TW452575B - New Α-aminoacetophenone photoinitiators and photopolymerizable compositions comprising these photoinitiators - Google Patents

New Α-aminoacetophenone photoinitiators and photopolymerizable compositions comprising these photoinitiators Download PDF

Info

Publication number
TW452575B
TW452575B TW086116781A TW86116781A TW452575B TW 452575 B TW452575 B TW 452575B TW 086116781 A TW086116781 A TW 086116781A TW 86116781 A TW86116781 A TW 86116781A TW 452575 B TW452575 B TW 452575B
Authority
TW
Taiwan
Prior art keywords
substituted
alkyl
group
phenyl
cns
Prior art date
Application number
TW086116781A
Other languages
English (en)
Chinese (zh)
Inventor
Masaki Ohwa
Hitoshi Yamoto
Jean-Luc Birbaum
Hiroko Nakashima
Akira Matsumoto
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Application granted granted Critical
Publication of TW452575B publication Critical patent/TW452575B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/104—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/108—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/10—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton
    • C07C323/11—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/12—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/24—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/25—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/31—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C07C323/32—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton having at least one of the nitrogen atoms bound to an acyclic carbon atom of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
    • C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D211/06—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
    • C07D211/08—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hydrocarbon or substituted hydrocarbon radicals directly attached to ring carbon atoms
    • C07D211/18—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hydrocarbon or substituted hydrocarbon radicals directly attached to ring carbon atoms with substituted hydrocarbon radicals attached to ring carbon atoms
    • C07D211/20—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hydrocarbon or substituted hydrocarbon radicals directly attached to ring carbon atoms with substituted hydrocarbon radicals attached to ring carbon atoms with hydrocarbon radicals, substituted by singly bound oxygen or sulphur atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Hydrogenated Pyridines (AREA)
  • Pyrrole Compounds (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Indole Compounds (AREA)
  • Paper (AREA)
TW086116781A 1996-12-06 1997-11-08 New Α-aminoacetophenone photoinitiators and photopolymerizable compositions comprising these photoinitiators TW452575B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP96810854 1996-12-06

Publications (1)

Publication Number Publication Date
TW452575B true TW452575B (en) 2001-09-01

Family

ID=8225767

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086116781A TW452575B (en) 1996-12-06 1997-11-08 New Α-aminoacetophenone photoinitiators and photopolymerizable compositions comprising these photoinitiators

Country Status (19)

Country Link
US (1) US6022906A (enExample)
JP (1) JPH10291969A (enExample)
CN (1) CN1134457C (enExample)
AT (1) AT500120B1 (enExample)
AU (1) AU741581B2 (enExample)
BE (1) BE1012647A5 (enExample)
BR (1) BR9706068A (enExample)
CA (1) CA2223376A1 (enExample)
CH (1) CH692422A5 (enExample)
DE (1) DE19753655B4 (enExample)
FR (1) FR2758139B1 (enExample)
GB (1) GB2320027B (enExample)
ID (1) ID17686A (enExample)
IT (1) IT1296930B1 (enExample)
MY (1) MY119467A (enExample)
NL (1) NL1007707C2 (enExample)
SG (1) SG73482A1 (enExample)
TW (1) TW452575B (enExample)
ZA (1) ZA9710956B (enExample)

Families Citing this family (94)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
EP1086145B1 (en) * 1998-05-29 2004-05-12 Ciba SC Holding AG Photoinitiators and their applications
SK1552000A3 (en) * 1998-06-03 2000-08-14 Kimberly Clark Co Novel photoinitiators and applications therefor
EP1144512B1 (en) 1999-01-19 2003-04-23 Kimberly-Clark Worldwide, Inc. Novel colorants, colorant stabilizers, ink compositions, and improved methods of making the same
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
US6673850B1 (en) * 1999-05-10 2004-01-06 Ciba Specialty Chemicals Corporation Photoinitiators and their applications
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
KR100772772B1 (ko) 2000-06-19 2007-11-01 킴벌리-클라크 월드와이드, 인크. 신규한 광개시제 및 그의 용도
EP1341823B1 (en) * 2000-12-13 2008-10-01 Ciba Holding Inc. Surface-active photoinitiators
JP4152597B2 (ja) * 2001-02-16 2008-09-17 三菱製紙株式会社 感光性組成物
JP2004043433A (ja) * 2002-04-26 2004-02-12 Kitai Kagi Kofun Yugenkoshi モルフォリノケトン誘導体及びその用途
US20030225179A1 (en) * 2002-04-26 2003-12-04 Chiu Chingfan Chris Novel morpholinoketone derivatives, and preparation process and uses of the same
EP1388538B1 (en) 2002-07-09 2010-09-01 Merck Patent GmbH Polymerisation Initiator
GB2403478A (en) * 2003-07-04 2005-01-05 Sun Chemical Ltd Piperazine-based sensitisers
US20050065227A1 (en) * 2003-09-22 2005-03-24 Condon John R. Visible-light sensitive macro-initiator
CN1914560A (zh) 2004-02-02 2007-02-14 西巴特殊化学品控股有限公司 功能化学引发剂
DE102004022232A1 (de) * 2004-05-04 2005-12-01 Infineon Technologies Ag Viskoses Klebematerial zur Befestigung elektronischer Bauelemente
GB2420117A (en) 2004-11-10 2006-05-17 Sun Chemical Ltd Piperazino based multi-functional photoinitiators
JP2007047302A (ja) * 2005-08-08 2007-02-22 Toshiba Corp ホログラム記録媒体
JP5051417B2 (ja) * 2006-03-29 2012-10-17 Ｄｉｃ株式会社 光開始剤及び重合性組成物
US8604031B2 (en) * 2006-05-18 2013-12-10 Mannkind Corporation Intracellular kinase inhibitors
ATE554941T1 (de) * 2006-11-14 2012-05-15 Contra Vision Ltd Verbesserungen beim bedrucken überlagerter schichten
JP5701576B2 (ja) 2009-11-20 2015-04-15 富士フイルム株式会社 分散組成物及び感光性樹脂組成物、並びに固体撮像素子
JP5878528B2 (ja) * 2010-06-28 2016-03-08 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 金属を含まない漂白用組成物
JP5622564B2 (ja) 2010-06-30 2014-11-12 富士フイルム株式会社 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、低屈折率膜、光学デバイス、及び、固体撮像素子
JP5544239B2 (ja) 2010-07-29 2014-07-09 富士フイルム株式会社 重合性組成物
BR112013010889B8 (pt) 2010-11-12 2020-08-04 Coloplast As fotoiniciador polimérico, métodos para produção de um fotoiniciador polimérico, e para reticulação do fotoiniciador polimérico e uso de um fotoiniciador polimérico
KR101830206B1 (ko) 2010-12-28 2018-02-20 후지필름 가부시키가이샤 차광막 형성용 티타늄 블랙 분산 조성물과 그 제조방법, 흑색 감방사선성 조성물, 흑색 경화막, 고체촬상소자, 및 흑색 경화막의 제조방법
JP5821282B2 (ja) * 2011-05-26 2015-11-24 Jsr株式会社 新規化合物、新規化合物の製造方法、新規化合物を含有する感放射線性組成物及び硬化膜
KR101622990B1 (ko) 2011-09-14 2016-05-20 후지필름 가부시키가이샤 컬러필터용 착색 감방사선성 조성물, 패턴 형성 방법, 컬러필터, 그 제조 방법, 및 고체 촬상 소자
JP5922013B2 (ja) 2011-12-28 2016-05-24 富士フイルム株式会社 光学部材セット及びこれを用いた固体撮像素子
JP5976523B2 (ja) 2011-12-28 2016-08-23 富士フイルム株式会社 光学部材セット及びこれを用いた固体撮像素子
JP5934664B2 (ja) 2012-03-19 2016-06-15 富士フイルム株式会社 着色感放射線性組成物、着色硬化膜、カラーフィルタ、着色パターン形成方法、カラーフィルタの製造方法、固体撮像素子、及び画像表示装置
JP5775479B2 (ja) 2012-03-21 2015-09-09 富士フイルム株式会社 着色感放射線性組成物、着色硬化膜、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子、及び画像表示装置
US9353211B2 (en) 2012-05-16 2016-05-31 Coloplast A/S Polymeric photoinitiators and photoinitiator monomers
JP2014009173A (ja) * 2012-06-28 2014-01-20 Toray Fine Chemicals Co Ltd スルフィド化合物およびその製造方法
JP5934682B2 (ja) 2012-08-31 2016-06-15 富士フイルム株式会社 マイクロレンズ形成用又はカラーフィルターの下塗り膜形成用硬化性組成物、透明膜、マイクロレンズ、固体撮像素子、及び、硬化性組成物の製造方法
JP5909468B2 (ja) 2012-08-31 2016-04-26 富士フイルム株式会社 分散組成物、これを用いた硬化性組成物、透明膜、マイクロレンズ、及び固体撮像素子
JP5894943B2 (ja) 2012-08-31 2016-03-30 富士フイルム株式会社 分散組成物、これを用いた硬化性組成物、透明膜、マイクロレンズ、マイクロレンズの製造方法、及び固体撮像素子
WO2014084289A1 (ja) 2012-11-30 2014-06-05 富士フイルム株式会社 硬化性樹脂組成物、これを用いたイメージセンサチップの製造方法及びイメージセンサチップ
KR20150081315A (ko) 2012-11-30 2015-07-13 후지필름 가부시키가이샤 경화성 수지 조성물, 이것을 사용한 이미지 센서칩의 제조방법 및 이미지 센서칩
CN102993123B (zh) * 2012-12-21 2015-07-29 天津久日化学股份有限公司 一种高分子型多官能团α-胺烷基苯乙酮光引发剂
JP6170673B2 (ja) 2012-12-27 2017-07-26 富士フイルム株式会社 カラーフィルタ用組成物、赤外線透過フィルタ及びその製造方法、並びに赤外線センサー
EP2940081A4 (en) 2012-12-28 2016-01-06 Fujifilm Corp CURABLE RESIN COMPOSITION, INFRARED RADIATION FILTER, AND SEMICONDUCTOR IMAGING ELEMENT USING THE FILTER
EP2940090A4 (en) 2012-12-28 2016-01-06 Fujifilm Corp HARDENABLE RESIN COMPOSITION FOR PREPARING AN INFRARED REFLECTIVE FILM, INFRARED REFLECTIVE FILM, AND METHOD OF MANUFACTURING THEREOF, INFRARED EDGEFILTER, AND SOLIDAGE IMAGING ELEMENT THEREWITH
EP2960691B1 (en) 2013-02-19 2017-09-27 Fujifilm Corporation Near-infrared absorbing composition, near-infrared blocking filter, method for producing near-infrared blocking filter, camera module and method for manufacturing camera module
WO2014168221A1 (ja) 2013-04-11 2014-10-16 富士フイルム株式会社 近赤外線吸収性組成物、これを用いた近赤外線カットフィルタ及びその製造方法、並びに、カメラモジュール及びその製造方法
JP6159291B2 (ja) 2013-05-23 2017-07-05 富士フイルム株式会社 近赤外線吸収性組成物、これを用いた近赤外線カットフィルタおよびその製造方法、並びに、カメラモジュール
JP2015017244A (ja) 2013-06-12 2015-01-29 富士フイルム株式会社 硬化性組成物、硬化膜、近赤外線カットフィルタ、カメラモジュールおよびカメラモジュールの製造方法
JP5540165B1 (ja) * 2013-06-28 2014-07-02 太陽インキ製造株式会社 光硬化性樹脂組成物、その硬化物およびプリント配線板
JP6162084B2 (ja) 2013-09-06 2017-07-12 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、画像表示装置、ポリマー、キサンテン色素
US9957402B2 (en) 2014-05-15 2018-05-01 Dic Corporation Compound, active energy ray curable composition, cured article thereof, printing ink, and inkjet recording ink
CN106470971B (zh) * 2014-08-01 2020-03-03 株式会社艾迪科 新型聚合引发剂及含有该聚合引发剂的自由基聚合性组合物
JP2016079157A (ja) * 2014-10-22 2016-05-16 株式会社Adeka 新規重合開始剤及び該重合開始剤を含有するラジカル重合性組成物
JP6530902B2 (ja) * 2014-10-22 2019-06-12 株式会社Adeka 新規重合開始剤及び該重合開始剤を含有するラジカル重合性組成物
WO2016106062A1 (en) 2014-12-23 2016-06-30 Bridgestone Americas Tire Operations, Llc Actinic radiation curable polymeric mixtures, cured polymeric mixtures and related processes
US11597839B2 (en) 2015-09-25 2023-03-07 Photocentric Limited Methods for making an object and formulations for use in said methods
US11097531B2 (en) 2015-12-17 2021-08-24 Bridgestone Americas Tire Operations, Llc Additive manufacturing cartridges and processes for producing cured polymeric products by additive manufacturing
TWI634135B (zh) 2015-12-25 2018-09-01 日商富士軟片股份有限公司 樹脂、組成物、硬化膜、硬化膜的製造方法及半導體元件
JP6721670B2 (ja) 2016-03-14 2020-07-15 富士フイルム株式会社 組成物、膜、硬化膜、光学センサおよび膜の製造方法
WO2017186480A1 (en) 2016-04-26 2017-11-02 Basf Se Metal free bleaching composition
JP6260845B1 (ja) 2016-05-13 2018-01-17 Dic株式会社 新規化合物、光硬化性組成物、その硬化物、印刷インキ及び該印刷インキを用いた印刷物
TWI830588B (zh) 2016-08-01 2024-01-21 日商富士軟片股份有限公司 感光性樹脂組成物、硬化膜、積層體、硬化膜的製造方法、積層體的製造方法及半導體元件
WO2018081053A1 (en) 2016-10-27 2018-05-03 Bridgestone Americas Tire Operations, Llc Processes for producing cured polymeric products by additive manufacturing
CN110692018B (zh) 2017-05-31 2023-11-03 富士胶片株式会社 感光性树脂组合物、聚合物前体、固化膜、层叠体、固化膜的制造方法及半导体器件
WO2019176409A1 (ja) 2018-03-13 2019-09-19 富士フイルム株式会社 硬化膜の製造方法、固体撮像素子の製造方法
TWI677492B (zh) * 2018-07-17 2019-11-21 奇鈦科技股份有限公司 液態光引發化合物及其應用
JPWO2020049930A1 (ja) 2018-09-07 2021-09-02 富士フイルム株式会社 車両用ヘッドライトユニット、ヘッドライト用の遮光膜、ヘッドライト用の遮光膜の製造方法
WO2020066416A1 (ja) 2018-09-28 2020-04-02 富士フイルム株式会社 感光性樹脂組成物、硬化膜、積層体、硬化膜の製造方法、および半導体デバイス
SG11202105559WA (en) 2018-12-05 2021-06-29 Fujifilm Corp Photosensitive resin composition, pattern forming method, cured film, laminate, and device
WO2020116238A1 (ja) 2018-12-05 2020-06-11 富士フイルム株式会社 パターン形成方法、感光性樹脂組成物、硬化膜、積層体、及び、デバイス
CN113518805B (zh) * 2018-12-28 2023-08-08 意大利艾坚蒙树脂有限公司 光引发剂
KR102647598B1 (ko) 2019-03-15 2024-03-14 후지필름 가부시키가이샤 경화성 수지 조성물, 경화막, 적층체, 경화막의 제조 방법, 반도체 디바이스, 및, 폴리머 전구체
KR102603923B1 (ko) 2019-03-29 2023-11-20 후지필름 가부시키가이샤 감광성 수지 조성물, 경화막, 인덕터, 안테나
TWI851818B (zh) 2019-09-26 2024-08-11 日商富士軟片股份有限公司 導熱層的製造方法、積層體的製造方法及半導體器件的製造方法
TWI859361B (zh) 2019-11-21 2024-10-21 日商富士軟片股份有限公司 圖案形成方法、光硬化性樹脂組成物、積層體的製造方法及電子元件的製造方法
CN114867790B (zh) 2019-12-25 2025-08-19 富士胶片株式会社 树脂组合物、固化物、紫外线吸收剂、紫外线截止滤波器、透镜、保护材料、化合物及化合物的合成方法
WO2021246400A1 (ja) * 2020-06-04 2021-12-09 富士フイルム株式会社 転写フィルム及び積層体の製造方法
WO2022039120A1 (ja) 2020-08-21 2022-02-24 富士フイルム株式会社 重合性組成物、重合体、紫外線遮蔽材料、積層体、化合物、紫外線吸収剤及び化合物の製造方法
EP4216242A4 (en) 2020-09-18 2024-05-22 FUJIFILM Corporation COMPOSITION, FILM CONTAINING MAGNETIC PARTICLES AND ELECTRONIC COMPONENT
JPWO2022065183A1 (enExample) 2020-09-24 2022-03-31
TW202248755A (zh) 2021-03-22 2022-12-16 日商富士軟片股份有限公司 負型感光性樹脂組成物、硬化物、積層體、硬化物的製造方法以及半導體元件
JPWO2022202394A1 (enExample) 2021-03-22 2022-09-29
WO2023032545A1 (ja) 2021-08-31 2023-03-09 富士フイルム株式会社 硬化物の製造方法、積層体の製造方法、及び、半導体デバイスの製造方法、並びに、処理液
EP4410902A4 (en) 2021-09-30 2025-01-22 FUJIFILM Corporation METHOD FOR PRODUCING A COMPOSITION CONTAINING MAGNETIC PARTICLES, CURED PRODUCT CONTAINING MAGNETIC PARTICLES, SUBSTRATE CONTAINING MAGNETIC PARTICLES AND ELECTRONIC MATERIAL
EP4456133A4 (en) 2021-12-23 2025-07-30 Fujifilm Corp Joined body production method, joined body, laminate production method, laminate, device production method, device, and composition for forming polyimide-containing precursor part
JPWO2023162687A1 (enExample) 2022-02-24 2023-08-31
KR20240156619A (ko) 2022-03-29 2024-10-30 후지필름 가부시키가이샤 수지 조성물, 경화물, 적층체, 경화물의 제조 방법, 적층체의 제조 방법, 반도체 디바이스의 제조 방법, 및, 반도체 디바이스
CN115141162B (zh) * 2022-09-05 2022-12-20 天津久日新材料股份有限公司 一种光引发剂的制备方法及其产品
CN119998728A (zh) 2022-09-30 2025-05-13 富士胶片株式会社 膜的制造方法、感光性树脂组合物、固化物的制造方法，固化物及层叠体
TW202424051A (zh) 2022-09-30 2024-06-16 日商富士軟片股份有限公司 樹脂組成物、硬化物、積層體、硬化物的製造方法、積層體的製造方法、半導體元件的製造方法及半導體元件
KR20250055605A (ko) 2022-09-30 2025-04-24 후지필름 가부시키가이샤 수지 조성물, 경화물, 적층체, 경화물의 제조 방법, 적층체의 제조 방법, 반도체 디바이스의 제조 방법, 및, 반도체 디바이스
CN116003273B (zh) * 2023-02-09 2023-11-07 湖南勤润新材料有限公司 一种α-胺基酮类化合物、其制备方法及其在光辐射固化领域的应用
CN117532894B (zh) * 2023-12-05 2024-06-14 东莞美泰电子有限公司 一种用于保护零件的pu皮革热压贴皮工艺

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4307182A (en) * 1980-05-23 1981-12-22 Minnesota Mining And Manufacturing Company Imaging systems with tetra(aliphatic) borate salts
EP0088050B1 (de) * 1982-02-26 1986-09-03 Ciba-Geigy Ag Photohärtbare gefärbte Massen
DE3471486D1 (de) * 1983-08-15 1988-06-30 Ciba Geigy Ag Photocurable compositions
DE3880868D1 (en) * 1987-03-26 1993-06-17 Ciba Geigy Ag Neue alpha-aminoacetophenone als photoinitiatoren.
JP2641260B2 (ja) * 1988-07-26 1997-08-13 キヤノン株式会社 光重合開始剤及び感光性組成物
ES2110987T3 (es) * 1990-11-05 1998-03-01 Tokyo Ohka Kogyo Co Ltd Composiciones fotopolimerizables.
US5698285A (en) * 1995-10-19 1997-12-16 Three Bond Co., Ltd. Adhesive for optical disk

Also Published As

Publication number Publication date
MY119467A (en) 2005-05-31
US6022906A (en) 2000-02-08
DE19753655A1 (de) 1998-06-10
CN1134457C (zh) 2004-01-14
CN1184117A (zh) 1998-06-10
BR9706068A (pt) 2000-03-21
ZA9710956B (en) 1998-06-15
IT1296930B1 (it) 1999-08-03
CA2223376A1 (en) 1998-06-06
FR2758139B1 (fr) 2001-04-20
FR2758139A1 (fr) 1998-07-10
SG73482A1 (en) 2000-06-20
ID17686A (id) 1998-01-22
AU741581B2 (en) 2001-12-06
AT500120B1 (de) 2007-03-15
JPH10291969A (ja) 1998-11-04
ITMI972703A1 (it) 1999-06-05
GB2320027B (en) 2001-05-09
NL1007707A1 (nl) 1998-06-09
NL1007707C2 (nl) 1998-10-27
DE19753655B4 (de) 2008-05-15
GB9723965D0 (en) 1998-01-07
BE1012647A5 (fr) 2001-02-06
CH692422A5 (de) 2002-06-14
AT500120A1 (de) 2005-10-15
GB2320027A (en) 1998-06-10
AU4677397A (en) 1998-06-11

Similar Documents

Publication Publication Date Title
TW452575B (en) New Α-aminoacetophenone photoinitiators and photopolymerizable compositions comprising these photoinitiators
JP3834738B2 (ja) アルコキシフェニル置換ビスアシルホスフィンオキシド
TW460450B (en) Specific non-volatile dimeric phenylglyoxalic ester compounds and photopolymerizable compositions comprising said compounds
AU720186B2 (en) Molecular complex compounds as photoinitiators
KR100698799B1 (ko) 신규한 광개시제 및 블록 공중합체
AU750819B2 (en) Photogeneration of amines from alpha-aminoacetophenones
AT404729B (de) Alkylphenylbisacylphosphinoxide und photoinitiatormischungen
TW200305582A (en) Incorporable photoinitiator
TW466255B (en) Photoactivatable nitrogen-contained bases on Α-amino alkenes
US5723512A (en) Dimeric bisacylphosphines, oxides and sulfides
TW412540B (en) Bisborate compounds and photoinitiators comprising said compounds in combination with electron donor compounds
TW200422296A (en) Oxime ester photoinitiators with heteroaromatic groups
MXPA05004015A (es) Mejora en la estabilidad al almacenamiento de fotoiniciadores.
US6361925B1 (en) Photoinitiator mixtures and compositions with alkylphenylbisacylphosphine oxides
JP4975211B2 (ja) 新規な光開始剤及びその応用
JP2000510884A (ja) 重合性組成物
EP0898202A1 (en) Photogeneration of amines from alpha-aminoacetophenones
TW499411B (en) Oxime ester photoinitiators
KR19980063821A (ko) 신규 α-아미노아세토페논 광개시제
MXPA01001448A (en) Organometallic monoacylarylphosphines
MXPA97001638A (en) Oxides of alkylphenilbisacilphosphine and mixtures defotoinicia

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees