CN120380425A - 感光性树脂组合物、树脂固化膜及图像显示装置 - Google Patents

感光性树脂组合物、树脂固化膜及图像显示装置

Info

Publication number
CN120380425A
CN120380425A CN202380082728.0A CN202380082728A CN120380425A CN 120380425 A CN120380425 A CN 120380425A CN 202380082728 A CN202380082728 A CN 202380082728A CN 120380425 A CN120380425 A CN 120380425A
Authority
CN
China
Prior art keywords
resin
meth
resin composition
mol
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202380082728.0A
Other languages
English (en)
Chinese (zh)
Inventor
周正伟
柳正义
原司
木下健宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Resonac Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Resonac Corp filed Critical Resonac Corp
Publication of CN120380425A publication Critical patent/CN120380425A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14—Polymers provided for in subclass C08G
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
CN202380082728.0A 2022-12-09 2023-10-19 感光性树脂组合物、树脂固化膜及图像显示装置 Pending CN120380425A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022197408 2022-12-09
JP2022-197408 2022-12-09
PCT/JP2023/037872 WO2024122200A1 (ja) 2022-12-09 2023-10-19 感光性樹脂組成物、樹脂硬化膜、及び画像表示装置

Publications (1)

Publication Number Publication Date
CN120380425A true CN120380425A (zh) 2025-07-25

Family

ID=91378946

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202380082728.0A Pending CN120380425A (zh) 2022-12-09 2023-10-19 感光性树脂组合物、树脂固化膜及图像显示装置

Country Status (5)

Country Link
JP (1) JPWO2024122200A1 (https=)
KR (1) KR20250095719A (https=)
CN (1) CN120380425A (https=)
TW (1) TW202428664A (https=)
WO (1) WO2024122200A1 (https=)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002182383A (ja) * 2001-10-09 2002-06-26 Goo Chemical Co Ltd プリント回路基板製造用感光性樹脂組成物並びにそれを用いた被膜、レジストインク、レジスト、ソルダーレジスト及びプリント回路基板
JP2008088394A (ja) * 2006-09-07 2008-04-17 Showa Highpolymer Co Ltd アルカリ現像可能な感光性樹脂及びそれを含む感光性樹脂組成物
JP5504738B2 (ja) * 2009-08-05 2014-05-28 東洋インキＳｃホールディングス株式会社 感光性組成物
JP5385729B2 (ja) * 2009-09-01 2014-01-08 昭和電工株式会社 感光性樹脂
KR20220091736A (ko) 2020-12-24 2022-07-01 롬엔드하스전자재료코리아유한회사 플루오르화 아크릴레이트계 공중합체 및 이를 포함하는 감광성 수지 조성물
JP7642683B2 (ja) * 2021-02-08 2025-03-10 大阪有機化学工業株式会社 アルカリ可溶性樹脂、感光性樹脂組成物、硬化物、及び画像表示装置

Also Published As

Publication number Publication date
KR20250095719A (ko) 2025-06-26
WO2024122200A1 (ja) 2024-06-13
TW202428664A (zh) 2024-07-16
JPWO2024122200A1 (https=) 2024-06-13

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