TW200712756A - Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks - Google Patents

Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks

Info

Publication number
TW200712756A
TW200712756A TW095125943A TW95125943A TW200712756A TW 200712756 A TW200712756 A TW 200712756A TW 095125943 A TW095125943 A TW 095125943A TW 95125943 A TW95125943 A TW 95125943A TW 200712756 A TW200712756 A TW 200712756A
Authority
TW
Taiwan
Prior art keywords
light
blanks
semi
tone mask
gray tone
Prior art date
Application number
TW095125943A
Other languages
English (en)
Chinese (zh)
Inventor
Fumihiko Yamada
Toshiharu Ozaki
Gou Hiramoto
Original Assignee
Ulvac Coating Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Coating Corp filed Critical Ulvac Coating Corp
Publication of TW200712756A publication Critical patent/TW200712756A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • ing And Chemical Polishing (AREA)
TW095125943A 2005-07-15 2006-07-14 Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks TW200712756A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005207285 2005-07-15

Publications (1)

Publication Number Publication Date
TW200712756A true TW200712756A (en) 2007-04-01

Family

ID=37668745

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095125943A TW200712756A (en) 2005-07-15 2006-07-14 Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks

Country Status (5)

Country Link
JP (1) JP4898679B2 (ko)
KR (1) KR20080016949A (ko)
CN (1) CN101061431A (ko)
TW (1) TW200712756A (ko)
WO (1) WO2007010864A1 (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008203373A (ja) * 2007-02-16 2008-09-04 Clean Surface Gijutsu:Kk ハーフトーンブランクス及びハーフトーンブランクスの製造方法
JP5115953B2 (ja) * 2007-03-30 2013-01-09 Ｈｏｙａ株式会社 フォトマスクブランク及びフォトマスク
JP5254581B2 (ja) * 2007-08-22 2013-08-07 Ｈｏｙａ株式会社 フォトマスク及びフォトマスクの製造方法
JP5217345B2 (ja) * 2007-10-05 2013-06-19 大日本印刷株式会社 フォトマスクおよびフォトマスクブランクス
JP5808944B2 (ja) 2011-05-11 2015-11-10 ピクストロニクス，インコーポレイテッド 表示装置及び表示装置の製造方法
US9097918B2 (en) 2012-06-25 2015-08-04 Shenzhen China Star Optoelectronics Technology Co., Ltd. Mask for curing frame sealant and liquid crystal display panel manufacturing method
CN102736323B (zh) * 2012-06-25 2014-12-17 深圳市华星光电技术有限公司 框胶固化之光罩及液晶显示面板的制作方法
CN103451665B (zh) * 2013-08-30 2016-02-17 东莞市平波电子有限公司 一种触摸屏引线的加工工艺
CN107086219B (zh) * 2017-04-20 2019-11-26 深圳市华星光电技术有限公司 一种tft基板的制作方法、tft基板及光罩

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5189846A (ja) * 1975-02-05 1976-08-06 Aruminiumupataannokeiseiho
JPS52136526A (en) * 1976-05-10 1977-11-15 Akai Electric Method of forming twoocolor stripe filter
JPS5779174A (en) * 1980-11-06 1982-05-18 Konishiroku Photo Ind Co Ltd Etching solution for chromium film and chromium oxide film
JPH03259409A (ja) * 1990-03-07 1991-11-19 Nec Corp 薄膜磁気ヘッドの製造方法
JP3453435B2 (ja) * 1993-10-08 2003-10-06 大日本印刷株式会社 位相シフトマスクおよびその製造方法
JP3250973B2 (ja) * 1997-06-27 2002-01-28 ホーヤ株式会社 ハーフトーン型位相シフトマスクブランク及びハーフトーン型位相シフトマスク
JP4071849B2 (ja) * 1997-10-08 2008-04-02 アルバック成膜株式会社 ブランクス及びブラックマトリクス
JP4163331B2 (ja) * 1999-07-14 2008-10-08 アルバック成膜株式会社 位相シフタ膜の製造方法、位相シフトマスク用ブランクスの製造方法、および、位相シフトマスクの製造方法
JP2002189281A (ja) * 2000-12-19 2002-07-05 Hoya Corp グレートーンマスク及びその製造方法
JP3645882B2 (ja) * 2002-03-01 2005-05-11 Ｈｏｙａ株式会社 ハーフトーン型位相シフトマスクブランクの製造方法
JP4210166B2 (ja) * 2003-06-30 2009-01-14 Ｈｏｙａ株式会社 グレートーンマスクの製造方法
JP4385690B2 (ja) * 2003-09-09 2009-12-16 凸版印刷株式会社 液晶表示素子製造用露光マスク及びその製造方法

Also Published As

Publication number Publication date
JPWO2007010864A1 (ja) 2009-01-29
WO2007010864A1 (ja) 2007-01-25
JP4898679B2 (ja) 2012-03-21
CN101061431A (zh) 2007-10-24
KR20080016949A (ko) 2008-02-22

Similar Documents

Publication Publication Date Title
TW200712756A (en) Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks
TW200733375A (en) Semiconductor device and manufacturing method thereof
TWI267158B (en) Elongated features for improved alignment process integration
MY144847A (en) Method and system for double-sided patterning of substrates
TW200632127A (en) Shadow frame with mask panels
TW200745737A (en) Photomask blank and photomask making method
TW200600963A (en) Gray scale mask and method of manufacturing the same
TW200618303A (en) Thin film etching method and method of fabricating liquid crystal display device using the same
TW200636850A (en) Semiconductor device and manufacturing method thereof
WO2009075348A1 (ja) 光学フィルタ、ディスプレイ用光学フィルタ及びこれを備えたディスプレイ並びにプラズマディスプレイパネル
TW200629618A (en) Electronic devices and processes for forming electronic devices
TW200632544A (en) Apparatus for forming fine pattern on substrate
TW200702947A (en) Liquid immersion lithography system having a tilted showerhead relative to a substrate
TW200705097A (en) Pattern coating material and pattern formation method
TW200506514A (en) Method for manufacturing gray tone mask, and gray tone mask
TW200700932A (en) Lithography process with an enhanced depth-of-depth
TW200615389A (en) Film forming method, electronic device and electronic apparatus
WO2006096794A3 (en) System having aperture-matched optical component and light emitting device
TW200715043A (en) Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks
DE50212291D1 (de) Beschichtungsverfahren und beschichtungsmittel
ATE521480T1 (de) Opakes bestücktes substrat
TW200608454A (en) Semiconductor device, and fabrication method of semiconductor device
TW200628876A (en) Liquid crystal display
TW200531837A (en) Slotted substrates and methods of forming
TW200641167A (en) Nanofabrication based on sam growth