TW201247055A - Multi-layer printed circuit board and manufacturing method thereof - Google Patents

Multi-layer printed circuit board and manufacturing method thereof Download PDF

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TW201247055A
TW201247055A TW100137889A TW100137889A TW201247055A TW 201247055 A TW201247055 A TW 201247055A TW 100137889 A TW100137889 A TW 100137889A TW 100137889 A TW100137889 A TW 100137889A TW 201247055 A TW201247055 A TW 201247055A
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Taiwan
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circuit substrate
hole
outer layer
layer
inner layer
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TW100137889A
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Chinese (zh)
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TWI500366B (en
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Takeshi Kunifuda
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Nippon Mektron Kk
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  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)

Abstract

[Topic] The present invention provides a multi-layer printed circuit board with through holes filled with plating metal and a manufacturing method thereof. [Solving means] The multi-layer printed circuit board (90) of one embodiment of the present invention comprises: an inner layer circuit substrate (10); an outer layer circuit substrate (40) with an intervened insulating layer laminated on the surface of inner layer circuit substrate (10); an outer layer circuit substrate (50) with an intervened insulating layer laminated inside the inner layer circuit substrate (10); and, through holes (61) penetrating both the inner layer circuit substrate (10) and the outer layer circuit substrates (40, 50), and the filled through pin holes (71) filled with plating metal (68). The through holes (61) comprises the pin holes (67) connecting through the outer layer circuit substrate (40), the inner layer through holes (5) penetrating the inner layer circuit substrate (10), and the pin holes (66) penetrating the outer layer circuit substrate (50). The minimum opening diameter of pin holes (66) and (67) are larger than the maximum opening size of the inner layer through holes (5).

Description

201247055 六、發明說明: 【發明所屬之技術領域】 本發明是有關多層印刷配線板及其製造方法,戈;#是 有關具有塡孔構造的多層印刷配線板及其製造方法。 【先前技術】 近年,電子機器的小型化及高機能化愈來愈進步,連 帶提高對於印刷配線板之高密度化的要求。因此,貼合複 數印刷配線板,達到高密度化的多層印刷配線板,以攜帶 式電話和數位相機等小型電子機器爲中心擴大普及。以高 密度化的印刷配線板爲例而揭示了層積撓性印刷配線板的 多層印刷配線板(例如:參照專利文獻1)。 又,於專利文獻2及3中揭示,通孔的縱斷面形狀爲 鼓狀,或錐形狀的頂部彼此形成互相配合的形狀,形成以 電鍍金屬塡充的通孔(以下稱「塡充貫通孔」)的方法。 [先行技術文獻] [專利文獻] [專利文獻1]日本特開第2004-200260號公報 [專利文獻2]日本特開第2004-311919號公報 [專利文獻3]日本特開第2003-046248號公報 【發明內容】 [發明槪要] -5- 201247055 [發明欲解決之課題] 在此,針對有關比較例的多層撓性印刷配線板的製造 方法,採用第5A圖及第5B圖做說明。 (1) 首先,準備一片在由聚醯亞胺製成的可撓性之絕 緣基層膜的兩面形成有銅箔的雙面覆銅層積板。而且針對 該雙面覆銅層積板,進行通孔的形成、鍍銅處理及銅箔的 圖案化等,製作內層電路基材100。像是由第5A圖(1)即 可明白,內層電路基材1 〇〇,係具有:形成在絕緣基層膜 之兩面的配線圖案、和電性連接雙面的配線圖案的鍍通孔 〇 (2) 其次,像是由第5A圖(1)即可明白,爲了絕緣保 護內層電路基材100的兩面,使用真空層壓機等,將具有 絕緣膜130與接著劑層120的覆蓋層1 10,層壓在內層電 路基材100的兩面。藉此製作出核心基板200。 (3) 接著,製作增建層用的外層電路基材3 00。該外層 電路基材3 00隨著既定的圖案來加工雙面覆銅層積板的兩 面銅箔。外層電路基材3 00的配線圖案,是在盲孔形成部 位具有開口部3 1 0。該開口部3 1 0,是在後段的雷射加工 製程作爲正形光罩的功能。 (4) 接著,在核心基板200的兩面介設層積接著劑層 210來層積外層電路基材3 00,藉此製作出第5A圖(1)所 示的多層電路基材400。 (5) 接著,如第5A圖(2)所示,在多層電路基材400 形成盲孔及通孔。更具體是對外層電路基材3 00的開口部201247055 VI. [Technical Field] The present invention relates to a multilayer printed wiring board and a method of manufacturing the same, and relates to a multilayer printed wiring board having a pupil structure and a method of manufacturing the same. [Prior Art] In recent years, the miniaturization and high-performance of electronic equipment have become more and more advanced, and the demand for higher density of printed wiring boards has been increased. For this reason, a multi-layer printed wiring board having a high density has been bonded to a plurality of printed wiring boards, and has been widely spread around small electronic devices such as portable telephones and digital cameras. A multilayer printed wiring board in which a flexible printed wiring board is laminated is disclosed as an example of a printed wiring board having a high density (for example, see Patent Document 1). Further, in Patent Documents 2 and 3, the through-holes have a vertical cross-sectional shape in the shape of a drum, or the tops of the tapered shape form a mutually matching shape, and a through hole formed by plating metal is formed (hereinafter referred to as "filling through". Hole") method. [PRIOR ART DOCUMENT] [Patent Document 1] Japanese Laid-Open Patent Publication No. 2004-200926 [Patent Document 2] Japanese Laid-Open Patent Publication No. 2004-311919 (Patent Document 3) Japanese Patent Laid-Open No. 2003-046248 [Invention] [5] In the present invention, a method of manufacturing a multilayer flexible printed wiring board according to a comparative example will be described with reference to FIGS. 5A and 5B. (1) First, a double-sided copper-clad laminate in which copper foil was formed on both surfaces of a flexible insulating base film made of polyimide. Further, the double-sided copper clad laminate is formed by forming a via hole, a copper plating process, and patterning a copper foil. As can be understood from Fig. 5A (1), the inner layer circuit substrate 1 has a wiring pattern formed on both surfaces of the insulating base film and a plated through hole 电 electrically connecting the wiring patterns on both sides. (2) Next, as is understood from Fig. 5A (1), in order to insulate and protect both sides of the inner layer circuit substrate 100, a cover layer having the insulating film 130 and the adhesive layer 120 is used using a vacuum laminator or the like. 1 10, laminated on both sides of the inner layer circuit substrate 100. Thereby, the core substrate 200 is produced. (3) Next, an outer layer circuit substrate 300 for the build-up layer was produced. The outer layer circuit substrate 300 processes the both sides of the copper foil of the double-sided copper clad laminate in accordance with a predetermined pattern. The wiring pattern of the outer layer substrate 300 has an opening portion 310 in the blind hole forming portion. The opening portion 310 is a function of the laser processing in the subsequent stage as a positive mask. (4) Next, the laminated circuit layer 210 is laminated on both surfaces of the core substrate 200 to laminate the outer layer circuit substrate 300, whereby the multilayer circuit substrate 400 shown in Fig. 5A (1) is produced. (5) Next, as shown in Fig. 5A (2), blind holes and through holes are formed in the multilayer circuit substrate 400. More specifically, the opening portion of the outer circuit substrate 300

S -6- 201247055 310照射雷射光進行雷射加工,來形成在底面露出內層電 路基材100的配線圖案的盲孔410、以及在底面露出外層 電路基材300的裏面的配線圖案的盲孔420。並且在通孔 的形成部位進行鑽孔加工,藉此形成貫通多層電路基材 400的通孔430。 (6) 接著,如第5A圖(3)所示,對著形成有肓孔410、 420、以及通孔43 0的多層電路基材400施行電鍍處理, 形成鍍皮膜45 0。在盲孔410、420、以及通孔430的側面 形成有鍍皮膜45 0,藉此形成有作爲層間連接路徑之功能 的鍍肓孔460、470、480、以及銨通孔490。 (7) 接著,如第5B圖(4)所示,使用感光蝕刻加工手 法,以既定的圖案來加工外層電路基材3 00之表面的導電 膜,來形成外層電路配線圖案5 00。 (8) 接著,如第5B圖(5)所示,形成絕緣保護外層電 路配線圖案500、鍍肓孔460、470、480、以及鍍通孔 490的防焊劑510。該防焊劑510是形成在零件安裝用的 端子以及連接用的端子之形成預定部位具有開口部510a 。再者,作爲絕緣保護材,也可以取代防焊劑,而使用覆 蓋層。 (9) 接著,對著露出於開口部510a之底面的外層電路 配線圖案5 00施行鑛金或鍍錫等的表面處理,來形成端子 520 ° 藉由上述製程,完成具有:鍍盲孔460、470、480、 以及鍍通孔490的多層撓性印刷配線板600。 201247055 像是由第5B圖即可明白,端子520並非設置在鍍盲 孔460、470、480、以及鍍通孔490的的正上方。此乃爲 了對多層撓性印刷配線板平行地安裝,電子機器典型上是 晶片尺寸封裝(CSP:Chip Size Package)之類的裸晶片。亦 即,在鍍盲孔460、470、4 80、以及鍍通孔490的正上方 安裝電子零件的場合,對印刷配線板平行地安裝電子雰件 是很困難的事情。爲了理解該理由,針對CSP的安裝製 程做說明。 首先,設置在CSP之端子上的複數個焊球,是以各 自位在鍍盲孔460、470、480、以及鍍通孔490之正上方 的方式,在印刷配線板之上載置CSP。然後,在廻焊製程 中,溶解焊球,將CSP固定在印刷配線板。然而,如第 5B圖(5)所示,由於鍍盲孔460、470、480、以及鍍通孔 490的深度有所區別,吸入到該些孔的溶融的焊料量,每 個孔各不相同。其結果,CSP無法對印刷配線板平行地安 裝。 因而,無法在鍍肓孔460、470、4 8 0、以及鍍通孔 490的正上方設置端子,如第5B圖(5)所示的端子5 20, 必須在自鍍肓孔460、470、480、以及鍍通孔490之正上 方左右偏離的位置設置端子。 近年數位相機等之電子機器的小型化、高機能化非常 驚人,CSP的焊墊間距愈來愈窄距化。具體而言,當初 0.8mm左右的焊墊間距變成0.5mm以下,對應於此,而 對印刷配線板要求更高密度化。S-6-201247055 310 laser light is irradiated to form a blind hole 410 in which the wiring pattern of the inner layer circuit substrate 100 is exposed on the bottom surface, and a blind hole in which the wiring pattern on the inner surface of the outer layer circuit substrate 300 is exposed on the bottom surface. 420. Further, drilling is performed at a portion where the through hole is formed, thereby forming a through hole 430 penetrating the multilayer circuit substrate 400. (6) Next, as shown in Fig. 5A (3), the multilayer circuit substrate 400 on which the pupils 410, 420 and the vias 43 0 are formed is subjected to a plating treatment to form a plating film 45 0 . A plating film 45 0 is formed on the side faces of the blind holes 410, 420 and the through holes 430, whereby the plating holes 460, 470, and 480 and the ammonium through holes 490 functioning as interlayer connection paths are formed. (7) Next, as shown in Fig. 5B (4), the conductive film on the surface of the outer layer substrate 300 is processed in a predetermined pattern by a photosensitive etching process to form the outer layer wiring pattern 500. (8) Next, as shown in Fig. 5B (5), the insulating protective outer layer wiring pattern 500, the plating holes 460, 470, 480, and the solder resist 510 of the plated through holes 490 are formed. The solder resist 510 has an opening 510a formed at a predetermined portion where the terminal for mounting the component and the terminal for connection are formed. Further, as the insulating protective material, a coating layer may be used instead of the solder resist. (9) Next, the outer layer circuit wiring pattern 500 exposed on the bottom surface of the opening 510a is subjected to a surface treatment such as gold or tin plating to form the terminal 520 °. The method includes the plating hole 460, 470, 480, and a multilayer flexible printed wiring board 600 plated through holes 490. 201247055 As can be seen from Fig. 5B, the terminal 520 is not disposed directly above the plating blind holes 460, 470, 480, and the plated through holes 490. This is for mounting a multilayer flexible printed wiring board in parallel, and the electronic device is typically a bare chip such as a Chip Size Package (CSP). In other words, when electronic components are mounted directly above the plating blind holes 460, 470, and 480 and the plated through holes 490, it is difficult to mount the electronic components in parallel with the printed wiring boards. In order to understand the reason, the installation process of the CSP is explained. First, a plurality of solder balls provided on the terminals of the CSP are placed on the printed wiring board so that the CSPs are placed directly above the plating blind holes 460, 470, and 480 and the plated through holes 490. Then, in the soldering process, the solder balls are dissolved to fix the CSP to the printed wiring board. However, as shown in FIG. 5B (5), since the depths of the plated blind holes 460, 470, 480, and the plated through holes 490 are different, the amount of molten solder sucked into the holes is different for each hole. . As a result, the CSP cannot mount the printed wiring board in parallel. Therefore, it is not possible to provide terminals directly above the plating holes 460, 470, 480, and the plated through holes 490, such as the terminals 5 20 shown in FIG. 5B (5), which must be in the self-plating holes 460, 470, 480, and a terminal is disposed at a position deviated from the right side of the plated through hole 490 to the left and right. In recent years, the miniaturization and high performance of electronic devices such as digital cameras have been remarkable, and the pitch of CSP pads has become increasingly narrow. Specifically, the pitch of the pads of about 0.8 mm is 0.5 mm or less, which corresponds to this, and the printed wiring board is required to have a higher density.

S -8- 201247055 然而’如上記,爲了限制端子的位置,以往要安裝窄 距且多針腳的晶片,例如1 0 X 1 0以上的焊墊以柵壓來配置 的CSP是非常困難的。 因此,考慮藉由對盲孔或通孔進行塡充金屬的塡孔電 鍍(filling plated)處理,形成塡孔構造。如前述,在專利 文獻2及3提案一種通孔的縱斷面形狀爲鼓狀,而形成塡 充貫通孔的方法。 然而,該些的文獻無論那一個都是以由單一材料所製 成的單層之基板爲對象,對於多層印刷配線板而言無法適 用。例如第5B圖(5)所示的多層印刷配線板的場合,被加 工層是層積著絕緣膜、接著劑、以及銅箔等加工特性相異 的各種材料。因而,即便採用雷射加工等,欲將被加工層 加工成爲縱斷面爲鼓狀的情形是極爲困難的。 再者,多層印刷配線板的場合,也有別的問題。亦即 ,電子零件的端子不光是設置在通孔上,也必須設置在盲 孔上,但由於通孔與盲孔,在構造上,電鍍藥液的流動性 不同,因此就會有所謂的在同一個塡孔電鍍製程中進行處 理相當困難的問題。更詳細就是,塡孔電鍍處理具有電鑛 藥液之流動性低者,其效率上較爲容易的特徵。有底的盲 孔的場合,由於電鑛藥液的流動性低,因此可得到良好的 塡孔構造。對此,通孔的場合,由於電鍍藥液的流動性高 ,因此無法效率的良好將電鍍金屬塡充到通孔內。 [用以解決課題之手段] 201247055 藉由本發明之一形態,提供一種具備:內層電路基材 ;介設絕緣層被層積在前記內層電路基材之表面的第一外 層電路基材;介設絕緣層被層積在前記內層電路基材之裏 面的第二外層電路基材;和對貫通前記第一外層電路蕋材 、前記內層電路基材以及前記第二外層電路基材的通孔, 塡充電鍍金屬的塡充貫通孔:前記通孔,係構成連通藉貫 通前記第一外層電路基材的第一針孔、貫通前記內層電路 基材的內層通孔、以及貫通前記第二外層電路基材的第二 針孔,前記第一及第二針孔,具有較前記內層通孔的最大 開口徑更大的最小開口徑爲其特徵的多層印刷配線板。 藉由本發明之另一形態,提供一種準備具有:可撓性 之絕緣基膜、形成在該絕緣基膜之兩面的金屬箔的雙面覆 金屬層積板,形成朝厚度方向貫通前記両面覆金屬層積板 的內層通孔,將前記雙面覆金屬層積板的金屬箔圖案化, 形成內層配線圖案,藉此製作內層電路基材,準備具有: 可撓性之絕緣基膜、和形成在該絕緣基膜之至少一方的面 的金屬箔的第一及第二覆金屬層積板,將前記第一覆金屬 層積板的金屬箔圖案化,形成第一外層配線圖案,藉此製 作第一外層電路基材,將前記第二覆金屬層積板的金屬箔 圖案化,形成第二外層配線圖案,藉此製作第二外層電路 基材,在前記內層電路基材之表面將前記第一外層電路基 材,以前記第一外層配線圖案位在外側的方式,介設著絕 緣層而層積,且在前記內層電路基材的裏面將前記第二外 層電路基材,以前記第二外層配線圖案位在外側的方式,S -8- 201247055 However, as described above, in order to limit the position of the terminals, it has been difficult to mount a narrow-distance and multi-pin wafer in the past, for example, a CSP in which a pad of 10×10 or more is arranged with a gate voltage is very difficult. Therefore, it is considered that a pupil structure is formed by a filling plated treatment of a blind hole or a via hole. As described above, Patent Documents 2 and 3 propose a method in which the through-hole shape of the through hole is drum-shaped to form a through-hole. However, none of these documents is aimed at a single-layer substrate made of a single material, and is not applicable to a multilayer printed wiring board. For example, in the case of the multilayer printed wiring board shown in Fig. 5B (5), the processed layer is formed by laminating various materials having different processing characteristics such as an insulating film, an adhesive, and a copper foil. Therefore, even if laser processing or the like is employed, it is extremely difficult to process the layer to be processed into a drum shape in a longitudinal section. Furthermore, in the case of a multilayer printed wiring board, there are other problems. That is, the terminals of the electronic component are not only disposed on the through hole, but also must be disposed on the blind hole, but due to the through hole and the blind hole, the fluidity of the plating solution is different in structure, so there is a so-called It is quite difficult to handle in the same pupil plating process. More specifically, the pupil plating treatment has a feature that the fluidity of the electromineral liquid is low, and the efficiency is relatively easy. In the case of a bottomed blind hole, since the fluidity of the electromineral liquid is low, a good pupil structure can be obtained. On the other hand, in the case of a through hole, since the fluidity of the plating solution is high, it is not possible to efficiently charge the plated metal into the through hole. [Means for Solving the Problem] 201247055 According to an aspect of the present invention, a first outer layer circuit substrate including an inner layer circuit substrate and a dielectric layer laminated on a surface of a front inner circuit substrate; a second outer layer circuit substrate having an insulating layer laminated on the inner surface of the inner layer circuit substrate; and a first outer layer circuit coffin, a front inner circuit substrate, and a second outer circuit substrate Through hole, 塡charged metal plated through hole: the front through hole constitutes a first pinhole through which the first outer layer circuit substrate is connected, an inner layer through hole penetrating the inner layer circuit substrate, and a through hole The second pinhole of the second outer circuit substrate, the first and second pinholes, has a multilayer printed wiring board characterized by a minimum opening diameter larger than the maximum opening diameter of the inner layer through hole. According to another aspect of the present invention, there is provided a double-sided metal-clad laminate in which an insulating base film having flexibility and a metal foil formed on both surfaces of the insulating base film are prepared, and a metal-clad surface is formed in the thickness direction. The inner layer through hole of the laminated board is patterned by forming a metal foil of the double-sided metal-clad laminate, and an inner layer wiring pattern is formed, thereby preparing an inner layer circuit substrate, and having an insulating insulating base film, And the first and second metal-clad laminates of the metal foil formed on at least one of the insulating base films, and the metal foil of the first metal-clad laminate is patterned to form a first outer wiring pattern. The first outer circuit substrate is formed, and the metal foil of the second metal-clad laminate is patterned to form a second outer wiring pattern, thereby fabricating a second outer circuit substrate, which is preceded by the surface of the inner circuit substrate. The first outer layer circuit substrate is preceded by the first outer layer wiring pattern being placed on the outer side, and the insulating layer is laminated, and the second outer layer circuit substrate is preceded by the inner layer of the inner layer circuit substrate. Previously, the way the second outer wiring pattern was on the outside,

S -10- 201247055 介設著絕緣.層而層積,藉此製作多層電路基材,藉由對前 記多層電路基材之既定的領域施行照射雷射光的雷射加工 製程,來貫通前記第一外層電路基材,作爲連通具有比前 記內層通孔之最大開口徑還大的最小開口徑的第一針孔、 和貫通前記內層通孔與前記第二外層電路基材,且具有比 前記內層通孔之最大開口徑還大的最小開口徑的第二針孔 所構成,形成貫通前記多層電路基材的通孔,且施行對前 記通孔塡充電鍍金屬的塡充電鍍處理,形成電性連接前記 內層配線圖案、前記第一外層配線圖案及前記第二外層配 線圖案的塡充貫通孔之多層印刷配線板之製造方法。 [發明效果] 有關本發明之實施形態的通孔是構成連通有:貫通第 一外層電路基材的第一針孔、貫通內層電路基材的內層通 孔、和貫通第二外層電路基材的第二針孔。又,第一及第 二針孔,是具有比內層通孔之最大開口徑還大的最小開口 徑。在具有此種構成的通孔中,在第一針孔與內層通孔之 連接部分及第二針孔與內層通孔的連接部分形成角隅部, 在通孔內塡充電鍍金屬之際,藉由具有角隅部使電鍍藥液 的流動性下降,電鍍金屬變得很容易析出。再者,由於第 一及第二針孔,是作爲具有比內層通孔之最大開口徑還大 的最小開口徑所構成,因此通孔係愈往內層側孔徑愈小。 因此,塡孔電鍍處理之際,內層通孔會因電鑛金屬而最先 閉塞,形成上下兩個v字型的凹部。藉此,由於可抑制氣 -11 - 201247055 泡等的產生而形成高品質的塡充貫通孔’同時電鑛藥液的 流動性更爲下降,因此塡孔電鍍處理的效率提昇’就能縮 短塡充貫通孔的形成時間。 【實施方式】 以下參照圖面,針對本發明之實施形態做說明。 再者,在各圖中具有同等功能的構成要素附上相同的 符號,相同符號的構成要素之詳細說明不予重複。又,圖 面是以特徵部分爲中心來表現,厚度與平面尺寸的關係、 各層之厚度的比例等與實物不同。 有關本實施形態的多層印刷配線板之製造方法,採用 第1A圖、第1B圖、第2A圖、第2B圖、第3圖、第4A 圖及第4B圖做說明。 首先,採用第1A圖,針對核心基板之製造方法做說 明。 (1) 準備具有:由聚醯亞胺等製成的可撓性之絕緣基層 膜1、形成在該絕緣基層膜1之兩面的銅箔2及銅箔3的 雙面覆銅層積板4。 (2) 接著’像是由第1A圖(1)即可明白,對於雙面覆 銅層積板4,藉由NC鑽頭加工(或雷射加工法)等,形成 貫通雙面覆銅層積板4的內層通孔5。 (3) 接著,像是由第1A圖(1)即可明白,對內層通孔5 內施行去膠渣(desmear)處理及導電化處理之後,對形成 內層通孔5之雙面覆銅層積板4的全面施行電鍍處理(例S -10- 201247055 Interlayering and laminating to form a multilayer circuit substrate, by performing a laser processing process for irradiating laser light to a predetermined field of the pre-recorded multilayer circuit substrate, The outer circuit substrate is a first pinhole that communicates with a minimum opening diameter larger than a maximum opening diameter of the inscribed inner layer through hole, and a through hole inner layer through hole and a second outer layer circuit substrate, and has a comparison The second through hole having the smallest opening diameter of the inner layer through hole having a large maximum opening diameter is formed, and a through hole penetrating the multilayer circuit substrate is formed, and a ruthenium plating process for charging and plating the front via hole is performed to form A method of manufacturing a multilayer printed wiring board in which an inner layer wiring pattern, a first outer layer wiring pattern, and a second outer layer wiring pattern of a pre-recorded through-hole are electrically connected. [Effect of the Invention] The through hole according to the embodiment of the present invention is configured to communicate with the first pinhole penetrating the first outer layer circuit substrate, the inner layer through hole penetrating the inner layer circuit substrate, and the second outer layer circuit. The second pinhole of the material. Further, the first and second pinholes have a minimum opening diameter which is larger than the maximum opening diameter of the inner layer through hole. In the through hole having such a configuration, the connecting portion of the first pinhole and the inner layer through hole and the connecting portion of the second pin hole and the inner layer through hole form a corner portion, and the metal plating is performed in the through hole. Further, by having a corner portion, the fluidity of the plating solution is lowered, and the plating metal is easily precipitated. Further, since the first and second pinholes are formed as a minimum opening diameter which is larger than the maximum opening diameter of the inner layer through hole, the hole diameter becomes smaller toward the inner layer side. Therefore, at the time of the pupil plating treatment, the inner layer through holes are first occluded by the electric ore metal, and the upper and lower v-shaped recesses are formed. In this way, it is possible to suppress the generation of gas-11 - 201247055 bubbles and the like, thereby forming a high-quality entangled through-hole. At the same time, the fluidity of the electro-mineral liquid is further reduced, so that the efficiency of the boring plating process can be improved. The formation time of the through hole. [Embodiment] Hereinafter, embodiments of the present invention will be described with reference to the drawings. The components having the same functions in the respective drawings are denoted by the same reference numerals, and the detailed description of the components of the same reference numerals will not be repeated. Further, the surface is represented by the feature portion, and the relationship between the thickness and the plane size, the ratio of the thickness of each layer, and the like are different from the actual object. The method for manufacturing the multilayer printed wiring board according to the present embodiment will be described with reference to Figs. 1A, 1B, 2A, 2B, 3, 4A and 4B. First, the manufacturing method of the core substrate will be described using FIG. 1A. (1) A double-sided copper clad laminate 4 having a flexible insulating base film 1 made of polyimide or the like, and a copper foil 2 and a copper foil 3 formed on both surfaces of the insulating base film 1 . (2) Next, it can be understood from Fig. 1A (1) that the double-sided copper clad laminate 4 is formed by double-sided copper lamination by NC bit processing (or laser processing). The inner layer through hole 5 of the plate 4. (3) Next, as shown in Fig. 1A (1), it is understood that after the desmear treatment and the conductive treatment are performed on the inner layer via hole 5, the double layer of the inner layer via hole 5 is formed. Full plating treatment of copper laminated board 4 (example

S -12- 201247055 如電解銅電鍍處理)。藉此,在銅箔2、3上、以及內層通 孔5之內壁形成鍍皮膜6,同時形成電性連接銅箔2及銅 箔3的鍍通孔7。 (4) 接著,藉由減除法(Subtractive Process),以既定 的圖案來加工絕緣基層膜1之雙面的導電膜(鍍皮膜6及 銅箔2、3)。更詳細是以被覆鍍皮膜6及鍍通孔7的方 式,來形成乾薄膜阻劑等之蝕刻層(圖未揭示),然後, 藉由感光蝕刻加工法來曝光、顯像蝕刻層,以既定的圖案 來加工蝕刻層。然後,以圖案化的蝕刻層作爲光罩,來蝕 刻鍍皮膜6及銅箔2、3,藉此來形成內層配線圖案8A、 8B。然後,剝離蝕刻層。 藉由至此的製程,如第1A圖(1)所示,在表面及裏面 分別形成有內層配線圖案8A、8B,製成出具有鍍通孔7 的內層電路基材10。 再者,在上記之順序中,雖是在形成內層通孔5之後 施行電鍍處理,但也可以不施行該電鍍處理就施行銅箔2 、3的圖案化。 (5) 接著,準備具有:由聚醯亞胺膜等製成的絕緣膜12 、形成在該絕緣膜12之單面的接著劑層Π的覆蓋層13 。接著劑層1 1是例如由壓克力、環氧樹脂等的接著劑製 成。而且,爲了絕緣保護內層配線圖案8A、8B,使用真 空層壓機等,對內層電路基材10的雙面層壓各個覆蓋層 13。經過本製程,製作出第1圖(2)所示的核心基板20。 再者,如第1圖(2)所示,內層配線圖案8A、8B、以及鍍 -13- 201247055 通孔7是藉由接著劑層11被塡充。 其次,針對成爲層積在核心基板20的增建層的外層 電路基材40、50的製造方法,採用第1B圖做說明。 (1) 首先,準備雙面覆銅層積板34及雙面覆銅層積板 44。該雙面覆銅層積板34(44),係具有:由聚醯亞胺等製 成的可撓性之絕緣基層膜31(41)、和形成在該兩面的銅箔 32(42)及銅箔 33(43)。 (2) 接著,藉由減除工法,以既定的圖案來加工雙面 覆銅層積板34的銅箔32、33,藉此製作出第1B圖(a)所 示的外層電路基材40。銅箔32具有開口部35、37及38 ,銅箔33具有包含開口部36的外層配線圖案39» 同樣地,以既定的圖案來加工雙面覆銅層積扳44的 銅箔42、43,藉此製作出第1B圖(b)所示的外層電路基 材50。銅箔42具有包含開口部47的外層配線圖案49, 銅箔43具有開口部45、46及48。開口部35〜 38及開 口部45〜48,是設置在通孔或盲孔的形成預定領域,在 後段的雷射加工製程中,作爲正形投影光罩(Conformal mask)功能。 又,於第1B圖(a)及(b)表示由圖中下方觀看時的開口 部36及開口部45的形狀。像這樣地開口部36及45,試 著以最小開口徑爲基準的話,成爲葉狀地具有複數個凹部 的星形形狀所形成,且試著以最大開口徑爲基準的話,成 爲具有向著內側的複數個突起部所形成。 接著,使用在上記製成所製作的核心基板20、外層S -12- 201247055 Such as electrolytic copper plating treatment). Thereby, the plating film 6 is formed on the inner walls of the copper foils 2, 3 and the inner layer vias 5, and the plated through holes 7 for electrically connecting the copper foil 2 and the copper foil 3 are formed. (4) Next, the double-sided conductive film (coating film 6 and copper foils 2, 3) of the insulating base film 1 is processed in a predetermined pattern by a subtractive process. More specifically, an etching layer (not shown) of a dry film resist or the like is formed so as to cover the plating film 6 and the plated through holes 7. Then, the etching layer is exposed and developed by a photosensitive etching process to define The pattern is used to process the etch layer. Then, the plating film 6 and the copper foils 2, 3 are etched by using the patterned etching layer as a mask to form the inner wiring patterns 8A, 8B. Then, the etching layer is peeled off. By the process thus far, as shown in Fig. 1A (1), the inner layer wiring patterns 8A and 8B are formed on the front surface and the inner surface, respectively, and the inner layer circuit substrate 10 having the plated through holes 7 is formed. Further, in the above-described order, although the plating treatment is performed after the formation of the inner layer via hole 5, the patterning of the copper foils 2 and 3 may be performed without performing the plating treatment. (5) Next, a cover layer 13 having an insulating film 12 made of a polyimide film or the like and an adhesive layer formed on one surface of the insulating film 12 is prepared. The subsequent agent layer 11 is made of, for example, an adhesive such as acryl, epoxy resin or the like. Further, in order to insulate and protect the inner layer wiring patterns 8A, 8B, the respective cover layers 13 are laminated on both sides of the inner layer circuit substrate 10 using a vacuum laminator or the like. Through this process, the core substrate 20 shown in Fig. 1 (2) is produced. Further, as shown in Fig. 1 (2), the inner layer wiring patterns 8A, 8B and the through-plated holes -13 - 201247055 are filled by the adhesive layer 11. Next, a method of manufacturing the outer layer circuit substrates 40 and 50 which are laminated layers of the core substrate 20 will be described with reference to Fig. 1B. (1) First, a double-sided copper clad laminate 34 and a double-sided copper clad laminate 44 are prepared. The double-sided copper-clad laminate 34 (44) has a flexible insulating base film 31 (41) made of polyimide or the like, and a copper foil 32 (42) formed on both sides and Copper foil 33 (43). (2) Next, the copper foils 32 and 33 of the double-sided copper clad laminate 34 are processed in a predetermined pattern by the subtractive method, whereby the outer layer substrate 40 shown in Fig. 1(a) is produced. . The copper foil 32 has openings 35, 37, and 38. The copper foil 33 has an outer layer wiring pattern 39 including an opening 36. Similarly, the copper foils 42, 43 of the double-sided copper laminate 44 are processed in a predetermined pattern. Thereby, the outer layer circuit substrate 50 shown in Fig. 1B(b) is produced. The copper foil 42 has an outer layer wiring pattern 49 including an opening 47, and the copper foil 43 has openings 45, 46, and 48. The openings 35 to 38 and the opening portions 45 to 48 are provided in a predetermined area in which the through holes or the blind holes are formed, and function as a conformal mask in the laser processing in the subsequent stage. Further, in Figs. 1B (a) and (b), the shapes of the opening portion 36 and the opening portion 45 when viewed from the lower side in the drawing are shown. In the case of the opening portions 36 and 45, the opening portions 36 and 45 are formed in a star shape having a plurality of concave portions in a leaf shape with reference to the minimum opening diameter, and the inner opening is tried to be based on the maximum opening diameter. A plurality of protrusions are formed. Next, the core substrate 20 and the outer layer produced by the above are used.

S -14- 201247055 電路基材40及外層電路基材50,來說明製作有關本實施 形態之可撓性印刷配線板之方法。 (1) 如第2A圖(1)所示,將外層電路基材40及50’介 設接著劑層51 ’分別層積接著在核心基板20的表面以及 裏面之既定的領域。藉此’製作第2A圖(2)所示的多層電 路基材60。未層積多層電路基材的領域,是成爲供拉出 配線的可撓性電線部。 再者,作爲應用在接著劑層51的接著材’理想上是 低流量(low flow)型之所謂預漬體或黏合薄片等之流出量 少的物質。 (2) 接著,如第2A圖(2)及(3)所示’對著多層電路基 材60的開口部35、37、38、45、46、48照射雷射光(例 如C02雷射),進行正形投影雷射(Conformal laser)。藉此 ’形成通孔61、以及盲孔62〜65。然後’藉由去膠處理 等,進行通孔61、以及盲孔62〜65內的洗淨。 如第2A圖(3)所示,通孔61是朝厚度方向貫通多層 電路基材60,更詳細從圖中上側向下側,貫通絕緣基層 膜31、接著劑層51(上側)、絕緣膜12(上側)、接著劑層 1 1 (上側)、接著劑層1 1 (下側)、絕緣膜1 2(下側)、接著劑 層5 1 (下側)、以及絕緣基層膜4 1。 盲孔62是貫通絕緣基層膜3 1、接著劑層5 1、絕緣膜 12、以及接著劑層11,在其底面露出鍍皮膜6°該盲孔 62是跳過(skip)設置在外層電路基材40之裏面的外層配 線圖案39的跳過盲孔(skip via hole)。 -15- 201247055 盲孔63是貫通絕緣基層膜41、接著劑層5 1、絕緣膜 12、以及接著劑層11,在其底面露出鍍皮膜6。該窗孔 63,是在中段露出銅箱42的階梯肓孔(step via hole)。 盲孔64是貫通絕緣基層膜31,在其底面爲露出銅箔 33的盲孔。盲孔65是貫通絕緣基層膜41,在其底面爲露 出銅箔42的盲孔。 在此,有關通孔61的構造,採用第3圖,做更詳細 地說明。第3圖是表示以第2A圖(3)之虛線所框起來的部 分(A部)之放大剖面圖。通孔6 1是作爲連通內層通孔5、 針孔67、以及針孔66所構成》 針孔67是具有以銅箔32之開口部35作爲光罩而形 成的上孔和以銅箔3 3之開口部3 6作爲光罩而形成的下孔 的踏板盲孔。如第3圖所示,按內層通孔5、針孔67之 下孔、針孔6 7之上孔的順序,將直徑變大。亦即,貫通 多層電路基材的通孔之直徑,是隨著往內層側而段差變小 〇 針孔66是以銅箔43的開口部45爲光罩而形成的針 孔。如第3圖所示,針孔66的直徑比內層通孔5的直徑 還大。 就一般而言,設置在內層電路基材10的內層通孔5 的最大開口徑,是比設置在外層電路基材40、50的針孔 66、67的最小開口徑還小。在此,最大開口徑是意味著 開口徑的最大値。若內層通孔5的橫斷面形狀是如第3圖 所示的圓形,最大開口徑就是該圓的直徑(第3圖中的長 -16- 201247055 度a)。 在此,最小開口徑是意味著開口徑的最小値。若針孔 66或針孔67的下孔的橫斷面形狀是具有朝向如第3圖所 示的內側之突起部的星形,最小開口徑就能該星形之面對 面的兩個突起部間的距離(第3圖中的長度b)。 在第3圖之放大斷面圖的上方及下方,是分別表示從 上側及下側觀看通孔6 1時的通孔6 1之俯視圖。 針孔67之下孔的橫斷面是成爲與開口部36的形狀相 同。因此,在針孔6 7之下孔的側壁,是反映開口部3 6的 星形形狀而形成凹凸。同樣地,針孔66的橫斷面是成爲 與開口部45的形狀相同。因此,在針孔66的側壁,是反 映開口部45的星形形狀而形成凹凸。 (3)接著,如第2B圖(4)所示,對通孔61、以及盲孔 62〜65進行導電化處理。然後,藉由使用塡孔電鍍處理 用的電鑛藥液(硫酸銅電鍍添加劑,例如奧野製藥工業社 製的Top Lucina THF)的塡孔電鍍處理(電解電鍍處理), 在通孔61、以及盲孔62〜65內塡充電鍍金屬68,形成塡 充貫通孔7 1、以及塡孔72〜7 5。 藉此,如第2B圖(4)所示,就可以得到以電鍍金屬 68塡充通孔61、以及盲孔62〜65的多層電路基材70。 在此,針對有關在通孔61內塡充有電鍍金屬68的樣 子,採用第4A圖及第4B圖做詳細地說明。 如第4A圖(1)所示,在塡孔電鑛處理的初期,以塡孔 電鍍藥液之流動性較小的角隅部c爲中心’析出電鍍金屬 -17- 201247055 68。然後,連帶進行電鍍處理’如第4A圖(2)所示,析出 至通孔61內的電鍍金屬,就會成爲以通孔61中之最小徑 的領域D爲頂部的鼓狀。 若進一步進fr電鑛處理’如第4A圖(2)及(3)所示, 通孔61在領域D藉由電鍍金屬69被閉塞。其結果,如 第4A圖(3)所示,形成上下兩個硏鉢狀的凹部69。由於 形成凹部69,電鍍藥液的流動性更爲降低’因此促進電 鍍塡孔。 然後,連帶進行塡孔電鍍處理’如第4B圖(4)及(5) 所示,凹部69變淺’最後成爲既定的深度以下,完成塡 孔電鍍處理。 像這樣,由於通孔61 ’是構成具有角隅部’且往內 側孔徑變小,所以能迅速地且不會產生氣泡等地,利用電 鍍金屬68來塡充通孔61。 又,藉由通孔61的塡孔電鍍處理’肓孔62、63' 64 、6 5也能利用電鍍金屬6 8塡充。因而,能統一通孔61 和盲孔62、63、64、65的電鍍塡孔製程。 進而,如採用第3圖做說明,針孔67的下孔及針孔 66的側壁是褶狀地設有複數個凹部。由於藉由該凹部也 會使電鍍藥液的流動性降低’因此塡孔電鍍處理之際,會 促使電鍍金屬析出至該凹部。其結果,可更迅速地進行金 屬的塡充。 (4)接著,如第2B圖(5)所示,例如藉由前述的減除 工法,依照既定的圖案來蝕刻多層電路基材70之表層的 -18- 201247055 導電膜,來形成外層配線圖案80A及80B。 (5) 接著,如第2B圖(6)所示,形成保護外層配線圖 案8 0A、80B的防焊劑91 »該防焊劑91是在零件安裝用 的端子以及連接用的端子之形成預定部位具有開口部91a 。再者,取代防焊劑,也可以使用覆蓋層來形成外層配線 圖案80A、80B的保護膜。 (6) 接著,如第2B圖(6)所示,對著露出於開口部91a 之底面的電鍍金屬68施行鍍金或鍍錫等之所要的表面處 理,來形成端子92。 經過以上的製程,完成有關本發明之實施形態的多層 撓性印刷配線板90。 接著,針對有關本實施形態之多層撓性印刷配線板 90的構成做說明。 如第2B圖(6)所示,多層撓性印刷配線板90 ’是作 爲在內層電路基板1〇的表面及裏面分別層積有多層電路 基板40及50所構成。多層電路基材40’是介設著絕緣 層(接著劑層11、絕緣膜12、接著劑層51)而層積在內層 電路基材10的表面。多層電路基材50 ’是介設著絕緣層 (接著劑層11、絕緣膜12'接著劑層51)而層積在內層電 路基材10的裏面。 又,多層撓性印刷配線板90是在貫通外層電路基板 40、內層電路基板10及外層電路基板50的通孔61 ’具 備塡充有電鍍金屬的塡充貫通孔71。 通孔61是構成連通有:貫通外層電路基材40的針孔 -19- 201247055 67、貫通內層電路基材10的內層通孔5、貫通外層電路 基材50的針孔66。又,針孔66、67,是具有比內層通孔 5之最大開口徑還大的最小開口徑。 塡充貫通孔71,是電性連接設置在外層電路基材40 之兩面的配線圖案、設置在內層電路基材10之兩面的配 線圖案、以及設置在外層電路基材50之兩面的配線圖案 之合計六層。再者,在通孔5的側壁設有鍍皮膜6,可進 —步提昇塡充貫通孔71之層間連接的可靠性。 而且,在多層撓性印刷配線板90中,在盲孔亦具備 塡充有電鍍金屬的塡孔72〜75。塡孔(surface via)74、75 ,是電性連接被設置在增建層的外層電路基材40、50之 兩面的雙層配線圖案。塡孔(surface via) 72,是電性連接 被設置在外層電路基材40與內層電路基材10之雙層的配 線圖案。又,塡孔(surface vi a)73,是電性連接被設置在 外層電路基材50之兩面的配線圖案以及被設置在內層電 路基材10之兩面的配線圖案的三層。 如上記,在多層撓性印刷配線板90,層間導電路是 利用塡孔構造所構成。藉此,如第2B圖(6)所示,可以在 塡充貫通孔71或塡孔72〜75的正上方設置端子92。因 而,端子之配置自由度增加,可對多層撓性印刷配線板 90平行地安裝窄距之CSP等等的電子零件。 如以上說明,藉由本發明,積體度高,就可得到能搭 載窄距之CSP等等的電子零件的多層印刷配線板。 又,多層撓性印刷配線板90,也可以具備作爲拉出S -14-201247055 Circuit substrate 40 and outer layer circuit substrate 50, a method of producing the flexible printed wiring board of the present embodiment will be described. (1) As shown in Fig. 2A (1), the outer layer circuit substrates 40 and 50' are laminated on the surface of the core substrate 20 and the predetermined areas in which the adhesive layer 51' is laminated. Thereby, the multilayer circuit substrate 60 shown in Fig. 2A (2) is produced. In the field of unstacked multilayer circuit substrates, it is a flexible electric wire portion for pulling out wiring. Further, the adhesive material applied to the adhesive layer 51 is desirably a substance having a low flow rate of a so-called pre-stained body or an adhesive sheet. (2) Next, as shown in Fig. 2A (2) and (3), the laser beam (e.g., C02 laser) is irradiated toward the openings 35, 37, 38, 45, 46, and 48 of the multilayer circuit substrate 60, Perform a Conformal laser. Thereby, the through hole 61 and the blind holes 62 to 65 are formed. Then, the through holes 61 and the blind holes 62 to 65 are cleaned by a glue removal process or the like. As shown in FIG. 2A (3), the through hole 61 penetrates the multilayer circuit substrate 60 in the thickness direction, and penetrates the insulating base film 31, the adhesive layer 51 (upper side), and the insulating film in more detail from the upper side to the lower side in the drawing. 12 (upper side), adhesive layer 1 1 (upper side), adhesive layer 1 1 (lower side), insulating film 12 (lower side), adhesive layer 5 1 (lower side), and insulating base layer film 41. The blind via 62 penetrates through the insulating base film 31, the adhesive layer 51, the insulating film 12, and the adhesive layer 11, and the plating film is exposed at the bottom surface thereof by 6°. The blind via 62 is skipped on the outer circuit substrate. The skip via hole of the outer layer wiring pattern 39 inside the material 40. -15- 201247055 The blind via 63 penetrates the insulating base film 41, the adhesive layer 51, the insulating film 12, and the adhesive layer 11, and the plating film 6 is exposed on the bottom surface thereof. The window hole 63 is a step via hole in which the copper box 42 is exposed at the middle portion. The blind via 64 penetrates the insulating base film 31 and has a blind via which exposes the copper foil 33 on the bottom surface thereof. The blind via 65 penetrates the insulating base film 41, and the bottom surface thereof is a blind via which exposes the copper foil 42. Here, the structure of the through hole 61 will be described in more detail using Fig. 3 . Fig. 3 is an enlarged cross-sectional view showing a portion (A portion) which is framed by a broken line in Fig. 2A (3). The through hole 6 1 is configured to communicate with the inner layer through hole 5 , the pin hole 67 , and the pin hole 66 . The pin hole 67 is an upper hole formed by the opening portion 35 of the copper foil 32 as a mask and the copper foil 3 The opening portion 3 of 3 is a blind hole for a lower hole formed as a mask. As shown in Fig. 3, the diameter is increased in the order of the inner layer through hole 5, the lower hole of the pinhole 67, and the hole above the pinhole 67. That is, the diameter of the through hole penetrating the multilayer circuit substrate is smaller as the step toward the inner layer side. The pinhole 66 is a pinhole formed by the opening 45 of the copper foil 43 as a mask. As shown in Fig. 3, the diameter of the pinhole 66 is larger than the diameter of the inner layer through hole 5. In general, the maximum opening diameter of the inner layer through holes 5 provided in the inner layer circuit substrate 10 is smaller than the minimum opening diameter of the pin holes 66, 67 provided in the outer layer circuit substrates 40, 50. Here, the maximum opening diameter means the maximum flaw of the opening diameter. If the cross-sectional shape of the inner layer through hole 5 is a circle as shown in Fig. 3, the maximum opening diameter is the diameter of the circle (the length -16 - 201247055 degrees a in Fig. 3). Here, the minimum opening diameter means the minimum flaw of the opening diameter. If the cross-sectional shape of the lower hole of the pinhole 66 or the pinhole 67 is a star having a protrusion toward the inner side as shown in FIG. 3, the minimum opening diameter is such that the star faces face between the two protrusions. Distance (length b in Figure 3). Above and below the enlarged cross-sectional view of Fig. 3 is a plan view showing the through hole 6 1 when the through hole 61 is viewed from the upper side and the lower side, respectively. The cross section of the hole below the pinhole 67 is the same as the shape of the opening 36. Therefore, the side wall of the hole below the pinhole 6 7 reflects the star shape of the opening portion 36 to form irregularities. Similarly, the cross section of the pinhole 66 is the same as the shape of the opening 45. Therefore, the side wall of the pinhole 66 reflects the star shape of the opening portion 45 to form irregularities. (3) Next, as shown in Fig. 2B (4), the via hole 61 and the blind via holes 62 to 65 are subjected to a conductive process. Then, by using a boring plating treatment (electrolytic plating treatment) of an electric mineral liquid (a copper sulfate plating additive such as Top Lucina THF manufactured by Okuno Pharmaceutical Co., Ltd.) for the pupil plating treatment, in the through hole 61, and blind The holes 62 to 65 are internally filled with a metal plating 68 to form a through-hole 7 1 and pupils 72 to 75. Thereby, as shown in Fig. 2B (4), the multilayer circuit substrate 70 in which the metal ferrules 61 are filled and the blind holes 62 to 65 are obtained. Here, the manner in which the plating metal 68 is filled in the through hole 61 will be described in detail using Figs. 4A and 4B. As shown in Fig. 4A (1), in the initial stage of the treatment of the boring electrode, the plating metal -17-201247055 68 is precipitated centering on the corner portion c having a small fluidity of the boring plating solution. Then, the plating treatment is carried out in combination. As shown in Fig. 4A (2), the plating metal deposited in the through hole 61 has a drum shape in which the field D of the smallest diameter of the through hole 61 is the top. If further ferroelectric treatment is carried out, as shown in Figs. 4A (2) and (3), the through hole 61 is occluded in the field D by the plating metal 69. As a result, as shown in Fig. 4A (3), the upper and lower two-shaped concave portions 69 are formed. Since the concave portion 69 is formed, the fluidity of the plating solution is further lowered, thus promoting the electroplating of the pupil. Then, the pupil plating treatment is carried out in combination. As shown in Fig. 4B (4) and (5), the concave portion 69 becomes shallower and finally becomes a predetermined depth or less, and the pupil plating treatment is completed. In this manner, since the through hole 61' has the corner portion and the inner diameter becomes smaller, the through hole 61 can be filled with the plating metal 68 quickly without causing bubbles or the like. Further, the pupil holes 62, 63' 64, and 65 can be filled with the plating metal by the pupil plating treatment of the through holes 61. Thus, the plating boring process of the through hole 61 and the blind holes 62, 63, 64, 65 can be unified. Further, as will be described with reference to Fig. 3, the lower hole of the pinhole 67 and the side wall of the pinhole 66 are provided with a plurality of concave portions in a pleated shape. Since the fluidity of the plating solution is also lowered by the concave portion, the plating metal is precipitated to the concave portion at the time of the pupil plating treatment. As a result, the metal can be charged more quickly. (4) Next, as shown in FIG. 2B (5), for example, the conductive film of -18-201247055 of the surface layer of the multilayer circuit substrate 70 is etched in accordance with a predetermined pattern by the above-described subtractive method to form an outer layer wiring pattern. 80A and 80B. (5) Next, as shown in FIG. 2B (6), the solder resist 91 of the protective outer layer wiring patterns 80A and 80B is formed. The solder resist 91 has a predetermined portion where the terminal for mounting the component and the terminal for connection are formed. Opening portion 91a. Further, instead of the solder resist, a protective film of the outer layer wiring patterns 80A and 80B may be formed using a cover layer. (6) Next, as shown in Fig. 2B (6), the plating metal 68 exposed on the bottom surface of the opening 91a is subjected to a surface treatment such as gold plating or tin plating to form the terminal 92. Through the above process, the multilayer flexible printed wiring board 90 according to the embodiment of the present invention is completed. Next, the configuration of the multilayer flexible printed wiring board 90 of the present embodiment will be described. As shown in Fig. 2B (6), the multilayer flexible printed wiring board 90' is formed by laminating a plurality of circuit boards 40 and 50 on the surface and the inside of the inner layer circuit board 1A. The multilayer circuit substrate 40' is laminated on the surface of the inner layer circuit substrate 10 via an insulating layer (the adhesive layer 11, the insulating film 12, and the adhesive layer 51). The multilayer circuit substrate 50' is laminated on the inside of the inner layer circuit substrate 10 via an insulating layer (the adhesive layer 11, the insulating film 12' adhesive layer 51). Further, the multilayer flexible printed wiring board 90 is provided with a through hole 71 filled with a plating metal in the through hole 61' penetrating through the outer layer circuit board 40, the inner layer circuit board 10, and the outer layer circuit board 50. The through hole 61 is formed by a pinhole -19-201247055 67 that penetrates the outer layer circuit substrate 40, an inner layer through hole 5 that penetrates the inner layer circuit substrate 10, and a pinhole 66 that penetrates the outer layer circuit substrate 50. Further, the pinholes 66 and 67 have a minimum opening diameter which is larger than the maximum opening diameter of the inner layer through hole 5. The filling through hole 71 is a wiring pattern electrically connected to both surfaces of the outer layer circuit substrate 40, a wiring pattern provided on both surfaces of the inner layer circuit substrate 10, and a wiring pattern provided on both surfaces of the outer layer circuit substrate 50. The total is six floors. Further, a plating film 6 is provided on the side wall of the through hole 5, so that the reliability of the interlayer connection of the filling through hole 71 can be further improved. Further, in the multilayer flexible printed wiring board 90, the blind holes 72 to 75 are also provided in the blind holes. The surface vias 74, 75 are electrically connected to the two-layer wiring pattern provided on both sides of the outer layer circuit substrates 40, 50 of the build-up layer. The surface via 72 is a wiring pattern electrically connected to the double layer of the outer layer circuit substrate 40 and the inner layer circuit substrate 10. Further, the surface vi a 73 is electrically connected to the wiring pattern provided on both surfaces of the outer layer substrate 50 and the wiring pattern provided on both surfaces of the inner layer substrate 10 . As described above, in the multilayer flexible printed wiring board 90, the interlayer conductive circuit is constituted by a pupil structure. Thereby, as shown in Fig. 2B (6), the terminal 92 can be provided directly above the filling through hole 71 or the pupils 72 to 75. Therefore, the degree of freedom in the arrangement of the terminals is increased, and electronic components such as narrow-distance CSPs can be mounted in parallel to the multilayer flexible printed wiring board 90. As described above, according to the present invention, a multilayer printed wiring board capable of mounting electronic components such as a CSP having a narrow pitch can be obtained with a high degree of integration. Further, the multilayer flexible printed wiring board 90 may be provided as a pull-out

S -20- 201247055 自由度高的可換性電纜部。該可撓性電纜部,是設成從層 積有外層電路基材40、50的零件安裝部開始延伸。 在上記之實施形態之說明中,外層電路基材40、50 ,是使用雙面覆銅層積板34、44製作,但不限於此,也 可以使用單面覆銅層積板製作。第6圖(A),是表示將利 用單面覆銅層積板製作的外層電路基材40A、50A,層積 在核心基板20的多層印刷配線板90A的斷面圖。 如第6圖(A)所示,外層電路基材40A及50A,是具 有加工單面覆銅層積板之銅箔而形成的外層配線圖案,以 該外層配線圖案位於外側的方式,使外層電路基材40A 及50A介設著接著劑層51A而分別層積在核心基板20的 表面及裏面。 又,在上記之實施形態的說明中,雖是在內層電路基 材1 〇層壓覆蓋層1 3而製作核心基板20,然後將外層電 路基材層積在核心基板20,但並不限於此,也可以在內 層電路基材10直接層積外層電路基材。第6圖(B),是表 示將利用單面覆銅層積板製作的外層電路基材40B、50B ,層積在內層電路基材1 0的多層印刷配線板90B的斷面 圖。 如第6圖(B)所示,外層電路基材40B及50B,是具 有加工單面覆銅層積板之銅箔而形成的外層配線圖案,以 該外層配線圖案位於外側的方式,使外層電路基材40B及 5 0B介設著接著劑層51B而分別層積在內層電路基材10 的表面及裏面。如第6圖(B)即可明白,爲了絕緣保護內 -21 - 201247055 層電路基材10的內層配線圖案,外層電路基材40B、50B 也可層積在可撓性電纜部。 再者,將外層電路基材40B、5 0B層積在內層電路基 材10之方法,具有兩大方法。 第一方法,是以塡充內層電路基材10之內層配線圖 案8A、8B及電鍍通孔7的方式來形成接著劑層51B,在 該接著劑層51B之上層積外層電路基材40B、50B的方法 〇 第二方法,是採用在未形成有銅箔之一方的面具有妾 著劑層的附接著劑層單面覆銅積層板的方法。在該方法中 ,加工單面覆銅層積板的銅箔而製作外層電路基材40B、 50B,將該外層電路基材40B、50B層壓在內層電路基材 10。再者,也可以將附接著劑層單面覆銅層積板層壓在內 層電路基材1 〇之後,加工表面的銅箔來形成外層配線圖 案。 而且,也可以在核心基板20(或是內層電路基材1〇) 之一方的面,自雙面覆銅層積板開始層積已製成的外層電 路基材,在另一面,自單面覆銅層積板開始層積已製成的 外層電路基材。 以上,針對有關本發明之多層印刷配線板及其製造方 法做說明。 在上記實施形態之說明中,作爲將銅箔等之導電膜圖 案化而設置配線圖案及開口部的手法,雖是採用減除工法 ,但並不限於此,也可以使用半加成工法(Semi-additiveS -20- 201247055 Removable cable section with high degree of freedom. The flexible cable portion is formed to extend from a component mounting portion in which the outer layer substrate 40, 50 is laminated. In the above description of the embodiment, the outer layer circuit substrates 40 and 50 are formed using the double-sided copper clad laminates 34 and 44. However, the present invention is not limited thereto, and a single-sided copper clad laminate may be used. Fig. 6(A) is a cross-sectional view showing the multilayer printed wiring board 90A laminated on the core substrate 20, using the outer layer base materials 40A and 50A made of a single-sided copper clad laminate. As shown in Fig. 6(A), the outer layer base materials 40A and 50A are outer layer wiring patterns formed by processing a copper foil of a single-sided copper-clad laminate, and the outer layer wiring pattern is positioned on the outer side to make the outer layer The circuit substrates 40A and 50A are laminated on the surface and the inside of the core substrate 20 via the adhesive layer 51A. Further, in the above description of the embodiment, the core substrate 20 is formed by laminating the cover layer 13 on the inner layer substrate 1 and then the outer layer substrate is laminated on the core substrate 20. However, the present invention is not limited thereto. Therefore, the outer layer circuit substrate may be directly laminated on the inner layer circuit substrate 10. Fig. 6(B) is a cross-sectional view showing the multilayer printed wiring board 90B in which the outer layer circuit substrates 40B and 50B produced by the single-sided copper clad laminate are laminated on the inner layer substrate 10. As shown in Fig. 6(B), the outer layer base materials 40B and 50B are outer layer wiring patterns formed by processing a copper foil of a single-sided copper-clad laminate, and the outer layer wiring pattern is positioned on the outer side to make the outer layer The circuit substrates 40B and 50B are laminated on the surface and the inside of the inner layer circuit substrate 10 via the adhesive layer 51B. As can be seen from Fig. 6(B), the outer layer circuit substrates 40B and 50B may be laminated on the flexible cable portion in order to insulate the inner wiring pattern of the inner circuit substrate -21 - 201247055. Further, there are two major methods for laminating the outer layer substrate 40B, 50B to the inner layer circuit substrate 10. In the first method, the adhesive layer 51B is formed by filling the inner wiring patterns 8A and 8B of the inner layer substrate 10 and the plated through holes 7, and the outer layer substrate 40B is laminated on the adhesive layer 51B. The method of 50B and the second method are a method of using a single-sided copper-clad laminate having an adhesive layer on the surface on which one of the copper foils is not formed. In this method, the copper foil of the single-sided copper clad laminate is processed to form the outer layer base materials 40B, 50B, and the outer layer circuit substrates 40B, 50B are laminated on the inner layer circuit substrate 10. Further, the adhesive layer single-sided copper-clad laminate may be laminated on the inner layer substrate 1 and the copper foil on the surface may be processed to form an outer wiring pattern. Further, on the one side of the core substrate 20 (or the inner layer circuit substrate 1), the outer layer circuit substrate which has been formed may be laminated from the double-sided copper-clad laminate, and on the other side, The copper-clad laminate is initially laminated to the finished outer circuit substrate. The above description is directed to the multilayer printed wiring board of the present invention and a method of manufacturing the same. In the above description, the method of providing a wiring pattern and an opening by patterning a conductive film such as a copper foil is not limited thereto, and a semi-additive method (Semi) may be used. -additive

S -22- 201247055 process)等其他的工法。 又,作爲正形投影光罩之功能的開口部,也可以在將 外層電路基材層積在核心基板之後予以形成。除此之外, 作爲雷射加工法,也可以不採用正形投影光罩的方法,亦 即可採用直接對導電膜上照射雷射光,除去導電膜及其下 面的絕緣層之直接雷射加工法。 又,於針孔66、67,橫斷面之形狀並不限於第3圖 所示的星形。只要在塡孔電鍍處理中,設有欲令電鍍藥液 之流動性下降的構造(凹凸等)即可。而且,不光是針孔67 的下孔,也可以在上孔之側壁設置凹部。 而且,在上記實施形態中,雖是針對多層撓性印刷配 線板做說明,但並不限於此,對於軟硬複合(Rigid-Flex) 印刷配線板或多層剛性印刷(Rigid-Printed )配線板等其 他多層印刷配線板也適用本發明。 而且,配線圖案或電鍍金屬並不限於銅。亦即,在上 記實施形態之說明中,雖然構成配線圖案的金屬及塡充到 針孔等的電鍍金屬是銅,但本發明並不限於此,例如也可 以是鋁或銀等其他金屬。 而且’雖然上記實施形態的多層撓性印刷配線板是具 有六層之配線圖案者,但並不限於此。對於在多層電路基 材40、50之上進一步層積外層電路基材的多層印刷配線 板,也能應用本發明。 根據上記記載,雖說只要是該業者,或許也能思及本 發明之追加效果和各種變形,但本發明之形態,並不限於 -23- 201247055 上述之實施形態。在不脫離申請專利範圍所規定的內容及 其等效設計所導出的本發明之槪念上的思想與主旨之範圍 下,可做各種追加、變更及部分增減。 【圖式簡單說明】 第1 A圖是表示有關本發明之實施形態的多層撓性印 刷配線板之製造方法的製程剖面圖。 第1 B圖是表示有關本發明之實施形態的多層撓性印 刷配線板之製造方法的製程剖面圖。 第2A圖是表示有關本發明之實施形態的多層撓性印 刷配線板之製造方法的製程剖面圖。 第2B圖是接續第2A圖,表示有關本發明之實施形 態的多層撓性印刷配線板之製造方法的製程剖面圖。 第3圖是表示放大第2A圖(3)之A部的剖面圖,以及 通孔之俯視圖^ 第4A圖是表示在通孔內塡充電鍍金屬之形態的剖面 圖。 第4B圖是接續第4A圖,表示在通孔內塡充電鍍金 屬之形態的剖面圖。 第5A圖是表示有關比較例之多層撓性印刷配線板之 製造方法的製程剖面圖。 第5B圖是接續第5A圖,表示有關比較例之多層撓 性印刷配線板之製造方法的製程剖面圖。 第6圖(A)是從單面覆銅層積板開始將已製成的外層S -22- 201247055 process) and other methods. Further, the opening as a function of the positive projection mask may be formed after the outer layer substrate is laminated on the core substrate. In addition, as the laser processing method, it is also possible to use a method of directly projecting a mask, or to directly irradiate the conductive film with laser light, and to remove the conductive film and the direct laser processing of the insulating layer below it. law. Further, in the pinholes 66, 67, the shape of the cross section is not limited to the star shape shown in Fig. 3. In the pupil plating process, a structure (concavity or the like) for degrading the fluidity of the plating solution may be provided. Further, not only the lower hole of the pinhole 67 but also the concave portion may be provided on the side wall of the upper hole. Further, in the above-described embodiment, the multilayer flexible printed wiring board is described. However, the present invention is not limited thereto, and a Rigid-Flex printed wiring board or a multi-layer rigid printed (Rigid-Printed) wiring board is not limited thereto. Other multilayer printed wiring boards are also applicable to the present invention. Moreover, the wiring pattern or the plating metal is not limited to copper. In other words, in the description of the above embodiment, the metal constituting the wiring pattern and the plating metal to be filled into the pinhole or the like are copper. However, the present invention is not limited thereto, and for example, other metals such as aluminum or silver may be used. Further, the multilayer flexible printed wiring board of the embodiment described above is a wiring pattern having six layers, but is not limited thereto. The present invention can also be applied to a multilayer printed wiring board in which an outer layer circuit substrate is further laminated on the multilayer circuit substrates 40, 50. According to the above description, it is possible to consider the additional effects and various modifications of the present invention as long as it is the manufacturer. However, the embodiment of the present invention is not limited to the above-described embodiment of -23-201247055. Various additions, modifications, and partial additions and deletions may be made without departing from the spirit and scope of the invention as delineated from the scope of the invention and the equivalents thereof. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1A is a cross-sectional view showing a process of manufacturing a multilayer flexible printed wiring board according to an embodiment of the present invention. Fig. 1B is a process sectional view showing a method of manufacturing a multilayer flexible printed wiring board according to an embodiment of the present invention. Fig. 2A is a process sectional view showing a method of manufacturing a multilayer flexible printed wiring board according to an embodiment of the present invention. Fig. 2B is a cross-sectional view showing the process of manufacturing a multilayer flexible printed wiring board according to an embodiment of the present invention, taken along line 2A. Fig. 3 is a cross-sectional view showing a portion A of Fig. 2A (3), and a plan view of the through hole. Fig. 4A is a cross-sectional view showing a state in which a metal plating is performed in a through hole. Fig. 4B is a cross-sectional view showing the form of the ruthenium plating metal in the through hole, continued from Fig. 4A. Fig. 5A is a process sectional view showing a method of manufacturing a multilayer flexible printed wiring board according to a comparative example. Fig. 5B is a cross-sectional view showing a process of manufacturing a multilayer flexible printed wiring board according to a comparative example, taken along line 5A. Figure 6 (A) is the outer layer that has been made from a single-sided copper clad laminate

S -24- 201247055 電路基材層積在核心基板的多層撓性印刷配線板的剖面圖 ,(B)是從單面覆銅層積板開始將已製成的外層電路基材 層積在內層電路基材的多層撓性印刷配線板的剖面圖。 【主要元件符號說明】 1 :絕緣基層膜 2、3 :銅箱 4:雙面覆銅層積板 5 :內層通孔 6 :鍍皮膜 7 :鍍通孔 8A、8B:內層配線圖案 10 :內層電路基材 1 1 :接著劑層 1 2 :絕緣膜 13 :覆蓋蓋 2 0 :核心基板 3 1、4 1 :絕緣基層膜 32、33、42、43 :銅箔 34、 44:雙面覆銅層積板 35、 36、 37、 38、 45、 46、 47、 48:開口部 39、 49 :外層配線圖案 40、 40A、40B、50、50A、50B:外層電路基材 51、51A、51B:接著劑層 -25- 201247055 60 :多層回路基材 6 1 :通孔S -24- 201247055 A cross-sectional view of a multilayer flexible printed wiring board in which a circuit substrate is laminated on a core substrate, and (B) a layered outer layer circuit substrate is laminated from a single-sided copper-clad laminate. A cross-sectional view of a multilayer flexible printed wiring board of a layer circuit substrate. [Explanation of main component symbols] 1: Insulation base film 2, 3: Copper case 4: Double-sided copper clad laminate 5: Inner layer through hole 6: Coating film 7: Plated through holes 8A, 8B: Inner layer wiring pattern 10 : inner layer circuit substrate 1 1 : adhesive layer 1 2 : insulating film 13 : covering cover 20 : core substrate 3 1 , 4 1 : insulating base film 32, 33, 42, 43 : copper foil 34, 44: double Copper-clad laminates 35, 36, 37, 38, 45, 46, 47, 48: openings 39, 49: outer layer wiring patterns 40, 40A, 40B, 50, 50A, 50B: outer layer substrate 51, 51A , 51B: adhesive layer - 25 - 201247055 60 : multilayer circuit substrate 6 1 : through hole

62、63、64、65:盲孑L 6 6、6 7 :針孔 68 :電鍍金屬 69 :凹部 70 :多層電路基材 7 1 :塡充貫通孔62, 63, 64, 65: blind 孑 L 6 6、6 7 : pinhole 68 : electroplated metal 69 : recess 70 : multilayer circuit substrate 7 1 : 贯通 filling through hole

72、 73、 74、 75:塡孑L 80A、80B :外層配線圖案 9 0、9 0 A、9 0 B :多層印刷配線板 9 1 :防焊劑 9 1 a :開口部 92 :端子 1 00 :內層電路基材 1 1 〇 :覆蓋層 120 :接著劑層 1 3 0 :絕緣膜 200 :核心基板 2 1 0 :層積接著劑層 300:外層電路基材 3 1 0 :開口部 400:多層電路基材 4 1 0、4 2 0 :盲孔72, 73, 74, 75: 塡孑L 80A, 80B: outer layer wiring pattern 9 0, 9 0 A, 9 0 B : multilayer printed wiring board 9 1 : solder resist 9 1 a : opening portion 92 : terminal 1 00 : Inner layer circuit substrate 1 1 〇: cover layer 120: adhesive layer 1 3 0 : insulating film 200: core substrate 2 1 0 : laminated adhesive layer 300: outer layer circuit substrate 3 1 0 : opening portion 400: multilayer Circuit substrate 4 1 0, 4 2 0 : blind hole

S -26- 201247055 430 :通孔 45 0 :鍍皮膜 460、 470、 480 :鍍肓孔 490 :鍍通孔 5 0 0 :外層電路配線圖案 5 1 0 :防焊劑 5 1 0 a :開口部 520 :端子 600 :多層印刷配線板 C :角隅部 D :中央領域 -27-S -26- 201247055 430 : Through hole 45 0 : plating film 460, 470, 480 : plated hole 490 : plated through hole 5 0 0 : outer layer wiring pattern 5 1 0 : solder resist 5 1 0 a : opening portion 520 : Terminal 600: Multilayer Printed Wiring Board C: Corner Joint D: Central Area-27-

Claims (1)

201247055 七、申請專利範圍: 1. 一種多層印刷配線板,其特徵爲:具備:內層電路 基材;介設絕緣層被層積在前記內層電路基材之表面的第 一外層電路基材;介設絕緣層被層積在前記內層電路基材 之裏面的第二外層電路基材;和對貫通前記第一外層電路 基材、前記內層電路基材以及前記第二外層電路基材的通 孔,塡充電鍍金屬的塡充貫通孔:前記通孔,係構成連通 著貫通前記第一外層電路基材的第一針孔、貫通前記內層 電路基材的內層通孔、以及貫通前記第二外層電路基材的 第二針孔,前記第一及第二針孔,具有較前記內層通孔的 最大開口徑更大的最小開口徑。 2. 如申請專利範圍第1項所記載之多層印刷配線板, 其中,前記第一針孔及/或前記第二針孔,是在其側壁具 有凹凸。 3 .如申請專利範圍第1項所記載之多層印刷配線板, 其中,前記第一針孔及/或前記第二針孔之橫斷面,是具 有朝向內側的複數個突起部。 4 ·如申請專利範圍第1項所記載之多層印刷配線板, 其中,在貫通前記第一外層電路基材及/或前記第二外層 電路基材之盲孔,更具備塡充有電鍍金屬的塡孔。 5 ·如申請專利範圍第1項所記載之多層印刷配線板, 其中,更具備從層積有前記第一及第二外層電路基材的零 件安裝部開始延伸的可撓性電纜部。 6.如申請專利範圍第1項所記述之多層印刷配線板, S -28- 201247055 其中,前述內層電路基材具有:可撓性 和分別設置在前記第一絕緣基膜之兩面 配線圖案;前記第一外層電路基材具有 緣基膜、和分別設置在前記第二絕緣基 第一及第二外層配線圖案;前述第二外 可撓性的第三絕緣基膜、和分別設置在 之表面及裏面的第三及第四外層配線圖 孔是電性連接前記第一及第二內層配線 至第四外層配線圖案。 7.—種多層印刷配線板之製造方法 具有:可撓性之絕緣基膜、形成在該絕 屬箔的雙面覆金屬層積板,形成朝厚度 覆金屬層積板的內層通孔,將前記雙面 屬箔圖案化,形成內層配線圖案,藉此 ,準備具有:可撓性之絕緣基膜、和形 至少一方的面的金屬箔的第一及第二覆 記第一覆金屬層積板的金屬箔圖案化, 圖案,藉此製作第一外層電路基材,將 積板的金屬箔圖案化,形成第二外層配 第二外層電路基材,在前記內層電路基 一外層電路基材,以前記第一外層配線 式,介設著絕緣層而層積,且在前記內 將前記第二外層電路基材,以前記第二 外側的方式,介設著絕緣層而層積,藉 的第一絕緣基膜、 的第一及第二內層 :可撓性的第二絕 膜之表面及裏面的 層電路基材具有: 前記第三絕緣基膜 案;前記塡充貫通 圖案、和前記第一 ,其特徵爲:準備 緣基膜之兩面的金 方向貫通前記両面 覆金屬層積板的金 製作內層電路基材 成在該絕緣基膜之 金屬層積板,將前 形成第一外層配線 前記第二覆金屬層 線圖案,藉此製作 材之表面將前記第 圖案位在外側的方 層電路基材的裏面 外層配線圖案位在 此製作多層電路® -29- 201247055 材,藉由對前記多層電路基材之既定的領域施行照射雷射 光的雷射加工製程,來貫通前記第一外層電路基材,作爲 連通具有比前記內層通孔之最大開口徑還大的最小開口徑 的第一針孔、和貫通前記內層通孔與前記第二外層電路基 材,且具有比前記內層通孔之最大開口徑還大的最小開口 徑的第二針孔所構成,形成貫通前記多層電路基材的通孔 ,且施行對前記通孔塡充電鍍金屬的塡充電鍍處理,形成 電性連接前記內層配線圖案、前記第一外層配線圖案及前 記第二外層配線圖案的塡充貫通孔。 8. 如申請專利範圍第7項所記載之多層印刷配線板之 製造方法,其中,在前記雷射加工製程之前,在前記第一 覆金屬層積板及/或前記第二覆金屬層積板的金屬箔,形 成具有朝向內側的複數個突起部的通孔形成用開口部;在 前記雷射加工製程中,進行將雷射光照射到前記通孔形成 用開口部的正形投影光罩加工,形成橫斷面爲與前記通孔 形成用開口部相同形狀的前記第一針孔。 9. 如申請專利範圍第7項所記載之多層印刷配線板之 製造方法’其中,形成前記內層通孔之後,且在形成前記 內層配線圖案之前,對形成有前記內層通孔的前記第一雙 面覆金屬層積板施行電鍍處理,藉此形成電性連接被設置 在前記第一雙面覆金屬層積板之兩面的金屬箔的鍍通孔。 1 〇.如申請專利範圍第7項所記載之多層印刷配線板 之製造方法,其中,在前記第一覆金屬積層板及/或前記 第二覆金屬積層板形成肓孔形成用開口部;將雷射光照射 S -30- 201247055 到前記盲孔形成用開口部進行 在前記塡孔電鍍處理中,在前 形成塡孔。 正形投 記肓孔 影光罩,形成盲孔; 塡充前記電鍍金屬, -31 -201247055 VII. Patent application scope: 1. A multilayer printed wiring board, characterized by: having: an inner layer circuit substrate; and a first outer circuit substrate laminated with an insulating layer laminated on a surface of the inner circuit substrate a second outer layer circuit substrate on which the insulating layer is laminated on the inner surface of the inner circuit substrate; and a first outer circuit substrate, a front inner circuit substrate, and a second outer circuit substrate Through hole, 塡charged metal plated through hole: the front through hole constitutes a first pinhole that communicates with the first outer layer circuit substrate before, and an inner layer through hole that penetrates the inner layer circuit substrate, and The second pinhole of the second outer layer circuit substrate is preceded by the first and second pinholes, and has a minimum opening diameter larger than the maximum opening diameter of the inner layer through hole. 2. The multilayer printed wiring board according to the first aspect of the invention, wherein the first pinhole and/or the second pinhole have a concavity and convexity on a side wall thereof. The multilayer printed wiring board according to the first aspect of the invention, wherein the cross section of the first pinhole and/or the second pinhole of the front is a plurality of protrusions having an inner side. 4. The multilayer printed wiring board according to the first aspect of the invention, wherein the first outer layer circuit substrate and/or the second outer layer circuit substrate have a blind hole before the penetration, and further have a plating metal Pupil. The multilayer printed wiring board according to the first aspect of the invention, further comprising a flexible cable portion extending from a component mounting portion in which the first and second outer layer circuit substrates are stacked. 6. The multilayer printed wiring board according to claim 1, wherein the inner layer circuit substrate has flexibility and a double-sided wiring pattern respectively disposed on the first insulating base film; The first outer circuit substrate has a base film, and first and second outer wiring patterns respectively disposed on the second insulating base; the second outer flexible third insulating base film and the surface respectively disposed on the surface And the third and fourth outer wiring pattern holes therein are electrically connected to the first and second inner layer wirings to the fourth outer layer wiring pattern. 7. A method of manufacturing a multilayer printed wiring board comprising: a flexible insulating base film, a double-sided metal-clad laminate formed on the absolute foil, and an inner layer through hole formed in a metal-clad laminate. The first and second overlying first cladding metals are prepared by patterning the double-sided foil of the front surface to form an inner wiring pattern, thereby preparing a flexible base film and a metal foil having at least one surface. The metal foil of the laminated board is patterned and patterned to form a first outer layer circuit substrate, and the metal foil of the laminated board is patterned to form a second outer layer with a second outer layer circuit substrate, and an outer layer of the inner layer circuit is The circuit substrate, previously described as the first outer layer wiring type, is laminated with an insulating layer interposed therebetween, and the second outer layer circuit substrate is pre-recorded in the foregoing, and the second outer layer is previously described, and the insulating layer is laminated and laminated. The first insulating base film, the first and second inner layers: the surface of the flexible second insulating film and the inner layer of the circuit substrate have: a third insulating base film case; a pre-filled through pattern And the first note, which is characterized by: preparation margin The gold layer on both sides of the base film penetrates the front surface of the metal-clad laminate to form the inner layer circuit substrate into the metal laminated plate of the insulating base film, and the first outer layer wiring is formed before the second metal-clad layer pattern The surface of the fabricated material is formed by the inner and outer wiring patterns of the square circuit substrate on which the pre-recorded pattern is located outside, and the multilayered circuit layer -29-201247055 is formed here, by the predetermined field of the pre-recorded multilayer circuit substrate. Performing a laser processing process for irradiating the laser light to penetrate the first outer layer circuit substrate as a first pinhole having a minimum opening diameter larger than a maximum opening diameter of the inscribed inner layer through hole, and a through hole inner layer The through hole and the second outer layer circuit substrate of the foregoing, and having a second pinhole having a minimum opening diameter larger than a maximum opening diameter of the inner layer through hole, forming a through hole penetrating the multilayer circuit substrate beforehand, and performing The 塡 charge plating process for charging the metallization of the through hole ,, forming an electrical connection front inner wiring pattern, a first outer wiring pattern, and a second outer wiring pattern Chen filling the through-holes. 8. The method of manufacturing a multilayer printed wiring board according to claim 7, wherein the first metal-clad laminate and/or the second metal-clad laminate are preceded by a pre-recorded laser processing process. The metal foil has a through hole forming opening portion having a plurality of protrusions facing the inner side; and in the foregoing laser processing process, the orthographic projection mask processing for irradiating the laser beam to the front opening through hole forming portion is performed. The first pinhole having the same shape as the opening for forming the through hole is formed in the cross section. 9. The method of manufacturing a multilayer printed wiring board according to the seventh aspect of the invention, wherein the front inner layer through hole is formed, and the front inner layer through hole is formed before the front inner layer wiring pattern is formed. The first double-sided metal clad laminate is subjected to a plating treatment, thereby forming a plated through hole of the metal foil provided on both sides of the first double-sided metal clad laminate. The method for producing a multilayer printed wiring board according to the seventh aspect of the invention, wherein the first metal-clad laminate and/or the second metal-clad laminate are formed with an opening for forming a pupil; Laser light irradiation S -30- 201247055 The opening of the blind hole forming portion is performed in the front hole plating process, and the pupil is formed in the front. Positive projection pupil mask, forming a blind hole;
TW100137889A 2011-04-06 2011-10-19 Multilayer printed wiring board and manufacturing method thereof TWI500366B (en)

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