CN101091101A - 通过俄歇电子能谱测量纳米薄膜厚度的方法 - Google Patents
通过俄歇电子能谱测量纳米薄膜厚度的方法 Download PDFInfo
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- CN101091101A CN101091101A CNA2004800447433A CN200480044743A CN101091101A CN 101091101 A CN101091101 A CN 101091101A CN A2004800447433 A CNA2004800447433 A CN A2004800447433A CN 200480044743 A CN200480044743 A CN 200480044743A CN 101091101 A CN101091101 A CN 101091101A
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- thickness
- mathematical model
- auger electron
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- 238000000034 method Methods 0.000 title claims abstract description 46
- 238000001228 spectrum Methods 0.000 title claims description 6
- 239000002120 nanofilm Substances 0.000 title description 3
- 238000000682 scanning probe acoustic microscopy Methods 0.000 claims abstract description 42
- 239000000758 substrate Substances 0.000 claims abstract description 35
- 238000013178 mathematical model Methods 0.000 claims abstract description 34
- 238000005259 measurement Methods 0.000 claims abstract description 25
- 238000004458 analytical method Methods 0.000 claims abstract description 5
- 238000005516 engineering process Methods 0.000 claims description 8
- 230000005540 biological transmission Effects 0.000 claims description 6
- 238000012360 testing method Methods 0.000 claims description 3
- 238000009795 derivation Methods 0.000 claims description 2
- 239000010408 film Substances 0.000 abstract description 18
- 239000010409 thin film Substances 0.000 abstract description 3
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 17
- 239000012528 membrane Substances 0.000 description 16
- 229910052710 silicon Inorganic materials 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 229910052799 carbon Inorganic materials 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 229910003271 Ni-Fe Inorganic materials 0.000 description 4
- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910017061 Fe Co Inorganic materials 0.000 description 3
- 229910001021 Ferroalloy Inorganic materials 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 230000001066 destructive effect Effects 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 2
- 229910017709 Ni Co Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000005211 surface analysis Methods 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
- G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/227—Measuring photoelectric effect, e.g. photoelectron emission microscopy [PEEM]
- G01N23/2276—Measuring photoelectric effect, e.g. photoelectron emission microscopy [PEEM] using the Auger effect, e.g. Auger electron spectroscopy [AES]
Abstract
Description
强度比 | ABS(Al2) | Ni-Fe(Ni1) | Ni-Fe-Co(Co1) | 引线(Au3) |
a′ | 0.946 | 2.319 | 2.043 | 5.529 |
a″ | 1.090 | 1.011 | 1.011 | 1.011 |
修改因子 | ABS(Al2) | Ni-Fe(Ni1) | Ni-Fe-Co(Co1) | 引线(Au3) |
R | 1.000 | 1.420 | 1.420 | 1.652 |
R’ | 1.000 | 1.263 | 1.263 | 0.937 |
平均自由路径 | ABS(Al2) | Ni-Fe(Ni1) | Ni-Fe-Co(Co1) | 引线(Au3) |
λSi DLC | 3.100nm | 3.1nm | 3.1nm | 3.1nm |
λSubstrate Si | 2.400nm | 1.951nm | 1.951nm | 1.260nm |
测量面积 | 条块(无ABS) | 滑块/条块上ABS | 屏蔽 | 引线 | ||||||||
方法 | DLC | Si | 总计 | DLC | Si | 总计 | DLC | Si | 总计 | DLC | Si | 总计 |
目标() | 25 | 10 | 35 | 25 | 10 | 35 | 25 | 10 | 35 | 25 | 10 | 35 |
AES数据() | 24.7 | 30.6 | 55.3 | 24.7 | 30.6 | 55.3 | 29.8 | 30 | 59.8 | 28.6 | 32.7 | 61.3 |
ESCA数据() | 29.2 | 25.7 | 54.9 | --- | --- | --- | --- | --- | --- | --- | --- | --- |
AFM数据() | --- | --- | 57.9 | --- | --- | 57.9 | --- | --- | 57.9 | --- | --- | 57.9 |
TEM数据() | --- | --- | 60 | --- | --- | 60 | --- | --- | 60 | --- | --- | 60 |
测量面积 | 条块(无ABS) | 滑块/条块上ABS | 屏蔽 | 引线 | ||||||||
方法 | DLC | Si | 总计 | DLC | Si | 总计 | DLC | Si | 总计 | DLC | Si | 总计 |
目标() | 10 | 25 | 35 | 10 | 25 | 35 | 10 | 25 | 35 | 10 | 25 | 35 |
AES数据() | 15 | 35.6 | 50.6 | 15 | 35.6 | 50.6 | 12.6 | 40.8 | 53.4 | 14.8 | 40.4 | 53.2 |
ESCA数据() | 11.9 | 37.2 | 49.1 | --- | --- | --- | --- | --- | --- | --- | --- | --- |
AFM数据() | --- | --- | 50.5 | --- | --- | 50.5 | --- | --- | 50.5 | --- | --- | 50.5 |
TEM数据() | --- | --- | 48 | --- | --- | 48 | --- | --- | 48 | --- | --- | 48 |
测量面积 | 条块(无ABS) | 滑块/条块上ABS | 屏蔽 | 引线 | ||||||||
方法 | DLC | Si | 总计 | DLC | Si | 总计 | DLC | Si | 总计 | DLC | Si | 总计 |
目标() | 40 | 25 | 65 | 40 | 25 | 65 | 40 | 25 | 65 | 40 | 25 | 65 |
AES数据() | 48.9 | --- | --- | 48.9 | --- | --- | 47.4 | --- | --- | 44.6 | --- | --- |
ESCA数据() | 37.3 | 44.2 | 81.5 | --- | --- | --- | --- | --- | --- | --- | --- | --- |
AFM数据() | --- | --- | 82.2 | --- | --- | 82.2 | --- | --- | 82.2 | --- | --- | 82.2 |
TEM数据() | --- | --- | 78 | --- | --- | 78 | --- | --- | 78 | --- | --- | 78 |
测量面积 | 条块(无ABS) | 滑块/条块上ABS | 屏蔽 | 引线 | ||||||||
方法 | DLC | Si | 总计 | DLC | Si | 总计 | DLC | Si | 总计 | DLC | Si | 总计 |
目标() | 25 | 40 | 65 | 25 | 40 | 65 | 25 | 40 | 65 | 25 | 40 | 65 |
AES数据() | 49.5 | --- | --- | 49.5 | --- | --- | 47.5 | --- | --- | 50 | --- | --- |
ESCA数据() | 28.2 | 50.8 | 79 | --- | --- | --- | --- | --- | --- | --- | --- | --- |
AFM数据() | --- | --- | 83.7 | --- | --- | 83.7 | --- | --- | 83.7 | --- | --- | 83.7 |
TEM数据() | --- | --- | 84 | --- | --- | 84 | --- | --- | 84 | --- | --- | 84 |
Claims (20)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/CN2004/001529 WO2006069469A1 (en) | 2004-12-27 | 2004-12-27 | Method of nano thin film thickness measurement by auger electron spectrscopy |
Publications (1)
Publication Number | Publication Date |
---|---|
CN101091101A true CN101091101A (zh) | 2007-12-19 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNA2004800447433A Pending CN101091101A (zh) | 2004-12-27 | 2004-12-27 | 通过俄歇电子能谱测量纳米薄膜厚度的方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US7582868B2 (zh) |
CN (1) | CN101091101A (zh) |
WO (1) | WO2006069469A1 (zh) |
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TWI457536B (zh) * | 2011-03-03 | 2014-10-21 | Dainippon Screen Mfg | 膜形狀取得裝置及膜形狀取得方法 |
CN106770620A (zh) * | 2016-11-21 | 2017-05-31 | 汕头大学 | 用溅射深度剖析技术确定薄膜中元素成分深度分布的方法 |
CN108535305A (zh) * | 2018-03-30 | 2018-09-14 | 南京大学 | 一种基于元素成像的超导纳米线均匀性分析的方法 |
CN112992711A (zh) * | 2021-03-11 | 2021-06-18 | 中国电子科技集团公司第四十六研究所 | 超薄型soi材料顶层硅和埋氧化层厚度的测量方法 |
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JP4401407B2 (ja) * | 2007-08-24 | 2010-01-20 | 富士通株式会社 | 素子評価方法及び装置 |
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US9026716B2 (en) | 2010-05-12 | 2015-05-05 | Western Digital Technologies, Inc. | System and method for managing garbage collection in solid-state memory |
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US8298609B1 (en) | 2010-06-14 | 2012-10-30 | Wd Media, Inc. | Method and system for interrogating the thickness of a carbon layer |
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JPS532599B2 (zh) * | 1972-10-30 | 1978-01-30 | ||
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JP3060889B2 (ja) * | 1995-05-19 | 2000-07-10 | トヨタ自動車株式会社 | 薄膜の膜厚測定方法 |
JP2924819B2 (ja) * | 1996-10-09 | 1999-07-26 | 日本電気株式会社 | 磁気抵抗効果膜及びその製造方法 |
US6476913B1 (en) * | 1998-11-30 | 2002-11-05 | Hitachi, Ltd. | Inspection method, apparatus and system for circuit pattern |
JP3388709B2 (ja) * | 1999-01-27 | 2003-03-24 | 理化学研究所 | 電子衝撃型反跳水素分析器 |
US6399944B1 (en) * | 1999-07-09 | 2002-06-04 | Fei Company | Measurement of film thickness by inelastic electron scattering |
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US6781126B2 (en) * | 2002-02-04 | 2004-08-24 | Applied Materials, Inc. | Auger-based thin film metrology |
JP3811089B2 (ja) * | 2002-04-15 | 2006-08-16 | 株式会社東芝 | 摩耗量測定方法 |
-
2004
- 2004-12-27 CN CNA2004800447433A patent/CN101091101A/zh active Pending
- 2004-12-27 WO PCT/CN2004/001529 patent/WO2006069469A1/en not_active Application Discontinuation
-
2005
- 2005-07-27 US US11/192,199 patent/US7582868B2/en active Active
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US20060138326A1 (en) | 2006-06-29 |
WO2006069469A1 (en) | 2006-07-06 |
US7582868B2 (en) | 2009-09-01 |
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