TW498514B - An integrated circuit package - Google Patents
An integrated circuit package Download PDFInfo
- Publication number
- TW498514B TW498514B TW090117908A TW90117908A TW498514B TW 498514 B TW498514 B TW 498514B TW 090117908 A TW090117908 A TW 090117908A TW 90117908 A TW90117908 A TW 90117908A TW 498514 B TW498514 B TW 498514B
- Authority
- TW
- Taiwan
- Prior art keywords
- integrated circuit
- heat sink
- conductive
- package
- patent application
- Prior art date
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- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Description
498514 A7 _ ____ B7 五、發明説明(1 ) 發明範缚 本發明係有關積體電路’特別指封裝式的積體電路。 發明背景 傳統上,積體電路封裝提供積體電路晶片與外部導體之 間的電路連接,同時也保護晶片不致受到外界環境的破 壞。一些大型積體電路,例如電信業及其他應用上所採用 的 ASICs (Application Specific Integrated Circuits)可消耗數 瓦的電力。因此,需發展一種其内部積體電路晶片與具有 消散熱量功能之外露表面的熱傳導性金屬或合金導體基材 接觸之具散熱器積體電路封裝。 目前’一種名爲BGA (Ball Grid Array)之封裝在高接腳 數(high lead count)積體電路,例如電信業使用的ASICs, 封裝上受到廣泛的應用。其接腳以踢球矩陣(arrayS 〇f solder balls)的方式呈現。錫球藉由迴銲(s〇ider refl〇w)焊 錫而固定夺基材的塾(pad )上,可提供高密度(high density ) 的緊密(compact)及可信賴 (reliable)之連接 (interconnections )。BGA封裝本體由聚化物,例如聚醯亞 胺(polyimide )或陶資絕緣體(ceramic dielectric body )所構 成。另外’ B G A封裝亦可具有一散熱器,例如以銅或其他 熱傳導金屬/合金所製成的散熱片。 圖3所示爲常見的積體電路Bga封裝示意圖。積體電路 12的封裝1〇具有一熱傳導性散熱器14,通常爲一金屬 層。此金屬通常爲數個薄層或一厚的銅材質散熱塊(slug) -4- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 498514 A7 B7 五、發明説明(2 所構成。積體電路1 2以具熱傳導性之模片黏著媒介(die attach adhesive medium) 13 黏附在散熱器 14 之上。 積體電路的銲墊16經由導電接腳18 ( leads )連接到封裝 基材上由導電層16、20及22所構成的導電路徑。基材具 有類似印刷電路技術上所採用之電介質層2 4、2 6及2 7結 構。在基材的另一面上,具有一其上將配置錫球陣列 30,構成導電路徑的導電層28。導電導通孔(through holes) 31延伸穿過構成基材的電介質層24、26及27,以 提供錫球3 0與積體電路晶片接觸墊(contact pads) 1 6之間 的電流連接(electrical interconnections )。封裝材料32封住 並保護積體電路晶片1 2與銲線(bonding wires ) 1 8。 封裝藉由錫球30熱迴銲(thermal reflow)所形成的球鮮點 (ball bonds )與基材1 〇上各個對應的接觸墊3 6連接,以產 生和主機板3 8之間的連接。此封裝具有一或多個金屬連 接層(one or more levels of metal interconnections),例如由 16、20及22所形成的向下穴狀結構(cavity down configuration)。在此種結構中,不同的層分別作爲提供電 源(power )、接地(ground )與信號連接(signal connections ) 之用。基材中每增加一層,將增加封裝上的成本。因此, 減少層數是封裝技術上追求的目標。 發明摘要 本發明提供一種將内部積體電路晶片裝置在一導電性散 熱塊上並與之電轉合(electrically coupled)的積體電路封 裝。此導電性散熱塊除了作爲散熱器之外,同時也具有接 -5- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 498514 A7 B7 五、發明説明(3 ) 地功能。如此,可減少額外的導電層以及用來產生電路連 接至(例如)接地端的電鍍導通孔之需求。因此,内部接地 端(internal ground planes ) 6令導電路徑(conductive paths )艮P 可不需被用來互連接地連接(interconnecting ground connections )之電鍍導通孔所切斷(cut off),也就可以避 免如先前技藝中電路效能降低(electrical performance degradation)之缺點。此外,本發明允許增加更多之信號 (allows more signals to be added )、以及 / 或是減小積體電 路晶片之尺寸,以增進電路效能。上述及下列關於本發明 之説明皆爲示範性(exemplary)描述,而非限定性 (restrictive) 0 圖式之簡單描述 閱讀下列之詳細説明時配合相對應之圖示將有助於了解 本發明之内容。另外,爲了説明上之方便,圖示中許多物 件的尺寸辟任意放大或縮小,而不依照半導體工業實際情 況之比例繪製。圖示包含下列附圖: 圖1爲依據本發明原理之具體實施例中,一積體電路裝 置(mounted)在一積體電路封裝内之示意圖; 圖2a及2b爲依據本發明原理之具體實施例中,積體電 路封裝之導電性散熱塊上視圖; 圖2c爲圖2a中之導電性散熱塊之2a-2a截面示意圖;及 圖3爲依據先前技藝,積體電路晶片裝置於積體電路上 之示意圖。 發明之詳細説明 -6- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 498514 A7 B7 五、發明説明(4 ) 附圖上所標示之類似的數字代表類似之元件。圖1爲依 據本發明原理之具體實施例中,一積體電路晶片裝置在封 裝本體内之示意圖。圖2a及2b爲依據本發明原理之具體 實施例之導電性散熱塊1 1 4之上視圖。積體電路晶片1 1 2 之封裝100具有一可作爲熱傳導(heat spreader)/散熱(heat sink),以及/或導電物質之導電性散熱塊1 1 4(爲一導電性 物體)。 簡言之,積體電路晶片1 1 2可藉由銲線(wire bonds)或 其他合適之機制,以直接和導電性散熱塊耦合。如此,可 減少額外的導電層(conductive layers )以及用來產生連接到 (例如)接地端之電鍍導通孔連接之需求。因此,内部平面 (internal planes )的導電路徑即不需被用來形成互連接地連 接之電鍍導通孔所切斷;也就可以避免如先前技藝中某些 電路效能降低之缺點。此外,本發明允許增加更多之信 號、以及/或是減小積體電路晶片之尺寸,以增進電路效 能。 導電性散熱塊1 1 4之材質需具有良好的熱傳導以及/或 電流特性,例如包含金屬合金以及銅材質等。導電性散熱 塊114可由一或多層金屬或金屬合金所形成。導電性散熱 塊1 1 4也可由一具有導電物質塗層之熱傳導性材質所構 成。導電性散熱塊1 1 4可包含一低傳導性(reduced conductive)或非導體材質之保護塗層(protective coating) 或外層114b與114d。 舉例而言,假如導電性散熱塊1 1 4由銅所構成,即可在 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 498514 A7 B7 五、發明説明(5 ) 導電性散熱塊1 1 4的表面上產生一氧化銅(c〇pper 〇xide, black oxide)外層U4b及114d。或是只在内側表面114c上 產生氧化銅114d。在第二種作法上,外層11扑可爲(例如) 一電鍍鎳(N i )層。在此兩種作法中的氧化銅可用來增加 積體電路晶片黏著到導電基材時之結合度(b〇nding)。 藉由去除外層114d之某些部份,可以在導電性散熱塊 114心底部形成一接觸區U4.a。此接觸區U4a可用來提供 積體電路晶片1 1 2與導電性散熱塊丨丨4之間的電耦合。接 觸區114a可產生在固定積體電路晶片〗12之區域114c的 一 一或更多邊上。接觸區114a可如圖2a中所示圍 繞住區域114c,或如圖2b中所示將整個區域114c都包含 在範圍内。 接觸區114a可採常用之技藝製作,例如,於產生外層 114bi前先遮罩區域114a。接觸區U4a可包含一或多個額 外層,以作爲積體電路晶片112與接觸區114&之間銲線及 電耦合足用途。這些額外層可爲導電材質,像是金屬及金 屬合金、。例如,在接觸區114&之上先產生一鎳(mckei)層 14〇之後再產生一金層(a layer of gold) 145。各層可採 電鍍方式製作。在電鍍期間,鎳與金將不會黏附到外層 114b之上。因此,不需要另一額外的遮罩層。 積體電路晶片U 2可藉由熱傳導性晶元黏著媒介1 1 3固 定在導電性散熱塊的區域114(:上。導電性散熱塊ιΐ4則詳 接到基材的一個表面。基材具有電介質層124及126。導 電性散熱塊114與基材之黏合材料可包含黏著劑、坪锡或 -8 -
A7 B7 6 五、發明説明( /、他可提仏導%性散熱塊〗丨4與一或多個導電層之間電耦 口 I材質。在此具體實施例中,導電性散熱塊採用焊錫 150黏附。在此例中,焊錫15〇黏附到導電性散熱塊η# 及導%層116的一區段(segment) 1 5 5 〇 導電性散熱塊1 1 4可固定到基材上以提供導電性散熱塊 114與一或多個錫球13〇之間經由電鍍導通孔之電耦合。 在此具體實施例中,焊錫i 5 〇作爲導電性散熱塊丨丨4與區 段1 5 5足間的電流連接。接著,區段丨5 5則經由導電層 1 1 6和一或多個電鍍導通孔i 3 1而耦合到一或多個錫球 130 〇 積體電路晶片之銲墊117藉由導電線(electrically conductive wires ) 1 1 8連接到封裝基材中各個不同之導電 層116、120及122。這些導電層可用來作爲電源、接地· 端及k號之互連。此外,導電層的數量可依照積體電路晶 片與封裝所^產生之互連數量(number of interconnections )多 寡而增加或減少。 導電線1 1 8也同時銲接到導電性散熱塊丨丨4以提供導電 性散熱塊1 1 4與錫球1 4 0之間經由電鍍導通孔1 3 1之電耦 合。如此可減少額外的導電層以及導電層與導電層之間額 外的電鍍導通孔之需求。因此,内部接地端的導體路徑即 可不需被電鍍導通孔所切斷,也就可以避免如先前技藝中 電路效能降低之缺點。此外,本發明允許增加更多之信號 以及/或是減小積體電路晶片之尺寸,以增進電路效能。 基材之另一表面具有一其上將配置錫球陣列130,構成 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐)
裝
訂
498514 A7 B7 五、發明説明 導電路徑之導電層116。同時也提供一焊錫遮罩136。如 前所述,導電導通孔131延伸穿過構成基材的電介質層 1 2 4及1 2 6,以提供錫球1 3 0與導電層1丨6之間的電流連 接。一環氧化物封裝材料1 3 2封住並保護積體電路晶片 1 1 2與銲線1 1 8。 之後,此封裝可藉由熱迴銲錫球〗3 〇所產生之焊錫而連 接到主機板上各個對應之接觸墊。此處所指的主機板爲 (例如)一印刷電路板。 本發明雖然以參照具體實施例之方式加以説明,但並非 只侷限於這些具體實施例。文後所附之申請專利範圍内容 將包含其他不超出本發明之精神及範圍,技藝上之修改及 具體實施例。 -10- 本紙張尺度適用中國國家標準(CNS) A4規格(210X 297公釐)
Claims (1)
- 498514 A8 B8 C81· 一種積體電路封裝 一導電性散熱塊; 一與導電性散熱塊辑合之積體電路晶片;以及 一由積體電路晶片延伸至導電性散熱塊之導電性元 件0 包含 2. 3. 如申請專利範圍第1項之積體電路封裝, 與導電性散熱塊耦合之基材封裝。 如申请專利範圍第2項之積體電路封裝, 裝包含至少一第一導電層,該積體電路晶 第一導電層。 進一步包含一 其中該基材封 片電耦合至該 4.如申請專利範圍第3項之積體電路封裝,其中該基材告 裝包含-第二導電層’該導電性散熱塊電耦合工該第二 導電層。 5. 如申請專利範圍第4項之積體電路封裝,並中咳基材封 裝内之第-導電層與該第二導電層之間爲電隔:狀態。 6. 如申請專利範圍第4項之積體電路封裝,其中該基材封 裝包含至少二個導電層’ 1¾時該積體電路晶片電耦合至 該第三導電層。 7. 如申請專利範圍第2項之積體電路封装,其中該基材封 裝用以裝置在一主機板上。 8·如申請專利範圍第7項之積體電路封裝,其中該基材爲 一電路板。 9.如申請專利範圍第2項之積體電路封裳,其中核基材封 裝具電鍍導通孔,且該導電性散熱塊電轉合至該導通孔 -11- 本紙張尺度適用中國國家標準(CNS) Α4規格(210X297公釐)裝 訂 線498514 A B c D 六、申請專利範圍 之至少其中之一。 10. 如申請專利範圍第1項之積體電路封裝,其中該積體電 路晶片同時以機械(mechanically)及電方式搞合至該導 電性散熱塊。 11. 如申請專利範圍第1項之積體電路封裝,其中一外層形 成於該導電性散熱塊之上,該外層具有一開口露出該導 電性散熱塊之一區段,且該積體電路晶片電耦合至該區 段。 12. 如申請專利範圍第1項之積體電路封裝,其中該導電性 散熱塊構成一散熱器。 13. —種積體電路封裝,包含: 一導電性散熱塊; 一與導電性散熱塊電耦合之積體電路晶片;以及 一具複數個導電層之基材封裝,該複數個導電層之至 少其中之一電耦合至該積體電路晶片。 14. 如申請專利範圍第1 3項之積體電路封裝,其中該基材 封裝用以裝置於一主機板上。 15. 如申請專利範圍第1 4項之積體電路封裝,其中該基材 爲一電路板。 16. 如申請專利範圍第1 3項之積體電路封裝,其中該基材 封裝具導通孔,且該導電性散熱塊電耦合至該電鍍導通 孔之至少其中之一。 17. 如申請專利範圍第1 3項之積體電路封裝,其中該積體 電路晶片同時以機械(mechanically)及電方式搞合至該 -12- 本纸張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) A B c D 498514 々、申請專利範圍 導電性散熱塊。 18. 如申請專利範圍第1 3項之積體電路封裝,其中一外層 形成於該導電性散熱塊之上,該外層具有一開口露出該 導電性散熱塊之一區段,且該積體電路電耦合至該區 19. 如申請專利範圍第1 3項之積體電路封裝,其中該導電 性散熱塊構成一散熱器。 -13- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐)
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US5650593A (en) * | 1994-05-26 | 1997-07-22 | Amkor Electronics, Inc. | Thermally enhanced chip carrier package |
JP3292798B2 (ja) * | 1995-10-04 | 2002-06-17 | 三菱電機株式会社 | 半導体装置 |
US6133623A (en) * | 1996-07-03 | 2000-10-17 | Seiko Epson Corporation | Resin sealing type semiconductor device that includes a plurality of leads and method of making the same |
US5894166A (en) | 1997-09-17 | 1999-04-13 | Northern Telecom Limited | Chip mounting scheme |
-
2000
- 2000-07-28 US US09/628,067 patent/US6509642B1/en not_active Expired - Lifetime
-
2001
- 2001-07-21 KR KR1020010043981A patent/KR100675030B1/ko active IP Right Grant
- 2001-07-23 TW TW090117908A patent/TW498514B/zh not_active IP Right Cessation
- 2001-07-23 GB GB0117917A patent/GB2370687B/en not_active Expired - Fee Related
- 2001-07-27 JP JP2001226903A patent/JP2002057238A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JP2002057238A (ja) | 2002-02-22 |
GB0117917D0 (en) | 2001-09-12 |
US6509642B1 (en) | 2003-01-21 |
KR20020010489A (ko) | 2002-02-04 |
KR100675030B1 (ko) | 2007-01-29 |
GB2370687B (en) | 2005-03-23 |
GB2370687A (en) | 2002-07-03 |
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