TW293037B - - Google Patents
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- Publication number
- TW293037B TW293037B TW083105374A TW83105374A TW293037B TW 293037 B TW293037 B TW 293037B TW 083105374 A TW083105374 A TW 083105374A TW 83105374 A TW83105374 A TW 83105374A TW 293037 B TW293037 B TW 293037B
- Authority
- TW
- Taiwan
- Prior art keywords
- titanium
- layer
- radon
- coated
- nitride
- Prior art date
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- 239000010410 layer Substances 0.000 claims abstract description 317
- 238000005520 cutting process Methods 0.000 claims abstract description 267
- 239000010936 titanium Substances 0.000 claims abstract description 188
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 183
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 172
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims abstract description 162
- 239000011247 coating layer Substances 0.000 claims abstract description 110
- 239000000463 material Substances 0.000 claims abstract description 106
- 238000000576 coating method Methods 0.000 claims abstract description 75
- 239000011248 coating agent Substances 0.000 claims abstract description 65
- 239000002356 single layer Substances 0.000 claims abstract description 35
- 238000004519 manufacturing process Methods 0.000 claims abstract description 16
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 claims abstract 2
- 239000000758 substrate Substances 0.000 claims description 207
- SYUHGPGVQRZVTB-UHFFFAOYSA-N radon atom Chemical compound [Rn] SYUHGPGVQRZVTB-UHFFFAOYSA-N 0.000 claims description 71
- 229910052704 radon Inorganic materials 0.000 claims description 69
- -1 titanium sulfonium nitride Chemical class 0.000 claims description 54
- 239000007789 gas Substances 0.000 claims description 46
- 150000001875 compounds Chemical class 0.000 claims description 36
- 239000013078 crystal Substances 0.000 claims description 36
- 238000011049 filling Methods 0.000 claims description 36
- 229910045601 alloy Inorganic materials 0.000 claims description 34
- 239000000956 alloy Substances 0.000 claims description 34
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 claims description 33
- 239000000919 ceramic Substances 0.000 claims description 26
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 25
- 230000000737 periodic effect Effects 0.000 claims description 22
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 20
- 239000010931 gold Substances 0.000 claims description 20
- 229910052737 gold Inorganic materials 0.000 claims description 20
- 150000004767 nitrides Chemical class 0.000 claims description 20
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 19
- 229910052782 aluminium Inorganic materials 0.000 claims description 18
- 238000002309 gasification Methods 0.000 claims description 17
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 16
- 150000003608 titanium Chemical class 0.000 claims description 15
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- QDZRBIRIPNZRSG-UHFFFAOYSA-N titanium nitrate Chemical compound [O-][N+](=O)O[Ti](O[N+]([O-])=O)(O[N+]([O-])=O)O[N+]([O-])=O QDZRBIRIPNZRSG-UHFFFAOYSA-N 0.000 claims description 12
- 230000002079 cooperative effect Effects 0.000 claims description 10
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical group O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 10
- NMJKIRUDPFBRHW-UHFFFAOYSA-N titanium Chemical group [Ti].[Ti] NMJKIRUDPFBRHW-UHFFFAOYSA-N 0.000 claims description 10
- QDMRQDKMCNPQQH-UHFFFAOYSA-N boranylidynetitanium Chemical compound [B].[Ti] QDMRQDKMCNPQQH-UHFFFAOYSA-N 0.000 claims description 9
- 229910052582 BN Inorganic materials 0.000 claims description 7
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 7
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 7
- RCYJPSGNXVLIBO-UHFFFAOYSA-N sulfanylidenetitanium Chemical compound [S].[Ti] RCYJPSGNXVLIBO-UHFFFAOYSA-N 0.000 claims description 6
- 229910001020 Au alloy Inorganic materials 0.000 claims description 5
- 239000003353 gold alloy Substances 0.000 claims description 5
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 4
- RGZQGGVFIISIHZ-UHFFFAOYSA-N strontium titanium Chemical compound [Ti].[Sr] RGZQGGVFIISIHZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- 239000004615 ingredient Substances 0.000 claims description 2
- 150000003257 radon Chemical class 0.000 claims description 2
- 150000003871 sulfonates Chemical class 0.000 claims description 2
- 150000003258 radon compounds Chemical class 0.000 claims 15
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 4
- 229910052796 boron Inorganic materials 0.000 claims 4
- KELHQGOVULCJSG-UHFFFAOYSA-N n,n-dimethyl-1-(5-methylfuran-2-yl)ethane-1,2-diamine Chemical compound CN(C)C(CN)C1=CC=C(C)O1 KELHQGOVULCJSG-UHFFFAOYSA-N 0.000 claims 4
- 229910052705 radium Inorganic materials 0.000 claims 2
- HCWPIIXVSYCSAN-UHFFFAOYSA-N radium atom Chemical compound [Ra] HCWPIIXVSYCSAN-UHFFFAOYSA-N 0.000 claims 2
- 150000004763 sulfides Chemical class 0.000 claims 2
- PCTMTFRHKVHKIS-BMFZQQSSSA-N (1s,3r,4e,6e,8e,10e,12e,14e,16e,18s,19r,20r,21s,25r,27r,30r,31r,33s,35r,37s,38r)-3-[(2r,3s,4s,5s,6r)-4-amino-3,5-dihydroxy-6-methyloxan-2-yl]oxy-19,25,27,30,31,33,35,37-octahydroxy-18,20,21-trimethyl-23-oxo-22,39-dioxabicyclo[33.3.1]nonatriaconta-4,6,8,10 Chemical compound C1C=C2C[C@@H](OS(O)(=O)=O)CC[C@]2(C)[C@@H]2[C@@H]1[C@@H]1CC[C@H]([C@H](C)CCCC(C)C)[C@@]1(C)CC2.O[C@H]1[C@@H](N)[C@H](O)[C@@H](C)O[C@H]1O[C@H]1/C=C/C=C/C=C/C=C/C=C/C=C/C=C/[C@H](C)[C@@H](O)[C@@H](C)[C@H](C)OC(=O)C[C@H](O)C[C@H](O)CC[C@@H](O)[C@H](O)C[C@H](O)C[C@](O)(C[C@H](O)[C@H]2C(O)=O)O[C@H]2C1 PCTMTFRHKVHKIS-BMFZQQSSSA-N 0.000 claims 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 1
- VTVVTTMZKYGXNG-UHFFFAOYSA-N [Ti].[He] Chemical compound [Ti].[He] VTVVTTMZKYGXNG-UHFFFAOYSA-N 0.000 claims 1
- VQYHBXLHGKQYOY-UHFFFAOYSA-N aluminum oxygen(2-) titanium(4+) Chemical compound [O-2].[Al+3].[Ti+4] VQYHBXLHGKQYOY-UHFFFAOYSA-N 0.000 claims 1
- 239000003054 catalyst Substances 0.000 claims 1
- 238000005253 cladding Methods 0.000 claims 1
- 150000002823 nitrates Chemical class 0.000 claims 1
- 230000002688 persistence Effects 0.000 claims 1
- 150000003256 radium compounds Chemical class 0.000 claims 1
- OOCAFVVHAFKGBZ-UHFFFAOYSA-N strontium tungsten Chemical compound [Sr][W] OOCAFVVHAFKGBZ-UHFFFAOYSA-N 0.000 claims 1
- 229910052716 thallium Inorganic materials 0.000 claims 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 claims 1
- ITRNXVSDJBHYNJ-UHFFFAOYSA-N tungsten disulfide Chemical compound S=[W]=S ITRNXVSDJBHYNJ-UHFFFAOYSA-N 0.000 claims 1
- 229910052726 zirconium Inorganic materials 0.000 claims 1
- 239000000460 chlorine Substances 0.000 abstract description 12
- 229910052801 chlorine Inorganic materials 0.000 abstract description 11
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract description 10
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 abstract description 5
- 239000010408 film Substances 0.000 description 315
- NUCWENGKGHLSAT-UHFFFAOYSA-N titanium(4+) tetracyanide Chemical compound [Ti+4].[C-]#N.[C-]#N.[C-]#N.[C-]#N NUCWENGKGHLSAT-UHFFFAOYSA-N 0.000 description 95
- 238000000034 method Methods 0.000 description 62
- 239000000047 product Substances 0.000 description 57
- 206010040844 Skin exfoliation Diseases 0.000 description 34
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 32
- 238000005299 abrasion Methods 0.000 description 31
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 29
- 238000005229 chemical vapour deposition Methods 0.000 description 28
- 230000015572 biosynthetic process Effects 0.000 description 22
- 239000010730 cutting oil Substances 0.000 description 22
- 230000000694 effects Effects 0.000 description 21
- 230000000052 comparative effect Effects 0.000 description 20
- 229910052757 nitrogen Inorganic materials 0.000 description 18
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 16
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 14
- 230000006378 damage Effects 0.000 description 14
- 230000007547 defect Effects 0.000 description 14
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 14
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 13
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 12
- 238000012545 processing Methods 0.000 description 12
- XROWMBWRMNHXMF-UHFFFAOYSA-J titanium tetrafluoride Chemical compound [F-].[F-].[F-].[F-].[Ti+4] XROWMBWRMNHXMF-UHFFFAOYSA-J 0.000 description 11
- 239000000203 mixture Substances 0.000 description 10
- 239000002245 particle Substances 0.000 description 10
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- 238000007639 printing Methods 0.000 description 10
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- 230000006911 nucleation Effects 0.000 description 8
- 238000010899 nucleation Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 229910052786 argon Inorganic materials 0.000 description 7
- 238000005260 corrosion Methods 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- 230000002159 abnormal effect Effects 0.000 description 6
- 125000004429 atom Chemical group 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 230000008439 repair process Effects 0.000 description 6
- 238000011161 development Methods 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 229910001069 Ti alloy Inorganic materials 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 4
- 150000002825 nitriles Chemical class 0.000 description 4
- 238000010025 steaming Methods 0.000 description 4
- 150000003609 titanium compounds Chemical class 0.000 description 4
- 150000003657 tungsten Chemical class 0.000 description 4
- 238000009834 vaporization Methods 0.000 description 4
- 241000234282 Allium Species 0.000 description 3
- 235000002732 Allium cepa var. cepa Nutrition 0.000 description 3
- 229910052693 Europium Inorganic materials 0.000 description 3
- 229910010165 TiCu Inorganic materials 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
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- 235000013601 eggs Nutrition 0.000 description 3
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- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 239000005864 Sulphur Substances 0.000 description 2
- YZCKVEUIGOORGS-NJFSPNSNSA-N Tritium Chemical compound [3H] YZCKVEUIGOORGS-NJFSPNSNSA-N 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
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- 229940037003 alum Drugs 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
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- 229910052743 krypton Inorganic materials 0.000 description 2
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
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- 229910052722 tritium Inorganic materials 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 240000001592 Amaranthus caudatus Species 0.000 description 1
- 235000009328 Amaranthus caudatus Nutrition 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 235000007516 Chrysanthemum Nutrition 0.000 description 1
- 244000189548 Chrysanthemum x morifolium Species 0.000 description 1
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- JPAJFTNFRXGCSX-UHFFFAOYSA-F F[Ti](F)(F)F.F[Ti](F)(F)F Chemical compound F[Ti](F)(F)F.F[Ti](F)(F)F JPAJFTNFRXGCSX-UHFFFAOYSA-F 0.000 description 1
- 241000282326 Felis catus Species 0.000 description 1
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- MKYBYDHXWVHEJW-UHFFFAOYSA-N N-[1-oxo-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propan-2-yl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(C(C)NC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 MKYBYDHXWVHEJW-UHFFFAOYSA-N 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
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- 230000014759 maintenance of location Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000002897 organic nitrogen compounds Chemical class 0.000 description 1
- BAQNULZQXCKSQW-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[O-2].[O-2].[Ti+4].[Ti+4] BAQNULZQXCKSQW-UHFFFAOYSA-N 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- DPGAAOUOSQHIJH-UHFFFAOYSA-N ruthenium titanium Chemical compound [Ti].[Ru] DPGAAOUOSQHIJH-UHFFFAOYSA-N 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 210000000457 tarsus Anatomy 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N thiocyanic acid Chemical compound SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 229910000048 titanium hydride Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/36—Carbonitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12014—All metal or with adjacent metals having metal particles
- Y10T428/12028—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]
- Y10T428/12049—Nonmetal component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12576—Boride, carbide or nitride component
Landscapes
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Turning (AREA)
- Chemical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Scissors And Nippers (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12871393 | 1993-05-31 | ||
| JP19724093 | 1993-08-09 | ||
| JP08144594A JP3353449B2 (ja) | 1994-04-20 | 1994-04-20 | 被覆切削工具 |
| JP11081194A JP3384110B2 (ja) | 1993-05-31 | 1994-05-25 | 被覆切削工具とその製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW293037B true TW293037B (https=) | 1996-12-11 |
Family
ID=27466570
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW083105374A TW293037B (https=) | 1993-05-31 | 1994-06-11 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US5915162A (https=) |
| EP (1) | EP0653499B1 (https=) |
| KR (1) | KR0165923B1 (https=) |
| AT (1) | ATE221142T1 (https=) |
| DE (1) | DE69431032T2 (https=) |
| TW (1) | TW293037B (https=) |
| WO (1) | WO1994028191A1 (https=) |
Families Citing this family (53)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69521410T2 (de) * | 1994-10-04 | 2001-10-04 | Sumitomo Electric Industries, Ltd. | Beschichtete hartlegierung |
| SE514181C2 (sv) * | 1995-04-05 | 2001-01-15 | Sandvik Ab | Belagt hårmetallskär för fräsning av gjutjärn |
| US5786069A (en) | 1995-09-01 | 1998-07-28 | Sandvik Ab | Coated turning insert |
| WO1997020082A1 (en) * | 1995-11-30 | 1997-06-05 | Sandvik Ab, (Publ) | Coated turning insert and method of making it |
| SE9504304D0 (sv) | 1995-11-30 | 1995-11-30 | Sandvik Ab | Coated milling insert |
| US6062776A (en) * | 1995-11-30 | 2000-05-16 | Sandvik Ab | Coated cutting insert and method of making it |
| SE509560C2 (sv) * | 1996-09-06 | 1999-02-08 | Sandvik Ab | Belagt hårdmetallskär för bearbetning av gjutjärn |
| USRE40005E1 (en) | 1996-09-06 | 2008-01-15 | Sandvik Intellectual Property Ab | Coated cutting insert |
| US6071560A (en) * | 1997-09-12 | 2000-06-06 | Balzers Aktiengesellschaft | Tool with tool body and protective layer system |
| SE9802488D0 (sv) * | 1998-07-09 | 1998-07-09 | Sandvik Ab | Coated grooving or parting insert |
| US6251508B1 (en) * | 1998-12-09 | 2001-06-26 | Seco Tools Ab | Grade for cast iron |
| US6221469B1 (en) * | 1998-12-09 | 2001-04-24 | Seco Tools Ab | Grade for steel |
| SE519110C2 (sv) * | 1999-05-04 | 2003-01-14 | Sandvik Ab | Belagt kiselnitridbaserat skärverktyg |
| US6472060B1 (en) * | 2000-01-19 | 2002-10-29 | Seco Tools Ab | Coated body with nanocrystalline CVD coating for enhanced edge toughness and reduced friction |
| JP4437353B2 (ja) | 2000-03-30 | 2010-03-24 | 株式会社タンガロイ | 被覆切削工具およびその製造方法 |
| SE0002448D0 (sv) * | 2000-06-28 | 2000-06-28 | Hoeganaes Ab | method of producig powder metal components |
| DE60107177T2 (de) * | 2000-09-07 | 2005-11-03 | NGK Spark Plug Co., Ltd., Nagoya | Beschichtetes Schneidwerkzeug |
| US6933509B1 (en) | 2001-09-11 | 2005-08-23 | Allasso Industries, Inc. | Apparatus and method using fractionated irradiation to harden metal |
| US6750459B1 (en) | 2001-09-11 | 2004-06-15 | Allasso Industries, Inc. | Apparatus and method using irradiation to harden metal |
| US6761851B1 (en) | 2001-09-11 | 2004-07-13 | Allasso Industries, Inc. | Apparatus and method for hardening metal by varying the engagement between irradiation and metal |
| KR20030052469A (ko) * | 2001-12-21 | 2003-06-27 | 한국야금 주식회사 | 내마모성 및 인성이 향상된 피복 초경합금 절삭공구의제조방법 |
| KR100457658B1 (ko) * | 2002-01-16 | 2004-11-17 | 한국야금 주식회사 | 내마모성 및 인성이 향상된 피복 초경합금 절삭공구 |
| SE527349C2 (sv) * | 2003-04-24 | 2006-02-14 | Seco Tools Ab | Skär med beläggning av skikt av MTCVD-Ti (C,N) med styrd kornstorlek och morfologi och metod för att belägga skäret |
| US20070054146A1 (en) * | 2003-04-28 | 2007-03-08 | Tatsuhiko Aizawa | High-speed machining tool |
| DE10320652A1 (de) * | 2003-05-07 | 2004-12-02 | Kennametal Widia Gmbh & Co.Kg | Werkzeug, insbesondere Schneidwerkzeug und Verfahren zur CVD-Abscheidung einer zweiphasigen Schicht auf einem Substratkörper |
| US7455918B2 (en) * | 2004-03-12 | 2008-11-25 | Kennametal Inc. | Alumina coating, coated product and method of making the same |
| KR101225803B1 (ko) * | 2004-04-13 | 2013-01-23 | 스미또모 덴꼬오 하드메탈 가부시끼가이샤 | 표면 피복 절삭 공구 |
| WO2005121038A2 (en) * | 2004-06-07 | 2005-12-22 | Colorado School Of Mines | Coating for glass molding dies and forming tools |
| RU2296813C2 (ru) * | 2004-07-13 | 2007-04-10 | Государственное образовательное учреждение высшего профессионального образования "Тольяттинский государственный университет" | Способ упрочнения инструмента |
| JP2006082207A (ja) * | 2004-09-17 | 2006-03-30 | Sumitomo Electric Hardmetal Corp | 表面被覆切削工具 |
| SE528107C2 (sv) * | 2004-10-04 | 2006-09-05 | Sandvik Intellectual Property | Belagt hårdmetallskär, speciellt användbart för höghastighetsbearbetning av metalliska arbetsstycken |
| KR20070092945A (ko) * | 2004-12-22 | 2007-09-14 | 스미또모 덴꼬오 하드메탈 가부시끼가이샤 | 표면 피복 절삭 공구 |
| JP4753249B2 (ja) * | 2006-01-13 | 2011-08-24 | 株式会社神戸製鋼所 | ガラス成形用金型 |
| US8080312B2 (en) * | 2006-06-22 | 2011-12-20 | Kennametal Inc. | CVD coating scheme including alumina and/or titanium-containing materials and method of making the same |
| JP2009095907A (ja) * | 2007-10-15 | 2009-05-07 | Sumitomo Electric Hardmetal Corp | 刃先交換型切削チップ |
| KR100920835B1 (ko) * | 2007-12-20 | 2009-10-08 | 주식회사 하이닉스반도체 | 반도체 메모리 장치 |
| WO2009096476A1 (ja) * | 2008-01-29 | 2009-08-06 | Kyocera Corporation | 切削工具 |
| WO2012018063A1 (ja) * | 2010-08-04 | 2012-02-09 | 株式会社タンガロイ | 被覆工具 |
| DE102010039035A1 (de) * | 2010-08-06 | 2012-02-09 | Walter Ag | Schneidwerkzeug mit mehrlagiger Beschichtung |
| US8734070B2 (en) | 2010-10-20 | 2014-05-27 | Kennametal Inc. | Toolholder with externally-mounted dynamic absorber |
| AT510963B1 (de) † | 2011-03-18 | 2012-08-15 | Boehlerit Gmbh & Co Kg | Beschichteter körper und verfahren zu dessen herstellung |
| EP2700460B1 (en) * | 2011-04-20 | 2018-11-07 | Tungaloy Corporation | Coated cutting tool |
| US8524360B2 (en) | 2011-08-29 | 2013-09-03 | Kennametal Inc. | Cutting insert with a titanium oxycarbonitride coating and method for making the same |
| JP6272356B2 (ja) | 2013-12-26 | 2018-01-31 | 京セラ株式会社 | 切削工具 |
| US9764986B2 (en) | 2015-01-22 | 2017-09-19 | Kennametal Inc. | Low temperature CVD coatings and applications thereof |
| CN121380952A (zh) * | 2017-04-07 | 2026-01-23 | 山特维克知识产权股份有限公司 | 涂层切削工具 |
| JP6784928B2 (ja) | 2018-09-04 | 2020-11-18 | 株式会社タンガロイ | 被覆切削工具 |
| DE112019004438T5 (de) | 2018-09-05 | 2021-05-20 | Kyocera Corporation | Beschichtetes werkzeug und schneidwerkzeug |
| US11998991B2 (en) | 2018-09-05 | 2024-06-04 | Kyocera Corporation | Coated tool and cutting tool |
| US11964328B2 (en) | 2018-09-05 | 2024-04-23 | Kyocera Corporation | Coated tool and cutting tool |
| JP7142097B2 (ja) | 2018-09-05 | 2022-09-26 | 京セラ株式会社 | 被覆工具及び切削工具 |
| WO2020050263A1 (ja) | 2018-09-05 | 2020-03-12 | 京セラ株式会社 | 被覆工具及び切削工具 |
| WO2020050264A1 (ja) * | 2018-09-05 | 2020-03-12 | 京セラ株式会社 | 被覆工具及び切削工具 |
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| US3656995A (en) * | 1969-05-02 | 1972-04-18 | Texas Instruments Inc | Chemical vapor deposition coatings on titanium |
| US3771976A (en) * | 1971-01-08 | 1973-11-13 | Texas Instruments Inc | Metal carbonitride-coated article and method of producing same |
| US4150195A (en) * | 1976-06-18 | 1979-04-17 | Sumitomo Electric Industries, Ltd. | Surface-coated cemented carbide article and a process for the production thereof |
| US4282289A (en) * | 1980-04-16 | 1981-08-04 | Sandvik Aktiebolag | Method of preparing coated cemented carbide product and resulting product |
| JPS6077972A (ja) * | 1983-10-05 | 1985-05-02 | Toshiba Tungaloy Co Ltd | 高温特性にすぐれた多層被覆工具材料 |
| JPS6089574A (ja) * | 1983-10-21 | 1985-05-20 | Mitsubishi Metal Corp | 切削工具および耐摩耗工具用表面被覆焼結硬質合金部材 |
| JPS61170559A (ja) * | 1985-01-21 | 1986-08-01 | Sumitomo Electric Ind Ltd | 被覆超硬合金 |
| JPH0732961B2 (ja) * | 1986-10-03 | 1995-04-12 | 三菱マテリアル株式会社 | 表面被覆炭化タングステン基超硬合金製切削工具 |
| JPH0773802B2 (ja) * | 1987-07-10 | 1995-08-09 | 住友電気工業株式会社 | 被覆超硬合金工具 |
| DE3841731C1 (en) * | 1988-12-10 | 1990-04-12 | Krupp Widia Gmbh, 4300 Essen, De | Process for coating a tool base, and tool produced by this process |
| US4984940A (en) * | 1989-03-17 | 1991-01-15 | Kennametal Inc. | Multilayer coated cemented carbide cutting insert |
| JPH03190604A (ja) * | 1989-12-15 | 1991-08-20 | Mitsubishi Materials Corp | 硬質層被覆炭化タングステン基超硬合金製工具部材 |
| US5075181A (en) * | 1989-05-05 | 1991-12-24 | Kennametal Inc. | High hardness/high compressive stress multilayer coated tool |
| US5436071A (en) * | 1990-01-31 | 1995-07-25 | Mitsubishi Materials Corporation | Cermet cutting tool and process for producing the same |
| JP2775955B2 (ja) * | 1990-01-31 | 1998-07-16 | 三菱マテリアル株式会社 | 耐摩耗性に優れたコーティングサーメットの製造法 |
| JPH0413874A (ja) * | 1990-05-02 | 1992-01-17 | Mitsubishi Materials Corp | 炭化チタン被覆工具部材 |
| US5250367A (en) * | 1990-09-17 | 1993-10-05 | Kennametal Inc. | Binder enriched CVD and PVD coated cutting tool |
| JP2985300B2 (ja) * | 1990-12-25 | 1999-11-29 | 三菱マテリアル株式会社 | 硬質層被覆サーメット |
| US5372873A (en) * | 1992-10-22 | 1994-12-13 | Mitsubishi Materials Corporation | Multilayer coated hard alloy cutting tool |
| US5374471A (en) * | 1992-11-27 | 1994-12-20 | Mitsubishi Materials Corporation | Multilayer coated hard alloy cutting tool |
| SE501527C2 (sv) * | 1992-12-18 | 1995-03-06 | Sandvik Ab | Sätt och alster vid beläggning av ett skärande verktyg med ett aluminiumoxidskikt |
-
1994
- 1994-05-31 EP EP94916435A patent/EP0653499B1/en not_active Expired - Lifetime
- 1994-05-31 AT AT94916435T patent/ATE221142T1/de not_active IP Right Cessation
- 1994-05-31 KR KR1019950700369A patent/KR0165923B1/ko not_active Expired - Lifetime
- 1994-05-31 US US08/379,624 patent/US5915162A/en not_active Expired - Lifetime
- 1994-05-31 WO PCT/JP1994/000882 patent/WO1994028191A1/ja not_active Ceased
- 1994-05-31 DE DE69431032T patent/DE69431032T2/de not_active Expired - Lifetime
- 1994-06-11 TW TW083105374A patent/TW293037B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| EP0653499B1 (en) | 2002-07-24 |
| KR0165923B1 (ko) | 1999-01-15 |
| WO1994028191A1 (en) | 1994-12-08 |
| US5915162A (en) | 1999-06-22 |
| DE69431032D1 (de) | 2002-08-29 |
| EP0653499A4 (en) | 1997-11-12 |
| EP0653499A1 (en) | 1995-05-17 |
| ATE221142T1 (de) | 2002-08-15 |
| DE69431032T2 (de) | 2003-01-30 |
| KR950702648A (ko) | 1995-07-29 |
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