TW457362B - Measurement of film thickness by inelastic electron scattering - Google Patents
Measurement of film thickness by inelastic electron scattering Download PDFInfo
- Publication number
- TW457362B TW457362B TW089112792A TW89112792A TW457362B TW 457362 B TW457362 B TW 457362B TW 089112792 A TW089112792 A TW 089112792A TW 89112792 A TW89112792 A TW 89112792A TW 457362 B TW457362 B TW 457362B
- Authority
- TW
- Taiwan
- Prior art keywords
- energy
- patent application
- thickness
- scope
- item
- Prior art date
Links
- 238000005259 measurement Methods 0.000 title claims description 17
- 238000001803 electron scattering Methods 0.000 title 1
- 238000001228 spectrum Methods 0.000 claims abstract description 53
- 238000012360 testing method Methods 0.000 claims abstract description 37
- 239000000463 material Substances 0.000 claims abstract description 34
- 238000000034 method Methods 0.000 claims abstract description 34
- 230000005855 radiation Effects 0.000 claims abstract description 22
- 239000000758 substrate Substances 0.000 claims abstract description 19
- 239000000203 mixture Substances 0.000 claims abstract description 14
- 238000004458 analytical method Methods 0.000 claims abstract description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 6
- 239000010408 film Substances 0.000 claims description 55
- 239000000523 sample Substances 0.000 claims description 32
- 239000013074 reference sample Substances 0.000 claims description 10
- 239000010409 thin film Substances 0.000 claims description 7
- 230000002079 cooperative effect Effects 0.000 claims description 6
- 239000003302 ferromagnetic material Substances 0.000 claims description 4
- 230000005611 electricity Effects 0.000 claims description 2
- 239000008186 active pharmaceutical agent Substances 0.000 claims 1
- 238000013507 mapping Methods 0.000 claims 1
- 238000000576 coating method Methods 0.000 abstract description 3
- 230000005294 ferromagnetic effect Effects 0.000 abstract description 3
- 239000011248 coating agent Substances 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 26
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 5
- 230000007704 transition Effects 0.000 description 5
- 230000001066 destructive effect Effects 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000002265 electronic spectrum Methods 0.000 description 4
- 230000005291 magnetic effect Effects 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 230000002596 correlated effect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000001493 electron microscopy Methods 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 235000015170 shellfish Nutrition 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- 240000005979 Hordeum vulgare Species 0.000 description 1
- 235000007340 Hordeum vulgare Nutrition 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000009429 distress Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 238000010606 normalization Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000012925 reference material Substances 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000000562 secondary electron spectroscopy Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000005211 surface analysis Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
- G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Measurement Of The Respiration, Hearing Ability, Form, And Blood Characteristics Of Living Organisms (AREA)
- Extrusion Moulding Of Plastics Or The Like (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/350,701 US6399944B1 (en) | 1999-07-09 | 1999-07-09 | Measurement of film thickness by inelastic electron scattering |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW457362B true TW457362B (en) | 2001-10-01 |
Family
ID=23377837
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW089112792A TW457362B (en) | 1999-07-09 | 2000-06-28 | Measurement of film thickness by inelastic electron scattering |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6399944B1 (enExample) |
| EP (1) | EP1192416B1 (enExample) |
| JP (1) | JP2003504609A (enExample) |
| AT (1) | ATE291731T1 (enExample) |
| AU (1) | AU5759400A (enExample) |
| DE (1) | DE60018932T2 (enExample) |
| TW (1) | TW457362B (enExample) |
| WO (1) | WO2001004574A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111566472A (zh) * | 2018-01-06 | 2020-08-21 | 科磊股份有限公司 | 用于组合的x射线反射测量术与光电子光谱术的系统及方法 |
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|---|---|---|---|---|
| US6635869B2 (en) * | 2001-02-26 | 2003-10-21 | Fei Company | Step function determination of Auger peak intensity |
| US6781126B2 (en) * | 2002-02-04 | 2004-08-24 | Applied Materials, Inc. | Auger-based thin film metrology |
| US6891158B2 (en) | 2002-12-27 | 2005-05-10 | Revera Incorporated | Nondestructive characterization of thin films based on acquired spectrum |
| WO2004061388A2 (en) * | 2002-12-27 | 2004-07-22 | Physical Electronics, Inc. | Nondestructive characterization of thin films using measured basis spectra and/or based on acquired spectrum |
| JP4344197B2 (ja) * | 2003-08-26 | 2009-10-14 | パナソニック株式会社 | 絶縁膜測定装置、絶縁膜測定方法及び絶縁膜評価装置 |
| CN101091101A (zh) * | 2004-12-27 | 2007-12-19 | 新科实业有限公司 | 通过俄歇电子能谱测量纳米薄膜厚度的方法 |
| EP1843126B1 (en) * | 2005-01-07 | 2009-12-09 | SII NanoTechnology Inc. | Method and apparatus for measuring thin film sample |
| US7420163B2 (en) * | 2005-04-29 | 2008-09-02 | Revera Incorporated | Determining layer thickness using photoelectron spectroscopy |
| US7231324B2 (en) * | 2005-04-29 | 2007-06-12 | Revera Incorporated | Techniques for analyzing data generated by instruments |
| US7411188B2 (en) | 2005-07-11 | 2008-08-12 | Revera Incorporated | Method and system for non-destructive distribution profiling of an element in a film |
| EP2251452B1 (en) | 2009-05-13 | 2018-07-18 | SiO2 Medical Products, Inc. | Pecvd apparatus for vessel coating |
| US7985188B2 (en) | 2009-05-13 | 2011-07-26 | Cv Holdings Llc | Vessel, coating, inspection and processing apparatus |
| US9458536B2 (en) | 2009-07-02 | 2016-10-04 | Sio2 Medical Products, Inc. | PECVD coating methods for capped syringes, cartridges and other articles |
| US8581602B2 (en) * | 2009-09-02 | 2013-11-12 | Systems And Materials Research Corporation | Method and apparatus for nondestructive measuring of a coating thickness on a curved surface |
| US11624115B2 (en) | 2010-05-12 | 2023-04-11 | Sio2 Medical Products, Inc. | Syringe with PECVD lubrication |
| US8698077B2 (en) | 2010-06-25 | 2014-04-15 | Nec Corporation | Method for determining number of layers of two-dimensional thin film atomic structure and device for determining number of layers of two-dimensional thin film atomic structure |
| US9878101B2 (en) | 2010-11-12 | 2018-01-30 | Sio2 Medical Products, Inc. | Cyclic olefin polymer vessels and vessel coating methods |
| US8853078B2 (en) | 2011-01-30 | 2014-10-07 | Fei Company | Method of depositing material |
| US9090973B2 (en) | 2011-01-31 | 2015-07-28 | Fei Company | Beam-induced deposition of low-resistivity material |
| US9272095B2 (en) | 2011-04-01 | 2016-03-01 | Sio2 Medical Products, Inc. | Vessels, contact surfaces, and coating and inspection apparatus and methods |
| US11116695B2 (en) | 2011-11-11 | 2021-09-14 | Sio2 Medical Products, Inc. | Blood sample collection tube |
| CN103930595A (zh) | 2011-11-11 | 2014-07-16 | Sio2医药产品公司 | 用于药物包装的钝化、pH保护性或润滑性涂层、涂布方法以及设备 |
| EP2846755A1 (en) | 2012-05-09 | 2015-03-18 | SiO2 Medical Products, Inc. | Saccharide protective coating for pharmaceutical package |
| US8658973B2 (en) * | 2012-06-12 | 2014-02-25 | Kla-Tencor Corporation | Auger elemental identification algorithm |
| US20150297800A1 (en) | 2012-07-03 | 2015-10-22 | Sio2 Medical Products, Inc. | SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS |
| KR101241007B1 (ko) * | 2012-10-26 | 2013-03-11 | 나노씨엠에스(주) | 엑스선을 이용한 박막층의 두께 측정 방법 및 장치 |
| US9664626B2 (en) | 2012-11-01 | 2017-05-30 | Sio2 Medical Products, Inc. | Coating inspection method |
| WO2014078666A1 (en) | 2012-11-16 | 2014-05-22 | Sio2 Medical Products, Inc. | Method and apparatus for detecting rapid barrier coating integrity characteristics |
| US9764093B2 (en) | 2012-11-30 | 2017-09-19 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition |
| EP2925903B1 (en) | 2012-11-30 | 2022-04-13 | Si02 Medical Products, Inc. | Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like |
| US9662450B2 (en) | 2013-03-01 | 2017-05-30 | Sio2 Medical Products, Inc. | Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus |
| US9937099B2 (en) | 2013-03-11 | 2018-04-10 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging with low oxygen transmission rate |
| WO2014164928A1 (en) | 2013-03-11 | 2014-10-09 | Sio2 Medical Products, Inc. | Coated packaging |
| WO2014144926A1 (en) | 2013-03-15 | 2014-09-18 | Sio2 Medical Products, Inc. | Coating method |
| CN103713002B (zh) * | 2013-12-27 | 2016-04-27 | 昆明贵研催化剂有限责任公司 | 一种测定汽车尾气催化剂涂层厚度的方法 |
| EP3122917B1 (en) | 2014-03-28 | 2020-05-06 | SiO2 Medical Products, Inc. | Antistatic coatings for plastic vessels |
| EP3104155A1 (en) | 2015-06-09 | 2016-12-14 | FEI Company | Method of analyzing surface modification of a specimen in a charged-particle microscope |
| EP4001456A1 (en) | 2015-08-18 | 2022-05-25 | SiO2 Medical Products, Inc. | Pharmaceutical and other packaging with low oxygen transmission rate |
| US9837246B1 (en) | 2016-07-22 | 2017-12-05 | Fei Company | Reinforced sample for transmission electron microscope |
| WO2018229848A1 (ja) * | 2017-06-13 | 2018-12-20 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置及び試料の厚さ測定法 |
| DE102018202985A1 (de) | 2018-02-28 | 2018-04-12 | Carl Zeiss Smt Gmbh | Verfahren zum Bestimmen einer Ablösewahrscheinlichkeit einer Schicht |
| CN114046736B (zh) * | 2021-11-09 | 2023-02-28 | 北京理工大学 | 一种基于泵浦探测分析确定金属电子弹道深度的方法 |
| CN114923938B (zh) * | 2022-05-24 | 2025-04-29 | 长江存储科技有限责任公司 | 样品的表征方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2611411C3 (de) | 1976-03-18 | 1980-07-17 | Helmut Fischer Gmbh & Co Institut Fuer Elektronik Und Messtechnik, 7032 Sindelfingen | Vorrichtung zum Messen der Dicke von Schichten mit einem die Schicht bestrahlenden Radionuklid |
| JPS52127292A (en) * | 1976-04-16 | 1977-10-25 | Hitachi Ltd | Analyzer |
| GB2054136B (en) | 1979-07-19 | 1983-06-29 | Fischer H | Apparatus for measuring the thickness of thin layers |
| JPS60128306A (ja) * | 1983-12-16 | 1985-07-09 | Nippon Telegr & Teleph Corp <Ntt> | 磁気デイスク媒体の潤滑剤膜厚測定方法 |
| JPH0766507B2 (ja) * | 1984-02-16 | 1995-07-19 | コニカ株式会社 | 磁気記録媒体 |
| EP0189498B1 (en) * | 1985-01-29 | 1989-05-03 | International Business Machines Corporation | Field-emission scanning auger electron microscope |
| JPS639807A (ja) * | 1986-06-30 | 1988-01-16 | Nec Corp | 膜厚測定方法およびその装置 |
| US5594245A (en) * | 1990-10-12 | 1997-01-14 | Hitachi, Ltd. | Scanning electron microscope and method for dimension measuring by using the same |
| US5280176A (en) | 1992-11-06 | 1994-01-18 | The United States Of America As Represented By The Secretary Of Commerce | X-ray photoelectron emission spectrometry system |
| JP2930866B2 (ja) * | 1994-05-25 | 1999-08-09 | 理学電機工業株式会社 | Ｘ線分析方法およびこれに用いる装置 |
| JPH0914947A (ja) * | 1995-06-29 | 1997-01-17 | Sony Corp | カーボン膜の膜厚測定方法 |
| US5924058A (en) * | 1997-02-14 | 1999-07-13 | Applied Materials, Inc. | Permanently mounted reference sample for a substrate measurement tool |
| US6067154A (en) * | 1998-10-23 | 2000-05-23 | Advanced Micro Devices, Inc. | Method and apparatus for the molecular identification of defects in semiconductor manufacturing using a radiation scattering technique such as raman spectroscopy |
-
1999
- 1999-07-09 US US09/350,701 patent/US6399944B1/en not_active Expired - Lifetime
-
2000
- 2000-06-22 AT AT00943069T patent/ATE291731T1/de not_active IP Right Cessation
- 2000-06-22 EP EP00943069A patent/EP1192416B1/en not_active Expired - Lifetime
- 2000-06-22 AU AU57594/00A patent/AU5759400A/en not_active Abandoned
- 2000-06-22 WO PCT/US2000/017234 patent/WO2001004574A1/en not_active Ceased
- 2000-06-22 JP JP2001509941A patent/JP2003504609A/ja active Pending
- 2000-06-22 DE DE60018932T patent/DE60018932T2/de not_active Expired - Lifetime
- 2000-06-28 TW TW089112792A patent/TW457362B/zh not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111566472A (zh) * | 2018-01-06 | 2020-08-21 | 科磊股份有限公司 | 用于组合的x射线反射测量术与光电子光谱术的系统及方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE60018932T2 (de) | 2006-03-30 |
| EP1192416B1 (en) | 2005-03-23 |
| WO2001004574A1 (en) | 2001-01-18 |
| DE60018932D1 (de) | 2005-04-28 |
| US6399944B1 (en) | 2002-06-04 |
| JP2003504609A (ja) | 2003-02-04 |
| EP1192416A1 (en) | 2002-04-03 |
| AU5759400A (en) | 2001-01-30 |
| ATE291731T1 (de) | 2005-04-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GD4A | Issue of patent certificate for granted invention patent | ||
| MM4A | Annulment or lapse of patent due to non-payment of fees |