TW478024B - Die Bonder or Wire Bonder with a suction device for pulling flat and holding down a curved substrate - Google Patents
Die Bonder or Wire Bonder with a suction device for pulling flat and holding down a curved substrate Download PDFInfo
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- TW478024B TW478024B TW089126004A TW89126004A TW478024B TW 478024 B TW478024 B TW 478024B TW 089126004 A TW089126004 A TW 089126004A TW 89126004 A TW89126004 A TW 89126004A TW 478024 B TW478024 B TW 478024B
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- substrate
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- suction device
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- vacuum gripper
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- 239000000758 substrate Substances 0.000 title claims abstract description 47
- 239000000463 material Substances 0.000 claims abstract description 3
- 238000003825 pressing Methods 0.000 claims description 6
- 239000004065 semiconductor Substances 0.000 abstract description 11
- 235000012431 wafers Nutrition 0.000 description 10
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 230000000903 blocking effect Effects 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 1
- 230000002079 cooperative effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
- B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
- B25B11/005—Vacuum work holders
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/60—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67138—Apparatus for wiring semiconductor or solid state device
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67144—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/0061—Tools for holding the circuit boards during processing; handling transport of printed circuit boards
- H05K13/0069—Holders for printed circuit boards
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19043—Component type being a resistor
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Manipulator (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
478024 A7 B7 五、發明説明(I ) 發明說明 (請先閲讀背面之注意事項再填办 本發明是關於具有一用來拉平和壓制一彎曲基板的吸 取裝置之晶片接合機和/或導線接合機,其型式是陳述於 申請專利範圍第1項的前言部分。 在藉由所謂晶粒接合機將半導體晶片安裝在基板時, 基板是以預定距離的步調輸送於支撐表面上,以致於半 導體晶片可以安裝在所預見的位置。爲了使基板平躺於 支撐表面上,支撐表面具有一鑽孔,其可連接至一真空 來源,用於基板的吸取與壓制。 某些基板-例如,BGA®S(球狀柵極陣列),其已裝有半 導體晶片,且首先塗覆粘劑,然後裝上第二半導體晶片 ,或者,其饋送至導線接合機的接合站,以做導線連接-可以在特定的環境下,彎曲至不能成功吸取基板的程度 本發明之目的是說明一吸取裝置,其可壓制和支撐表 面齊平之彎曲度頗大的基板。 經濟部智慧財產局員工消費合作社印製 本發明由申請專利範圍第1項的特徵組成。有利的實 施例是來自申請專利範圍依附項。 本發明在於穴係支撐表面中所預見者,而可上升和下 降的真空握爪是由撓性及形狀穩定的材料製成。藉由晶 粒接合機,基板總是一致地前進至分配站,在該處施加 粘劑,然後至接合站,在該處安裝次一半導體晶片。藉 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 478024 A7 B7 五、發明説明(2·) 讀· 先 閲 背 τέ 之 注 意 事 項 再 填 由導線接合機,基板總是一致地前進至接合站,在該處 導線連接於半導體晶片與基板之間。在彎曲基板的向前 饋送期間,真空握爪下降至穴內。當基板已到達它的位 置時,真空握爪由舉升缸舉起一預定的距離且施加真空 。在此位置,真空握爪突起越過支撐表面的位準。當真 空握爪接觸彎曲基板下面時,產生一或多或少密封良好 的穴。基板上表面的壓力(大氣壓力)與下面的穴中之壓力 (真空)之間的壓力差具有的效應是,基板平壓於支撐表面 ,使得撓性真空握爪受壓。當過程-粘劑的施加或半導 體晶片或線路的安裝-完成的時候,釋放真空且使舉升 缸下降。依據本發明的解決方案所具有的利益是,在基 板的前向饋送期間,真空握爪位在支撐表面下方,所以 不能干涉基板的前向饋送。 下文將根據圖式更詳細說明本發明之一實施例,其中 圖式並未依照比例。 第1A、B圖示爲用於接收基板之吸取裝置的剖面與平 視圖。 經濟部智慧財產局員工消費合作社印製 第2圖爲又一吸取裝置。 第ΙΑ、B圖顯示一吸取裝置的剖面與平視圖,其具有 一板1,板具有一水平支撐表面2,用於接受基板3。基 板3由一未顯示的輸送裝置一致地向前饋送於一輸送方 向4,到達一處理站,在該處施加粘劑,或在該處裝上一 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐) 478024 經濟部智慧財產局員工消費合作社印製 A7 __B7_五、發明説明(3 ) 半導體晶片,或在該處執行已安裝的半導體晶片與基板3 之間的導線連接。板1具有一鑽孔5與一溝槽6,鑽孔5 可連接至一真空源,其可開啓及關閉,溝槽6通往支撐 表面2。溝槽6位於處理站的位置。板1含有四配置成矩 陣形的穴7,其朝向支撐表面2敞開,每一穴配置一下降 的撓性真空握爪8.1至8.4。真空握爪8.1至8.4較佳爲所 謂風箱型真空握爪,其由於折疊而可在它們的縱向壓縮 。四真空握爪8.1至8.4安裝在一載板9上,其由一氣壓 驅動的舉升缸10上下移動於一上行進限制與一下行進限 制之間。下行進限制與上行進限制是由止動件界定。上 行進限制是由,例如,配置於載板9中的螺絲1 1界定, 螺絲頭於舉起舉升缸10時撞擊於板1。藉由螺絲1 1,可 以精密界定真空握爪8.1至8.4於上行進限制時突起至支 撐表面位準上方的距離D。在上行進限制,真空握爪8.1 至8.4突起至支撐表面2的位準上方一距離D,其典型上 是約2公厘。距離D是依基板3的最大曲率而定。在下 行進限制,真空握爪8.1至8.4完全降至個別的穴7中, 以致於基板3的前向饋送可以無阻礙地發生。 在一方面,由於風箱型真空握爪之吸取開口的漸增之 直徑,作用於基板3的力在真空施加時增加,另一方面 ,風箱型真空握爪之剛性增加,其提供對於基板3之吸 取的機械阻力。來自Schmalz公司的圖9類型的風箱型真 ($先閲讀背面之注意事項再填0一 .裝. I) 訂 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 478024 A7 __— _ B7_ 五、發明説明(七) 空握爪已証明是可靠的。 請· 先 閱 讀 背 之 注 意 事 項 再 填 二真空握爪8.1與8.2,其在輸送方向4觀看時係配置 於相同的位準,藉由第一閥12連接至一未顯示的真空源 。二真空握爪8.3與8.4,其在輸送方向4觀看時也配置 於相同的位準,藉由第二閥13連接至真空源。鑽孔5由 第三閥14連接至真空源。 經濟部智慧財產局員工消費合作社印製 操作時,吸取裝置對應於機器的工作循環而操作如下 :舉升缸10首先位於它的下行進限制:真空握爪8.1至 8.4降入穴7中。閥12、13與14關閉··無真空施加至鑽 孔5或施加至真空握爪8.1至8.4。基板3向前饋送。在 基板3已到達它的預見位置時,將舉升缸1〇帶到它的上 行進限制。此外,三閥1 2、1 3與14開啓,以致於真空施 加至鑽孔5與真空握爪8.1至8.4。當一真空握爪接觸基 板3下方時,產生一或多或少密封良好的穴。然後,基 板3上表面的壓力(大氣壓力)與穴下方的壓力(真空)之間 的壓力差具有的效應是,基板3平壓於支撐表面2,使得 真空握爪壓縮。當基板3平躺於支撐表面2時,形成於 溝槽6與基板3之間的穴也充滿真空。因爲溝槽6,基板 3 —方面被吸至處理位置,另一方面被支撐於環繞溝槽6 之支撐表面2的區域上。當過程-粘劑的施加或半導體 晶片或線路的安裝-完成時,三閥12、13與14關閉,且 舉升缸10下降。工作循環完成,次一工作循環開始。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 478024 A7 _B7___ 五、發明説明($ ) 操作時,經常發生的是,只有二真空握爪8.1與8.2 或只有真空握爪8.3與8.4由基板3遮蓋。儘管如此’當 閥12、13與14的內部流動阻力足夠大時,充分的真空可 以建立在基板3與被遮蓋的真空握爪之間。然後,未被 遮蓋的真空握爪產生洩漏,但進入的空氣之生產能力保 持足夠低,且不能侵害到真空。 三閥12、13與14較佳爲同時開啓和關閉。然而,也 可以開啓閥14,其略爲延遲而施加真空至鑽孔5。 選擇性地,可以有一第二鑽孔15,其敞開進入溝槽6 ,其另一端配置一未顯示的感測器,用於測量真空。在 三閥12、13與14的每一開口後方,感測器檢查鑽孔15 或溝槽6中的真空是否到達一預定値。如果基板3平躺 於支撐表面2上,則鑽孔15或溝槽6中的真空發展,感 測器響應,且執行過程步驟。如果未達成所欲的真空, 則產生一誤差訊息。 第2圖顯示又一吸取裝置的示意圖,四真空握爪8.1 至8.4與鑽孔5連接到單一閥12。二真空握爪8.1與8.2 ,其於輸送方向4觀看時係配置成相鄰,經由一共同的 流動阻擋件16而連接至閥12。二真空握爪8.3與8.4, 其於輸送方向4觀看時也配置成相鄰,經由一共同的流 動阻擋件1 7而連接至閥1 2。鑽孔5經由第三流動阻擋件 1 8,連接到閥1 2。流動阻擋件1 6至18的工作是在對應 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (Φ先閲讀背面之注意事項再填) •裝· 經濟部智慧財產局員工消費合作社印製 478024 A7 B7 _ 五、發明説明(b ) 的真空握爪或鑽孔5未遮蓋時限制洩漏率,以致於其他 遮蓋的真空握爪仍施加吸力至基板3。此流動阻擋件由一 喉部組成,喉部安裝在真空握爪與閥之間的管線中,其 剖面與長度導致所欲的流動阻力。 具有四真空握爪的吸取裝置之設計保証基板的完美壓 制,而最妥當地使用可用面積且最妥當地配合基板輸送 的方式:即,必須考慮,基板須——地饋送至處理站, 且必須在該處保持平躺於支撐表面上。也可使用不同形 狀的真空握爪,矩形、正方形或橢圓形,以取代圓形風 箱型真空握爪。 元件符號說明: 1… 板 2… 支援表面 3… 基板 4… 輸送方向 5… 鑽孔 經濟部智慧財產局員工消費合作社印製 6… 溝槽 7… 穴 8.1-8.4…真空握爪 9… 載板 10··· 舉升缸 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 478024 A7 B7 五、發明説明(q ) 經濟部智慧財產局員工消費合作社印製 1 1… 螺絲 1 2… 閥 1 3… 閥 14… 閥 15··· 鑽孔 1 6… 流動阻擋件 17··· 流動阻擋件 1 8… 流動阻擋件 9- (請先閲讀背面之注意事項再填· :裝·
Mr 本紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐)
Claims (1)
- 478024六、申請專利範圍 第89126004號「具有一用來拉平和壓制一彎曲基板的吸取裝 置之晶片或導線接合機」專利案 (90年11月修正) 六申請專利範圍 1. 一種晶片或導線之接合機,其具有一用來拉平和壓制一 在處理站之彎曲基板的吸取裝置,該吸取裝置包括: -一’板,其具有一用於基板的支撐表面,板含有至少一 穴,穴朝向支撐表面敞開: --由撓性材料製成的真空握爪,其位在至少一穴內; -驅動裝置,用於在基板輸送期間,將真空握爪舉起於 支撐表面的位準上方,以施加吸力至基板,及用於使 真空握爪降入穴內;及 -一感測器,用於測量在處理站的基板下方的真空。 2. 如申請專利範圍第1項之晶片或導線之接合機,其中真 空握爪是風箱型。 3·如申請專利範圍第1或2項之晶片或導線之接合機,其 中支撐表面包括一位在處理站一位置處之溝槽及一用於 對溝槽施加真孔之孔;及其中由輸送基板之方向視之’ 至少一穴位在溝槽的一側及至少另一穴位在溝槽另一 側。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH229099 | 1999-12-14 |
Publications (1)
Publication Number | Publication Date |
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TW478024B true TW478024B (en) | 2002-03-01 |
Family
ID=4230324
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW089126004A TW478024B (en) | 1999-12-14 | 2000-12-06 | Die Bonder or Wire Bonder with a suction device for pulling flat and holding down a curved substrate |
Country Status (7)
Country | Link |
---|---|
US (1) | US6435492B1 (zh) |
KR (1) | KR100655981B1 (zh) |
CH (1) | CH695405A5 (zh) |
DE (1) | DE10059883A1 (zh) |
HK (1) | HK1032334A2 (zh) |
SG (1) | SG90213A1 (zh) |
TW (1) | TW478024B (zh) |
Families Citing this family (14)
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CH695075A5 (de) * | 2000-07-03 | 2005-11-30 | Esec Trading Sa | Greifwerkzeug. |
TW527674B (en) * | 2000-12-06 | 2003-04-11 | Esec Trading Sa | Die bonder and/or wire bonder with a device for holding down a substrate |
US6564979B2 (en) * | 2001-07-18 | 2003-05-20 | Micron Technology, Inc. | Method and apparatus for dispensing adhesive on microelectronic substrate supports |
DE10159921A1 (de) * | 2001-12-06 | 2003-06-18 | Imt Robot Ag | Objektgreifer für die Automatisierungstechnik |
TWI271247B (en) * | 2003-03-21 | 2007-01-21 | Esec Trading Sa | Wire bonder |
JP4312001B2 (ja) * | 2003-07-28 | 2009-08-12 | リアライズ・アドバンストテクノロジ株式会社 | 基板支持装置および基板取り外し方法 |
US7044476B2 (en) * | 2003-11-25 | 2006-05-16 | N&K Technology, Inc. | Compact pinlifter assembly integrated in wafer chuck |
JP4555008B2 (ja) * | 2004-07-08 | 2010-09-29 | パナソニック株式会社 | 部品実装装置 |
TW200602713A (en) * | 2004-07-08 | 2006-01-16 | Matsushita Electric Ind Co Ltd | Substrate processing apparatus and mounter |
DE102011001879A1 (de) * | 2011-04-07 | 2012-10-11 | Jenoptik Automatisierungstechnik Gmbh | Vorrichtung zum Spannen verformter Wafer |
CN103904011B (zh) * | 2012-12-28 | 2016-12-28 | 上海微电子装备有限公司 | 翘曲硅片吸附装置及其吸附方法 |
US9630269B2 (en) | 2013-10-30 | 2017-04-25 | Globalfoundries Inc. | Mechanism to attach a die to a substrate |
JP6663252B2 (ja) * | 2016-03-01 | 2020-03-11 | 株式会社アドテックエンジニアリング | プリント基板用露光装置 |
JP6789368B2 (ja) * | 2019-12-25 | 2020-11-25 | 株式会社アドテックエンジニアリング | プリント基板用露光装置 |
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US3934916A (en) * | 1974-01-25 | 1976-01-27 | Kliklok Corporation | Vacuum pickup cup |
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JP3225336B2 (ja) | 1995-07-13 | 2001-11-05 | 株式会社新川 | リードフレームの吸着保持装置 |
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-
2000
- 2000-11-15 CH CH02222/00A patent/CH695405A5/de not_active IP Right Cessation
- 2000-12-01 DE DE10059883A patent/DE10059883A1/de not_active Withdrawn
- 2000-12-05 SG SG200007136A patent/SG90213A1/en unknown
- 2000-12-06 TW TW089126004A patent/TW478024B/zh not_active IP Right Cessation
- 2000-12-07 KR KR1020000074065A patent/KR100655981B1/ko not_active IP Right Cessation
- 2000-12-08 US US09/732,678 patent/US6435492B1/en not_active Expired - Fee Related
- 2000-12-14 HK HK00108081A patent/HK1032334A2/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US20020093130A1 (en) | 2002-07-18 |
SG90213A1 (en) | 2002-07-23 |
US6435492B1 (en) | 2002-08-20 |
HK1032334A2 (en) | 2001-07-06 |
CH695405A5 (de) | 2006-04-28 |
KR100655981B1 (ko) | 2006-12-08 |
KR20010062185A (ko) | 2001-07-07 |
DE10059883A1 (de) | 2001-09-20 |
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