JP4803440B2 - 探針形状評価用標準試料 - Google Patents
探針形状評価用標準試料 Download PDFInfo
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- JP4803440B2 JP4803440B2 JP2006220848A JP2006220848A JP4803440B2 JP 4803440 B2 JP4803440 B2 JP 4803440B2 JP 2006220848 A JP2006220848 A JP 2006220848A JP 2006220848 A JP2006220848 A JP 2006220848A JP 4803440 B2 JP4803440 B2 JP 4803440B2
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- プローブ顕微鏡の探針の幅と長さを評価する探針形状評価用の標準試料であって、
多層膜を選択性エッチングすることにより、線幅及び線間隔は、該多層膜の膜厚により規定され、線の高さは、該エッチングのエッチング量により規定される構造を備え、
前記多層膜は、GaAsとInGaPからなる多層膜又はシリコンとシリコン酸化膜からなる多層膜であることを特徴とするプローブ顕微鏡の探針形状評価用の標準試料。 - 上記試料は、上記線幅が1から50nmであるナイフエッジ構造を有することを特徴とする請求項1に記載のプローブ顕微鏡の探針形状測定用の標準試料。
- 上記試料は、櫛型の周期構造を有していることを特徴とする請求項1に記載のプローブ顕微鏡の探針形状評価用の標準試料。
- 上記試料は、上記線幅が1から50nmであるナイフエッジ構造及び櫛型の周期構造を組み合わせたことを特徴とする請求項1に記載のプローブ顕微鏡の探針形状評価用の標準試料。
- 請求項2乃至4のいずれか1項に記載された上記試料を複数枚張り合わせたことを特徴とするプローブ顕微鏡の探針形状測定用の標準試料。
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JP2006220848A JP4803440B2 (ja) | 2005-08-16 | 2006-08-14 | 探針形状評価用標準試料 |
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JP2006220848A JP4803440B2 (ja) | 2005-08-16 | 2006-08-14 | 探針形状評価用標準試料 |
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JP2007078679A JP2007078679A (ja) | 2007-03-29 |
JP4803440B2 true JP4803440B2 (ja) | 2011-10-26 |
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Families Citing this family (5)
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FR2951550B1 (fr) * | 2009-10-19 | 2012-04-06 | Commissariat Energie Atomique | Procede et structure de caracterisation d'une pointe de microscopie a force atomique |
JP5902485B2 (ja) * | 2012-01-10 | 2016-04-13 | 株式会社日立ハイテクサイエンス | 走査型プローブ顕微鏡の探針形状評価方法 |
JP7390481B2 (ja) | 2020-05-14 | 2023-12-01 | エヌ・ティ・ティ・アドバンステクノロジ株式会社 | 標準試料およびその作製方法 |
KR102263564B1 (ko) * | 2020-12-15 | 2021-06-11 | 한국표준과학연구원 | 나노 측정 단위 교정 방법 및 이에 이용되는 표준물질 |
US20240069064A1 (en) * | 2020-12-21 | 2024-02-29 | Shimadzu Corporation | Probe assessment method and spm |
Family Cites Families (14)
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JPH0733987B2 (ja) * | 1987-09-17 | 1995-04-12 | 日電アネルバ株式会社 | 表面分析における定量測定方法及び定量測定用標準試料 |
JPH02170426A (ja) * | 1988-12-22 | 1990-07-02 | Toshiba Corp | 多層構造膜のドライエッチング方法 |
JPH04220937A (ja) * | 1990-12-21 | 1992-08-11 | Hitachi Ltd | 分解能評価試料およびその製造方法 |
JPH04287918A (ja) * | 1991-01-23 | 1992-10-13 | Nec Corp | 半導体多層膜のエッチング方法 |
JPH06218870A (ja) * | 1992-06-16 | 1994-08-09 | Kanegafuchi Chem Ind Co Ltd | 多層膜厚さ基準物 |
JPH07225469A (ja) * | 1994-02-16 | 1995-08-22 | Mitsubishi Electric Corp | 露光用マスクおよびその製造方法 |
JPH085313A (ja) * | 1994-06-15 | 1996-01-12 | Shimadzu Corp | 走査型プローブ顕微鏡 |
JPH08201405A (ja) * | 1995-01-30 | 1996-08-09 | Hitachi Ltd | 走査プローブ顕微鏡およびその探針の形状測定方法 |
JPH09199805A (ja) * | 1996-01-13 | 1997-07-31 | Sony Corp | 半導体回折格子およびその製造方法 |
JP3950609B2 (ja) * | 2000-01-24 | 2007-08-01 | 日本電子株式会社 | 探針評価法および走査形プローブ顕微鏡 |
US6294450B1 (en) * | 2000-03-01 | 2001-09-25 | Hewlett-Packard Company | Nanoscale patterning for the formation of extensive wires |
JP2004264039A (ja) * | 2003-01-30 | 2004-09-24 | Hitachi Ltd | 走査プローブ顕微鏡及びcd・断面プロファイル計測方法並びに半導体デバイス製造方法 |
JP2005175450A (ja) * | 2003-11-21 | 2005-06-30 | Sharp Corp | 化合物半導体装置およびその製造方法、ならびにその化合物半導体装置を備えた光ディスク装置 |
JP2006308313A (ja) * | 2005-04-26 | 2006-11-09 | Hitachi Kenki Fine Tech Co Ltd | 走査型プローブ顕微鏡およびその探針評価方法 |
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