN106896179B (zh) * 2015-12-21 2019-01-22 中昊晨光化工研究院有限公司 一种氟化工行业的环境在线监测系统和在线监测方法
CN105548075A (zh) * 2016-01-08 2016-05-04 楚天科技股份有限公司 一种玻璃药瓶内氧气含量的检测装置与方法
KR102366148B1 (ko) * 2017-09-25 2022-02-23 사이머 엘엘씨 가스 방전 광원에서의 불소 검출 방법
CN108287157A (zh) * 2017-12-29 2018-07-17 和立气体（上海）有限公司 一种氟气分析转化装置
TWI770568B (zh) * 2019-08-29 2022-07-11 美商希瑪有限責任公司 氣體放電光源中之氟偵測
JP7511744B2 (ja) * 2020-09-10 2024-07-05 サイマー リミテッド ライアビリティ カンパニー フッ素測定装置及びフッ素測定方法
CN113917075A (zh) * 2021-09-14 2022-01-11 苏州金宏气体股份有限公司 含氟混合气体中氟含量测试装置及方法
CN114813448A (zh) * 2022-04-18 2022-07-29 浙江博瑞中硝科技有限公司 一种氟氮混合气中氟含量自动化测试的方法

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IT1229210B (it) * 1988-03-31 1991-07-25 Central Glass Co Ltd Metodo e dispositivo per analizzare gas contenenti fluoro.

Also Published As

Publication number Publication date
GB2217842B (en) 1991-10-09
GB2217842A (en) 1989-11-01
FR2627863A1 (fr) 1989-09-01
DE3910345C2 (it) 1991-04-18
IT8919907A0 (it) 1989-03-24
GB8907052D0 (en) 1989-05-10
FR2627863B1 (fr) 1991-05-24
US5017499A (en) 1991-05-21
DE3910345A1 (de) 1989-10-26
US5149659A (en) 1992-09-22

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Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19940331