KR20250095719A - 감광성 수지 조성물, 수지 경화막 및 화상 표시 장치 - Google Patents
감광성 수지 조성물, 수지 경화막 및 화상 표시 장치 Download PDFInfo
- Publication number
- KR20250095719A KR20250095719A KR1020257017623A KR20257017623A KR20250095719A KR 20250095719 A KR20250095719 A KR 20250095719A KR 1020257017623 A KR1020257017623 A KR 1020257017623A KR 20257017623 A KR20257017623 A KR 20257017623A KR 20250095719 A KR20250095719 A KR 20250095719A
- Authority
- KR
- South Korea
- Prior art keywords
- resin
- meth
- group
- resin composition
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2022-197408 | 2022-12-09 | ||
| JP2022197408 | 2022-12-09 | ||
| PCT/JP2023/037872 WO2024122200A1 (ja) | 2022-12-09 | 2023-10-19 | 感光性樹脂組成物、樹脂硬化膜、及び画像表示装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20250095719A true KR20250095719A (ko) | 2025-06-26 |
Family
ID=91378946
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020257017623A Pending KR20250095719A (ko) | 2022-12-09 | 2023-10-19 | 감광성 수지 조성물, 수지 경화막 및 화상 표시 장치 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2024122200A1 (https=) |
| KR (1) | KR20250095719A (https=) |
| CN (1) | CN120380425A (https=) |
| TW (1) | TW202428664A (https=) |
| WO (1) | WO2024122200A1 (https=) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2022101511A (ja) | 2020-12-24 | 2022-07-06 | ローム・アンド・ハース・エレクトロニック・マテリアルズ・コリア・リミテッド | フッ素化アクリレート系コポリマー及びそれを含む感光性樹脂組成物 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002182383A (ja) * | 2001-10-09 | 2002-06-26 | Goo Chemical Co Ltd | プリント回路基板製造用感光性樹脂組成物並びにそれを用いた被膜、レジストインク、レジスト、ソルダーレジスト及びプリント回路基板 |
| JP2008088394A (ja) * | 2006-09-07 | 2008-04-17 | Showa Highpolymer Co Ltd | アルカリ現像可能な感光性樹脂及びそれを含む感光性樹脂組成物 |
| JP5504738B2 (ja) * | 2009-08-05 | 2014-05-28 | 東洋インキScホールディングス株式会社 | 感光性組成物 |
| JP5385729B2 (ja) * | 2009-09-01 | 2014-01-08 | 昭和電工株式会社 | 感光性樹脂 |
| JP7642683B2 (ja) * | 2021-02-08 | 2025-03-10 | 大阪有機化学工業株式会社 | アルカリ可溶性樹脂、感光性樹脂組成物、硬化物、及び画像表示装置 |
-
2023
- 2023-10-19 WO PCT/JP2023/037872 patent/WO2024122200A1/ja not_active Ceased
- 2023-10-19 CN CN202380082728.0A patent/CN120380425A/zh active Pending
- 2023-10-19 JP JP2024562611A patent/JPWO2024122200A1/ja active Pending
- 2023-10-19 KR KR1020257017623A patent/KR20250095719A/ko active Pending
- 2023-11-07 TW TW112142786A patent/TW202428664A/zh unknown
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2022101511A (ja) | 2020-12-24 | 2022-07-06 | ローム・アンド・ハース・エレクトロニック・マテリアルズ・コリア・リミテッド | フッ素化アクリレート系コポリマー及びそれを含む感光性樹脂組成物 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024122200A1 (ja) | 2024-06-13 |
| TW202428664A (zh) | 2024-07-16 |
| CN120380425A (zh) | 2025-07-25 |
| JPWO2024122200A1 (https=) | 2024-06-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| D21 | Rejection of application intended |
Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D21-EXM-PE0902 (AS PROVIDED BY THE NATIONAL OFFICE) |
|
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |