TW201135868A - Method of forming a semiconductor die - Google Patents
Method of forming a semiconductor die Download PDFInfo
- Publication number
- TW201135868A TW201135868A TW099147016A TW99147016A TW201135868A TW 201135868 A TW201135868 A TW 201135868A TW 099147016 A TW099147016 A TW 099147016A TW 99147016 A TW99147016 A TW 99147016A TW 201135868 A TW201135868 A TW 201135868A
- Authority
- TW
- Taiwan
- Prior art keywords
- die
- grains
- wafer
- semiconductor
- dies
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
- H01L25/03—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/065—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H10D89/00
- H01L25/0655—Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10D, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H10D89/00 the devices being arranged next to each other
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49575—Assemblies of semiconductor devices on lead frames
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
- H01L25/16—Assemblies consisting of a plurality of semiconductor or other solid state devices the devices being of types provided for in two or more different subclasses of H10B, H10D, H10F, H10H, H10K or H10N, e.g. forming hybrid circuits
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/117—Shapes of semiconductor bodies
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3157—Partial encapsulation or coating
- H01L23/3171—Partial encapsulation or coating the coating being directly applied to the semiconductor body, e.g. passivation layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
- H01L2924/13091—Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/30107—Inductance
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Dicing (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/689,126 US8384231B2 (en) | 2010-01-18 | 2010-01-18 | Method of forming a semiconductor die |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW201135868A true TW201135868A (en) | 2011-10-16 |
Family
ID=44268046
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW099147016A TW201135868A (en) | 2010-01-18 | 2010-12-30 | Method of forming a semiconductor die |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8384231B2 (enExample) |
| JP (1) | JP2011146718A (enExample) |
| KR (1) | KR20110084836A (enExample) |
| CN (1) | CN102130022A (enExample) |
| TW (1) | TW201135868A (enExample) |
Families Citing this family (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8871613B2 (en) | 2012-06-18 | 2014-10-28 | Semiconductor Components Industries, Llc | Semiconductor die singulation method |
| US8664089B1 (en) | 2012-08-20 | 2014-03-04 | Semiconductor Components Industries, Llc | Semiconductor die singulation method |
| US9034733B2 (en) | 2012-08-20 | 2015-05-19 | Semiconductor Components Industries, Llc | Semiconductor die singulation method |
| US9484260B2 (en) | 2012-11-07 | 2016-11-01 | Semiconductor Components Industries, Llc | Heated carrier substrate semiconductor die singulation method |
| US9136173B2 (en) | 2012-11-07 | 2015-09-15 | Semiconductor Components Industries, Llc | Singulation method for semiconductor die having a layer of material along one major surface |
| US9034734B2 (en) | 2013-02-04 | 2015-05-19 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Systems and methods for plasma etching compound semiconductor (CS) dies and passively aligning the dies |
| US9406564B2 (en) * | 2013-11-21 | 2016-08-02 | Infineon Technologies Ag | Singulation through a masking structure surrounding expitaxial regions |
| US20150255349A1 (en) * | 2014-03-07 | 2015-09-10 | JAMES Matthew HOLDEN | Approaches for cleaning a wafer during hybrid laser scribing and plasma etching wafer dicing processes |
| US9418894B2 (en) | 2014-03-21 | 2016-08-16 | Semiconductor Components Industries, Llc | Electronic die singulation method |
| US9472458B2 (en) | 2014-06-04 | 2016-10-18 | Semiconductor Components Industries, Llc | Method of reducing residual contamination in singulated semiconductor die |
| US10163709B2 (en) | 2015-02-13 | 2018-12-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device and method |
| US9337098B1 (en) | 2015-08-14 | 2016-05-10 | Semiconductor Components Industries, Llc | Semiconductor die back layer separation method |
| US11342189B2 (en) | 2015-09-17 | 2022-05-24 | Semiconductor Components Industries, Llc | Semiconductor packages with die including cavities and related methods |
| US10319639B2 (en) | 2017-08-17 | 2019-06-11 | Semiconductor Components Industries, Llc | Thin semiconductor package and related methods |
| US10529576B2 (en) | 2017-08-17 | 2020-01-07 | Semiconductor Components Industries, Llc | Multi-faced molded semiconductor package and related methods |
| US11430746B2 (en) | 2020-04-29 | 2022-08-30 | Semiconductor Components Industries, Llc | Multidie supports for reducing die warpage |
| US10115790B2 (en) | 2015-09-17 | 2018-10-30 | Semiconductor Components Industries, Llc | Electronic device including an insulating structure |
| US10366923B2 (en) | 2016-06-02 | 2019-07-30 | Semiconductor Components Industries, Llc | Method of separating electronic devices having a back layer and apparatus |
| US10497602B2 (en) | 2016-08-01 | 2019-12-03 | Semiconductor Components Industries, Llc | Process of forming an electronic device including forming an electronic component and removing a portion of a substrate |
| US10056428B2 (en) * | 2016-09-07 | 2018-08-21 | Semiconductor Components Industries, Llc | Semiconductor device and method of forming curved image sensor region robust against buckling |
| US10373869B2 (en) | 2017-05-24 | 2019-08-06 | Semiconductor Components Industries, Llc | Method of separating a back layer on a substrate using exposure to reduced temperature and related apparatus |
| US10497689B2 (en) * | 2017-08-04 | 2019-12-03 | Mediatek Inc. | Semiconductor package assembly and method for forming the same |
| US12230502B2 (en) | 2017-08-17 | 2025-02-18 | Semiconductor Components Industries, Llc | Semiconductor package stress balance structures and related methods |
| US11348796B2 (en) | 2017-08-17 | 2022-05-31 | Semiconductor Components Industries, Llc | Backmetal removal methods |
| US11361970B2 (en) | 2017-08-17 | 2022-06-14 | Semiconductor Components Industries, Llc | Silicon-on-insulator die support structures and related methods |
| US10741487B2 (en) | 2018-04-24 | 2020-08-11 | Semiconductor Components Industries, Llc | SOI substrate and related methods |
| US11404276B2 (en) | 2017-08-17 | 2022-08-02 | Semiconductor Components Industries, Llc | Semiconductor packages with thin die and related methods |
| US11367619B2 (en) | 2017-08-17 | 2022-06-21 | Semiconductor Components Industries, Llc | Semiconductor package electrical contacts and related methods |
| US11393692B2 (en) | 2017-08-17 | 2022-07-19 | Semiconductor Components Industries, Llc | Semiconductor package electrical contact structures and related methods |
| US11404277B2 (en) | 2017-08-17 | 2022-08-02 | Semiconductor Components Industries, Llc | Die sidewall coatings and related methods |
| US10880991B2 (en) * | 2018-04-04 | 2020-12-29 | Marvell Asia Pte, Ltd. | Apparatus and methods for enhancing signaling bandwidth in an integrated circuit package |
| US10916474B2 (en) | 2018-06-25 | 2021-02-09 | Semiconductor Components Industries, Llc | Method of reducing residual contamination in singulated semiconductor die |
| CN110634796A (zh) | 2018-06-25 | 2019-12-31 | 半导体元件工业有限责任公司 | 用于处理电子管芯的方法及半导体晶圆和管芯的切单方法 |
| US11791212B2 (en) * | 2019-12-13 | 2023-10-17 | Micron Technology, Inc. | Thin die release for semiconductor device assembly |
| KR102872928B1 (ko) * | 2019-12-30 | 2025-10-16 | 삼성전자주식회사 | 반도체 웨이퍼 및 그 제조 방법 |
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| JP5023614B2 (ja) | 2006-08-24 | 2012-09-12 | パナソニック株式会社 | 半導体チップの製造方法及び半導体ウエハの処理方法 |
| JP4544231B2 (ja) | 2006-10-06 | 2010-09-15 | パナソニック株式会社 | 半導体チップの製造方法 |
| JP2008159985A (ja) | 2006-12-26 | 2008-07-10 | Matsushita Electric Ind Co Ltd | 半導体チップの製造方法 |
| JP4840174B2 (ja) | 2007-02-08 | 2011-12-21 | パナソニック株式会社 | 半導体チップの製造方法 |
| JP2008217384A (ja) * | 2007-03-05 | 2008-09-18 | Hitachi Ltd | 回路チップ及びその製造方法、並びにこれを搭載したrfid回路装置 |
| US7705440B2 (en) * | 2007-09-07 | 2010-04-27 | Freescale Semiconductor, Inc. | Substrate having through-wafer vias and method of forming |
| TW200935506A (en) | 2007-11-16 | 2009-08-16 | Panasonic Corp | Plasma dicing apparatus and semiconductor chip manufacturing method |
| JP2009164263A (ja) * | 2007-12-28 | 2009-07-23 | Nec Electronics Corp | 配線モジュール及び半導体集積回路装置 |
-
2010
- 2010-01-18 US US12/689,126 patent/US8384231B2/en active Active
- 2010-12-30 TW TW099147016A patent/TW201135868A/zh unknown
-
2011
- 2011-01-17 KR KR1020110004372A patent/KR20110084836A/ko not_active Withdrawn
- 2011-01-18 CN CN201110009539XA patent/CN102130022A/zh active Pending
- 2011-01-18 JP JP2011007523A patent/JP2011146718A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN102130022A (zh) | 2011-07-20 |
| JP2011146718A (ja) | 2011-07-28 |
| US20110175242A1 (en) | 2011-07-21 |
| KR20110084836A (ko) | 2011-07-26 |
| US8384231B2 (en) | 2013-02-26 |
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