TW535227B - Active anti-vibration apparatus and exposure apparatus - Google Patents

Active anti-vibration apparatus and exposure apparatus Download PDF

Info

Publication number
TW535227B
TW535227B TW090102620A TW90102620A TW535227B TW 535227 B TW535227 B TW 535227B TW 090102620 A TW090102620 A TW 090102620A TW 90102620 A TW90102620 A TW 90102620A TW 535227 B TW535227 B TW 535227B
Authority
TW
Taiwan
Prior art keywords
platform
seismic
compensator
signal
driving
Prior art date
Application number
TW090102620A
Other languages
English (en)
Chinese (zh)
Inventor
Shinji Wakui
Isao Iwai
Takashi Maeda
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Application granted granted Critical
Publication of TW535227B publication Critical patent/TW535227B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F16F15/023—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means
    • F16F15/027—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means comprising control arrangements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Acoustics & Sound (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Vibration Prevention Devices (AREA)
  • Electron Beam Exposure (AREA)
TW090102620A 2000-02-09 2001-02-07 Active anti-vibration apparatus and exposure apparatus TW535227B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000031342A JP4416250B2 (ja) 2000-02-09 2000-02-09 アクティブ除振装置及び露光装置

Publications (1)

Publication Number Publication Date
TW535227B true TW535227B (en) 2003-06-01

Family

ID=18556109

Family Applications (1)

Application Number Title Priority Date Filing Date
TW090102620A TW535227B (en) 2000-02-09 2001-02-07 Active anti-vibration apparatus and exposure apparatus

Country Status (6)

Country Link
US (1) US6684132B2 (https=)
EP (1) EP1124078B1 (https=)
JP (1) JP4416250B2 (https=)
KR (1) KR20010078795A (https=)
DE (1) DE60114260T2 (https=)
TW (1) TW535227B (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI391703B (zh) * 2008-12-03 2013-04-01 Asia Optical Co Inc 光學防手震系統之增益調整裝置及其方法
CN108369388A (zh) * 2015-12-21 2018-08-03 Asml荷兰有限公司 具有主动式底架支撑件的光刻设备
CN111692264A (zh) * 2019-09-20 2020-09-22 裴广华 基于振动补偿的大型机器用共振消除装置

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3670575B2 (ja) * 2000-01-12 2005-07-13 Ｔｄｋ株式会社 コイル封入圧粉コアの製造方法およびコイル封入圧粉コア
JP2003202051A (ja) * 2002-01-04 2003-07-18 Canon Inc 除振装置
US7108497B2 (en) * 2004-01-12 2006-09-19 Omnimold, Llc Interchangeable blow mold parison closing apparatus
JP2005282696A (ja) * 2004-03-29 2005-10-13 Canon Inc 除振マウント装置、露光装置及びデバイス製造方法
JP4290172B2 (ja) * 2006-03-30 2009-07-01 キヤノン株式会社 伝達特性算出装置及び伝達特性算出方法並びに露光装置
JP4906416B2 (ja) * 2006-07-11 2012-03-28 日本碍子株式会社 物体の通過検出装置
JP4970904B2 (ja) * 2006-11-06 2012-07-11 倉敷化工株式会社 アクティブ除振装置
EP2119938A1 (en) * 2008-05-15 2009-11-18 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO A vibration sensor and a system to isolate vibrations.
US20140293251A1 (en) * 2008-08-18 2014-10-02 Asml Netherlands B.V. Projection System, Lithographic Apparatus, Method of Projecting a Beam of Radiation onto a Target and Device Manufacturing Method
JP6151927B2 (ja) * 2012-02-17 2017-06-21 キヤノン株式会社 アクティブ除振装置
CN104412193B (zh) 2012-06-26 2017-03-08 株式会社日立高新技术 载物台装置以及试样观察装置
JP6152001B2 (ja) * 2012-08-03 2017-06-21 キヤノン株式会社 アクティブ除振装置、除振方法、加工装置、検査装置、露光装置及びワークの製造方法
EP2846062B1 (de) * 2013-09-10 2017-05-31 Integrated Dynamics Engineering GmbH Schwingungsisolationssystem mit in Teilbereiche unterteilter Auflage sowie Verfahren zu dessen Regelung
JP6681982B2 (ja) * 2015-11-23 2020-04-15 エーエスエムエル ネザーランズ ビー．ブイ． 位置決めデバイス、リソグラフィ装置、及びデバイス製造方法
JP6556196B2 (ja) 2017-07-27 2019-08-07 倉敷化工株式会社 アクティブ除振装置
NL2022752A (en) 2018-04-25 2019-10-31 Asml Netherlands Bv Pneumatic support device and lithographic apparatus with pneumatic support device.

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3217522B2 (ja) 1992-03-02 2001-10-09 キヤノン株式会社 精密位置決め装置
JP3184044B2 (ja) 1994-05-24 2001-07-09 キヤノン株式会社 微動位置決め制御装置
JP3224489B2 (ja) 1995-03-28 2001-10-29 キヤノン株式会社 空気バネ式除振装置
US5812420A (en) 1995-09-05 1998-09-22 Nikon Corporation Vibration-preventive apparatus and exposure apparatus
JP3807516B2 (ja) 1995-09-05 2006-08-09 株式会社ニコン 除振装置、除振方法及び露光装置
JPH09326362A (ja) 1996-04-05 1997-12-16 Nikon Corp 除振装置及び露光装置
JP3733174B2 (ja) 1996-06-19 2006-01-11 キヤノン株式会社 走査型投影露光装置
JP3581499B2 (ja) 1996-09-27 2004-10-27 キヤノン株式会社 除振装置及びその制御方法
US6128552A (en) * 1996-11-08 2000-10-03 Canon Kabushiki Kaisha Anti-vibration apparatus and method
JPH10141428A (ja) 1996-11-08 1998-05-29 Canon Inc 能動除振装置
JP3286201B2 (ja) 1997-03-07 2002-05-27 キヤノン株式会社 能動的除振装置
US6170622B1 (en) 1997-03-07 2001-01-09 Canon Kabushiki Kaisha Anti-vibration apparatus and anti-vibration method thereof
JPH10261561A (ja) 1997-03-18 1998-09-29 Toshiba Corp 露光制御方法及びその装置
JPH10311364A (ja) 1997-05-09 1998-11-24 Canon Inc 能動的除振制振装置
ATE419789T1 (de) 1997-05-23 2009-01-15 Prorhythm Inc Wegwerfbarer fokussierender ultraschallapplikator hoher intensität
JP4313865B2 (ja) 1998-01-14 2009-08-12 キヤノン株式会社 除振装置
JP4109747B2 (ja) 1998-05-07 2008-07-02 キヤノン株式会社 アクティブ除振装置および露光装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI391703B (zh) * 2008-12-03 2013-04-01 Asia Optical Co Inc 光學防手震系統之增益調整裝置及其方法
CN108369388A (zh) * 2015-12-21 2018-08-03 Asml荷兰有限公司 具有主动式底架支撑件的光刻设备
US10578983B2 (en) 2015-12-21 2020-03-03 Asml Netherlands B.V. Lithographic apparatus having an active base frame support
CN112965346A (zh) * 2015-12-21 2021-06-15 Asml荷兰有限公司 具有主动式底架支撑件的光刻设备
CN112965346B (zh) * 2015-12-21 2024-07-30 Asml荷兰有限公司 具有主动式底架支撑件的光刻设备
CN111692264A (zh) * 2019-09-20 2020-09-22 裴广华 基于振动补偿的大型机器用共振消除装置
CN111692264B (zh) * 2019-09-20 2021-08-03 苏州维斯勒姆智能科技有限公司 基于振动补偿的大型机器用共振消除装置

Also Published As

Publication number Publication date
JP2001221278A (ja) 2001-08-17
DE60114260D1 (de) 2005-12-01
EP1124078A3 (en) 2003-06-18
EP1124078B1 (en) 2005-10-26
DE60114260T2 (de) 2006-07-13
EP1124078A2 (en) 2001-08-16
JP4416250B2 (ja) 2010-02-17
US20010011697A1 (en) 2001-08-09
US6684132B2 (en) 2004-01-27
KR20010078795A (ko) 2001-08-21

Similar Documents

Publication Publication Date Title
TW535227B (en) Active anti-vibration apparatus and exposure apparatus
KR100399812B1 (ko) 스테이지용진동방지장치
CN1702559B (zh) 光刻装置和器件制造方法
US9915880B2 (en) Stage apparatus, lithographic apparatus and method of positioning an object table
US9122174B2 (en) Method of loading a substrate on a substrate table and lithographic apparatus and device manufacturing method
US6202492B1 (en) Anti-vibration apparatus and exposure apparatus
KR101363540B1 (ko) 패터닝 장치로부터 기판 상으로 패턴을 전사하는 리소그래피 장치 및 댐핑 방법
JP7111776B2 (ja) 基板支持部、リソグラフィ装置
KR20120059630A (ko) 기판 테이블 상에 기판을 적재하는 방법, 디바이스 제조 방법, 컴퓨터 프로그램물, 데이터 캐리어 및 장치
CN102566300B (zh) 定位系统、光刻设备和用于定位控制的方法
CN101446771A (zh) 具有主动阻尼组件的光刻设备
US7327437B2 (en) Lithographic apparatus and device manufacturing method
JP2005109441A (ja) リソグラフィ装置及びデバイス製造方法
CN101840161A (zh) 光刻设备和器件制造方法
US7170582B2 (en) Support device and lightographic apparatus
JP5313179B2 (ja) 可動オブジェクトの制御位置の位置量を制御する制御システム、リソグラフィ装置および方法
CN112965346A (zh) 具有主动式底架支撑件的光刻设备
WO2005085671A1 (ja) 防振装置、露光装置、及び防振方法
JP2000228343A (ja) アクティブ除振装置、露光装置およびデバイス製造方法
JP2000208402A (ja) 除振装置
JP3636337B2 (ja) 除振装置及び露光装置
JP2001217172A (ja) ステージ装置及び露光装置
TW202511868A (zh) 基台支承裝置及曝光裝置
JP2001332467A (ja) ステージ装置、露光装置およびデバイス製造方法
JP2025539234A (ja) 位置決めシステム、リソグラフィツールおよび位置決めシステムを用いる可動物体の位置決め方法

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees