TW202428664A - 感光性樹脂組成物、樹脂硬化膜及畫像顯示裝置 - Google Patents

感光性樹脂組成物、樹脂硬化膜及畫像顯示裝置 Download PDF

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Publication number
TW202428664A
TW202428664A TW112142786A TW112142786A TW202428664A TW 202428664 A TW202428664 A TW 202428664A TW 112142786 A TW112142786 A TW 112142786A TW 112142786 A TW112142786 A TW 112142786A TW 202428664 A TW202428664 A TW 202428664A
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TW
Taiwan
Prior art keywords
resin
meth
mol
resin composition
photosensitive resin
Prior art date
Application number
TW112142786A
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English (en)
Chinese (zh)
Inventor
周正偉
柳正義
原司
木下健宏
Original Assignee
日商力森諾科股份有限公司
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Publication date
Application filed by 日商力森諾科股份有限公司 filed Critical 日商力森諾科股份有限公司
Publication of TW202428664A publication Critical patent/TW202428664A/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14—Polymers provided for in subclass C08G
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
TW112142786A 2022-12-09 2023-11-07 感光性樹脂組成物、樹脂硬化膜及畫像顯示裝置 TW202428664A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022197408 2022-12-09
JP2022-197408 2022-12-09

Publications (1)

Publication Number Publication Date
TW202428664A true TW202428664A (zh) 2024-07-16

Family

ID=91378946

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112142786A TW202428664A (zh) 2022-12-09 2023-11-07 感光性樹脂組成物、樹脂硬化膜及畫像顯示裝置

Country Status (5)

Country Link
JP (1) JPWO2024122200A1 (https=)
KR (1) KR20250095719A (https=)
CN (1) CN120380425A (https=)
TW (1) TW202428664A (https=)
WO (1) WO2024122200A1 (https=)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002182383A (ja) * 2001-10-09 2002-06-26 Goo Chemical Co Ltd プリント回路基板製造用感光性樹脂組成物並びにそれを用いた被膜、レジストインク、レジスト、ソルダーレジスト及びプリント回路基板
JP2008088394A (ja) * 2006-09-07 2008-04-17 Showa Highpolymer Co Ltd アルカリ現像可能な感光性樹脂及びそれを含む感光性樹脂組成物
JP5504738B2 (ja) * 2009-08-05 2014-05-28 東洋インキＳｃホールディングス株式会社 感光性組成物
JP5385729B2 (ja) * 2009-09-01 2014-01-08 昭和電工株式会社 感光性樹脂
KR20220091736A (ko) 2020-12-24 2022-07-01 롬엔드하스전자재료코리아유한회사 플루오르화 아크릴레이트계 공중합체 및 이를 포함하는 감광성 수지 조성물
JP7642683B2 (ja) * 2021-02-08 2025-03-10 大阪有機化学工業株式会社 アルカリ可溶性樹脂、感光性樹脂組成物、硬化物、及び画像表示装置

Also Published As

Publication number Publication date
KR20250095719A (ko) 2025-06-26
WO2024122200A1 (ja) 2024-06-13
CN120380425A (zh) 2025-07-25
JPWO2024122200A1 (https=) 2024-06-13

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