US20020093130A1 - Die bonder and/or wire bonder with a suction device for pulling flat and holding down a curved substrate - Google Patents
Die bonder and/or wire bonder with a suction device for pulling flat and holding down a curved substrate Download PDFInfo
- Publication number
- US20020093130A1 US20020093130A1 US09/732,678 US73267800A US2002093130A1 US 20020093130 A1 US20020093130 A1 US 20020093130A1 US 73267800 A US73267800 A US 73267800A US 2002093130 A1 US2002093130 A1 US 2002093130A1
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- US
- United States
- Prior art keywords
- substrate
- vacuum
- supporting surface
- suction device
- bonder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000758 substrate Substances 0.000 title claims abstract description 52
- 239000000463 material Substances 0.000 claims abstract description 3
- 239000004065 semiconductor Substances 0.000 abstract description 11
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
- B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
- B25B11/005—Vacuum work holders
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/60—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67138—Apparatus for wiring semiconductor or solid state device
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67144—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/0061—Tools for holding the circuit boards during processing; handling transport of printed circuit boards
- H05K13/0069—Holders for printed circuit boards
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19043—Component type being a resistor
Definitions
- the invention concerns a Die Bonder and/or Wire Bonder with a suction device for pulling flat and holding down a curved substrate.
- the substrate When mounting semiconductor chips on a substrate by means of a so-called Die Bonder, the substrate is transported on a supporting surface in steps of a predetermined distance so that a semiconductor chip can be mounted at the foreseen location.
- the supporting surface In order that the substrate lies flat on the supporting surface, the supporting surface has a drill hole connectable to a vacuum source for the suction and holding down of the substrate.
- Some substrates for example BGA®s (Ball Grid Array) which are already equipped with semiconductor chips and which are first to be coated with adhesive and then equipped with a second semiconductor chip or those which are fed to the bonding station of a Wire Bonder for the making of wire connections, can, under certain circumstances, be curved to such an extent that suction of the substrate is unsuccessful.
- BGA®s All Grid Array
- the object of the invention is to specify a suction device which can hold down even strongly curved substrates level with the supporting surface.
- the invention consists in that cavities are foreseen in the supporting surface with raisable and lowerable vacuum grippers made of flexible and in shape stable material.
- a Die Bonder the substrate is always advanced in steps to the dispensing station where adhesive is applied and then to the bonding station where the next semiconductor chip is mounted.
- a Wire Bonder the substrate is always advanced in steps to the bonding station where the wires are attached between the semiconductor chip and the substrate.
- the vacuum grippers are lowered into the cavities.
- the vacuum grippers are raised by a predetermined distance by means of a lifting cylinder and vacuum is applied. In this position, the vacuum grippers protrude beyond the level of the supporting surface.
- the solution in accordance with the invention has the advantage that, during forward feed of the substrate, the vacuum grippers are located lowered below the supporting surface and therefore can not interfere with the forward feed of the substrate.
- FIG. 1A, B a cross-section and a plan view of a suction device for receiving a substrate
- FIG. 2 a further suction device.
- FIGS. 1A and 1B show a cross-section and a plan view of a suction device with a plate 1 having a level supporting surface 2 for receiving a substrate 3 .
- the substrate 3 is fed forwards in steps by a not presented transport arrangement in a transport direction 4 to a processing station where adhesive is applied or where it is equipped with a semiconductor chip or where wire connections are made between a mounted semiconductor chip and the substrate 3 .
- the plate 1 has a drill hole 5 connectable to a vacuum source which can be switched on and off and a groove 6 let into the supporting surface 2 .
- the groove 6 is located at the position of the processing station.
- the plate 1 contains four cavities 7 arranged in a matrix shape which are open towards the supporting surface 2 in each of which a lowered flexible vacuum gripper 8 . 1 to 8 . 4 is arranged.
- the vacuum grippers 8 . 1 to 8 . 4 are preferably so-called bellow-type vacuum grippers which, thanks to the folds, can be compressed in their longditudinal direction.
- the four vacuum grippers 8 . 1 to 8 . 4 are mounted on a carrier plate 9 which is moved up and down between an upper travel limit and a lower travel limit by means of a pneumatically driven lifting cylinder 10 .
- the lower travel limit and the upper travel limit are defined by means of stops.
- the upper travel limit is defined, for example, by means of screws 11 arranged in the carrier plate 9 the heads of which, on raising the lifting cylinder 10 , strike on the plate 1 .
- By means of the screws 11 it can be precisely defined by which distance D the vacuum grippers 8 . 1 to 8 . 4 protrude above the level of the supporting surface 2 at the upper travel limit.
- the vacuum grippers 8 . 1 to 8 . 4 protrude above the level of the supporting surface 2 by a distance D of typically around 2 mm.
- the distance D is dependent on the maximum curvature of the substrate 3 .
- the vacuum grippers 8 . 1 to 8 . 4 are located completely lowered within the respective cavity 7 so that the forward feed of the substrate 3 can take place unhindered.
- the two vacuum grippers 8 . 1 and 8 . 2 which are arranged at the same level when viewed in transport direction 4 are connected to a not presented vacuum source by means of a first valve 12 .
- the two vacuum grippers 8 . 3 and 8 . 4 which are also arranged at the same level when viewed in transport direction 4 are connected to the vacuum source by means of a second valve 13 .
- the drill hole 5 is connected to the vacuum source by means of a third valve 14 .
- the suction device works correspondingly to the working cycle of the machine as follows:
- the lifting cylinder 10 is first located at its lower travel limit: the vacuum grippers 8 . 1 to 8 . 4 are located lowered into the cavities 7 .
- the valves 12 , 13 and 14 are closed: No vacuum is applied to the drill hole 5 or to the vacuum grippers 8 . 1 to 8 . 4 .
- the substrate 3 is fed forward. After the substrate 3 has reached its foreseen position, the lifting cylinder 10 is brought to its upper travel limit. Furthermore, the three valves 12 , 13 and 14 are opened so that vacuum is applied to the drill hole 5 and the vacuum grippers 8 . 1 to 8 . 4 .
- valves 12 , 13 and 14 are preferably switched on and off simultaneously. However, it is also possible to open valve 14 which applies vacuum to the drill hole 5 with a slight delay.
- a second drill hole 15 opening into the groove 6 at the other end of which a not presented sensor is arranged for measuring the vacuum.
- the sensor checks whether or not the vacuum in the drill hole 15 or in the groove 6 reaches a predetermined value. If the substrate 3 lies flat on the supporting surface 2 , the vacuum in the drill hole 15 or in the groove 6 beneath the substrate develops, the sensor responds and the process step is carried out. If the desired vacuum strength is not achieved, then an error message is produced.
- FIG. 2 shows a schematic drawing of a further suction device with which the four vacuum grippers 8 . 1 to 8 . 4 and the drill hole 5 are connected to one single valve 12 .
- the two vacuum grippers 8 . 1 and 8 . 2 which are arranged next to each other when viewed in transport direction 4 are connected to the valve 12 via a common flow resistance 16 .
- the two vacuum grippers 8 . 3 and 8 . 4 which are also arranged next to each other when viewed in transport direction 4 are connected to the valve 12 via a common flow resistance 17 .
- the drill hole 5 is connected to the valve 12 via a third flow resistance 18 .
- the task of the flow resistors 16 to 18 is to limit the leakage rate when the corresponding vacuum grippers or the drill hole 5 are not covered so that the other covered vacuum grippers can nevertheless apply suction to the substrate 3 .
- a flow resistance consists, for example, of a throat installed in the line between the vacuum gripper and the valve, the cross-section and length of which result in the desired flow resistance.
- the design of the suction device with four vacuum grippers guarantees perfect holding of the substrate with optimum utilization of the available area and optimum adaptation to the manner in which the substrates are transported: It must namely be taken into consideration that the substrates have to be fed one after the other to the processing station and must be held there flat on the supporting surface.
- vacuum grippers of a different shape eg, of a rectangular, square or eliptical shape, can also be used.
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Manipulator (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
- The invention concerns a Die Bonder and/or Wire Bonder with a suction device for pulling flat and holding down a curved substrate.
- When mounting semiconductor chips on a substrate by means of a so-called Die Bonder, the substrate is transported on a supporting surface in steps of a predetermined distance so that a semiconductor chip can be mounted at the foreseen location. In order that the substrate lies flat on the supporting surface, the supporting surface has a drill hole connectable to a vacuum source for the suction and holding down of the substrate.
- Some substrates, for example BGA®s (Ball Grid Array) which are already equipped with semiconductor chips and which are first to be coated with adhesive and then equipped with a second semiconductor chip or those which are fed to the bonding station of a Wire Bonder for the making of wire connections, can, under certain circumstances, be curved to such an extent that suction of the substrate is unsuccessful.
- The object of the invention is to specify a suction device which can hold down even strongly curved substrates level with the supporting surface.
- The invention consists in that cavities are foreseen in the supporting surface with raisable and lowerable vacuum grippers made of flexible and in shape stable material. With a Die Bonder, the substrate is always advanced in steps to the dispensing station where adhesive is applied and then to the bonding station where the next semiconductor chip is mounted. With a Wire Bonder, the substrate is always advanced in steps to the bonding station where the wires are attached between the semiconductor chip and the substrate. During the forward feed of the curved substrate the vacuum grippers are lowered into the cavities. As soon as the substrate has reached its position, the vacuum grippers are raised by a predetermined distance by means of a lifting cylinder and vacuum is applied. In this position, the vacuum grippers protrude beyond the level of the supporting surface. As soon as the vacuum gripper touches the underneath of the curved substrate, a more or less well-sealed cavity is created. The pressure difference between the pressure on the upper surface of the substrate (atmospheric pressure) and the pressure in the cavity on the underneath (vacuum) then has the effect that the substrate is pressed flat against the supporting surface whereby the flexible vacuum gripper is compressed. As soon as the process—application of adhesive or mounting of semiconductor chip or wiring—is completed, the vacuum is released and the lifting cylinder is lowered. The solution in accordance with the invention has the advantage that, during forward feed of the substrate, the vacuum grippers are located lowered below the supporting surface and therefore can not interfere with the forward feed of the substrate.
- In the following, an embodiment of the invention is described in more detail based on the drawing which is not to scale.
- It is shown in: FIG. 1A, B a cross-section and a plan view of a suction device for receiving a substrate, and
- FIG. 2 a further suction device.
- FIGS. 1A and 1B show a cross-section and a plan view of a suction device with a
plate 1 having alevel supporting surface 2 for receiving asubstrate 3. Thesubstrate 3 is fed forwards in steps by a not presented transport arrangement in atransport direction 4 to a processing station where adhesive is applied or where it is equipped with a semiconductor chip or where wire connections are made between a mounted semiconductor chip and thesubstrate 3. Theplate 1 has adrill hole 5 connectable to a vacuum source which can be switched on and off and agroove 6 let into the supportingsurface 2. Thegroove 6 is located at the position of the processing station. Theplate 1 contains fourcavities 7 arranged in a matrix shape which are open towards the supportingsurface 2 in each of which a lowered flexible vacuum gripper 8.1 to 8.4 is arranged. The vacuum grippers 8.1 to 8.4 are preferably so-called bellow-type vacuum grippers which, thanks to the folds, can be compressed in their longditudinal direction. The four vacuum grippers 8.1 to 8.4 are mounted on acarrier plate 9 which is moved up and down between an upper travel limit and a lower travel limit by means of a pneumatically drivenlifting cylinder 10. The lower travel limit and the upper travel limit are defined by means of stops. The upper travel limit is defined, for example, by means ofscrews 11 arranged in thecarrier plate 9 the heads of which, on raising the liftingcylinder 10, strike on theplate 1. By means of thescrews 11 it can be precisely defined by which distance D the vacuum grippers 8.1 to 8.4 protrude above the level of the supportingsurface 2 at the upper travel limit. At the upper travel limit, the vacuum grippers 8.1 to 8.4 protrude above the level of the supportingsurface 2 by a distance D of typically around 2 mm. The distance D is dependent on the maximum curvature of thesubstrate 3. At the lower travel limit, the vacuum grippers 8.1 to 8.4 are located completely lowered within therespective cavity 7 so that the forward feed of thesubstrate 3 can take place unhindered. - On the one hand, with increasing diameter of the suction opening of the bellow-type vacuum gripper, the force acting upon the
substrate 3 increases when vacuum is applied while, on the other hand, the rigidity of the bellow-type vacuum gripper increases which offers mechanical resistance to the suction of thesubstrate 3. Bellow-type vacuum grippers of type FG 9 from the company Schmalz have proved to be reliable. - The two vacuum grippers8.1 and 8.2 which are arranged at the same level when viewed in
transport direction 4 are connected to a not presented vacuum source by means of afirst valve 12. The two vacuum grippers 8.3 and 8.4 which are also arranged at the same level when viewed intransport direction 4 are connected to the vacuum source by means of asecond valve 13. Thedrill hole 5 is connected to the vacuum source by means of athird valve 14. - In operation, the suction device works correspondingly to the working cycle of the machine as follows: The lifting
cylinder 10 is first located at its lower travel limit: the vacuum grippers 8.1 to 8.4 are located lowered into thecavities 7. Thevalves drill hole 5 or to the vacuum grippers 8.1 to 8.4. Thesubstrate 3 is fed forward. After thesubstrate 3 has reached its foreseen position, the liftingcylinder 10 is brought to its upper travel limit. Furthermore, the threevalves drill hole 5 and the vacuum grippers 8.1 to 8.4. As soon as a vacuum gripper touches the underneath of thesubstrate 3, a more or less well-sealed cavity is created. The pressure difference between the pressure on the upper surface of the substrate 3 (atmospheric pressure) and the pressure in the cavity underneath (vacuum) then has the effect that thesubstrate 3 is pressed flat against the supportingsurface 2 whereby the vacuum gripper is compressed. As soon as thesubstrate 3 lies flat on the supportingsurface 2, the cavity formed between thegroove 6 and thesubstrate 3 is also filled with vacuum. Because of thegroove 6, thesubstrate 3 is on the one hand sucked onto the processing location and, on the other hand, is supported on the area of the supportingsurface 2 surrounding thegroove 6. As soon as the process—application of adhesive or mounting or wiring the semiconductor chip—is completed, the threevalves lifting cylinder 10 is lowered. The working cycle is completed and the next working cycle begins. - In operation, it often occurs that only the two vacuum grippers8.1 and 8.2 or only the two vacuum grippers 8.3 and 8.4 are covered by the
substrate 3. Nevertheless, sufficient vacuum can be built up between thesubstrate 3 and the covered vacuum grippers to press thesubstrate 3 flat when the internal flow resistance of thevalves - The three
valves valve 14 which applies vacuum to thedrill hole 5 with a slight delay. - Optionally, there can be a
second drill hole 15 opening into thegroove 6 at the other end of which a not presented sensor is arranged for measuring the vacuum. After each opening of the threevalves drill hole 15 or in thegroove 6 reaches a predetermined value. If thesubstrate 3 lies flat on the supportingsurface 2, the vacuum in thedrill hole 15 or in thegroove 6 beneath the substrate develops, the sensor responds and the process step is carried out. If the desired vacuum strength is not achieved, then an error message is produced. - FIG. 2 shows a schematic drawing of a further suction device with which the four vacuum grippers8.1 to 8.4 and the
drill hole 5 are connected to onesingle valve 12. The two vacuum grippers 8.1 and 8.2 which are arranged next to each other when viewed intransport direction 4 are connected to thevalve 12 via acommon flow resistance 16. The two vacuum grippers 8.3 and 8.4 which are also arranged next to each other when viewed intransport direction 4 are connected to thevalve 12 via acommon flow resistance 17. Thedrill hole 5 is connected to thevalve 12 via athird flow resistance 18. The task of theflow resistors 16 to 18 is to limit the leakage rate when the corresponding vacuum grippers or thedrill hole 5 are not covered so that the other covered vacuum grippers can nevertheless apply suction to thesubstrate 3. Such a flow resistance consists, for example, of a throat installed in the line between the vacuum gripper and the valve, the cross-section and length of which result in the desired flow resistance. - The design of the suction device with four vacuum grippers guarantees perfect holding of the substrate with optimum utilization of the available area and optimum adaptation to the manner in which the substrates are transported: It must namely be taken into consideration that the substrates have to be fed one after the other to the processing station and must be held there flat on the supporting surface. Instead of the circular bellow-type vacuum gripper, vacuum grippers of a different shape, eg, of a rectangular, square or eliptical shape, can also be used.
Claims (3)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH229099 | 1999-12-14 | ||
CH2290/99 | 1999-12-14 | ||
CH19992290/99 | 1999-12-14 |
Publications (2)
Publication Number | Publication Date |
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US20020093130A1 true US20020093130A1 (en) | 2002-07-18 |
US6435492B1 US6435492B1 (en) | 2002-08-20 |
Family
ID=4230324
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/732,678 Expired - Fee Related US6435492B1 (en) | 1999-12-14 | 2000-12-08 | Die bonder and/or wire bonder with a suction device for pulling flat and holding down a curved substrate |
Country Status (7)
Country | Link |
---|---|
US (1) | US6435492B1 (en) |
KR (1) | KR100655981B1 (en) |
CH (1) | CH695405A5 (en) |
DE (1) | DE10059883A1 (en) |
HK (1) | HK1032334A2 (en) |
SG (1) | SG90213A1 (en) |
TW (1) | TW478024B (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040182912A1 (en) * | 2003-03-21 | 2004-09-23 | Esec Trading Sa | Wire bonder |
WO2006006509A2 (en) * | 2004-07-08 | 2006-01-19 | Matsushita Electric Industrial Co., Ltd. | Substrate processing apparatus and mounter |
JP2006024797A (en) * | 2004-07-08 | 2006-01-26 | Matsushita Electric Ind Co Ltd | Part packaging apparatus |
JP2017156525A (en) * | 2016-03-01 | 2017-09-07 | ウシオ電機株式会社 | Exposure device for printed circuit board |
JP2020057018A (en) * | 2019-12-25 | 2020-04-09 | 株式会社アドテックエンジニアリング | Exposure device for printed circuit board |
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CH695075A5 (en) * | 2000-07-03 | 2005-11-30 | Esec Trading Sa | Pick-up tool |
TW527674B (en) * | 2000-12-06 | 2003-04-11 | Esec Trading Sa | Die bonder and/or wire bonder with a device for holding down a substrate |
US6564979B2 (en) * | 2001-07-18 | 2003-05-20 | Micron Technology, Inc. | Method and apparatus for dispensing adhesive on microelectronic substrate supports |
DE10159921A1 (en) * | 2001-12-06 | 2003-06-18 | Imt Robot Ag | Object grippers for automation technology |
JP4312001B2 (en) * | 2003-07-28 | 2009-08-12 | リアライズ・アドバンストテクノロジ株式会社 | Substrate support device and substrate removal method |
US7044476B2 (en) * | 2003-11-25 | 2006-05-16 | N&K Technology, Inc. | Compact pinlifter assembly integrated in wafer chuck |
DE102011001879A1 (en) * | 2011-04-07 | 2012-10-11 | Jenoptik Automatisierungstechnik Gmbh | Device for clamping wafer utilized in e.g. micro system technology, has suction port connected with vacuum ejector via distributor, and suction insert provided in suction port and includes resilient hollow body opened at its two sides |
CN103904011B (en) * | 2012-12-28 | 2016-12-28 | 上海微电子装备有限公司 | Warpage silicon-chip absorption device and absorption method thereof |
US9630269B2 (en) | 2013-10-30 | 2017-04-25 | Globalfoundries Inc. | Mechanism to attach a die to a substrate |
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BE794002A (en) * | 1972-01-13 | 1973-05-02 | Coburn Optical Ind | SUCTION-EFFECT GLASS HOLDER FOR OPHTHALMIC GLASS FINISHING MACHINE |
US3934916A (en) * | 1974-01-25 | 1976-01-27 | Kliklok Corporation | Vacuum pickup cup |
FR2527124A1 (en) | 1982-05-18 | 1983-11-25 | Gerber Scient Products Inc | VACUUM HOLDER |
US4566170A (en) | 1983-05-10 | 1986-01-28 | Pitney Bowes Inc. | Method of producing a light emiting diode array |
NL8701603A (en) | 1987-07-08 | 1989-02-01 | Philips & Du Pont Optical | VACUUM DEVICE FOR SECURING WORKPIECES. |
JPH0831515B2 (en) * | 1988-06-21 | 1996-03-27 | 株式会社ニコン | Substrate suction device |
JPH02105429A (en) | 1988-10-13 | 1990-04-18 | Nec Corp | Lead-frame feed apparatus |
EP0456426B1 (en) | 1990-05-07 | 2004-09-15 | Canon Kabushiki Kaisha | Vacuum type wafer holder |
US5281794A (en) | 1990-05-25 | 1994-01-25 | Kabushiki Kaisha Shinkawa | Heater block for use in a bonder utilizing vacuum suction attachment means |
DE4024642A1 (en) | 1990-08-03 | 1992-02-06 | Ibm | SLINGER PLATE FOR SUBSTRATE |
DE4129146A1 (en) | 1991-09-02 | 1993-03-04 | Siemens Nixdorf Inf Syst | BAND-SHAPED AUXILIARY CARRIER AS ASSEMBLY AID FOR THE LINE-BY-LINE ASSEMBLY OF SEMICONDUCTOR CHIPS ON A MATCHING SURFACE OF A CARRIER ELEMENT AND A RELEVANT ASSEMBLY METHOD |
USH1373H (en) | 1992-04-06 | 1994-11-01 | American Telephone And Telegraph Company | Wafer handling apparatus and method |
JPH0669254A (en) | 1992-08-13 | 1994-03-11 | Hitachi Ltd | Lead-frame positioning stopper mechanism and wire bonder using the mechanism |
JPH0758191A (en) | 1993-08-13 | 1995-03-03 | Toshiba Corp | Wafer stage device |
JP3225336B2 (en) | 1995-07-13 | 2001-11-05 | 株式会社新川 | Lead frame suction holding device |
US5923408A (en) | 1996-01-31 | 1999-07-13 | Canon Kabushiki Kaisha | Substrate holding system and exposure apparatus using the same |
US5937993A (en) | 1997-01-14 | 1999-08-17 | Tamarac Scientific Co., Inc. | Apparatus and method for automatically handling and holding panels near and at the exact plane of exposure |
US6164633A (en) * | 1999-05-18 | 2000-12-26 | International Business Machines Corporation | Multiple size wafer vacuum chuck |
-
2000
- 2000-11-15 CH CH02222/00A patent/CH695405A5/en not_active IP Right Cessation
- 2000-12-01 DE DE10059883A patent/DE10059883A1/en not_active Withdrawn
- 2000-12-05 SG SG200007136A patent/SG90213A1/en unknown
- 2000-12-06 TW TW089126004A patent/TW478024B/en not_active IP Right Cessation
- 2000-12-07 KR KR1020000074065A patent/KR100655981B1/en not_active IP Right Cessation
- 2000-12-08 US US09/732,678 patent/US6435492B1/en not_active Expired - Fee Related
- 2000-12-14 HK HK00108081A patent/HK1032334A2/en not_active IP Right Cessation
Cited By (12)
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US20040182912A1 (en) * | 2003-03-21 | 2004-09-23 | Esec Trading Sa | Wire bonder |
WO2006006509A2 (en) * | 2004-07-08 | 2006-01-19 | Matsushita Electric Industrial Co., Ltd. | Substrate processing apparatus and mounter |
JP2006024797A (en) * | 2004-07-08 | 2006-01-26 | Matsushita Electric Ind Co Ltd | Part packaging apparatus |
WO2006006509A3 (en) * | 2004-07-08 | 2006-12-21 | Matsushita Electric Ind Co Ltd | Substrate processing apparatus and mounter |
US20080301932A1 (en) * | 2004-07-08 | 2008-12-11 | Takahiko Murata | Substrate Processing Apparatus and Mounter |
CN100546453C (en) * | 2004-07-08 | 2009-09-30 | 松下电器产业株式会社 | Substrate board treatment and erector |
US7653989B2 (en) | 2004-07-08 | 2010-02-02 | Panasonic Corporation | Substrate processing apparatus and mounter |
JP4555008B2 (en) * | 2004-07-08 | 2010-09-29 | パナソニック株式会社 | Component mounting equipment |
JP2017156525A (en) * | 2016-03-01 | 2017-09-07 | ウシオ電機株式会社 | Exposure device for printed circuit board |
KR20170102431A (en) * | 2016-03-01 | 2017-09-11 | 우시오덴키 가부시키가이샤 | Exposing apparatus for print substrate |
KR102126456B1 (en) | 2016-03-01 | 2020-06-24 | 우시오덴키 가부시키가이샤 | Exposing apparatus for print substrate |
JP2020057018A (en) * | 2019-12-25 | 2020-04-09 | 株式会社アドテックエンジニアリング | Exposure device for printed circuit board |
Also Published As
Publication number | Publication date |
---|---|
KR100655981B1 (en) | 2006-12-08 |
US6435492B1 (en) | 2002-08-20 |
DE10059883A1 (en) | 2001-09-20 |
KR20010062185A (en) | 2001-07-07 |
HK1032334A2 (en) | 2001-07-06 |
SG90213A1 (en) | 2002-07-23 |
TW478024B (en) | 2002-03-01 |
CH695405A5 (en) | 2006-04-28 |
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