JPWO2024122200A1 - - Google Patents
Info
- Publication number
- JPWO2024122200A1 JPWO2024122200A1 JP2024562611A JP2024562611A JPWO2024122200A1 JP WO2024122200 A1 JPWO2024122200 A1 JP WO2024122200A1 JP 2024562611 A JP2024562611 A JP 2024562611A JP 2024562611 A JP2024562611 A JP 2024562611A JP WO2024122200 A1 JPWO2024122200 A1 JP WO2024122200A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022197408 | 2022-12-09 | ||
| PCT/JP2023/037872 WO2024122200A1 (ja) | 2022-12-09 | 2023-10-19 | 感光性樹脂組成物、樹脂硬化膜、及び画像表示装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024122200A1 true JPWO2024122200A1 (https=) | 2024-06-13 |
| JPWO2024122200A5 JPWO2024122200A5 (https=) | 2025-08-18 |
Family
ID=91378946
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024562611A Pending JPWO2024122200A1 (https=) | 2022-12-09 | 2023-10-19 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2024122200A1 (https=) |
| KR (1) | KR20250095719A (https=) |
| CN (1) | CN120380425A (https=) |
| TW (1) | TW202428664A (https=) |
| WO (1) | WO2024122200A1 (https=) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002182383A (ja) * | 2001-10-09 | 2002-06-26 | Goo Chemical Co Ltd | プリント回路基板製造用感光性樹脂組成物並びにそれを用いた被膜、レジストインク、レジスト、ソルダーレジスト及びプリント回路基板 |
| JP2008088394A (ja) * | 2006-09-07 | 2008-04-17 | Showa Highpolymer Co Ltd | アルカリ現像可能な感光性樹脂及びそれを含む感光性樹脂組成物 |
| JP5504738B2 (ja) * | 2009-08-05 | 2014-05-28 | 東洋インキＳｃホールディングス株式会社 | 感光性組成物 |
| JP5385729B2 (ja) * | 2009-09-01 | 2014-01-08 | 昭和電工株式会社 | 感光性樹脂 |
| KR20220091736A (ko) | 2020-12-24 | 2022-07-01 | 롬엔드하스전자재료코리아유한회사 | 플루오르화 아크릴레이트계 공중합체 및 이를 포함하는 감광성 수지 조성물 |
| KR20230128119A (ko) * | 2021-02-08 | 2023-09-01 | 오사카 유키가가쿠고교 가부시키가이샤 | 알칼리 가용성 수지, 감광성 수지 조성물, 경화물,및 화상표시장치 |
-
2023
- 2023-10-19 JP JP2024562611A patent/JPWO2024122200A1/ja active Pending
- 2023-10-19 KR KR1020257017623A patent/KR20250095719A/ko active Pending
- 2023-10-19 WO PCT/JP2023/037872 patent/WO2024122200A1/ja not_active Ceased
- 2023-10-19 CN CN202380082728.0A patent/CN120380425A/zh active Pending
- 2023-11-07 TW TW112142786A patent/TW202428664A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| KR20250095719A (ko) | 2025-06-26 |
| TW202428664A (zh) | 2024-07-16 |
| WO2024122200A1 (ja) | 2024-06-13 |
| CN120380425A (zh) | 2025-07-25 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250303 |