FR2627863B1 - Procede et dispositif pour l'analyse de gaz contenant du fluor et pour controler la concentration en fluor dans un gaz de laser excimeur - Google Patents

Procede et dispositif pour l'analyse de gaz contenant du fluor et pour controler la concentration en fluor dans un gaz de laser excimeur

Info

Publication number
FR2627863B1
FR2627863B1 FR898904165A FR8904165A FR2627863B1 FR 2627863 B1 FR2627863 B1 FR 2627863B1 FR 898904165 A FR898904165 A FR 898904165A FR 8904165 A FR8904165 A FR 8904165A FR 2627863 B1 FR2627863 B1 FR 2627863B1
Authority
FR
France
Prior art keywords
fluorine
excime
analysis
concentration
controlling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR898904165A
Other languages
English (en)
Other versions
FR2627863A1 (fr
Inventor
Kohzo Hakuta
Minoru Aramaki
Takashi Suenaga
Mitsuo Kodama
Hisaji Nakano
Shinsuke Nakagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP31765888A external-priority patent/JPH0797106B2/ja
Priority claimed from JP33011588A external-priority patent/JPH0718862B2/ja
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Publication of FR2627863A1 publication Critical patent/FR2627863A1/fr
Application granted granted Critical
Publication of FR2627863B1 publication Critical patent/FR2627863B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/104—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N31/00—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
    • G01N31/005—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods investigating the presence of an element by oxidation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/0004—Gaseous mixtures, e.g. polluted air
    • G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
    • G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
    • G01N33/0036—General constructional details of gas analysers, e.g. portable test equipment concerning the detector specially adapted to detect a particular component
    • G01N33/0052—Gaseous halogens
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T436/00—Chemistry: analytical and immunological testing
    • Y10T436/12—Condition responsive control
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T436/00—Chemistry: analytical and immunological testing
    • Y10T436/19—Halogen containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T436/00—Chemistry: analytical and immunological testing
    • Y10T436/20—Oxygen containing
    • Y10T436/204998—Inorganic carbon compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T436/00—Chemistry: analytical and immunological testing
    • Y10T436/20—Oxygen containing
    • Y10T436/207497—Molecular oxygen

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Medicinal Chemistry (AREA)
  • Food Science & Technology (AREA)
  • Combustion & Propulsion (AREA)
  • Molecular Biology (AREA)
  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
FR898904165A 1988-03-31 1989-03-30 Procede et dispositif pour l'analyse de gaz contenant du fluor et pour controler la concentration en fluor dans un gaz de laser excimeur Expired - Fee Related FR2627863B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP7908888 1988-03-31
JP31765888A JPH0797106B2 (ja) 1988-12-16 1988-12-16 含フッ素ガス成分濃度測定方法およびその装置
JP33011588A JPH0718862B2 (ja) 1988-03-31 1988-12-27 フッ素濃度測定方法およびその装置

Publications (2)

Publication Number Publication Date
FR2627863A1 FR2627863A1 (fr) 1989-09-01
FR2627863B1 true FR2627863B1 (fr) 1991-05-24

Family

ID=27302920

Family Applications (1)

Application Number Title Priority Date Filing Date
FR898904165A Expired - Fee Related FR2627863B1 (fr) 1988-03-31 1989-03-30 Procede et dispositif pour l'analyse de gaz contenant du fluor et pour controler la concentration en fluor dans un gaz de laser excimeur

Country Status (5)

Country Link
US (2) US5017499A (fr)
DE (1) DE3910345A1 (fr)
FR (1) FR2627863B1 (fr)
GB (1) GB2217842B (fr)
IT (1) IT1229210B (fr)

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US6008264A (en) 1997-04-30 1999-12-28 Laser Med, Inc. Method for curing polymeric materials, such as those used in dentistry, and for tailoring the post-cure properties of polymeric materials through the use of light source power modulation
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US6116900A (en) * 1997-11-17 2000-09-12 Lumachem, Inc. Binary energizer and peroxide delivery system for dental bleaching
US6200134B1 (en) 1998-01-20 2001-03-13 Kerr Corporation Apparatus and method for curing materials with radiation
JP3880314B2 (ja) * 1998-01-30 2007-02-14 サイマー， インコーポレイテッド フッ素モニターを有するフッ素制御システム
US5978406A (en) * 1998-01-30 1999-11-02 Cymer, Inc. Fluorine control system for excimer lasers
US6240117B1 (en) 1998-01-30 2001-05-29 Cymer, Inc. Fluorine control system with fluorine monitor
US6490307B1 (en) 1999-03-17 2002-12-03 Lambda Physik Ag Method and procedure to automatically stabilize excimer laser output parameters
US6212214B1 (en) * 1998-10-05 2001-04-03 Lambda Physik Ag Performance control system and method for gas discharge lasers
US6526085B2 (en) * 1998-10-05 2003-02-25 Lambda Physik Ag Performance control system and method for gas discharge lasers
DE19942455A1 (de) 1998-10-05 2000-04-06 Lambda Physik Gmbh Leistungssteuersystem und -verfahren für Gasentladungslaser
US6804285B2 (en) 1998-10-29 2004-10-12 Canon Kabushiki Kaisha Gas supply path structure for a gas laser
US6389052B2 (en) 1999-03-17 2002-05-14 Lambda Physik Ag Laser gas replenishment method
US6965624B2 (en) * 1999-03-17 2005-11-15 Lambda Physik Ag Laser gas replenishment method
US6243406B1 (en) 1999-03-12 2001-06-05 Peter Heist Gas performance control system for gas discharge lasers
US6727731B1 (en) 1999-03-12 2004-04-27 Lambda Physik Ag Energy control for an excimer or molecular fluorine laser
US6714577B1 (en) 1999-03-17 2004-03-30 Lambda Physik Ag Energy stabilized gas discharge laser
JP3377183B2 (ja) * 1999-04-09 2003-02-17 セントラル硝子株式会社 Ｎｆ３の処理方法
US6157661A (en) * 1999-05-12 2000-12-05 Laserphysics, Inc. System for producing a pulsed, varied and modulated laser output
US7179653B2 (en) * 2000-03-31 2007-02-20 Showa Denko K.K. Measuring method for concentration of halogen and fluorine compound, measuring equipment thereof and manufacturing method of halogen compound
US6721345B2 (en) 2000-07-14 2004-04-13 Lambda Physik Ag Electrostatic precipitator corona discharge ignition voltage probe for gas status detection and control system for gas discharge lasers
WO2003002454A2 (fr) * 2001-06-29 2003-01-09 Showa Denko K. K. Fluor gazeux de grande purete, production et utilisation de ce dernier, et procede d'analyse d'impuretes a l'etat de traces dans du fluor gazeux de grande purete
JP2003021619A (ja) * 2001-07-05 2003-01-24 Canon Inc 蛍石及びその分析法、製造法、光学特性評価法
US7830934B2 (en) * 2001-08-29 2010-11-09 Cymer, Inc. Multi-chamber gas discharge laser bandwidth control through discharge timing
US7209507B2 (en) * 2003-07-30 2007-04-24 Cymer, Inc. Method and apparatus for controlling the output of a gas discharge MOPA laser system
US7317179B2 (en) * 2005-10-28 2008-01-08 Cymer, Inc. Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate
US7679029B2 (en) * 2005-10-28 2010-03-16 Cymer, Inc. Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
US9066777B2 (en) 2009-04-02 2015-06-30 Kerr Corporation Curing light device
US9072572B2 (en) 2009-04-02 2015-07-07 Kerr Corporation Dental light device
US8444935B2 (en) * 2009-06-12 2013-05-21 Bose Corporation Multiple-specimen device testing with particle measurement
CN102574682A (zh) * 2009-10-16 2012-07-11 苏威氟有限公司 高纯度氟气、其生产和用途、以及用于监测氟气中杂质的方法
CN105353057B (zh) * 2015-12-17 2017-02-01 中国原子能科学研究院 一种用于在线分析Ne中微量He、H2和杂质组分的气相色谱检测系统及方法
CN106896179B (zh) * 2015-12-21 2019-01-22 中昊晨光化工研究院有限公司 一种氟化工行业的环境在线监测系统和在线监测方法
CN105548075A (zh) * 2016-01-08 2016-05-04 楚天科技股份有限公司 一种玻璃药瓶内氧气含量的检测装置与方法
KR102366148B1 (ko) * 2017-09-25 2022-02-23 사이머 엘엘씨 가스 방전 광원에서의 불소 검출 방법
CN108287157A (zh) * 2017-12-29 2018-07-17 和立气体（上海）有限公司 一种氟气分析转化装置
TWI770568B (zh) * 2019-08-29 2022-07-11 美商希瑪有限責任公司 氣體放電光源中之氟偵測
JP2023541105A (ja) * 2020-09-10 2023-09-28 サイマー リミテッド ライアビリティ カンパニー フッ素測定装置及びフッ素測定方法
CN113917075A (zh) * 2021-09-14 2022-01-11 苏州金宏气体股份有限公司 含氟混合气体中氟含量测试装置及方法
CN114813448A (zh) * 2022-04-18 2022-07-29 浙江博瑞中硝科技有限公司 一种氟氮混合气中氟含量自动化测试的方法

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Also Published As

Publication number Publication date
IT1229210B (it) 1991-07-25
US5017499A (en) 1991-05-21
GB2217842B (en) 1991-10-09
DE3910345C2 (fr) 1991-04-18
IT8919907A0 (it) 1989-03-24
FR2627863A1 (fr) 1989-09-01
GB2217842A (en) 1989-11-01
US5149659A (en) 1992-09-22
GB8907052D0 (en) 1989-05-10
DE3910345A1 (de) 1989-10-26

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Legal Events

Date Code Title Description
ST Notification of lapse