TW201435495A - 感光性樹脂組成物、其之硬化皮膜及印刷配線板 - Google Patents

感光性樹脂組成物、其之硬化皮膜及印刷配線板 Download PDF

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Publication number
TW201435495A
TW201435495A TW103119016A TW103119016A TW201435495A TW 201435495 A TW201435495 A TW 201435495A TW 103119016 A TW103119016 A TW 103119016A TW 103119016 A TW103119016 A TW 103119016A TW 201435495 A TW201435495 A TW 201435495A
Authority
TW
Taiwan
Prior art keywords
photosensitive
compound
resin
epoxy resin
manufactured
Prior art date
Application number
TW103119016A
Other languages
English (en)
Chinese (zh)
Inventor
Akio Norikoshi
Masao Arima
Original Assignee
Taiyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Ink Mfg Co Ltd filed Critical Taiyo Ink Mfg Co Ltd
Publication of TW201435495A publication Critical patent/TW201435495A/zh

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/28—Nitrogen-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/02—Homopolymers or copolymers of acids; Metal or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials For Photolithography (AREA)
  • Epoxy Resins (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
TW103119016A 2011-09-30 2012-09-14 感光性樹脂組成物、其之硬化皮膜及印刷配線板 TW201435495A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011218750 2011-09-30

Publications (1)

Publication Number Publication Date
TW201435495A true TW201435495A (zh) 2014-09-16

Family

ID=47993195

Family Applications (2)

Application Number Title Priority Date Filing Date
TW101133762A TWI537678B (zh) 2011-09-30 2012-09-14 A photosensitive resin composition, a hardened film thereof, and a printed wiring board
TW103119016A TW201435495A (zh) 2011-09-30 2012-09-14 感光性樹脂組成物、其之硬化皮膜及印刷配線板

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW101133762A TWI537678B (zh) 2011-09-30 2012-09-14 A photosensitive resin composition, a hardened film thereof, and a printed wiring board

Country Status (5)

Country Link
US (1) US20130085208A1 (enExample)
JP (1) JP6185227B2 (enExample)
KR (1) KR101662353B1 (enExample)
CN (2) CN103034053B (enExample)
TW (2) TWI537678B (enExample)

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US9868873B2 (en) 2012-05-17 2018-01-16 Xerox Corporation Photochromic security enabled ink for digital offset printing applications
US20130310517A1 (en) 2012-05-17 2013-11-21 Xerox Corporation Methods for manufacturing curable inks for digital offset printing applications and the inks made therefrom
US10113076B2 (en) 2014-09-30 2018-10-30 Xerox Corporation Inverse emulsion acrylate ink compositions for ink-based digital lithographic printing
US9815992B2 (en) 2015-01-30 2017-11-14 Xerox Corporation Acrylate ink compositions for ink-based digital lithographic printing
US9890291B2 (en) 2015-01-30 2018-02-13 Xerox Corporation Acrylate ink compositions for ink-based digital lithographic printing
US10323154B2 (en) * 2015-02-11 2019-06-18 Xerox Corporation White ink composition for ink-based digital printing
US9751326B2 (en) 2015-02-12 2017-09-05 Xerox Corporation Hyperbranched ink compositions for controlled dimensional change and low energy curing
US9956757B2 (en) 2015-03-11 2018-05-01 Xerox Corporation Acrylate ink compositions for ink-based digital lithographic printing
JP6785551B2 (ja) * 2015-04-03 2020-11-18 三菱製紙株式会社 エッチング方法
CN105038194A (zh) * 2015-06-05 2015-11-11 苏州珍展科技材料有限公司 一种用于人造大理石的聚氨酯丙烯酸酯复合材料及其制备方法
TWI591119B (zh) 2016-06-16 2017-07-11 臻鼎科技股份有限公司 感光性樹脂組合物、覆蓋膜及電路板
US9744757B1 (en) 2016-08-18 2017-08-29 Xerox Corporation Methods for rejuvenating an imaging member of an ink-based digital printing system
CN108628093A (zh) * 2017-03-23 2018-10-09 株式会社田村制作所 感光性树脂组合物
US11939478B2 (en) 2020-03-10 2024-03-26 Xerox Corporation Metallic inks composition for digital offset lithographic printing

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JPS61243869A (ja) 1985-04-19 1986-10-30 Taiyo Ink Seizo Kk レジストインキ組成物
JP2862313B2 (ja) 1990-02-28 1999-03-03 山栄化学株式会社 ソルダーレジストインキ組成物及びその硬化物
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JP5239786B2 (ja) * 2008-11-28 2013-07-17 日立化成株式会社 感光性樹脂組成物、並びにこれを用いた感光性フィルム、レジストパターンの形成方法、ソルダーレジスト、層間絶縁膜、プリント配線板の製造方法及びプリント配線板
JP5377020B2 (ja) * 2009-03-23 2013-12-25 太陽ホールディングス株式会社 光硬化性熱硬化性樹脂組成物、そのドライフィルム及び硬化物並びにそれらを用いたプリント配線板
JP5183540B2 (ja) * 2009-03-23 2013-04-17 太陽ホールディングス株式会社 硬化性樹脂組成物、それを用いたドライフィルム及びプリント配線板
JP5465453B2 (ja) * 2009-03-26 2014-04-09 パナソニック株式会社 光導波路形成用エポキシ樹脂組成物、光導波路形成用硬化性フィルム、光伝送用フレキシブルプリント配線板、及び電子情報機器
JP2011075787A (ja) * 2009-09-30 2011-04-14 Sekisui Chem Co Ltd 感光性組成物
JP2011164516A (ja) * 2010-02-15 2011-08-25 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
JP5744528B2 (ja) * 2011-01-11 2015-07-08 東京応化工業株式会社 タッチパネル用着色感光性樹脂組成物、タッチパネル、及び表示装置
JP6061449B2 (ja) * 2011-03-31 2017-01-18 太陽インキ製造株式会社 光硬化性熱硬化性樹脂組成物、そのドライフィルム及び硬化物並びにそれらを用いたプリント配線板

Also Published As

Publication number Publication date
KR101662353B1 (ko) 2016-10-04
CN104035280A (zh) 2014-09-10
CN104035280B (zh) 2017-10-24
CN103034053A (zh) 2013-04-10
TW201324036A (zh) 2013-06-16
CN103034053B (zh) 2015-08-05
KR20130035951A (ko) 2013-04-09
TWI537678B (zh) 2016-06-11
JP6185227B2 (ja) 2017-08-23
US20130085208A1 (en) 2013-04-04
JP2013083960A (ja) 2013-05-09

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