JPS5779174A - Etching solution for chromium film and chromium oxide film - Google Patents

Etching solution for chromium film and chromium oxide film

Info

Publication number
JPS5779174A
JPS5779174A JP15667980A JP15667980A JPS5779174A JP S5779174 A JPS5779174 A JP S5779174A JP 15667980 A JP15667980 A JP 15667980A JP 15667980 A JP15667980 A JP 15667980A JP S5779174 A JPS5779174 A JP S5779174A
Authority
JP
Japan
Prior art keywords
alcohol
soln
chromium
film
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15667980A
Other languages
Japanese (ja)
Other versions
JPS6328990B2 (en
Inventor
Kunio Masumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP15667980A priority Critical patent/JPS5779174A/en
Publication of JPS5779174A publication Critical patent/JPS5779174A/en
Publication of JPS6328990B2 publication Critical patent/JPS6328990B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/26—Acidic compositions for etching refractory metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE:To eliminate the occurrence of a phenomenon leaving an island and to reduce the formation of black spots by using a soln. prepared by mixing ceric ammonium nitrate with alcohol when a chromium film or a chromium oxide film on a printed substrate is etched. CONSTITUTION:An etching soln. for wet etching is prepared by blending ceric ammonium nitrate as a principal component with perhydrochloric acid, sulfuric acid, nitric acid or acetic acid as a secondary component, and the soln. is mixed with lower alcohol or polyhydric alcohol, preferably mono-, di- or trihydric alcohol. Etching is conducted with the resulting soln. The preferred substituent of the alcohol is <=10C alkyl or alkylene, and for example, methanol, ethanol or 1,2,3-propanetriol is used. Thus, the quality of a hard mask, the guarantee of the quality and the accuracy of the forming process are enhanced.
JP15667980A 1980-11-06 1980-11-06 Etching solution for chromium film and chromium oxide film Granted JPS5779174A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15667980A JPS5779174A (en) 1980-11-06 1980-11-06 Etching solution for chromium film and chromium oxide film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15667980A JPS5779174A (en) 1980-11-06 1980-11-06 Etching solution for chromium film and chromium oxide film

Publications (2)

Publication Number Publication Date
JPS5779174A true JPS5779174A (en) 1982-05-18
JPS6328990B2 JPS6328990B2 (en) 1988-06-10

Family

ID=15632946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15667980A Granted JPS5779174A (en) 1980-11-06 1980-11-06 Etching solution for chromium film and chromium oxide film

Country Status (1)

Country Link
JP (1) JPS5779174A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61124589A (en) * 1984-11-17 1986-06-12 Daikin Ind Ltd Composition for etching agent
US6171765B1 (en) * 1998-05-26 2001-01-09 Agilent Technologies, Inc. Photolithographic processing for polymer LEDs with reactive metal cathodes
WO2007010864A1 (en) * 2005-07-15 2007-01-25 Ulvac Coating Corporation Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks
WO2007010866A1 (en) * 2005-07-15 2007-01-25 Ulvac Coating Corporation Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks
EP2592131A3 (en) * 2011-11-14 2013-06-12 Advanced Technology Materials, Inc. Aqueous cerium-containing solution having an extended bath lifetime for removing mask material
CN112087878A (en) * 2020-09-14 2020-12-15 深圳市志凌伟业光电有限公司 Etching method of composite copper film structure

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61124589A (en) * 1984-11-17 1986-06-12 Daikin Ind Ltd Composition for etching agent
US6171765B1 (en) * 1998-05-26 2001-01-09 Agilent Technologies, Inc. Photolithographic processing for polymer LEDs with reactive metal cathodes
WO2007010864A1 (en) * 2005-07-15 2007-01-25 Ulvac Coating Corporation Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks
WO2007010866A1 (en) * 2005-07-15 2007-01-25 Ulvac Coating Corporation Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks
JP4898679B2 (en) * 2005-07-15 2012-03-21 アルバック成膜株式会社 Manufacturing method of gray tone mask using blanks for gray tone mask
JP4898680B2 (en) * 2005-07-15 2012-03-21 アルバック成膜株式会社 Manufacturing method of gray tone mask using blanks for gray tone mask
EP2592131A3 (en) * 2011-11-14 2013-06-12 Advanced Technology Materials, Inc. Aqueous cerium-containing solution having an extended bath lifetime for removing mask material
CN112087878A (en) * 2020-09-14 2020-12-15 深圳市志凌伟业光电有限公司 Etching method of composite copper film structure

Also Published As

Publication number Publication date
JPS6328990B2 (en) 1988-06-10

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