JPWO2024053579A1 - - Google Patents
Info
- Publication number
- JPWO2024053579A1 JPWO2024053579A1 JP2024545637A JP2024545637A JPWO2024053579A1 JP WO2024053579 A1 JPWO2024053579 A1 JP WO2024053579A1 JP 2024545637 A JP2024545637 A JP 2024545637A JP 2024545637 A JP2024545637 A JP 2024545637A JP WO2024053579 A1 JPWO2024053579 A1 JP WO2024053579A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022143275 | 2022-09-08 | ||
| PCT/JP2023/032086 WO2024053579A1 (ja) | 2022-09-08 | 2023-09-01 | 感光性樹脂組成物 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024053579A1 true JPWO2024053579A1 (https=) | 2024-03-14 |
Family
ID=90191012
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024545637A Pending JPWO2024053579A1 (https=) | 2022-09-08 | 2023-09-01 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2024053579A1 (https=) |
| TW (1) | TW202424010A (https=) |
| WO (1) | WO2024053579A1 (https=) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3030672B2 (ja) * | 1991-06-18 | 2000-04-10 | 和光純薬工業株式会社 | 新規なレジスト材料及びパタ−ン形成方法 |
| JP4190138B2 (ja) * | 2000-08-02 | 2008-12-03 | 富士フイルム株式会社 | ポジ型フォトレジスト組成物 |
| JP6927176B2 (ja) * | 2017-10-16 | 2021-08-25 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| JP7219607B2 (ja) * | 2018-12-25 | 2023-02-08 | 東京応化工業株式会社 | 樹脂組成物、及びマイクロレンズパターンを備える基板の製造方法 |
-
2023
- 2023-09-01 JP JP2024545637A patent/JPWO2024053579A1/ja active Pending
- 2023-09-01 WO PCT/JP2023/032086 patent/WO2024053579A1/ja not_active Ceased
- 2023-09-06 TW TW112133814A patent/TW202424010A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024053579A1 (ja) | 2024-03-14 |
| TW202424010A (zh) | 2024-06-16 |