JPS5647571A - Etching liquid for mo - Google Patents
Etching liquid for moInfo
- Publication number
- JPS5647571A JPS5647571A JP12496979A JP12496979A JPS5647571A JP S5647571 A JPS5647571 A JP S5647571A JP 12496979 A JP12496979 A JP 12496979A JP 12496979 A JP12496979 A JP 12496979A JP S5647571 A JPS5647571 A JP S5647571A
- Authority
- JP
- Japan
- Prior art keywords
- etching liquid
- iodic acid
- water
- etching
- concn
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/26—Acidic compositions for etching refractory metals
Abstract
PURPOSE:To enable the fine processing by using the etching liquid for Mo containing iodic acid. CONSTITUTION:This iodic acid containing etching liquid is prepared by using water, an aqueous ammonia solution and an org. solvent forming a mixed solution with water and the concn. of iodic acid is adjusted to 0.03-1wt%. This etching liquid has a rapid etching speed for Mo and can form fine patterns on a surface or a thin layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12496979A JPS5647571A (en) | 1979-09-28 | 1979-09-28 | Etching liquid for mo |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12496979A JPS5647571A (en) | 1979-09-28 | 1979-09-28 | Etching liquid for mo |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5647571A true JPS5647571A (en) | 1981-04-30 |
Family
ID=14898694
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12496979A Pending JPS5647571A (en) | 1979-09-28 | 1979-09-28 | Etching liquid for mo |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5647571A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6537357B2 (en) * | 2001-02-20 | 2003-03-25 | Glenn Paul Wampole, Sr. | Treatment of wood, wood fiber products, and porous surfaces with periodic acid and iodic acid |
WO2004040633A1 (en) * | 2002-10-25 | 2004-05-13 | Intersurface Dynamics, Inc. | Method for using additives in the caustic etching of silicon for obtaining improved surface characteristics |
US7179327B2 (en) | 2001-02-20 | 2007-02-20 | Wampole Sr Glenn P | Wood treatment process and chemical composition |
-
1979
- 1979-09-28 JP JP12496979A patent/JPS5647571A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6537357B2 (en) * | 2001-02-20 | 2003-03-25 | Glenn Paul Wampole, Sr. | Treatment of wood, wood fiber products, and porous surfaces with periodic acid and iodic acid |
US7179327B2 (en) | 2001-02-20 | 2007-02-20 | Wampole Sr Glenn P | Wood treatment process and chemical composition |
WO2004040633A1 (en) * | 2002-10-25 | 2004-05-13 | Intersurface Dynamics, Inc. | Method for using additives in the caustic etching of silicon for obtaining improved surface characteristics |
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