TW202424010A - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物 Download PDF

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Publication number
TW202424010A
TW202424010A TW112133814A TW112133814A TW202424010A TW 202424010 A TW202424010 A TW 202424010A TW 112133814 A TW112133814 A TW 112133814A TW 112133814 A TW112133814 A TW 112133814A TW 202424010 A TW202424010 A TW 202424010A
Authority
TW
Taiwan
Prior art keywords
group
resin composition
photosensitive resin
aforementioned
alkyl group
Prior art date
Application number
TW112133814A
Other languages
English (en)
Chinese (zh)
Inventor
安井大貴
磯部信吾
Original Assignee
日商東京應化工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商東京應化工業股份有限公司 filed Critical 日商東京應化工業股份有限公司
Publication of TW202424010A publication Critical patent/TW202424010A/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW112133814A 2022-09-08 2023-09-06 感光性樹脂組成物 TW202424010A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022143275 2022-09-08
JP2022-143275 2022-09-08

Publications (1)

Publication Number Publication Date
TW202424010A true TW202424010A (zh) 2024-06-16

Family

ID=90191012

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112133814A TW202424010A (zh) 2022-09-08 2023-09-06 感光性樹脂組成物

Country Status (3)

Country Link
JP (1) JPWO2024053579A1 (https=)
TW (1) TW202424010A (https=)
WO (1) WO2024053579A1 (https=)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3030672B2 (ja) * 1991-06-18 2000-04-10 和光純薬工業株式会社 新規なレジスト材料及びパタ−ン形成方法
JP4190138B2 (ja) * 2000-08-02 2008-12-03 富士フイルム株式会社 ポジ型フォトレジスト組成物
JP6927176B2 (ja) * 2017-10-16 2021-08-25 信越化学工業株式会社 レジスト材料及びパターン形成方法
JP7219607B2 (ja) * 2018-12-25 2023-02-08 東京応化工業株式会社 樹脂組成物、及びマイクロレンズパターンを備える基板の製造方法

Also Published As

Publication number Publication date
JPWO2024053579A1 (https=) 2024-03-14
WO2024053579A1 (ja) 2024-03-14

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