AU5759400A - Measurement of film thickness by inelastic electron scattering - Google Patents

Measurement of film thickness by inelastic electron scattering

Info

Publication number
AU5759400A
AU5759400A AU57594/00A AU5759400A AU5759400A AU 5759400 A AU5759400 A AU 5759400A AU 57594/00 A AU57594/00 A AU 57594/00A AU 5759400 A AU5759400 A AU 5759400A AU 5759400 A AU5759400 A AU 5759400A
Authority
AU
Australia
Prior art keywords
thickness
substrate
test
film thickness
electrons
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU57594/00A
Other languages
English (en)
Inventor
Sergey Borodyansky
Charles E. Bryson Iii
Dmitri Ki Yachko
Robert Linder
Leonid A. Vasilyev
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FEI Co
Original Assignee
Surface Interface Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Surface Interface Inc filed Critical Surface Interface Inc
Publication of AU5759400A publication Critical patent/AU5759400A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Measurement Of The Respiration, Hearing Ability, Form, And Blood Characteristics Of Living Organisms (AREA)
  • Extrusion Moulding Of Plastics Or The Like (AREA)
AU57594/00A 1999-07-09 2000-06-22 Measurement of film thickness by inelastic electron scattering Abandoned AU5759400A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/350,701 US6399944B1 (en) 1999-07-09 1999-07-09 Measurement of film thickness by inelastic electron scattering
US09350701 1999-07-09
PCT/US2000/017234 WO2001004574A1 (en) 1999-07-09 2000-06-22 Measurement of film thickness by inelastic electron scattering

Publications (1)

Publication Number Publication Date
AU5759400A true AU5759400A (en) 2001-01-30

Family

ID=23377837

Family Applications (1)

Application Number Title Priority Date Filing Date
AU57594/00A Abandoned AU5759400A (en) 1999-07-09 2000-06-22 Measurement of film thickness by inelastic electron scattering

Country Status (8)

Country Link
US (1) US6399944B1 (enExample)
EP (1) EP1192416B1 (enExample)
JP (1) JP2003504609A (enExample)
AT (1) ATE291731T1 (enExample)
AU (1) AU5759400A (enExample)
DE (1) DE60018932T2 (enExample)
TW (1) TW457362B (enExample)
WO (1) WO2001004574A1 (enExample)

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US6891158B2 (en) * 2002-12-27 2005-05-10 Revera Incorporated Nondestructive characterization of thin films based on acquired spectrum
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WO2006069469A1 (en) * 2004-12-27 2006-07-06 Sae Magnetics (H.K.) Ltd. Method of nano thin film thickness measurement by auger electron spectrscopy
DE602005018261D1 (de) * 2005-01-07 2010-01-21 Sii Nanotechnology Inc Verfahren und vorrichtung zum messen von dünnfilmproben
US7420163B2 (en) * 2005-04-29 2008-09-02 Revera Incorporated Determining layer thickness using photoelectron spectroscopy
US7231324B2 (en) * 2005-04-29 2007-06-12 Revera Incorporated Techniques for analyzing data generated by instruments
US7411188B2 (en) 2005-07-11 2008-08-12 Revera Incorporated Method and system for non-destructive distribution profiling of an element in a film
US7985188B2 (en) 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
DK2251454T3 (da) 2009-05-13 2014-10-13 Sio2 Medical Products Inc Coating og inspektion af beholder
WO2013170052A1 (en) 2012-05-09 2013-11-14 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US8581602B2 (en) 2009-09-02 2013-11-12 Systems And Materials Research Corporation Method and apparatus for nondestructive measuring of a coating thickness on a curved surface
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US8698077B2 (en) 2010-06-25 2014-04-15 Nec Corporation Method for determining number of layers of two-dimensional thin film atomic structure and device for determining number of layers of two-dimensional thin film atomic structure
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US8853078B2 (en) 2011-01-30 2014-10-07 Fei Company Method of depositing material
US9090973B2 (en) 2011-01-31 2015-07-28 Fei Company Beam-induced deposition of low-resistivity material
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
EP2776603B1 (en) 2011-11-11 2019-03-06 SiO2 Medical Products, Inc. PASSIVATION, pH PROTECTIVE OR LUBRICITY COATING FOR PHARMACEUTICAL PACKAGE, COATING PROCESS AND APPARATUS
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
US8658973B2 (en) * 2012-06-12 2014-02-25 Kla-Tencor Corporation Auger elemental identification algorithm
US20150297800A1 (en) 2012-07-03 2015-10-22 Sio2 Medical Products, Inc. SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS
KR101241007B1 (ko) * 2012-10-26 2013-03-11 나노씨엠에스(주) 엑스선을 이용한 박막층의 두께 측정 방법 및 장치
CA2890066C (en) 2012-11-01 2021-11-09 Sio2 Medical Products, Inc. Coating inspection method
EP2920567B1 (en) 2012-11-16 2020-08-19 SiO2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
WO2014085348A2 (en) 2012-11-30 2014-06-05 Sio2 Medical Products, Inc. Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
EP4234753A3 (en) 2013-03-11 2023-11-01 SiO2 Medical Products, Inc. Coated packaging
EP2971227B1 (en) 2013-03-15 2017-11-15 Si02 Medical Products, Inc. Coating method.
CN103713002B (zh) * 2013-12-27 2016-04-27 昆明贵研催化剂有限责任公司 一种测定汽车尾气催化剂涂层厚度的方法
EP3122917B1 (en) 2014-03-28 2020-05-06 SiO2 Medical Products, Inc. Antistatic coatings for plastic vessels
EP3104155A1 (en) 2015-06-09 2016-12-14 FEI Company Method of analyzing surface modification of a specimen in a charged-particle microscope
CA2995225C (en) 2015-08-18 2023-08-29 Sio2 Medical Products, Inc. Pharmaceutical and other packaging with low oxygen transmission rate
US9837246B1 (en) 2016-07-22 2017-12-05 Fei Company Reinforced sample for transmission electron microscope
US11067391B2 (en) * 2017-06-13 2021-07-20 Hitachi High-Tech Corporation Charged particle beam device and sample thickness measurement method
US10895541B2 (en) * 2018-01-06 2021-01-19 Kla-Tencor Corporation Systems and methods for combined x-ray reflectometry and photoelectron spectroscopy
DE102018202985A1 (de) 2018-02-28 2018-04-12 Carl Zeiss Smt Gmbh Verfahren zum Bestimmen einer Ablösewahrscheinlichkeit einer Schicht
CN114046736B (zh) * 2021-11-09 2023-02-28 北京理工大学 一种基于泵浦探测分析确定金属电子弹道深度的方法
CN114923938B (zh) * 2022-05-24 2025-04-29 长江存储科技有限责任公司 样品的表征方法

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Also Published As

Publication number Publication date
JP2003504609A (ja) 2003-02-04
EP1192416A1 (en) 2002-04-03
EP1192416B1 (en) 2005-03-23
TW457362B (en) 2001-10-01
US6399944B1 (en) 2002-06-04
DE60018932D1 (de) 2005-04-28
DE60018932T2 (de) 2006-03-30
ATE291731T1 (de) 2005-04-15
WO2001004574A1 (en) 2001-01-18

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase